公开(公告)号：US08542275B2

公开(公告)日：2013-09-24

申请号：US12880626

申请日：2010-09-13

申请人： Masahiro Kiyohara ,  Makoto Sato ,  Haruo Takahashi ,  Junichi Tashiro

发明人： Masahiro Kiyohara ,  Makoto Sato ,  Haruo Takahashi ,  Junichi Tashiro

IPC分类号： H04N7/18

CPC分类号： G01N23/2255

摘要： A cross-section processing and observation method includes: forming a first cross section in a sample by etching processing using a focused ion beam; obtaining image information of the first cross section by irradiating the focused ion beam to the first cross section; forming a second cross section by performing etching processing on the first cross section; obtaining image information of the second cross section by irradiating the focused ion beam to an irradiation region including the second cross section; displaying image information of a part of a display region of the irradiation region from the image information of the second cross section; displaying the image information of the first cross section by superimposing it on the image information being displayed; and moving the display region within the irradiation region. Observation images in which display regions are aligned can be obtained while reducing damage to the sample.

摘要翻译： 截面处理和观察方法包括：通过使用聚焦离子束的蚀刻处理在样品中形成第一横截面; 通过将聚焦的离子束照射到第一横截面来获得第一横截面的图像信息; 通过对所述第一横截面进行蚀刻处理形成第二横截面; 通过将聚焦离子束照射到包括第二横截面的照射区域来获得第二横截面的图像信息; 从第二横截面的图像信息中显示照射区域的显示区域的一部分的图像信息; 通过将第一横截面的图像信息叠加在正在显示的图像信息上来显示图像信息; 并且在照射区域内移动显示区域。 可以获得显示区域对准的观察图像，同时减少对样品的损伤。

公开(公告)号：US20110052044A1

公开(公告)日：2011-03-03

申请号：US12873886

申请日：2010-09-01

申请人： Haruo Takahashi ,  Masahiro Kiyohara ,  Makoto Sato ,  Junichi Tashiro

发明人： Haruo Takahashi ,  Masahiro Kiyohara ,  Makoto Sato ,  Junichi Tashiro

IPC分类号： G06T7/00

CPC分类号： G01N23/2255 ,  H01J2237/221

摘要： A cross-section processing and observation method includes: forming a cross section in a sample by a focused ion beam through etching processing; obtaining a cross-section observation image through cross-section observation by the focused ion beam; and forming a new cross section by performing etching processing in a region including the cross section and obtaining a cross-section observation image of the new cross section. A surface observation image of a region including a mark on the sample and the cross section is obtained. A position of the mark is recognized in the surface observation image and etching processing is performed on the cross section by setting, in reference to the position of the mark, a focused ion beam irradiation region in which to form the new cross section. Cross-section processing and observation is thus enabled continuously and efficiently using a focused ion beam apparatus having no SEM apparatus.

摘要翻译： 截面处理和观察方法包括：通过蚀刻处理通过聚焦离子束在样品中形成横截面; 通过聚焦离子束的横截面观察获得横截面观察图像; 并且通过在包括横截面的区域中进行蚀刻处理并获得新横截面的横截面观察图像来形成新的横截面。 获得包括样品上的标记和横截面的区域的表面观察图像。 在表面观察图像中识别标记的位置，并且通过关于标记的位置设置形成新横截面的聚焦离子束照射区域来对截面进行蚀刻处理。 因此，使用不具有SEM装置的聚焦离子束装置，能够连续有效地进行横截面加工和观察。

公开(公告)号：US08426830B2

公开(公告)日：2013-04-23

申请号：US12613107

申请日：2009-11-05

申请人： Makoto Sato ,  Masahiro Kiyohara ,  Junichi Tashiro

发明人： Makoto Sato ,  Masahiro Kiyohara ,  Junichi Tashiro

IPC分类号： G21G4/00

CPC分类号： H01J37/3056 ,  H01J37/222 ,  H01J37/304 ,  H01J2237/221 ,  H01J2237/24507 ,  H01J2237/30416 ,  H01J2237/31745 ,  H01J2237/31749

摘要： A focused ion beam apparatus includes: a focused ion beam irradiating mechanism configured to irradiate a sample with a focused ion beam; a detector configured to detect a secondary charged particle generated by irradiating the sample with the focused beam; an image generating unit configured to generate an sample image of the sample; a processing area setting unit configured to set a processing area image including a plurality of pixels corresponding to positions of irradiation of the focused ion beam on the sample image; a position of irradiation setting unit configured to set coordinates of the pixels included in the processing area image; a beam setting unit configured to set a dose amount of the focused ion beam irradiated from the focused ion beam irradiating mechanism according to intensities; and an interpolating unit configured to perform an interpolating process on the processing area image.

