Automatic focusing apparatus
    1.
    发明授权
    Automatic focusing apparatus 失效
    自动对焦装置

    公开(公告)号:US4230940A

    公开(公告)日:1980-10-28

    申请号:US924722

    申请日:1978-07-14

    IPC分类号: G02B21/26 G01J1/36

    CPC分类号: G02B21/26

    摘要: An automatic focusing apparatus includes a lens for leading a laser beam onto a sample surface at a predetermined incident angle, a beam splitter to divide the reflected beam from the sample surface in accordance with the vertical shift thereof, a pair of photo diodes to respectively receive the divided beams and produce electric signals, a differential amplifier to produce a differential signal between the electric signals and a mechanism to vertically shift the stage by means of the differential signal to automatically focus a lens system on said sample surface.

    摘要翻译: 一种自动对焦装置,包括用于以预定入射角将激光束引导到样品表面上的透镜;分束器,用于根据其垂直位移来分离来自样品表面的反射光束;一对光电二极管,用于分别接收 分离的光束并产生电信号,差分放大器以产生电信号之间的差分信号和通过差分信号垂直移位级的机构,以自动将透镜系统聚焦在所述样品表面上。

    Focusing device, focusing method and a pattern inspecting apparatus
    2.
    发明授权
    Focusing device, focusing method and a pattern inspecting apparatus 失效
    聚焦装置,聚焦方法和图案检查装置

    公开(公告)号:US07394048B2

    公开(公告)日:2008-07-01

    申请号:US11679411

    申请日:2007-02-27

    IPC分类号: G02B7/04

    CPC分类号: G03F7/70641

    摘要: A focusing device comprises a first imaging optical system, a second imaging optical system which splits the optical image in the direction of an AF sensor and further splits the optical image so that a front focus image in which the point that is in focus is in front of the optical image on the inspecting sensor and a back focus image in which the point that is in focus is behind the optical image on the inspecting sensor are formed on the AF sensor, a focus detecting circuit which detects an optimum focus position on the basis of a high-frequency component of a front sensor image in a front focus position and a high-frequency component of a back sensor image in a back focus position, and a focus control circuit which controls the focusing of the first imaging optical system on the basis of the focus position.

    摘要翻译: 聚焦装置包括第一成像光学系统,第二成像光学系统,其在AF传感器的方向上分割光学图像,并进一步分割光学图像,使得其中焦点点在前面的前焦点图像 在AF传感器上形成检查传感器上的光学图像的背焦点图像和焦点上的焦点位于检测传感器上的光学图像之后的焦点检测电路,该焦点检测电路基于检测传感器的最佳聚焦位置 在前焦点位置处的前传感器图像的高频分量和后聚焦位置中的背传感器图像的高频分量的焦点控制电路,以及控制第一成像光学系统的聚焦在 基础的焦点位置。

    Automatic focusing apparatus for a semiconductor pattern inspection
system
    3.
    发明授权
    Automatic focusing apparatus for a semiconductor pattern inspection system 失效
    半导体图案检测系统的自动对焦装置

    公开(公告)号:US4577095A

    公开(公告)日:1986-03-18

    申请号:US472604

    申请日:1983-03-07

    申请人: Tomohide Watanabe

    发明人: Tomohide Watanabe

    CPC分类号: G03F9/7026

    摘要: Disclosed is an automatic focusing apparatus which comprises an objective disposed in opposition to a substrate with patterns formed thereon, a first line sensor disposed at a first focal point of the focal length of the objective, second and third line sensors which are disposed closer to and farther from the objective by a given distance with respect to second and third focal points of the focal length of the objective, first to third differential circuits for differentiating the output signals from the first to third line sensors, a detecting circuit for detecting a displacement of the substrate from a predetermined proper distance between the objective and the substrate on the basis of the output signals from the first to third differential circuits, and a correcting device for correcting the displacement on the basis of the output signal from the detecting circuit. Thus, a single optical system is used for automatically correcting focus and pattern inspection.

