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    Surface position detecting system and projection exposure apparatus using the same
    1.
    发明授权
    Surface position detecting system and projection exposure apparatus using the same 失效
    表面位置检测系统和使用其的投影曝光装置

    公开(公告)号：US5834767A

    公开(公告)日：1998-11-10

    申请号：US790798

    申请日：1997-01-30

    申请人： Masanobu Hasegawa ,  Minoru Yoshii ,  Kyoichi Miyazaki

    发明人： Masanobu Hasegawa ,  Minoru Yoshii ,  Kyoichi Miyazaki

    IPC分类号： G01B11/00 ,  G01B11/26 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

    CPC分类号： G03F9/7026

    摘要： A detecting system for detecting a surface position of an object, includes a light source, a first grating having a light collecting function, wherein the first grating is illuminated with light from the light source, a second grating having a light collecting function, a first optical system for imaging the first grating onto the object in a direction oblique to the surface of the object, a second optical system for re-imaging the image of the first grating, on the surface of the object, onto the second grating, wherein a moire fringe is produced by the second grating and the re-imaged image of the first grating, and a photodetector for detecting a position of a converged point of convergent light as produced by the moire fringe, wherein the surface position information of the object is determined on the basis of information related to the converged point position as detected by the photodetector.

    摘要翻译： 一种用于检测物体的表面位置的检测系统，包括光源，具有聚光功能的第一光栅，其中第一光栅被来自光源的光照射，具有光收集功能的第二光栅，第一光栅 光学系统，用于将物体上的第一光栅成像到物体表面上的方向上;第二光学系统，用于将物体表面上的第一光栅的图像重新成像到第二光栅上，其中， 莫尔条纹由第二光栅和第一光栅的再成像图像产生，以及光电检测器，用于检测由莫尔条纹产生的会聚光的会聚点的位置，其中确定物体的表面位置信息 基于与由光检测器检测到的会聚点位置有关的信息。

    Position sensor having a reflective projecting system and device fabrication method using the sensor
    2.
    发明授权
    Position sensor having a reflective projecting system and device fabrication method using the sensor 失效
    具有反射投影系统的位置传感器和使用传感器的装置制造方法

    公开(公告)号：US6124601A

    公开(公告)日：2000-09-26

    申请号：US766755

    申请日：1996-12-13

    申请人： Minoru Yoshii ,  Masanobu Hasegawa ,  Kyoichi Miyazaki

    发明人： Minoru Yoshii ,  Masanobu Hasegawa ,  Kyoichi Miyazaki

    IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G01N21/86

    CPC分类号： G03F9/7026

    摘要： A position detecting apparatus for detecting the position of a substrate in an interval direction in which the substrate is spaced by an interval form a pattern-printing projection optical system for printing pattern on the substrate includes first and second luminous flux projecting and receiving systems and a detector. The first luminous flux projecting system projects a first luminous flux to the substrate form a direction oblique to the interval direction. The first luminous flux receiving system receives a first luminous flux after the first luminous flux is reflected form the substrate. The second luminous flux projecting system projects a second luminous flux to a reflection member secured to the bottom end of the pattern-printing projection optical system. The second luminous flux receiving system receives the second luminous flux after the second luminous flux is reflected by the reflection member. The detection detects the position of the substrate in the interval direction by detecting the position at which the first luminous flux receiving system receives the first luminous flux and by detecting the position at which the second luminous flux receiving system receives the second luminous flux.

    摘要翻译： 一种位置检测装置，用于在衬底间隔开的间隔方向上检测衬底的位置，形成用于在衬底上印刷图案的图案印刷投影光学系统，包括第一和第二光束投射和接收系统，以及 探测器。 第一光通量投影系统将第一光束投射到基板，形成与间隔方向相反的方向。 第一光束接收系统在从基板反射第一光通量之后接收第一光通量。 第二光通量投影系统将第二光束投射到固定到图案印刷投影光学系统的底端的反射构件。 第二光束接收系统在第二光束被反射构件反射之后接收第二光束。 该检测通过检测第一光束接收系统接收到第一光通量的位置，并且通过检测第二光束接收系统接收到第二光束的位置来检测基板在间隔方向上的位置。

    Exposure state detecting system and exposure apparatus using the same
    3.
    发明授权
    Exposure state detecting system and exposure apparatus using the same 失效
    曝光状态检测系统及使用其的曝光装置

    公开(公告)号：US5777744A

    公开(公告)日：1998-07-07

    申请号：US648417

    申请日：1996-05-15

    申请人： Minoru Yoshii ,  Masanobu Hasegawa ,  Kyoichi Miyazaki ,  Seiji Takeuchi

    发明人： Minoru Yoshii ,  Masanobu Hasegawa ,  Kyoichi Miyazaki ,  Seiji Takeuchi

    IPC分类号： G03F7/20 ,  G01B11/00

    CPC分类号： G03F7/70558 ,  G03F7/70641 ,  G03F7/70675

    摘要： A state-of-formation detecting system for detecting a state of formation of a periodic pattern formed, through exposure light, upon an object with a photosensitive material applied thereto, includes a light projecting device for projecting input light onto the periodic pattern, and a determining device for receiving signal light from the periodic pattern and for detecting a change in the input light, to determine the state of formation of the periodic pattern on the basis of the change in the input light.