摘要翻译： 聚焦离子束装置包括：聚焦离子束照射机构，被配置为用聚焦离子束照射样品; 检测器，被配置为检测通过用所述聚焦光束照射所述样品而产生的二次带电粒子; 图像生成单元，被配置为生成样本的样本图像; 处理区域设定单元，被配置为将包括与所述聚焦离子束的照射位置对应的多个像素的处理区域图像设置在所述样本图像上; 被配置为设置包括在处理区域图像中的像素的坐标的照射设置单元的位置; 光束设定单元，被配置为根据强度设定从所述聚焦离子束照射机构照射的聚焦离子束的剂量; 以及被配置为对所述处理区域图像执行内插处理的内插单元。

公开(公告)号：US20100155624A1

公开(公告)日：2010-06-24

申请号：US12613107

申请日：2009-11-05

申请人： Makoto Sato ,  Masahiro Kiyohara ,  Junichi Tashiro

发明人： Makoto Sato ,  Masahiro Kiyohara ,  Junichi Tashiro

IPC分类号： H01J37/08 ,  G21K5/04

CPC分类号： H01J37/3056 ,  H01J37/222 ,  H01J37/304 ,  H01J2237/221 ,  H01J2237/24507 ,  H01J2237/30416 ,  H01J2237/31745 ,  H01J2237/31749

摘要： A focused ion beam apparatus includes: a focused ion beam irradiating mechanism configured to irradiate a sample with a focused ion beam; a detector configured to detect a secondary charged particle generated by irradiating the sample with the focused beam; an image generating unit configured to generate an sample image of the sample; a processing area setting unit configured to set a processing area image including a plurality of pixels corresponding to positions of irradiation of the focused ion beam on the sample image; a position of irradiation setting unit configured to set coordinates of the pixels included in the processing area image; a beam setting unit configured to set a dose amount of the focused ion beam irradiated from the focused ion beam irradiating mechanism according to intensities; and an interpolating unit configured to perform an interpolating process on the processing area image.

摘要翻译： 聚焦离子束装置包括：聚焦离子束照射机构，被配置为用聚焦离子束照射样品; 检测器，被配置为检测通过用所述聚焦光束照射所述样品而产生的二次带电粒子; 图像生成单元，被配置为生成样本的样本图像; 处理区域设定单元，被配置为将包括与所述聚焦离子束的照射位置对应的多个像素的处理区域图像设置在所述样本图像上; 被配置为设置包括在处理区域图像中的像素的坐标的照射设置单元的位置; 光束设定单元，被配置为根据强度设定从所述聚焦离子束照射机构照射的聚焦离子束的剂量; 以及被配置为对所述处理区域图像执行内插处理的内插单元。

公开(公告)号：US08198603B2

公开(公告)日：2012-06-12

申请号：US12290397

申请日：2008-10-29

申请人： Haruo Takahashi ,  Ikuko Nakatani ,  Junichi Tashiro

发明人： Haruo Takahashi ,  Ikuko Nakatani ,  Junichi Tashiro

IPC分类号： H01J37/20 ,  G21K5/10 ,  G01N1/28

CPC分类号： H01J37/20 ,  H01J37/023 ,  H01J37/3056 ,  H01J2237/202 ,  H01J2237/204 ,  H01J2237/2062 ,  H01J2237/208 ,  H01J2237/31745 ,  H01J2237/31749

摘要： A sample preparing device has a sample stage that supports a sample and undergoes rotation about a first rotation axis to bring a preselected direction of the sample piece into coincidence with an intersection line between a first plane formed by a surface of the sample piece and a second plane. A manipulator holds sample piece of the sample and undergoes rotation about a second rotation axis independently of the sample stage to rotate the sample piece to a preselected position in the state in which the preselected direction of the sample piece coincides with the intersection line. The manipulator is disposed relative to the sample stage so that an angle between the second rotation axis and the surface of the sample is in the range of 0° to 45°. The second plane corresponds to a plane obtained by rotating around the second rotation axis a line segment which is vertical to the surface of the sample and of which one end corresponds to an intersection between the surface of the sample and the second rotation axis.

