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公开(公告)号：US08293451B2
公开(公告)日：2012-10-23
申请号：US12543003
申请日：2009-08-18
申请人： Martin Glodde , Dario L. Goldfarb , Wu-Song Huang , Wai-Kin Li , Sen Liu , Pushkara R. Varanasi , Libor Vyklicky
发明人： Martin Glodde , Dario L. Goldfarb , Wu-Song Huang , Wai-Kin Li , Sen Liu , Pushkara R. Varanasi , Libor Vyklicky
CPC分类号： G03F7/091 , G03F9/7026
摘要： A curable liquid formulation containing at least (i) one or more near-infrared absorbing triphenylamine-based dyes, and (ii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.
摘要翻译： 包含至少（i）一种或多种近红外吸收性三苯胺类染料的可固化液体制剂，和（ii）一种或多种浇铸溶剂。 本发明还涉及由可固化液体制剂的交联形式组成的固体近红外吸收膜。 本发明还涉及一种含有固体近红外线吸收膜的涂层的微电子衬底，以及在近红外吸收膜位于微电子衬底之间的情况下，用于图案化涂覆在微电子衬底上的光刻胶层的方法 和光刻胶膜。
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公开(公告)号：US08586283B2
公开(公告)日：2013-11-19
申请号：US13608409
申请日：2012-09-10
申请人： Martin Glodde , Dario L. Goldfarb , Wu-Song Huang , Wai-Kin Li , Sen Liu , Pushkara R. Varanasi , Libor Vyklicky
发明人： Martin Glodde , Dario L. Goldfarb , Wu-Song Huang , Wai-Kin Li , Sen Liu , Pushkara R. Varanasi , Libor Vyklicky
CPC分类号： G03F7/091 , G03F9/7026
摘要： A curable liquid formulation containing at least (i) one or more near-infrared absorbing triphenylamine-based dyes, and (ii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.
摘要翻译： 包含至少（i）一种或多种近红外吸收性三苯胺类染料的可固化液体制剂，和（ii）一种或多种浇铸溶剂。 本发明还涉及由可固化液体制剂的交联形式组成的固体近红外吸收膜。 本发明还涉及一种含有固体近红外线吸收膜的涂层的微电子衬底，以及在近红外吸收膜位于微电子衬底之间的情况下，用于图案化涂覆在微电子衬底上的光刻胶层的方法 和光刻胶膜。
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公开(公告)号：US20130001484A1
公开(公告)日：2013-01-03
申请号：US13608409
申请日：2012-09-10
申请人： Martin Glodde , Dario L. Goldfarb , Wu-Song Huang , Wai-Kin Li , Sen Liu , Pushkara R. Varanasi , Libor Vyklicky
发明人： Martin Glodde , Dario L. Goldfarb , Wu-Song Huang , Wai-Kin Li , Sen Liu , Pushkara R. Varanasi , Libor Vyklicky
IPC分类号： G02B5/24
CPC分类号： G03F7/091 , G03F9/7026
摘要： A curable liquid formulation containing at least (i) one or more near-infrared absorbing triphenylamine-based dyes, and (ii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.
摘要翻译： 包含至少（i）一种或多种近红外吸收性三苯胺类染料的可固化液体制剂，和（ii）一种或多种浇铸溶剂。 本发明还涉及由可固化液体制剂的交联形式组成的固体近红外吸收膜。 本发明还涉及一种含有固体近红外线吸收膜的涂层的微电子衬底，以及在近红外吸收膜位于微电子衬底之间的情况下，用于图案化涂覆在微电子衬底上的光刻胶层的方法 和光刻胶膜。
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公开(公告)号：US20110042653A1
公开(公告)日：2011-02-24
申请号：US12543003
申请日：2009-08-18
申请人： Martin Glodde , Dario L. Goldfarb , Wu-Song Huang , Wai-Kin Li , Sen Liu , Pushkara R. Varanasi , Libor Vyklicky
发明人： Martin Glodde , Dario L. Goldfarb , Wu-Song Huang , Wai-Kin Li , Sen Liu , Pushkara R. Varanasi , Libor Vyklicky
CPC分类号： G03F7/091 , G03F9/7026
摘要： A curable liquid formulation containing at least (i) one or more near-infrared absorbing triphenylamine-based dyes, and (ii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.
