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公开(公告)号：US20070200051A1
公开(公告)日：2007-08-30
申请号：US11679411
申请日：2007-02-27
申请人： Hiromu Inoue , Tomohide Watanabe , Satoshi Endo , Masami Ikeda
发明人： Hiromu Inoue , Tomohide Watanabe , Satoshi Endo , Masami Ikeda
IPC分类号： G02B27/40
CPC分类号： G03F7/70641
摘要： A focusing device comprises a first imaging optical system, a second imaging optical system which splits the optical image in the direction of an AF sensor and further splits the optical image so that a front focus image in which the point that is in focus is in front of the optical image on the inspecting sensor and a back focus image in which the point that is in focus is behind the optical image on the inspecting sensor are formed on the AF sensor, a focus detecting circuit which detects an optimum focus position on the basis of a high-frequency component of a front sensor image in a front focus position and a high-frequency component of a back sensor image in a back focus position, and a focus control circuit which controls the focusing of the first imaging optical system on the basis of the focus position.
摘要翻译： 聚焦装置包括第一成像光学系统，第二成像光学系统，其在AF传感器的方向上分割光学图像，并进一步分割光学图像，使得其中焦点点在前面的前焦点图像 在AF传感器上形成检查传感器上的光学图像的背焦点图像和焦点上的焦点位于检测传感器上的光学图像之后的焦点检测电路，该焦点检测电路基于检测传感器的最佳聚焦位置 在前焦点位置处的前传感器图像的高频分量和后聚焦位置中的背传感器图像的高频分量的焦点控制电路，以及控制第一成像光学系统的聚焦在 基础的焦点位置。
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公开(公告)号：US07394048B2
公开(公告)日：2008-07-01
申请号：US11679411
申请日：2007-02-27
申请人： Hiromu Inoue , Tomohide Watanabe , Satoshi Endo , Masami Ikeda
发明人： Hiromu Inoue , Tomohide Watanabe , Satoshi Endo , Masami Ikeda
IPC分类号： G02B7/04
CPC分类号： G03F7/70641
摘要： A focusing device comprises a first imaging optical system, a second imaging optical system which splits the optical image in the direction of an AF sensor and further splits the optical image so that a front focus image in which the point that is in focus is in front of the optical image on the inspecting sensor and a back focus image in which the point that is in focus is behind the optical image on the inspecting sensor are formed on the AF sensor, a focus detecting circuit which detects an optimum focus position on the basis of a high-frequency component of a front sensor image in a front focus position and a high-frequency component of a back sensor image in a back focus position, and a focus control circuit which controls the focusing of the first imaging optical system on the basis of the focus position.
摘要翻译： 聚焦装置包括第一成像光学系统，第二成像光学系统，其在AF传感器的方向上分割光学图像，并进一步分割光学图像，使得其中焦点点在前面的前焦点图像 在AF传感器上形成检查传感器上的光学图像的背焦点图像和焦点上的焦点位于检测传感器上的光学图像之后的焦点检测电路，该焦点检测电路基于检测传感器的最佳聚焦位置 在前焦点位置处的前传感器图像的高频分量和后聚焦位置中的背传感器图像的高频分量的焦点控制电路，以及控制第一成像光学系统的聚焦在 基础的焦点位置。
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3.发明申请APPARATUS AND METHOD FOR INSPECTING A PATTERN AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE 审中-公开用于检查图案的装置和方法以及制造半导体器件的方法公开(公告)号：US20080055606A1
公开(公告)日：2008-03-06
申请号：US11771456
申请日：2007-06-29
申请人： Hiromu Inoue , Tomohide Watanabe , Ryoji Yoshikawa
发明人： Hiromu Inoue , Tomohide Watanabe , Ryoji Yoshikawa
IPC分类号： G01B9/02
CPC分类号： G01N21/95607
摘要： An apparatus for inspecting a pattern, including: at least one of a first floodlight system for inspection by transmissive light and a second floodlight system for inspection by reflective light; an inspection optical system for capturing an image of the pattern on an object under inspection; and a stage for mounting and moving the object under inspection. The one of the first floodlight system and the second floodlight system includes a diffracted light control means for enhancing light diffracted by the pattern.
