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公开(公告)号：US20100297557A1
公开(公告)日：2010-11-25
申请号：US12658615
申请日：2010-02-08
申请人： James F. Cameron , Jin Wuk Sung , John P. Amara , Greogory P. Prokopowicz , David A. Valeri , Libor Vyklicky , Wu-Song S. Huang , Wenjie Li , Pushkara R. Varanasi , Irene Y. Popova
发明人： James F. Cameron , Jin Wuk Sung , John P. Amara , Greogory P. Prokopowicz , David A. Valeri , Libor Vyklicky , Wu-Song S. Huang , Wenjie Li , Pushkara R. Varanasi , Irene Y. Popova
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development of an overcoated photoresist layer. Preferred coating compositions comprise a tetrapolymer that comprises at least four distinct functional groups.
摘要翻译： 提供了可以用含水碱性显影剂显影的有机涂料组合物，特别是抗反射涂料组合物，包括在外涂光致抗蚀剂层的显影过程中的一个步骤。 优选的涂料组合物包含包含至少四个不同官能团的四元共聚物。
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公开(公告)号：US09726977B2
公开(公告)日：2017-08-08
申请号：US12658615
申请日：2010-02-08
申请人： James F. Cameron , Jin Wuk Sung , John P. Amara , Greogory P. Prokopowicz , David A. Valeri , Libor Vyklicky , Wu-Song S. Huang , Wenjie Li , Pushkara R. Varanasi , Irene Y. Popova
发明人： James F. Cameron , Jin Wuk Sung , John P. Amara , Greogory P. Prokopowicz , David A. Valeri , Libor Vyklicky , Wu-Song S. Huang , Wenjie Li , Pushkara R. Varanasi , Irene Y. Popova
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development of an overcoated photoresist layer. Preferred coating compositions comprise a tetrapolymer that comprises at least four distinct functional groups.
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公开(公告)号：US08940472B2
公开(公告)日：2015-01-27
申请号：US12658614
申请日：2010-02-08
IPC分类号： G03F7/11 , G03F7/16 , G03F7/30 , G03F7/09 , C08F220/36
CPC分类号： G03F7/091 , B05D1/005 , B05D3/0254 , B05D3/06 , B05D5/061 , B05D7/54 , C08F220/36 , C09D5/006 , C09D133/12 , G03F7/11 , G03F7/16 , G03F7/20 , G03F7/322
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
摘要翻译： 提供了包含二烯/亲二烯体反应产物的有机涂料组合物，特别是抗反射涂料组合物。 本发明的优选组合物可用于减少来自衬底的曝光辐射反射回外涂光致抗蚀剂层的反射和/或作为平坦化，保形或通孔填充层的功能。
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公开(公告)号：US20100297556A1
公开(公告)日：2010-11-25
申请号：US12658614
申请日：2010-02-08
IPC分类号： G03F7/004 , G03F7/20 , C08G73/10 , C07D487/08
CPC分类号： G03F7/091 , B05D1/005 , B05D3/0254 , B05D3/06 , B05D5/061 , B05D7/54 , C08F220/36 , C09D5/006 , C09D133/12 , G03F7/11 , G03F7/16 , G03F7/20 , G03F7/322
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
摘要翻译： 提供了包含二烯/亲二烯体反应产物的有机涂料组合物，特别是抗反射涂料组合物。 本发明的优选组合物可用于减少来自衬底的曝光辐射反射回外涂光致抗蚀剂层的反射和/或作为平坦化，保形或通孔填充层的功能。
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公开(公告)号：US08883407B2
公开(公告)日：2014-11-11
申请号：US12813228
申请日：2010-06-10
IPC分类号： G03F7/30 , G03F7/09 , G03F7/16 , G03F7/20 , C08F220/36 , G03F7/095 , H01L21/027
CPC分类号： C09D5/006 , C07C69/76 , C07C69/94 , C08F220/36 , C09D133/14 , G03F7/091 , G03F7/16 , G03F7/168 , G03F7/20 , G03F7/322 , H01L21/0276
摘要： In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
摘要翻译： 在一个方面，提供了包含二烯/亲二烯体反应产物的有机涂料组合物，特别是抗反射涂料组合物。 在另一方面，提供了包含包含羟基 - 萘甲酸基团的组分的有机涂料组合物，特别是抗反射涂料组合物，例如6-羟基-2-萘甲酸基团。本发明的优选组合物可用于减少曝光辐射的反射 从衬底返回到外涂光致抗蚀剂层和/或作为平坦化，共形或通孔填充层的功能。
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公开(公告)号：US20110003250A1
公开(公告)日：2011-01-06
申请号：US12813228
申请日：2010-06-10
CPC分类号： C09D5/006 , C07C69/76 , C07C69/94 , C08F220/36 , C09D133/14 , G03F7/091 , G03F7/16 , G03F7/168 , G03F7/20 , G03F7/322 , H01L21/0276
摘要： In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
摘要翻译： 一方面，提供了包含二烯/亲二烯体反应产物的有机涂料组合物，特别是抗反射涂料组合物。 在另一方面，提供了包含包含羟基 - 萘甲酸基团的组分的有机涂料组合物，特别是抗反射涂料组合物，例如6-羟基-2-萘甲酸基团。本发明的优选组合物可用于减少曝光辐射的反射 从衬底返回到外涂光致抗蚀剂层和/或作为平坦化，共形或通孔填充层的功能。
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公开(公告)号：US07326518B2
公开(公告)日：2008-02-05
申请号：US11287104
申请日：2005-11-23
CPC分类号： G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/114
摘要： Chemically-amplified positive photoresist compositions are provided that contain a resin that comprises acetal and alicyclic groups. Photoresists of the invention can exhibit notably enhanced lithographic properties. Preferred photoresists of the invention comprise one or more photoacid generator compounds and one or more phenolic resins comprise one or more photoacid-labile acetal groups and one or more alicyclic groups such as adamantyl.
