公开(公告)号：US20110076458A1

公开(公告)日：2011-03-31

申请号：US12961727

申请日：2010-12-07

申请人： Masataka NUNOMURA ,  Masayuki Ooe ,  Hajime Nakano ,  Yoshiko Tsumaru ,  Takumi Ueno

发明人： Masataka NUNOMURA ,  Masayuki Ooe ,  Hajime Nakano ,  Yoshiko Tsumaru ,  Takumi Ueno

IPC分类号： B32B3/30 ,  G03C1/73 ,  G03F7/20

CPC分类号： G03F7/0233 ,  G03F7/0392 ,  H05K3/4676 ,  Y10S430/107 ,  Y10T428/24612

摘要： A photosensitive polymer composition, having (a) a polymer selected from polyimide precursors and polyimides having an acid group protected by a protecting group and having no amino group (—NH2) at the end; and (b) a compound that generates an acid when exposed to light and capable of deprotecting the protecting group from the acid group, is employed to form layers of a semiconductor device.

摘要翻译： 一种光敏聚合物组合物，其具有（a）选自聚酰亚胺前体和具有被保护基保护的酸基并且在末端不具有氨基（-NH 2）的聚酰亚胺）的聚合物; 和（b）当暴露于光并且能够使保护基从酸基脱保护时产生酸的化合物被用于形成半导体器件的层。

公开(公告)号：US20070072122A1

公开(公告)日：2007-03-29

申请号：US11605262

申请日：2006-11-29

申请人： Masataka Nunomura ,  Masayuki Ooe ,  Hajime Nakano ,  Yoshiko Tsumaru ,  Takumi Ueno

发明人： Masataka Nunomura ,  Masayuki Ooe ,  Hajime Nakano ,  Yoshiko Tsumaru ,  Takumi Ueno

IPC分类号： G03C1/00

CPC分类号： G03F7/0233 ,  G03F7/0392 ,  H05K3/4676 ,  Y10S430/107 ,  Y10T428/24612

摘要： A photosensitive polymer composition, having (a) a polymer selected from polyimide precursors and polyimides having an acid group protected by a protecting group and having no amino group (—NH2) at the end; and (b) a compound that generates an acid when exposed to light and capable of deprotecting the protecting group from the acid group, is employed to form layers of a semiconductor device.

摘要翻译： 一种光敏聚合物组合物，其具有（a）选自聚酰亚胺前体的聚合物和具有被保护基保护并且末端没有氨基（-NH 2））的酸基的聚酰亚胺; 和（b）当暴露于光并且能够使保护基从酸基脱保护时产生酸的化合物被用于形成半导体器件的层。

公开(公告)号：US07851128B2

公开(公告)日：2010-12-14

申请号：US11605262

申请日：2006-11-29

申请人： Masataka Nunomura ,  Masayuki Ooe ,  Hajime Nakano ,  Yoshiko Tsumaru ,  Takumi Ueno

发明人： Masataka Nunomura ,  Masayuki Ooe ,  Hajime Nakano ,  Yoshiko Tsumaru ,  Takumi Ueno

IPC分类号： G03F7/004 ,  G03F7/30

CPC分类号： G03F7/0233 ,  G03F7/0392 ,  H05K3/4676 ,  Y10S430/107 ,  Y10T428/24612

摘要： A photosensitive polymer composition, having (a) a polymer selected from polyimide precursors and polyimides having an acid group protected by a protecting group and having no amino group (—NH2) at the end; and (b) a compound that generates an acid when exposed to light and capable of deprotecting the protecting group from the acid group, is employed to form layers of a semiconductor device.