摘要翻译： 包含至少（i）一种或多种近红外吸收性三苯胺类染料的可固化液体制剂，和（ii）一种或多种浇铸溶剂。 本发明还涉及由可固化液体制剂的交联形式组成的固体近红外吸收膜。 本发明还涉及一种含有固体近红外线吸收膜的涂层的微电子衬底，以及在近红外吸收膜位于微电子衬底之间的情况下，用于图案化涂覆在微电子衬底上的光刻胶层的方法 和光刻胶膜。
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公开(公告)号：US08772376B2
公开(公告)日：2014-07-08
申请号：US12542970
申请日：2009-08-18
申请人： Wu-Song Huang , Martin Glodde , Dario L. Goldfarb , Wai-Kin Li , Sen Liu , Libor Vyklicky
发明人： Wu-Song Huang , Martin Glodde , Dario L. Goldfarb , Wai-Kin Li , Sen Liu , Libor Vyklicky
IPC分类号： C09D163/00 , C08L63/00 , C08K5/00 , B32B27/20 , B32B27/38 , C08G59/32 , C08G59/68 , G02B5/22
CPC分类号： G03F7/0388 , G03F7/038 , G03F7/091 , G03F7/11 , H01L51/447
摘要： A curable liquid formulation comprising: (i) one or more near-infrared absorbing polymethine dyes; (ii) one or more crosslinkable polymers; and (iii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.
摘要翻译： 一种可固化液体制剂，其包含：（i）一种或多种近红外吸收聚甲炔染料; （ii）一种或多种可交联聚合物; 和（iii）一种或多种浇铸溶剂。 本发明还涉及由可固化液体制剂的交联形式组成的固体近红外吸收膜。 本发明还涉及一种含有固体近红外线吸收膜的涂层的微电子衬底，以及在近红外吸收膜位于微电子衬底之间的情况下，用于图案化涂覆在微电子衬底上的光刻胶层的方法 和光刻胶膜。
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公开(公告)号：US20110042771A1
公开(公告)日：2011-02-24
申请号：US12542970
申请日：2009-08-18
申请人： Wu-Song Huang , Martin Glodde , Dario L. Goldfarb , Wai-Kin Li , Sen Liu , Libor Vyklicky
发明人： Wu-Song Huang , Martin Glodde , Dario L. Goldfarb , Wai-Kin Li , Sen Liu , Libor Vyklicky
IPC分类号： H01L31/0216 , G03F7/004 , G03F7/20
CPC分类号： G03F7/0388 , G03F7/038 , G03F7/091 , G03F7/11 , H01L51/447
摘要： A curable liquid formulation comprising: (i) one or more near-infrared absorbing polymethine dyes; (ii) one or more crosslinkable polymers; and (iii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.
摘要翻译： 一种可固化液体制剂，其包含：（i）一种或多种近红外吸收聚甲炔染料; （ii）一种或多种可交联聚合物; 和（iii）一种或多种浇铸溶剂。 本发明还涉及由可固化液体制剂的交联形式组成的固体近红外吸收膜。 本发明还涉及一种含有固体近红外线吸收膜的涂层的微电子衬底，以及在近红外吸收膜位于微电子衬底之间的情况下，用于图案化涂覆在微电子衬底上的光刻胶层的方法 和光刻胶膜。
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公开(公告)号：US09726977B2
公开(公告)日：2017-08-08
申请号：US12658615
申请日：2010-02-08
申请人： James F. Cameron , Jin Wuk Sung , John P. Amara , Greogory P. Prokopowicz , David A. Valeri , Libor Vyklicky , Wu-Song S. Huang , Wenjie Li , Pushkara R. Varanasi , Irene Y. Popova
发明人： James F. Cameron , Jin Wuk Sung , John P. Amara , Greogory P. Prokopowicz , David A. Valeri , Libor Vyklicky , Wu-Song S. Huang , Wenjie Li , Pushkara R. Varanasi , Irene Y. Popova
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development of an overcoated photoresist layer. Preferred coating compositions comprise a tetrapolymer that comprises at least four distinct functional groups.
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公开(公告)号：US20100297557A1
公开(公告)日：2010-11-25
申请号：US12658615
申请日：2010-02-08
申请人： James F. Cameron , Jin Wuk Sung , John P. Amara , Greogory P. Prokopowicz , David A. Valeri , Libor Vyklicky , Wu-Song S. Huang , Wenjie Li , Pushkara R. Varanasi , Irene Y. Popova
发明人： James F. Cameron , Jin Wuk Sung , John P. Amara , Greogory P. Prokopowicz , David A. Valeri , Libor Vyklicky , Wu-Song S. Huang , Wenjie Li , Pushkara R. Varanasi , Irene Y. Popova
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development of an overcoated photoresist layer. Preferred coating compositions comprise a tetrapolymer that comprises at least four distinct functional groups.