    摘要翻译: 公开了一种自动对焦装置,其包括与形成于其上的图案的基板相对设置的物镜,设置在物镜焦距的第一焦点处的第一线传感器,第二和第三线传感器, 相对于物镜的焦距的第二和第三焦点距物体远一个给定的距离,用于区分来自第一至第三行传感器的输出信号的第一至第三差分电路,检测电路 基于来自第一至第三差分电路的输出信号从目标和基板之间的预定适当距离的基板,以及用于基于来自检测电路的输出信号来校正位移的校正装置。 因此,使用单个光学系统来自动校正焦点和图案检查。

    FOCUSING DEVICE, FOCUSING METHOD AND A PATTERN INSPECTING APPARATUS
    4.
    发明申请
    FOCUSING DEVICE, FOCUSING METHOD AND A PATTERN INSPECTING APPARATUS 失效
    聚焦装置,聚焦方法和图案检查装置

    公开(公告)号:US20070200051A1

    公开(公告)日:2007-08-30

    申请号:US11679411

    申请日:2007-02-27

    IPC分类号: G02B27/40

    CPC分类号: G03F7/70641

    摘要: A focusing device comprises a first imaging optical system, a second imaging optical system which splits the optical image in the direction of an AF sensor and further splits the optical image so that a front focus image in which the point that is in focus is in front of the optical image on the inspecting sensor and a back focus image in which the point that is in focus is behind the optical image on the inspecting sensor are formed on the AF sensor, a focus detecting circuit which detects an optimum focus position on the basis of a high-frequency component of a front sensor image in a front focus position and a high-frequency component of a back sensor image in a back focus position, and a focus control circuit which controls the focusing of the first imaging optical system on the basis of the focus position.

    摘要翻译: 聚焦装置包括第一成像光学系统,第二成像光学系统,其在AF传感器的方向上分割光学图像,并进一步分割光学图像,使得其中焦点点在前面的前焦点图像 在AF传感器上形成检查传感器上的光学图像的背焦点图像和焦点上的焦点位于检测传感器上的光学图像之后的焦点检测电路,该焦点检测电路基于检测传感器的最佳聚焦位置 在前焦点位置处的前传感器图像的高频分量和后聚焦位置中的背传感器图像的高频分量的焦点控制电路,以及控制第一成像光学系统的聚焦在 基础的焦点位置。

    Method and apparatus for measuring non-linearity of a pattern edge
    5.
    发明授权
    Method and apparatus for measuring non-linearity of a pattern edge 失效
    用于测量图案边缘的非线性的方法和装置

    公开(公告)号:US4743768A

    公开(公告)日:1988-05-10

    申请号:US815927

    申请日:1986-01-03

    申请人: Tomohide Watanabe

    发明人: Tomohide Watanabe

    CPC分类号: G01B11/303

    摘要: A method of measuring non-linearity of a pattern edge of a pattern formed on a metal plate such as a glass plate and an apparatus for measuring the same are disclosed. With this novel pattern edge measurement system, first is to dispose a pattern to be measured so that a photosensitive picture element column in a light-receiving unit is substantially in parallel with a pattern edge of an image of the pattern to effect a relative movement of the light-receiving unit or the image of the pattern so that light-receiving unit traverses the pattern edge. Next is to memorize a signal indicative of a light received by the photosensitive picture element column every predetermined moving distances of the light-receiving unit or the pattern to determine a pattern edge position per each photosensitive picture element by making use of the received light signal. Then, a non-linearity of the pattern is computed on the basis of each pattern edge position. Thus, the novel pattern edge measuring system makes it possible to quantitatively measure a non-linearity of a pattern edge with high precision.