摘要翻译： 一种用于检查图案的装置，包括：用于通过透射光检查的第一泛光灯系统和用于通过反射光检查的第二泛光灯系统中的至少一个; 检查光学系统，用于捕获被检查物体上的图案的图像; 以及用于安装和移动被检查物体的台架。 第一泛光灯系统和第二泛光灯系统中的一个包括用于增强由图案衍射的光的衍射光控制装置。
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公开(公告)号：US08358340B2
公开(公告)日：2013-01-22
申请号：US12477666
申请日：2009-06-03
CPC分类号： G01N21/95607 , G01N2021/95676 , G06T7/001 , G06T2207/30148
摘要： A pattern inspection device according to the embodiment, includes: an image picking-up portion for picking-up an image of a pattern formation member in which a plurality of opening patterns are formed so as to obtain a picked-up image of the pattern formation member; a reference image obtaining portion for obtaining a reference image used for comparing with the picked-up image; and a pattern defect detecting portion for matching the center locations of the opening pattern images respectively between the picked-up image and the reference image, forming difference images of the opening pattern images between the picked-up image and the reference image per the opening pattern and detecting the defect of the opening pattern base on the difference images.
摘要翻译： 根据实施例的图案检查装置包括：图像拾取部分，用于拾取其中形成有多个开口图案的图案形成构件的图像，以便获得图案形成的拾取图像 会员; 参考图像获取部分，用于获得用于与所拾取的图像进行比较的参考图像; 以及图案缺陷检测部分，用于分别在拾取图像和参考图像之间匹配打开图案图像的中心位置，形成每个打开图案的拍摄图像和参考图像之间的打开图案图像的差异图像 并且基于差分图像检测打开图案的缺陷。
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公开(公告)号：US20090303323A1
公开(公告)日：2009-12-10
申请号：US12477666
申请日：2009-06-03
CPC分类号： G01N21/95607 , G01N2021/95676 , G06T7/001 , G06T2207/30148
摘要： A pattern inspection device according to the embodiment, includes: an image picking-up portion for picking-up an image of a pattern formation member in which a plurality of opening patterns are formed so as to obtain a picked-up image of the pattern formation member; a reference image obtaining portion for obtaining a reference image used for comparing with the picked-up image; and a pattern defect detecting portion for matching the center locations of the opening pattern images respectively between the picked-up image and the reference image, forming difference images of the opening pattern images between the picked-up image and the reference image per the opening pattern and detecting the defect of the opening pattern base on the difference images.
摘要翻译： 根据实施例的图案检查装置包括：图像拾取部分，用于拾取其中形成有多个开口图案的图案形成构件的图像，以便获得图案形成的拾取图像 会员; 参考图像获取部分，用于获得用于与所拾取的图像进行比较的参考图像; 以及图案缺陷检测部分，用于分别在拾取图像和参考图像之间匹配打开图案图像的中心位置，形成每个打开图案的拍摄图像和参考图像之间的打开图案图像的差异图像 并且基于差分图像检测打开图案的缺陷。
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6.发明申请公开(公告)号：US20110058729A1
公开(公告)日：2011-03-10
申请号：US12857906
申请日：2010-08-17
申请人： Hiromu Inoue , Hiroyuki Ikeda , Eiji Sawa
发明人： Hiromu Inoue , Hiroyuki Ikeda , Eiji Sawa
IPC分类号： G06K9/00
CPC分类号： G01N21/956 , G03F1/84 , G03F7/70525 , G03F7/70625 , G03F7/7065
摘要： According to one embodiment, a pattern characteristic detection apparatus for a photomask includes a detection-data creating portion, a reference-data creating portion, an extracting portion, a first area-setting portion, a detecting portion and an collecting portion. The detection-data creating portion is configured to create detection data on the basis of an optical image of a pattern formed on a photomask. The reference-data creating portion is configured to create reference data of the pattern. The extracting portion is configured to extract a pattern for pattern characteristic detection and positional information of the extracted pattern. The first area-setting portion is configured to set an area where pattern characteristics are to be detected, and configured to extract a target pattern. The detecting portion is configured to detect pattern characteristics of the target pattern within the area. In addition, the collecting portion is configured to collect the detected pattern characteristics.