摘要翻译： 提供了可以用含水碱性显影剂显影的有机涂料组合物，特别是抗反射涂料组合物，包括在外涂光致抗蚀剂层的显影过程中的一个步骤。 优选的涂料组合物包含包含至少四个不同官能团的四元共聚物。
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公开(公告)号：US20130052593A1
公开(公告)日：2013-02-28
申请号：US13221248
申请日：2011-08-30
IPC分类号： G03F7/20
CPC分类号： G03F7/405
摘要： An adhesion promoter layer is formed on a surface of a substrate as an adhesion promoter layer, on which a photoresist is applied. The photoresist is lithographically exposed. Soluble portions of the lithographically exposed photoresist are dissolved in a developer solution including tetraalkylammonium hydroxide. Tetraalkylammonium hydroxide salts are formed in crystalline forms on surfaces of the substrate. A water-soluble acidic polymer layer is applied over the surfaces of the substrate to dissolve the tetraalkylammonium hydroxide salts. The water-soluble acidic polymer layer is rinsed off by water, thereby providing clean surfaces that do not include the tetraalkylammonium hydroxide salts on the substrate. Subsequent processes can be performed on the substrate, which is covered by remaining portions of the developed photoresist and has clean surfaces in regions not covered by the photoresist.
摘要翻译： 在基材的表面上形成粘合促进剂层作为粘合促进剂层，在其上施加光致抗蚀剂。 光致抗蚀剂被光刻曝光。 将光刻曝光的光致抗蚀剂的可溶部分溶解在包括四烷基氢氧化铵的显影剂溶液中。 四烷基氢氧化铵盐以结晶形式形成在基材的表面上。 将水溶性酸性聚合物层施加在基材的表面上以溶解四烷基氢氧化铵盐。 将水溶性酸性聚合物层用水冲洗掉，由此提供在基材上不包括四烷基氢氧化铵盐的清洁表面。 随后的工艺可以在衬底上进行，其被显影的光致抗蚀剂的剩余部分覆盖，并且在未被光致抗蚀剂覆盖的区域中具有清洁的表面。
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10.发明申请Self-Segregating Multilayer Imaging Stack With Built-In Antireflective Properties 审中-公开具有内置抗反射特性的自分离多层成像叠层公开(公告)号：US20110300483A1
公开(公告)日：2011-12-08
申请号：US13190252
申请日：2011-07-25
申请人： Joy Cheng , Dario L. Goldfarb , David R. Medeiros , Daniel P. Sanders , Dirk Pfeiffer , Libor Vyklicky
发明人： Joy Cheng , Dario L. Goldfarb , David R. Medeiros , Daniel P. Sanders , Dirk Pfeiffer , Libor Vyklicky
CPC分类号： G03F7/091 , G03F7/0752 , Y10S430/136 , Y10S438/952 , Y10T428/24802
摘要： A coating process comprises forming a patterned material layer on a substrate using a self-segregating polymeric composition comprising a polymeric photoresistive material and an antireflective coating material contained in a single solution. When depositing this solution on a substrate and removing the solvent, the two materials self-segregate into two layers. This produces a coated substrate having a uniaxial bilayer coating oriented in a direction orthogonal to the substrate with a top photoresistive coating layer and a bottom antireflective coating layer. Pattern-wise exposing the coated substrate to imaging radiation and contacting the coated substrate with a developer, produces the patterned material layer. Any optional top coat material and a portion of the photoresist layer can be simultaneously removed from the coated substrate to form a patterned photoresist layer on the substrate.
摘要翻译： 涂覆方法包括使用包含聚合物光致抗蚀剂材料和包含在单一溶液中的抗反射涂层材料的自分离聚合物组合物在基材上形成图案化材料层。 当将该溶液沉积在基材上并除去溶剂时，两种材料自分离成两层。 这产生了具有单轴双层涂层的涂覆基材，该单轴双层涂层在垂直于基板的方向上具有顶部光刻胶涂层和底部抗反射涂层。 将经涂覆的基底图案地曝光成成像辐射并使涂覆的基底与显影剂接触，产生图案化的材料层。 任何可选的表面涂层材料和光致抗蚀剂层的一部分可以同时从涂覆的基底上移除，以在基底上形成图案化的光致抗蚀剂层。
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