摘要:
A closure for silica glass crucible to be mounted on an opening portion of a silica glass crucible is provided with a peripheral edge mounting portion closely adhered to an inner peripheral end of the opening portion.
摘要:
A closure for silica glass crucible to be mounted on an opening portion of a silica glass crucible is provided with a peripheral edge mounting portion closely adhered to an inner peripheral end of the opening portion.
摘要:
A closure for silica glass crucible to be mounted on an opening portion of a silica glass crucible is provided with a peripheral edge mounting portion closely adhered to an inner peripheral end of the opening portion.
摘要:
By providing a method capable of avoiding invasion of starting material powder for crucible into an inner face of the crucible, it is made possible to reliably avoid the invasion of foreign substances into a vitreous silica crucible until an actual use time of the crucible and to handle the crucible with no contamination. A cover 3 mounted onto an opening portion 2 of a vitreous silica crucible 1, comprising a flange portion 4 in close contact with an outer peripheral end 2a of the opening portion 2, is mounted onto the crucible 1.
摘要:
A vitreous silica crucible has high strength at high temperature, and allows easy taking-out from a susceptor after completion of pulling. The vitreous silica crucible includes a vitreous silica outer layer provided on the outer surface side of the crucible, a vitreous silica inner layer provided on the inner surface side of the crucible, and an vitreous silica intermediate layer provided between the vitreous silica outer layer and the vitreous silica inner layer. The vitreous silica outer layer has a mineralizer concentration of 100 ppm or more, and the vitreous silica intermediate layer and the vitreous silica inner layer has a mineralizer concentration of 50 ppm or less. The thickness of the vitreous silica outer layer is 0.5 mm to 2.0 mm on the bottom portion, and the thickness on the sidewall portion of the vitreous silica outer layer is larger than that on the bottom portion.
摘要:
A crucible for pulling a silicon single crystal has a double structure comprising a silica crucible and a graphite crucible covering an outside of the silica crucible, wherein the silica crucible is provided at its opening end portion with an inward falling prevention means for imparting a radially outward force to a body portion of the silica crucible.
摘要:
There is provided an amplifier circuit including: a first transistor having a source thereof connected to an input port and having a gate thereof grounded; a second transistor having a gate thereof grounded; a first inductor provided between a drain of the first transistor and a source of the second transistor; and a second inductor provided between a drain of the second transistor and an output port.
摘要:
A radiological image detection apparatus includes a first grating, a second grating, a scanning unit, a radiological image detector, a radiation detection unit, and a control unit. The scanning unit relatively displaces at least one of the radiological image and the second grating to a plurality of relative positions at which phase differences of the radiological image and the second grating are different from each other. The radiation detection unit is provided on a path of the radiation and detects the radiation irradiated to the radiological image detector. The control unit allows the scanning unit to perform a relative displacement operation of the first grating and the second grating in a time period in which a radiation dose detection value of the radiation detected by the radiation detection unit is attenuated to a given level.
摘要:
The accuracy of combining positions of elongated images is improved at low cost, in a radiation imaging apparatus for generating elongated images having dimensions greater than a detectable range of a radiation image detecting means. A laser source is utilized.Displacement measuring means for measuring distances to targets by receiving a laser beam reflected by the subjects is provided. Positions that correspond to the ends of images in the movement direction of the radiation image detecting means are scanned in the direction perpendicular to the movement direction with the laser beam at each imaging operation. The displacement measuring means measures the positions of the ends of subjects in the laser scanning direction by receiving the laser beam reflected during scanning. An image processing means matches the combining positions of radiation images such that the ends of the subjects measured during each imaging operation are matched, and generates the elongated image.
摘要:
In an apparatus for the production of a silica crucible comprising a carbon mold suitable for producing the silica crucible by the rotating mold method, the carbon mold has a thermal conductivity of not more than 125 W/(m·K).