摘要翻译： 一种光敏聚合物组合物，其具有（a）选自聚酰亚胺前体和具有被保护基保护的酸基并且在末端不具有氨基（-NH 2）的聚酰亚胺）的聚合物; 和（b）当暴露于光并且能够使保护基从酸基脱保护时产生酸的化合物被用于形成半导体器件的层。

公开(公告)号：US07150947B2

公开(公告)日：2006-12-19

申请号：US10440301

申请日：2003-05-19

申请人： Masataka Nunomura ,  Masayuki Ooe ,  Hajime Nakano ,  Yoshiko Tsumaru ,  Takumi Ueno

发明人： Masataka Nunomura ,  Masayuki Ooe ,  Hajime Nakano ,  Yoshiko Tsumaru ,  Takumi Ueno

IPC分类号： G03F7/004 ,  G03F7/30

CPC分类号： G03F7/0233 ,  G03F7/0392 ,  H05K3/4676 ,  Y10S430/107 ,  Y10T428/24612

摘要： A photosensitive polymer composition, having (a) a polymer selected from polyimide precursors and polyimides having an acid group protected by a protecting group and having no amino group (—NH2) at the end; and (b) a compound that generates an acid when exposed to light and capable of deprotecting the protecting group from the acid group, is employed to form layers of a semiconductor device.

摘要翻译： 一种光敏聚合物组合物，其具有（a）选自聚酰亚胺前体的聚合物和具有被保护基保护并且末端没有氨基（-NH 2））的酸基的聚酰亚胺; 和（b）当暴露于光并且能够使保护基从酸基脱保护时产生酸的化合物被用于形成半导体器件的层。

公开(公告)号：US08304149B2

公开(公告)日：2012-11-06

申请号：US12961727

申请日：2010-12-07

申请人： Masataka Nunomura ,  Masayuki Ooe ,  Hajime Nakano ,  Yoshiko Tsumaru ,  Takumi Ueno

发明人： Masataka Nunomura ,  Masayuki Ooe ,  Hajime Nakano ,  Yoshiko Tsumaru ,  Takumi Ueno

IPC分类号： G03F7/004 ,  G03F7/30

CPC分类号： G03F7/0233 ,  G03F7/0392 ,  H05K3/4676 ,  Y10S430/107 ,  Y10T428/24612

摘要： A photosensitive polymer composition, having (a) a polymer selected from polyimide precursors and polyimides having an acid group protected by a protecting group and having no amino group (—NH2) at the end; and (b) a compound that generates an acid when exposed to light and capable of deprotecting the protecting group from the acid group, is employed to form layers of a semiconductor device.

摘要翻译： 一种光敏聚合物组合物，其具有（a）选自聚酰亚胺前体和具有被保护基保护的酸基并且在末端不具有氨基（-NH 2）的聚酰亚胺）的聚合物; 和（b）当暴露于光并且能够使保护基从酸基脱保护时产生酸的化合物被用于形成半导体器件的层。

公开(公告)号：US08852726B2

公开(公告)日：2014-10-07

申请号：US13528989

申请日：2012-06-21

申请人： Masayuki Ooe ,  Hiroshi Komatsu ,  Yoshiko Tsumaru ,  Dai Kawasaki ,  Kouji Katou ,  Takumi Ueno

发明人： Masayuki Ooe ,  Hiroshi Komatsu ,  Yoshiko Tsumaru ,  Dai Kawasaki ,  Kouji Katou ,  Takumi Ueno

IPC分类号： B32B3/00 ,  G03F7/00 ,  C08K5/13 ,  C08K5/138 ,  G03F7/039 ,  G03F7/40 ,  C08L77/10 ,  G03F7/022 ,  G03F7/023 ,  G03F7/004 ,  C08K5/03 ,  C08L77/06

CPC分类号： G03F7/0226 ,  C08K5/03 ,  C08K5/13 ,  C08K5/138 ,  C08L77/06 ,  C08L77/10 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0233 ,  G03F7/039 ,  G03F7/40 ,  Y10T428/24521 ,  Y10T428/24612 ,  Y10T428/24802 ,  C08L77/00

摘要： A photosensitive polymer composition includes (a) a polyamide having a repeating unit represented by the following general formula (I): wherein U represents a tetravalent organic group, V represents a bivalent organic group and p is an integer representing a number of the repeating unit; (b) a compound which generates an acid upon receiving light; and (c) a compound represented by the following general formula (II): wherein m and n are each independently integer of 1 or 2, Rs are each independently hydrogen, alkyl group or acyl group, and R1 and R2 each independently represents fluoroalkyl group having 1 to 3 carbon atoms.

