公开(公告)号：US20050173049A1

公开(公告)日：2005-08-11

申请号：US10515687

申请日：2003-05-26

Applicant: Marinus Josephus Dona ,  Martin Blees ,  Michel Decre ,  Patrick Van Eerd ,  Richard Schroeders ,  Teunis Heijmans ,  Christiaan Leonard Janssen ,  Peter Slikkerveer

Inventor： Marinus Josephus Dona ,  Martin Blees ,  Michel Decre ,  Patrick Van Eerd ,  Richard Schroeders ,  Teunis Heijmans ,  Christiaan Leonard Janssen ,  Peter Slikkerveer

IPC: B41K3/02 ,  B05C1/02 ,  B05D1/28 ,  B41K1/02 ,  B41K1/22 ,  B41M1/04 ,  B41M1/30 ,  G03F7/00 ,  B44C1/165 ,  B44C1/00

CPC classification number: G03F7/0002 ,  B05C1/027 ,  B05D1/28 ,  B82Y10/00 ,  B82Y40/00

Abstract: The invention relates to a method for transferring a pattern from a stamping surface (31) of a stamp (30) to a receiving surface (21) of a substrate (20). The pattern is transferred to the receiving surface (21) by successively bringing portions of the pattern within such a range of the receiving surface (21) during a certain period, that the pattern is locally transferred from the stamping surface (31) to the receiving surface (21). The individual portions can be moved by means of individual actuators (50). By applying the method, the transfer of the pattern can be performed according to a wave, which is for example ring-shaped, moving from the center of the receiving surface (21) to the circumference, or linear, moving from side of the receiving surface (21) to an opposite side.

Abstract translation: 本发明涉及一种用于将图案从印模（30）的冲压表面（31）转移到基板（20）的接收表面（21）的方法。 通过将图案的一部分在接收表面（21）的一定范围内依次连续地传送到接收面（21），将图案从冲压表面（31）局部转移到接收面 表面（21）。 各个部分可以通过各个致动器（50）移动。 通过应用该方法，可以根据从接收表面（21）的中心移动到圆周的波形（例如环形），或者线性地从接收侧移动的波形来执行图案的传送 表面（21）到相对侧。

公开(公告)号：US20050003590A1

公开(公告)日：2005-01-06

申请号：US10497926

申请日：2002-11-25

Applicant: Martin Blees ,  Marcel Boehmer

Inventor： Martin Blees ,  Marcel Boehmer

IPC: H01L21/28 ,  C23C18/16 ,  H01L21/285 ,  H01L21/288 ,  H01L21/336 ,  H01L29/417 ,  H01L29/45 ,  H01L29/786 ,  H01L51/05 ,  H01L21/00 ,  H01L21/44 ,  H01L21/84

CPC classification number: B82Y30/00 ,  B82Y10/00 ,  C23C18/1605 ,  C23C18/1651 ,  C23C18/40 ,  C23C18/44 ,  H01L21/288 ,  H01L29/41733 ,  H01L29/458 ,  H01L29/66742

Abstract: A method for creating a source and a drain of a thin film transistor is disclosed. The method comprises the step (106) of forming a mask of a monolayer on a substrate. The mask will be used for selective electroless deposition of a metal layer (108). Thus, a metal layer could be grown in the areas where no monolayer is present. As a result, the grown metal layer could form a source and a drain with a gap in-between, where the monolayer has prevented deposition.

Abstract translation: 公开了一种用于产生薄膜晶体管的源极和漏极的方法。 该方法包括在基底上形成单层的掩模的步骤（106）。 掩模将用于金属层（108）的选择性无电沉积。 因此，可以在不存在单层的区域中生长金属层。 结果，生长的金属层可以形成在其间具有间隙的源和漏极，其中单层已经防止沉积。

公开(公告)号：US20070227383A1

公开(公告)日：2007-10-04

申请号：US11570801

申请日：2005-06-27

Applicant: Michel Decre ,  Martin Blees ,  Patrick Van Eerd ,  Richard Schroeders ,  Dirk Burdinski ,  Ruben Sharpe ,  Jurriaan Huskens

Inventor： Michel Decre ,  Martin Blees ,  Patrick Van Eerd ,  Richard Schroeders ,  Dirk Burdinski ,  Ruben Sharpe ,  Jurriaan Huskens

IPC: G03F7/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  H05K3/0002 ,  H05K3/1275 ,  H05K2203/0108 ,  H05K2203/1173

Abstract: The present invention provides a soft lithographic stamp (30) and a method for the manufacturing of such a stamp (30). A stamp (30) according to the present invention comprises blocking regions (37) and printing regions (38). The blocking regions (37) are formed of a material which is different from the material the printing regions (38) are formed of and which exhibits a reduced permeability, diffusivity or absorbing or adsorbing capability to the printing compound, such that it prevents or significantly reduces chemical or physical transport or transfer of the printing compound from the blocking regions to a substrate that has to be patterned or printed. In that way, when impregnating the stamp (30) with a printing compound, the printing compound only diffuses into the printing regions (38) and hence, the printing compound is only transferred from the printing regions (38) to the substrate to be patterned and substantially no diffusion of printing compound via air voids (33) between protruding elements (32) will occur.

Abstract translation: 本发明提供了一种软光刻印模（30）及其制造方法。 根据本发明的印模（30）包括阻挡区域（37）和印刷区域（38）。 阻挡区域（37）由不同于印刷区域（38）的材料形成的材料形成，并且其对印刷化合物的渗透性，扩散性或吸收或吸附能力降低，从而防止或显着地 减少化学或物理运输或将印刷化合物从阻挡区转移到必须被图案化或印刷的基底上。 以这种方式，当用印刷化合物浸渍印模（30）时，印刷化合物仅扩散到印刷区域（38）中，因此印刷化合物仅从印刷区域（38）转移到待图案化的基材 并且基本上不会在突出元件（32）之间通过空气（33）扩散印刷化合物。

公开(公告)号：US20050263025A1

公开(公告)日：2005-12-01

申请号：US10521856

申请日：2003-07-10

Applicant: Martin Blees

Inventor： Martin Blees

IPC: H01L21/027 ,  B05D1/28 ,  G03F7/00 ,  B41F1/16

CPC classification number: G03F7/0002 ,  B05D1/283 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00

Abstract: The invention relates to micro-contact printing, wherein a self-assembled monolayer(SAM)-forming molecular species (1) is applied to a surface (2) of an article (3). The SAM-forming species (1) comprise a polar functional group that is exposed when the species (1) form a monolayer. This enables said printing method to be performed in vacuum or in a gaseous atnosphere, preferably in air. The invention also relates to an article having a surface comprising at least one isolated region of a SAM having a lateral dimension within the range of from 1 to 100 nm. Furthermore, the invention relates to a method for producing at least one nanowire, or a grid of nanowires, having a lateral dimension within the range of from 1 to 100 nm.

Abstract translation: 本发明涉及微接触印刷，其中将自组装单层（SAM）形成分子种类（1）施加到制品（3）的表面（2）。 SAM形成物质（1）包含当物质（1）形成单层时暴露的极性官能团。 这使得所述打印方法能够在真空中或在气态的空气中，优选在空气中进行。 本发明还涉及一种具有表面的制品，该表面包含至少一个具有1至100nm范围内的横向尺寸的SAM的隔离区域。 此外，本发明涉及一种用于生产至少一个纳米线或纳米线网格的方法，其具有在1至100nm范围内的横向尺寸。