摘要:
A mark position detecting method and apparatus, suitably usable in a semiconductor device manufacturing exposure apparatus, called a stepper, prints images of a pattern of a reticle upon different shot areas on a semiconductor wafer, and aligns the reticle and the wafer. In this method, fuzzy reasoning is made by using, for example, a membership function which empirically represents the relationship between a mark signal and an alignment result. By using a conclusion of the fuzzy reasoning, the position of the mark is detected. Thus, the alignment accuracy can be improved significantly.
摘要:
A copying apparatus is provided with image reading device for reading image information on an original as image element signals, indicating device for indicating the area of the original to be masked in the scanning area of the original by the image reading device, mask signal formation device for reading the masked area indicated by the indicating device, by the image reading device and for forming mask signals, and recording device for controlling the image information read by the image reading devices, by the mask signals obtained by the mask signal formation device, to obtain on a recording medium a record in which the area indicated by the indicating device is masked.
摘要:
An image processing apparatus has CCDs for reading image data of an original, an edge detector for detecting edges of an area specified on the original with a loop or marks of a specific color, an area detector for detecting the specified area, memories for storing the image data read by the CCDs, and a data selector and a data switching circuit for selecting the image data read by one of the CCDs which is to be supplied to an inkjet head for recording. For preventing contamination of the original, the loop or marks can be drawn on the original through an original cover including a transparent or semitransparent sheet member facing the image of the original. Images inside and outside the area or areas can be selectively reproduced in various combinations of the normal mode, red output modes involving different types of color conversion, and extinguishing mode. Image data from another source which is stored in another memory can be inserted at a desired part of the reproduced copy.
摘要:
A solid-state photoelectric transducer comprises a plurality of output units for photoelectrically converted signals which units are constructed of: a plurality of photoelectric converter elements, a plurality of signal accumulators for accumulating signals output from said photoelectric converter elements corresponding to an amount of light incident on said photoelectric converter elements, each of said signal accumulators being connected with an associated one of said photoelectric converter elements; a plurality of devices for returning the signal accumulators from a signal accumulating state to an initial state, each of said devices being connected with an associated one of the signal accumulators; a plurality of signal amplifiers for outputting amplified signals corresponding to the signals accumulated in the signal accumulators, each signal amplifier being connected with an associated signal accumulator; and a plurality of cross-talk preventors for preventing cross-talk of the signal output from each signal amplifier, each signal amplifier being provided with one of the cross-talk preventors; a plurality of said signal amplifiers being exclusively selected by a unit selecting signal in each of said output units, said output units having a controlling line which transmits a controlling signal for controlling each of the return devices to the initial state in common, and the signal amplifiers of the same level in each output unit having a signal output line in common.
摘要:
An information read-out and recording apparatus includes an optical information read-out device for converting optical information into electrical information signals. A serial-input/parallel-output shift register stores information signals from the optical information read-out device and a latch circuit stores information from the shift register for supply to a recording device. The recording device records on a recording medium in accordance with the output of the latch circuit, which parallelly stores the contents of the shift register after a predetermined number of bits of information have been serially stored in the shift register.
摘要:
A copying apparatus is provided with an image reading device for reading image information on an original as electrical image signals, a manually operable device for designating an arbitrary area of the original and apparatus for outputting a gate signal in accordance with the area designated by the manually operable device. In response to the gate signal thus formed, a gate device extracts from the electrical signals generated by the reading device image signals corresponding to the designated area which signals are stored in a memory device. A recording device can then record an image in the designated area on plural sheets of recording medium in response to repeated readout of the image signals from the memory device.
摘要:
An alignment apparatus including a first off-axis alignment optical system having a magnification, and a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, wherein the apparatus is operable in a global alignment mode using the second off-axis alignment optical system. In another aspect, there is provided an alignment apparatus which includes a first off-axis alignment optical system having a magnification, a second off-axis alignment optical system having a magnification higher than that of the first off-axis alignment optical system, and a TTL alignment optical system, wherein the alignment apparatus is operable in a global alignment mode using the second off-axis alignment optical system and is operable in another global alignment mode using the TTL optical alignment system.