    摘要翻译: 公开了一种测量形成在诸如玻璃板的金属板上的图案的图案边缘的非线性的方法以及用于测量其的设备。 利用这种新颖的图形边缘测量系统,首先是设置要测量的图案,使得光接收单元中的感光像素列基本上与图案的图像的图案边缘平行,以实现相对运动 光接收单元或图案的图像,使得光接收单元穿过图案边缘。 接下来,存储指示由光接收单元或图案的每个预定移动距离由光敏像素列接收的光的信号,以通过利用所接收的光信号来确定每个感光像元的图案边缘位置。 然后,基于每个图案边缘位置来计算图案的非线性。 因此,新颖的图形边缘测量系统使得可以以高精度定量地测量图案边缘的非线性。

    APPARATUS AND METHOD FOR INSPECTING A PATTERN AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE
    6.
    发明申请
    APPARATUS AND METHOD FOR INSPECTING A PATTERN AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE 审中-公开
    用于检查图案的装置和方法以及制造半导体器件的方法

    公开(公告)号:US20080055606A1

    公开(公告)日:2008-03-06

    申请号:US11771456

    申请日:2007-06-29

    IPC分类号: G01B9/02

    CPC分类号: G01N21/95607

    摘要: An apparatus for inspecting a pattern, including: at least one of a first floodlight system for inspection by transmissive light and a second floodlight system for inspection by reflective light; an inspection optical system for capturing an image of the pattern on an object under inspection; and a stage for mounting and moving the object under inspection. The one of the first floodlight system and the second floodlight system includes a diffracted light control means for enhancing light diffracted by the pattern.

    摘要翻译: 一种用于检查图案的装置,包括:用于通过透射光检查的第一泛光灯系统和用于通过反射光检查的第二泛光灯系统中的至少一个; 检查光学系统,用于捕获被检查物体上的图案的图像; 以及用于安装和移动被检查物体的台架。 第一泛光灯系统和第二泛光灯系统中的一个包括用于增强由图案衍射的光的衍射光控制装置。

    Pattern evaluation apparatus and a method of pattern evaluation
    7.
    发明授权
    Pattern evaluation apparatus and a method of pattern evaluation 失效
    模式评估装置和模式评估方法

    公开(公告)号:US5602645A

    公开(公告)日:1997-02-11

    申请号:US527633

    申请日:1995-09-13

    摘要: The present invention provides a pattern evaluating device including light irradiating means for irradiating the rays of light from a light source upon an object, an objective lens through which the light having penetrated through the object passes, an aperture member stopping the diameter of a light beam which has passed the objective lens, a photo receiving element receiving the light beam which has had the diameter stopped by the aperture member, and judging means for evaluating the pattern, following the information of the light received by the photo receiving element and which corresponds to the pattern, wherein the aperture member is capable of changing the numerical aperture, depending whether or not the sample is provided with a pericle.

    摘要翻译: 本发明提供了一种图案评估装置,其包括用于将来自光源的光线照射到物体上的光照射装置,穿过物体的光穿过的物镜通过阻止光束直径的孔径构件 已经通过物镜的光接收元件,接收由孔部件阻挡直径的光束的光接收元件,以及用于评估图案的判断装置,遵循由光接收元件接收的光的信息,并且对应于 所述图案,其中所述孔径构件能够根据样品是否设置有微孔而能够改变数值孔径。

    Pattern inspection device and method of inspecting pattern
    8.
    发明授权
    Pattern inspection device and method of inspecting pattern 失效
    图案检查装置及检验方式

    公开(公告)号:US08358340B2

    公开(公告)日:2013-01-22

    申请号:US12477666

    申请日:2009-06-03

    IPC分类号: H04N7/18 H04N9/47

    摘要: A pattern inspection device according to the embodiment, includes: an image picking-up portion for picking-up an image of a pattern formation member in which a plurality of opening patterns are formed so as to obtain a picked-up image of the pattern formation member; a reference image obtaining portion for obtaining a reference image used for comparing with the picked-up image; and a pattern defect detecting portion for matching the center locations of the opening pattern images respectively between the picked-up image and the reference image, forming difference images of the opening pattern images between the picked-up image and the reference image per the opening pattern and detecting the defect of the opening pattern base on the difference images.