摘要翻译： 根据一个实施例，用于光掩模的图案特性检测装置包括检测数据创建部分，参考数据创建部分，提取部分，第一区域设置部分，检测部分和收集部分。 检测数据创建部分被配置为基于形成在光掩模上的图案的光学图像来创建检测数据。 参考数据创建部分被配置为创建该图案的参考数据。 提取部分被提取用于图案特征检测的图案和提取的图案的位置信息。 第一区域设定部被配置为设定要检测图案特性的区域，并且被配置为提取目标图案。 检测部被配置为检测该区域内的目标图案的图案特性。 此外，收集部分被配置为收集检测到的图案特征。
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公开(公告)号：US06965687B2
公开(公告)日：2005-11-15
申请号：US09883945
申请日：2001-06-20
申请人： Eiji Sawa , Hiromu Inoue
发明人： Eiji Sawa , Hiromu Inoue
CPC分类号： G01B11/028 , G01B11/2433 , G06T7/0006 , G06T7/12 , G06T7/168 , G06T7/62 , G06T2207/30148
摘要： A pair of edges that are located at ends as viewed in the widthwise direction of a design pattern are recognized. On the basis of the edge direction in which the paired edges are recognized, edge points on the design pattern are detected as sub-pixels. The widthwise dimension of the design pattern is calculated on the basis of the edge points. In addition, the widthwise dimension of a circuit pattern is calculated at the same position as the widthwise dimension of the design pattern. On the basis of the calculated widthwise dimensions, the semiconductor wafer circuit pattern is checked.
摘要翻译： 识别位于设计图案的宽度方向上观察的端部处的一对边缘。 基于识别成对边缘的边缘方向，设计图案上的边缘点被检测为子像素。 基于边缘点计算设计图案的宽度尺寸。 此外，在与设计图案的宽度尺寸相同的位置处计算电路图案的宽度尺寸。 基于计算出的宽度方向尺寸，检查半导体晶片电路图案。
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8.发明授权Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device 有权修复光掩模的方法，光掩模检查方法，光掩模的制造方法以及半导体装置的制造方法公开(公告)号：US06849363B2
公开(公告)日：2005-02-01
申请号：US09870702
申请日：2001-06-01
申请人： Katsuki Ohashi , Hiromu Inoue , Akira Ono , Hiroyuki Ikeda
发明人： Katsuki Ohashi , Hiromu Inoue , Akira Ono , Hiroyuki Ikeda
CPC分类号： G03F7/70058 , G01N21/956 , G01N2021/95676 , G03F1/72 , G03F1/84 , Y10S430/146
摘要： A method for inspecting a photomask, comprising generating a laser beam, changing a phase of the laser beam to smooth the brightness distribution of the laser beam, applying the smoothed laser beam to the photomask, acquiring an image of the photomask using a sensor while the laser beam and the photomask are relatively moved, examining the image of the photomask for a defect of the mask-pattern of the photomask.
摘要翻译： 一种用于检查光掩模的方法，包括产生激光束，改变激光束的相位以平滑激光束的亮度分布，将平滑的激光束施加到光掩模，使用传感器获取光掩模的图像，同时 激光束和光掩模相对移动，检查光掩模的图像以获得光掩模的掩模图案的缺陷。
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公开(公告)号：US4921623A
公开(公告)日：1990-05-01
申请号：US222532
申请日：1988-07-21
IPC分类号： C08K5/13 , C08K5/34 , C08K5/3472 , C08K5/3475 , C09D5/24 , C09D7/12 , H01B1/22 , H05K1/09
摘要： A copper-type conductive coating composition which comprises:(A) a copper powder,(B) a coating binder resin, and(C) at least one number selected from the group consisting of salicylic acid, its specific derivatives, and benzotriazolecarboxylic acid hydrazides.The copper-type conductive coating composition provides a conductive coating layer having excellent initial conductivity and capable of maintaining the level of it stable over a long period of the time.
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公开(公告)号：US09841385B2
公开(公告)日：2017-12-12
申请号：US12857906
申请日：2010-08-17
申请人： Hiromu Inoue , Hiroyuki Ikeda , Eiji Sawa
发明人： Hiromu Inoue , Hiroyuki Ikeda , Eiji Sawa
IPC分类号： G03F1/84 , G01N21/956 , G03F7/20
CPC分类号： G01N21/956 , G03F1/84 , G03F7/70525 , G03F7/70625 , G03F7/7065
摘要： According to one embodiment, a pattern characteristic detection apparatus for a photomask includes a detection-data creating portion, a reference-data creating portion, an extracting portion, a first area-setting portion, a detecting portion and an collecting portion. The detection-data creating portion is configured to create detection data on the basis of an optical image of a pattern formed on a photomask. The reference-data creating portion is configured to create reference data of the pattern. The extracting portion is configured to extract a pattern for pattern characteristic detection and positional information of the extracted pattern. The first area-setting portion is configured to set an area where pattern characteristics are to be detected, and configured to extract a target pattern. The detecting portion is configured to detect pattern characteristics of the target pattern within the area. In addition, the collecting portion is configured to collect the detected pattern characteristics.
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