摘要翻译： 提供化学扩增的正性光致抗蚀剂组合物，其含有包含缩醛和脂环族基团的树脂。 本发明的光刻胶可显示出显着增强的平版印刷性能。 本发明优选的光致抗蚀剂包含一种或多种光酸产生剂化合物，一种或多种酚醛树脂包含一种或多种光酸不稳定的缩醛基和一种或多种脂环族基，例如金刚烷基。
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公开(公告)号：US07297616B2
公开(公告)日：2007-11-20
申请号：US10822225
申请日：2004-04-09
IPC分类号： H01L21/425
CPC分类号： G03F7/40 , G03F7/0392 , G03F7/0397 , G03F7/16 , G03F7/405
摘要： New photoresists are provided that can be applied and imaged with reduced undesired outgassing and/or as thick coating layers. Preferred resists of the invention are chemically-amplified positive-acting resists that contain photoactive and resin components.
摘要翻译： 提供了新的光致抗蚀剂，其可以用减少的不需要的脱气和/或作为厚的涂层施加和成像。 本发明优选的抗蚀剂是含有光活性和树脂成分的化学放大的正性作用抗蚀剂。
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公开(公告)号：US20080220597A1
公开(公告)日：2008-09-11
申请号：US11981623
申请日：2007-10-31
IPC分类号： H01L21/425
CPC分类号： G03F7/40 , G03F7/0392 , G03F7/0397 , G03F7/16 , G03F7/405
摘要： New photoresists are provided that can be applied and imaged with reduced undesired outgassing and/or as thick coating layers. Preferred resists of the invention are chemically-amplified positive-acting resists that contain photoactive and resin components.
摘要翻译： 提供了新的光致抗蚀剂，其可以用减少的不需要的脱气和/或作为厚的涂层施加和成像。 本发明优选的抗蚀剂是含有光活性和树脂成分的化学放大的正性作用抗蚀剂。
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公开(公告)号：US08900792B2
公开(公告)日：2014-12-02
申请号：US13339948
申请日：2011-12-29
申请人： James W. Thackeray , Suzanne M. Coley , Vipul Jain , Owendi Ongayi , James F. Cameron , Paul J. Labeaume , Ahmad E. Madkour
发明人： James W. Thackeray , Suzanne M. Coley , Vipul Jain , Owendi Ongayi , James F. Cameron , Paul J. Labeaume , Ahmad E. Madkour
IPC分类号： G03F7/004 , G03F7/029 , C07D333/76 , G03F7/20 , C07C309/12 , C07C309/42 , C07C381/12 , G03F7/039 , C08F220/38
CPC分类号： G03F7/0045 , C07C309/12 , C07C309/42 , C07C381/12 , C07D333/76 , C08F220/38 , G03F7/0046 , G03F7/0397 , G03F7/20 , Y10S430/122 , Y10S430/123 , Y10S430/126
摘要： A compound has formula (I): Q-O-(A)-Z−G+ (I) wherein Q is a halogenated or non-halogenated, C2-30 olefin-containing group, A is a fluorine-substituted C1-30 alkylene group, a fluorine-substituted C3-30 cycloalkylene group, a fluorine-substituted C6-30 arylene group, or a fluorine-substituted C7-30 alkylene-arylene group, Z is an anionic group comprising sulfonate, sulfonamide, or sulfonimide, and G+ has formula (II): wherein X is S or I, each R0 is halogenated or non-halogenated and is independently C1-30 alkyl group; a polycyclic or monocyclic C3-30 cycloalkyl group; a polycyclic or monocyclic C4-30 aryl group; or a combination of these, wherein when X is S, one of the R0 groups is optionally attached to one adjacent R0 group by a single bond, and a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 3. A copolymer, a photoresist, a coated substrate and method of patterning are disclosed.
摘要翻译： 化合物具有式（I）：QO-（A）-Z-G +（I）其中Q是卤代或非卤代的含C30-30烯烃基团，A是氟取代的C1-30亚烷基， 氟取代的C3-30亚环烷基，氟取代的C6-30亚芳基或氟取代的C7-30亚烷基 - 亚芳基，Z是包含磺酸酯，磺酰胺或磺酰亚胺的阴离子基团，G +具有式 （II）：其中X为S或I，每个R 0为卤代或非卤代，独立地为C 1-30烷基; 多环或单环C 3-30环烷基; 多环或单环C 4-30芳基; 或这些的组合，其中当X是S时，R0中的一个可任选地通过单键连接到一个相邻的R0基团，a是2或3，其中当X是I时，a是2，或当X 是S，a是3。公开了共聚物，光致抗蚀剂，涂布的基材和图案化方法。
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