摘要:
A mark detecting method and device suitably applicable to the alignment of a reticle in a semiconductor device manufacturing exposure apparatus, called a stepper, is disclosed. A mark is provided by repeated patterns having specific pitches. These patterns are set so that at least one pitch of the patterns differs, on a light-receiving surface of an image sensor which receives an image of the mark, from a multiple, by an integral number, of the sampling pitch (pitch of picture elements) of the image sensor. In one preferred form, the mark is formed by repeated patterns of a number N (.gtoreq.2), wherein at least one pitch Pp of the patterns satisfies, on the light-receiving surface of the image sensor, a relationship Pp=(m+n/N).times.Pix where m is an arbitrary number, n is an integral number which satisfies 1.ltoreq.n.ltoreq.N, and Pix is the sampling pitch of the image sensor. The image of such a mark is photoelectrically converted to thereby determine the position of the mark. With the proposed concept, any error which might be caused upon quantization of the mark image by the picture elements of the image sensor can be canceled or compensated at the time of calculation of the mark center. Therefore, the precision of the mark center detection can be improved.
摘要翻译:公开了适用于半导体装置制造用曝光装置(称为步进机)中的掩模版的取向的标记检测方法和装置。 通过具有特定间距的重复图案提供标记。 这些图案被设置为使得图案的至少一个间距在从接收标记的图像的图像传感器的光接收表面上的不同之处,取决于采样间距(图像的间距) 元素)。 在一个优选形式中,标记由数目N(> / = 2)的重复图案形成,其中图案的至少一个间距Pp在图像传感器的光接收表面上满足关系Pp =( m + n / N)xPix其中m是任意数,n是满足1≤n≤N的整数,并且Pix是图像传感器的采样间距。 这样的标记的图像被光电转换,从而确定标记的位置。 利用所提出的概念,可以在计算标记中心时消除或补偿由图像传感器的图像元素对标记图像进行量化时可能引起的任何错误。 因此,可以提高标记中心检测的精度。
摘要:
A method of aligning a semiconductor wafer, usable in a step-and-repeat type exposure apparatus for projecting, in a reduced scale, images of a pattern formed on a reticle upon different shot areas on the semiconductor wafer in a predetermined sequence. According to this alignment method, the wafer is moved stepwise before the initiation of step-and-repeat exposures of the shot areas on the wafer and in accordance with a predetermined layout grid concerning the sites of the shot areas on the wafer. While moving the wafer stepwise in this manner, any positional deviation of each of some of the shot areas with respect to the layout grid is measured by use of a reduction projection lens system and, from the results of measurement, a corrected grid is prepared according to which grid the amount of stepwise movement of the wafer to be made for the step-and-repeat exposures thereof is determined. By this, for the exposures, the wafer can be moved stepwise exactly in accordance with the actual layout of the shot areas. Sample shot areas which are the subject of measurement can be selected under predetermined conditions. Additionally, of the values obtained as a result of the measurement, any extraordinary one or ones may be determined on the basis of the variance and then are excluded at the time of calculations made to determine the corrected grid. Thus, the stepwise movement of the wafer for the step-and-repeat exposures thereof can be controlled with higher precision.
摘要:
An alignment and exposure apparatus in which sequential operations of pattern projection for projecting a pattern of a first object, at a reduced ratio, onto a second object through an optical system, stepwise movement for moving the second object stepwise relative to the first object, detection for detecting any positional deviation between the first and second objects at a position at which the stepwise movement of the second object is terminated, and correction for correcting the positional relation between the first and second objects on the basis of the detected positional deviation, are repeated relative to the second object to thereby print the patterns onto the second object in a reduced scale. Upon correction of the positional relation between the first and second objects, at least one of the first and second objects is displaced in accordance with the magnitude of the detected positional deviation and/or, upon stepwise movement of the second object, the amount of stepwise movement to be made is corrected in accordance with the detected positional deviation with respect to the position at which the preceding stepwise movement of the second object is terminated. By this, the time required for repetitions of exposures is reduced.