摘要翻译： 光敏聚合物组合物包括（a）具有由以下通式（I）表示的重复单元的聚酰胺：其中U表示四价有机基团，V表示二价有机基团，p表示重复单元数目的整数 ; （b）在接收光时产生酸的化合物; 和（c）由以下通式（II）表示的化合物：其中m和n各自独立地为1或2的整数，R 5各自独立地为氢，烷基或酰基，并且R 1和R 2各自独立地表示氟代烷基 具有1至3个碳原子。

公开(公告)号：US08231959B2

公开(公告)日：2012-07-31

申请号：US10585738

申请日：2004-12-16

申请人： Masayuki Ooe ,  Hiroshi Komatsu ,  Yoshiko Tsumaru ,  Dai Kawasaki ,  Kouji Katou ,  Takumi Ueno

发明人： Masayuki Ooe ,  Hiroshi Komatsu ,  Yoshiko Tsumaru ,  Dai Kawasaki ,  Kouji Katou ,  Takumi Ueno

IPC分类号： B32B3/00 ,  G03F7/00

CPC分类号： G03F7/0226 ,  C08K5/03 ,  C08K5/13 ,  C08K5/138 ,  C08L77/06 ,  C08L77/10 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0233 ,  G03F7/039 ,  G03F7/40 ,  Y10T428/24521 ,  Y10T428/24612 ,  Y10T428/24802 ,  C08L77/00

摘要： A photosensitive polymer composition includes (a) a polyamide having a repeating unit represented by the following general formula (I): wherein U represents a tetravalent organic group, V represents a bivalent organic group and p is an integer representing a number of the repeating unit; (b) a compound which generates an acid upon receiving light; and (c) a compound represented by the following general formula (II): wherein m and n are each independently integer of 1 or 2, Rs are each independently hydrogen, alkyl group or acyl group, and R1 and R2 each independently represents fluoroalkyl group having 1 to 3 carbon atoms.

摘要翻译： 光敏聚合物组合物包括（a）具有由以下通式（I）表示的重复单元的聚酰胺：其中U表示四价有机基团，V表示二价有机基团，p表示重复单元数目的整数 ; （b）在接收光时产生酸的化合物; 和（c）由以下通式（II）表示的化合物：其中m和n各自独立地为1或2的整数，R 5各自独立地为氢，烷基或酰基，并且R 1和R 2各自独立地表示氟代烷基 具有1至3个碳原子。

公开(公告)号：US20120263920A1

公开(公告)日：2012-10-18

申请号：US13528989

申请日：2012-06-21

申请人： Masayuki Ooe ,  Hiroshi Komatsu ,  Yoshiko Tsumaru ,  Dai Kawasaki ,  Kouji Katou ,  Takumi Ueno

发明人： Masayuki Ooe ,  Hiroshi Komatsu ,  Yoshiko Tsumaru ,  Dai Kawasaki ,  Kouji Katou ,  Takumi Ueno

IPC分类号： G03F7/004 ,  B32B3/30 ,  G03F7/20

CPC分类号： G03F7/0226 ,  C08K5/03 ,  C08K5/13 ,  C08K5/138 ,  C08L77/06 ,  C08L77/10 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0233 ,  G03F7/039 ,  G03F7/40 ,  Y10T428/24521 ,  Y10T428/24612 ,  Y10T428/24802 ,  C08L77/00

摘要： A photosensitive polymer composition includes (a) a polyamide having a repeating unit represented by the following general formula (I): wherein U represents a tetravalent organic group, V represents a bivalent organic group and p is an integer representing a number of the repeating unit; (b) a compound which generates an acid upon receiving light; and (c) a compound represented by the following general formula (II): wherein m and n are each independently integer of 1 or 2, Rs are each independently hydrogen, alkyl group or acyl group, and R1 and R2 each independently represents fluoroalkyl group having 1 to 3 carbon atoms.