    摘要翻译： 一种用于检测通过曝光光形成的周期性图案的形成状态的状态检测系统，包括用于将输入光投射到周期性图案上的投光装置，以及 确定装置，用于接收来自周期性图案的信号光并用于检测输入光的变化，以基于输入光的变化确定周期性图案的形成状态。

    Surface position detecting system and exposure apparatus using the same
    4.
    发明授权
    Surface position detecting system and exposure apparatus using the same 失效
    表面位置检测系统及使用其的曝光装置

    公开(公告)号：US5969820A

    公开(公告)日：1999-10-19

    申请号：US873748

    申请日：1997-06-12

    申请人： Minoru Yoshii ,  Masanobu Hasegawa ,  Kyoichi Miyazaki

    发明人： Minoru Yoshii ,  Masanobu Hasegawa ,  Kyoichi Miyazaki

    IPC分类号： G03F9/00 ,  G01B11/00

    CPC分类号： G03F9/7026

    摘要： A surface position detecting system for detecting a position of a surface of an object disposed opposed to an exposure system, with respect to a direction of an optical system of the exposure system, includes an irradiation device for projecting light to the surface of the object, obliquely with respect to the optical axis of the exposure system, a detecting device for detecting light from the surface of the object irradiated with light from the irradiation device, the detecting device detecting a position of the surface of the object with respect to the optical axis direction of the exposure system, and a light quantity adjusting device provided in at least least one of the irradiation device and the detecting device, for controlling the quantity of light passage.

    摘要翻译： 用于检测与曝光系统相对设置的物体的表面相对于曝光系统的光学系统的方向的位置的表面位置检测系统包括：用于将光投射到物体的表面的照射装置， 相对于曝光系统的光轴倾斜的检测装置，用于检测来自被照射装置的光的物体的表面的光的检测装置，检测装置检测物体相对于光轴的表面的位置 曝光系统的方向，以及设置在照射装置和检测装置的至少一个中的光量调节装置，用于控制光通过量。

    Optical inspection method and apparatus including intensity modulation of a light beam and detection of light scattered at an inspection position
    6.
    发明授权
    Optical inspection method and apparatus including intensity modulation of a light beam and detection of light scattered at an inspection position 失效
    包括光束的强度调制和在检查位置散射的光的检测的光学检查方法和装置

    公开(公告)号：US5861952A

    公开(公告)日：1999-01-19

    申请号：US984509

    申请日：1992-12-02

    申请人： Toshihiko Tsuji ,  Kyoichi Miyazaki ,  Seiji Takeuchi ,  Minoru Yoshii ,  Noriyuki Nose

    发明人： Toshihiko Tsuji ,  Kyoichi Miyazaki ,  Seiji Takeuchi ,  Minoru Yoshii ,  Noriyuki Nose

    IPC分类号： G01N21/94 ,  G01B9/02 ,  G01N21/88

    CPC分类号： G01N21/94

    摘要： A light source portion having an acousto-optic element produces a laser beam of two light components having a frequency difference .DELTA.w and having registered polarization directions. The laser beam is subsequently divided by a half mirror. One of the divided laser beams is detected by a photoelectric detector as reference light, and a corresponding signal is applied to a synchronism detector. The other laser beam is projected by a scanning optical system to the surface of, e.g., an original to be examined to scan the same. At the position on the surface irradiated by the scanning light spot, the laser beam is modulated at a beat frequency .DELTA.w on the basis of optical heterodyne interference. A synchronism detector detects a signal corresponding to the scattered light from a particle or defect on the surface being examined, in synchronism with the frequency of the reference light, whereby the particle or defect can be detected with a good signal-to-noise ratio.

    摘要翻译： 具有声光元件的光源部分产生具有频差DELTA w并具有记录的偏振方向的两个光分量的激光束。 激光束随后被半反射镜分开。 其中一个激光束被光电检测器作为参考光检测，相应的信号被施加到同步检测器。 另一个激光束由扫描光学系统投影到例如要检查的原件的表面以扫描它。 在由扫描光点照射的表面上的位置处，基于光学外差干扰以激光束以拍频DELTA w进行调制。 同步检测器与参考光的频率同步地检测与被检查的表面上的颗粒或缺陷相对应的散射光的信号，从而可以以良好的信噪比检测颗粒或缺陷。