摘要翻译： 样品制备装置具有样品台，其支撑样品并围绕第一旋转轴线旋转以使样品片的预选方向与由样品片的表面形成的第一平面和第二面之间的交线相符， 飞机 操纵器保持样品的样品并且独立于样品台绕第二旋转轴旋转，以在样品的预选方向与交叉线重合的状态下将样品片旋转到预选位置。 操纵器相对于样品台设置，使得第二旋转轴与样品表面之间的角度在0°至45°的范围内。 第二平面对应于通过围绕第二旋转轴旋转垂直于样品表面的线段并且其一端对应于样品表面和第二旋转轴线之间的交叉而获得的平面。

公开(公告)号：US07755044B2

公开(公告)日：2010-07-13

申请号：US12047013

申请日：2008-03-12

申请人： Toshiaki Fujii ,  Haruo Takahashi ,  Junichi Tashiro

发明人： Toshiaki Fujii ,  Haruo Takahashi ,  Junichi Tashiro

IPC分类号： G21K5/04 ,  G21K5/10

CPC分类号： H01J37/3056 ,  G01N1/286 ,  H01J2237/31745

摘要： The apparatus for working and observing samples comprises a sample plate on which a sample is to be placed; a first ion beam lens barrel capable of irradiating a first ion beam over a whole predetermined irradiation range at one time; a mask that can be arranged between the sample plate and the first ion beam lens barrel, and shields part of the first ion beam; mask-moving means capable of moving the mask; a charged particle beam lens barrel capable of scanning a focused beam of charged particles in the range irradiated with the first ion beam; and detection means capable of detecting a secondarily generated substance.

摘要翻译： 用于工作和观察样品的装置包括样品板，样品板将放置在样品板上; 一次能够在整个预定照射范围内照射第一离子束的第一离子束透镜镜筒; 可以在样品板和第一离子束透镜筒之间布置的掩模，并且屏蔽第一离子束的一部分; 掩模移动装置，能够移动面罩; 带电粒子束透镜镜筒，其能够扫描在第一离子束照射的范围内的聚集的带电粒子束; 以及能够检测次要生成物质的检测装置。

公开(公告)号：US20090114842A1

公开(公告)日：2009-05-07

申请号：US12290397

申请日：2008-10-29

申请人： Haruo Takahashi ,  Ikuko Nakatani ,  Junichi Tashiro

发明人： Haruo Takahashi ,  Ikuko Nakatani ,  Junichi Tashiro

IPC分类号： G21K5/10

CPC分类号： H01J37/20 ,  H01J37/023 ,  H01J37/3056 ,  H01J2237/202 ,  H01J2237/204 ,  H01J2237/2062 ,  H01J2237/208 ,  H01J2237/31745 ,  H01J2237/31749

摘要： After a certain direction of a sample piece is allowed to coincide with an intersection line made by two planes of a surface of the sample and a conical side plane obtained by rotating, around a manipulator rotation axis, a line segment which is vertical to the surface of the sample and of which one end is an intersection of the surface of a sample and the manipulator rotation axis, the sample piece is supported by a manipulator and the manipulator rotation axis is operated.

摘要翻译： 在样品的一定方向被允许与由样品表面的两个平面形成的交线和通过围绕机械手旋转轴线旋转而获得的圆锥形侧面的与表面垂直的线段 并且其一端是样品的表面与操纵器旋转轴线的交点，样品片由操纵器支撑并且操纵器旋转轴被操作。

公开(公告)号：US20080224198A1

公开(公告)日：2008-09-18

申请号：US12047013

申请日：2008-03-12

申请人： Toshiaki Fujii ,  Haruo Takahashi ,  Junichi Tashiro

发明人： Toshiaki Fujii ,  Haruo Takahashi ,  Junichi Tashiro

IPC分类号： G01N23/225

CPC分类号： H01J37/3056 ,  G01N1/286 ,  H01J2237/31745

摘要： The apparatus for working and observing samples comprises a sample plate on which a sample is to be placed; a first ion beam lens barrel capable of irradiating a first ion beam over a whole predetermined irradiation range at one time; a mask that can be arranged between the sample plate and the first ion beam lens barrel, and shields part of the first ion beam; mask-moving means capable of moving the mask; a charged particle beam lens barrel capable of scanning a focused beam of charged particles in the range irradiated with the first ion beam; and detection means capable of detecting a secondarily generated substance.