摘要翻译： 光敏聚合物组合物包括（a）具有由以下通式（I）表示的重复单元的聚酰胺：其中U表示四价有机基团，V表示二价有机基团，p表示重复单元数目的整数 ; （b）在接收光时产生酸的化合物; 和（c）由以下通式（II）表示的化合物：其中m和n各自独立地为1或2的整数，R 5各自独立地为氢，烷基或酰基，并且R 1和R 2各自独立地表示氟代烷基 具有1至3个碳原子。

公开(公告)号：US20080220222A1

公开(公告)日：2008-09-11

申请号：US10585738

申请日：2004-12-16

申请人： Ooe Masayuki ,  Hiroshi Komatsu ,  Yoshiko Tsumaru ,  Dai Kawasaki ,  Kouji Katou ,  Takumi Ueno

发明人： Ooe Masayuki ,  Hiroshi Komatsu ,  Yoshiko Tsumaru ,  Dai Kawasaki ,  Kouji Katou ,  Takumi Ueno

IPC分类号： G03F7/004 ,  G03F7/20

CPC分类号： G03F7/0226 ,  C08K5/03 ,  C08K5/13 ,  C08K5/138 ,  C08L77/06 ,  C08L77/10 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0233 ,  G03F7/039 ,  G03F7/40 ,  Y10T428/24521 ,  Y10T428/24612 ,  Y10T428/24802 ,  C08L77/00

摘要： A photosensitive polymer composition includes (a) a polyamide having a repeating unit represented by the following general formula (I): wherein U represents a tetravalent organic group, V represents a bivalent organic group and p is an integer representing a number of the repeating unit; (b) a compound which generates an acid upon receiving light; and (c) a compound represented by the following general formula (II): wherein m and n are each independently integer of 1 or 2, Rs are each independently hydrogen, alkyl group or acyl group, and R1 and R2 each independently represents fluoroalkyl group having 1 to 3 carbon atoms.

摘要翻译： 光敏聚合物组合物包括（a）具有由以下通式（I）表示的重复单元的聚酰胺：其中U表示四价有机基团，V表示二价有机基团，p表示重复单元数目的整数 ; （b）在接收光时产生酸的化合物; 和（c）由以下通式（II）表示的化合物：其中m和n各自独立地为1或2的整数，R 5各自独立地为氢，烷基或酰基，R 1， >和R 2各自独立地表示具有1至3个碳原子的氟代烷基。

公开(公告)号：US20100227126A1

公开(公告)日：2010-09-09

申请号：US12377419

申请日：2006-08-14

申请人： Hajime Nakano ,  Noriyuki Yamazaki ,  Yoshiko Futagawa ,  Yoshika Satou ,  Dai Kawasaki ,  Takumi Ueno

发明人： Hajime Nakano ,  Noriyuki Yamazaki ,  Yoshiko Futagawa ,  Yoshika Satou ,  Dai Kawasaki ,  Takumi Ueno

IPC分类号： G03F7/004 ,  G03F7/20 ,  B32B3/00

CPC分类号： G03F7/0392 ,  G03F7/0233 ,  G03F7/085 ,  G03F7/11 ,  Y10T428/24802

摘要： A positive-type photosensitive resin composition for electronic materials having good film adhesiveness and sensitivity without causing a corrosion reaction to copper and copper alloys in metal wirings, a method for producing patterns and electronic parts are provided. The positive-type photosensitive resin composition includes (A) a polybenzoxazole precursor having a structure represented by the following general formula (I): wherein X represents a bivalent organic group, Y represents a tetravalent organic group, R1 represents a hydrogen atom or a monovalent organic group, and m represents an integer of 2 to 500 which represents a repeating unit number of the polymer, (B) a solvent, (C) a tetrazole derivative and (D) a compound which generates an acid by light.

摘要翻译： 提供了一种具有良好的膜粘附性和灵敏度的不会对金属布线中的铜和铜合金产生腐蚀反应的电子材料的正型感光性树脂组合物，制造图案和电子部件的方法。 正型感光性树脂组合物包括（A）具有以下通式（I）所示结构的聚苯并恶唑前体：其中X表示二价有机基团，Y表示四价有机基团，R 1表示氢原子或一价 有机基团，m表示2〜500的整数，表示聚合物的重复单元数，（B）溶剂，（C）四唑衍生物和（D）通过光产生酸的化合物。