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    Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process
    1.
    发明授权
    Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process 有权
    锍盐，聚合物，聚合物的制造方法，抗蚀剂组合物和图案化工艺

    公开(公告)号：US08691490B2

    公开(公告)日：2014-04-08

    申请号：US13013506

    申请日：2011-01-25

    申请人： Masaki Ohashi ,  Satoshi Watanabe ,  Youichi Ohsawa ,  Keiichi Masunaga ,  Takeshi Kinsho

    发明人： Masaki Ohashi ,  Satoshi Watanabe ,  Youichi Ohsawa ,  Keiichi Masunaga ,  Takeshi Kinsho

    IPC分类号： G03F7/004 ,  C07C69/54 ,  C07C309/67

    CPC分类号： C07C69/54 ,  C08F220/38 ,  G03F7/004 ,  G03F7/20

    摘要： There is disclosed a sulfonium salt represented by the following general formula (1). In the formula, X and Y each represents a group having a polymerizable functional group; Z represents a divalent hydrocarbon group having 1 to 33 carbon atoms optionally containing a hetero atom; R1 represents a divalent hydrocarbon group having 1 to 36 carbon atoms optionally containing a hetero atom; and R2 and R3 each represents a monovalent hydrocarbon group having 1 to 30 carbon atoms optionally containing a hetero atom or R2 and R3 may be bonded with each other to form a ring together with a sulfur atom in the formula. There can be provided a sulfonium salt usable as a resist composition providing high resolution and excellent in LER in photolithography using a high energy beam such as an ArF excimer laser, an EUV light and an electron beam as a light source, a polymer obtained from the sulfonium salt, a resist composition containing the polymer and a patterning process using the resist composition.

    摘要翻译： 公开了由以下通式（1）表示的锍盐。 在该式中，X和Y各自表示具有聚合性官能团的基团， Z表示任选含有杂原子的碳原子数1〜33的二价烃基; R1表示任选含有杂原子的碳原子数1〜36的二价烃基; R 2和R 3各自表示可以含有杂原子的具有1〜30个碳原子的一价烃基，或者R 2和R 3可以相互结合，与式中的硫原子一起形成环。 可以提供可用作抗蚀剂组合物的锍盐，其使用诸如ArF准分子激光器，EUV光和电子束作为光源的高能束在光刻中提供高分辨率和优异的LER，从 锍盐，含有聚合物的抗蚀剂组合物和使用该抗蚀剂组合物的图案化工艺。