摘要翻译： 用于工作和观察样品的装置包括样品板，样品板将放置在样品板上; 一次能够在整个预定照射范围内照射第一离子束的第一离子束透镜镜筒; 可以在样品板和第一离子束透镜筒之间布置的掩模，并且屏蔽第一离子束的一部分; 掩模移动装置，能够移动面罩; 带电粒子束透镜镜筒，其能够扫描在第一离子束照射的范围内的聚集的带电粒子束; 以及能够检测次要生成物质的检测装置。

公开(公告)号：US20090134327A1

公开(公告)日：2009-05-28

申请号：US12290619

申请日：2008-10-31

申请人： Yutaka Ikku ,  Junichi Tashiro ,  Makoto Sato

发明人： Yutaka Ikku ,  Junichi Tashiro ,  Makoto Sato

IPC分类号： G01N23/00 ,  H01J3/14

CPC分类号： H01J37/3056 ,  H01J37/244 ,  H01J37/304 ,  H01J2237/24578 ,  H01J2237/24592 ,  H01J2237/2817 ,  H01J2237/304 ,  H01J2237/31713 ,  H01J2237/3174 ,  H01J2237/31749

摘要： There are provided a detecting step of detecting secondary charged particles generated from an observation area of a sample when an electron beam or a focused ion beam is emitted onto the observation area under a certain irradiation condition; an image forming step of forming a plurality of observation images acquired by dividing the observation area and having an equal periodic pattern, from the secondary charged particles detected in the detecting step; and a defect recognizing step of recognizing a defect in the observation area from information on a difference acquired by comparing the plurality of observation images formed in the image forming step. Additionally, the detecting step, the image forming step, and the defect recognizing step are performed even when the electron beam or the focused ion beam is emitted onto the observation area under an irradiation condition different from the certain irradiation condition.

摘要翻译： 提供了当在一定的照射条件下将电子束或聚焦离子束发射到观察区域时，检测从样本的观察区域产生的二次带电粒子的检测步骤; 图像形成步骤，从在检测步骤中检测到的二次带电粒子形成通过划分观察区域并具有相同的周期性图案而获得的多个观察图像; 以及从通过比较在图像形成步骤中形成的多个观察图像而获得的差异的信息，识别观察区域中的缺陷的缺陷识别步骤。 此外，即使当电子束或聚焦离子束在与特定照射条件不同的照射条件下发射到观察区域上时，也执行检测步骤，图像形成步骤和缺陷识别步骤。

公开(公告)号：US20060192118A1

公开(公告)日：2006-08-31

申请号：US11360948

申请日：2006-02-23

申请人： Junichi Tashiro ,  Yutaka Ikku ,  Makoto Sato

发明人： Junichi Tashiro ,  Yutaka Ikku ,  Makoto Sato

IPC分类号： G21K7/00 ,  G01N23/00

CPC分类号： G01N23/2251 ,  H01J37/20 ,  H01J37/28 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/20235 ,  H01J2237/216 ,  H01J2237/221 ,  H01J2237/31745

摘要： Calculation means calculates a sample height for focusing an ion beam and an electron beam onto a same observation point, based on magnifications of a secondary electron image obtained by an irradiation with the ion beam and a secondary electron image obtained by an irradiation with the electron beam, and a distance between an observation point in the secondary electron image obtained by the irradiation with the ion beam and the observation point in the secondary electron image obtained by the irradiation with the electron beam.

摘要翻译： 计算装置基于通过用离子束照射获得的二次电子图像的放大率和通过用电子束照射获得的二次电子图像计算用于将离子束和电子束聚焦在同一观察点上的样本高度 以及通过用离子束照射获得的二次电子图像中的观察点与通过用电子束照射获得的二次电子图像中的观察点之间的距离。