    摘要翻译: 根据实施例的图案检查装置包括:图像拾取部分,用于拾取其中形成有多个开口图案的图案形成构件的图像,以便获得图案形成的拾取图像 会员; 参考图像获取部分,用于获得用于与所拾取的图像进行比较的参考图像; 以及图案缺陷检测部分,用于分别在拾取图像和参考图像之间匹配打开图案图像的中心位置,形成每个打开图案的拍摄图像和参考图像之间的打开图案图像的差异图像 并且基于差分图像检测打开图案的缺陷。

    PATTERN INSPECTION DEVICE AND METHOD OF INSPECTING PATTERN
    9.
    发明申请
    PATTERN INSPECTION DEVICE AND METHOD OF INSPECTING PATTERN 失效
    图案检查装置及检查图案的方法

    公开(公告)号:US20090303323A1

    公开(公告)日:2009-12-10

    申请号:US12477666

    申请日:2009-06-03

    IPC分类号: H04N7/18 G06K9/00

    摘要: A pattern inspection device according to the embodiment, includes: an image picking-up portion for picking-up an image of a pattern formation member in which a plurality of opening patterns are formed so as to obtain a picked-up image of the pattern formation member; a reference image obtaining portion for obtaining a reference image used for comparing with the picked-up image; and a pattern defect detecting portion for matching the center locations of the opening pattern images respectively between the picked-up image and the reference image, forming difference images of the opening pattern images between the picked-up image and the reference image per the opening pattern and detecting the defect of the opening pattern base on the difference images.

    摘要翻译: 根据实施例的图案检查装置包括:图像拾取部分,用于拾取其中形成有多个开口图案的图案形成构件的图像,以便获得图案形成的拾取图像 会员; 参考图像获取部分,用于获得用于与所拾取的图像进行比较的参考图像; 以及图案缺陷检测部分,用于分别在拾取图像和参考图像之间匹配打开图案图像的中心位置,形成每个打开图案的拍摄图像和参考图像之间的打开图案图像的差异图像 并且基于差分图像检测打开图案的缺陷。

    Pattern defects inspection system
    10.
    发明授权
    Pattern defects inspection system 失效
    图案缺陷检查系统

    公开(公告)号:US5379348A

    公开(公告)日:1995-01-03

    申请号:US40852

    申请日:1993-03-31

    摘要: A pattern defects inspection system inspects the presence/absence of pattern defects in a photomask as an object to be inspected in which a chromium pattern and a phase shift pattern are formed together. Measurement data output from a sensor circuit for generating measurement pattern data by inspecting measurement patterns corresponding to two types of patterns formed on the object by radiating light on the object, and two identifiable design data stored in a magnetic disk unit in advance, i.e., chromium pattern design data used to form a chromium pattern and phase shift pattern design data used to form a phase shift pattern, are read out by a bit pattern generator for performing development processing. The two types of bit data obtained by the bit pattern generator are synthesized according to the same coordinate definition. The synthesized design data is compared with the measurement data by a comparator. As a result, the presence/absence of pattern defects in the object can be determined.

    摘要翻译: 图案缺陷检查系统检查作为要检查的对象的光掩模中是否存在图案缺陷,其中形成铬图案和相移图案。 从传感器电路输出的测量数据,用于通过在物体上照射光来检查与形成在物体上的两种图案相对应的测量图案,以及预先存储在磁盘单元中的两个可识别的设计数据来产生测量图案数据,即铬 用于形成铬图案的图案设计数据和用于形成相移图案的相移图案设计数据由用于进行显影处理的位图发生器读出。 根据相同的坐标定义来合成由位图生成器获得的两种位数据。 将合成的设计数据与比较器的测量数据进行比较。 结果,可以确定对象中的图案缺陷的存在/不存在。