摘要:
Two imaging equipment are provided at a pair of cutting blade units, and the two imaging equipment image patterns at first positions in proximity to the center of a wafer at the same time. A controller drives drive mechanisms to align the wafer in such a way that current image patterns at the first positions can match with a reference pattern at the first positions. Then, the two imaging equipment are moved to positions for imaging patterns at second positions at the outer circumference of the wafer to image the patterns at the second positions. The controller drives the drive mechanisms to align the wafer in such a way that current image patterns at the second positions can match with a reference pattern at the second positions.
摘要:
Two imaging equipment are provided at a pair of cutting blade units, and the two imaging equipment image patterns at first positions in proximity to the center of a wafer at the same time. A controller drives drive mechanisms to align the wafer in such a way that current image patterns at the first positions can match with a reference pattern at the first positions. Then, the two imaging equipment are moved to positions for imaging patterns at second positions at the outer circumference of the wafer to image the patterns at the second positions. The controller drives the drive mecha- nisms to align the wafer in such a way that current image patterns at the second positions can match with a reference pattern at the second positions.
摘要:
A wafer is gripped by a chuck part provided at a front end of a slide arm, and the slide arm is moved in the first direction from a reference position, from which the workpiece is transferred to a workpiece cutting part, to a cleansing position, where the cut workpiece is cleansed, so that the wafer can be transferred in the first direction. The wafer is gripped by a chuck part provided at a front end of a rotary arm, which is rotatably supported at a base end by the front end of the slide arm. Then, the slide arm is moved in the first direction and the rotary arm is rotated. Thereby, the wafer can be transferred in the second direction, which is perpendicular to the first direction.
摘要:
Two blades are arranged oppositely at a predetermined interval along the Y-axis. The two blades cut a wafer along two cutting lines at the same time while the two blades are moving along the X-axis. After the wafer is cut along these two cutting lines, the two blades are moved along the Y-axis by one pitch of the cutting lines so that the wafer can be cut along the next two cutting lines. This action is repeated to cut the wafer along the cutting lines continuously. This wafer cutting method can hold the movement of the blades along the X-axis to a minimum because of the oppositely-arranged two blades. Consequently, the wafer can be cut in a short period of time.
摘要:
The flange cover covering the blade is divided into two. The second cover is turnably connected to the first cover through a shaft parallel with the spindle of the blade, and the second cover is opened and closed in connection with vertical movement of the spindle. When the spindle is moved upward for replacing the blade, the second cover is automatically turned to the opening position, and L-shaped coolant jetting nozzles are moved away from positions below the blade to positions beside the blade. Thus, the blade can be easily replaced, and an automatic blade replacing system can be applied.
摘要:
With a blade exchanging device, a cylindrical body is engaged with a nut that is fastened to a spindle, and at the same time the nut is held by fitting nails of a chuck member with grooves that are formed on the nut. Next, a torque wrench is inserted through the cylindrical body, and a polygonal head of the torque wrench is engaged with a polygonal hole formed in the head of the spindle. In this state, the spindle is rotated with the torque wrench in a direction to unfasten the nut from the spindle. The nut is thereby detached from the spindle. When the cylindrical body is disengaged from the spindle, the nut is prevented from falling off the cylindrical body, since the nails of the chuck hold the nut.
摘要:
A bead inspection step and a bead inspection apparatus that inspect the quality of a bead are disclosed . . . . The bead inspection apparatus includes a wire-feed-speed measurement device that measures the feed speed of a brazing wire, and an analysis portion that measures and analyzes position coordinate data about surfaces of a first, workpiece, a second workpiece and the bead, and performs a first shape data measurement step of. measuring first shape data before brazing, a second shape data measurement step of measuring second shape data after the brazing, a feature quantity calculation step of calculating predicted values of feature quantities based on the first and second shape data and the brazing wire feed speed, and a throat thickness calculation step of calculating a predicted value of the throat thickness by a regression expression formed based on actual measurements of the feature quantities and of the throat thickness.
摘要:
There is provided a laser dicing apparatus comprising: a first position detecting device detecting a position of the surface of a wafer at an incident point of laser light; second position detecting device detecting in advance a position of the surface of the wafer; and a control section controlling the position in the thickness direction of a condensing point inside the wafer, wherein the control section, when scanning the laser light from the outside of a periphery of the wafer to the inside of the periphery of the wafer, performs control based on data obtained with the second position detecting device detecting the position of the condensing point at the periphery of the wafer, and after scanning a predetermined distance, switches to perform control based on data obtained by the first position detecting device. Thereby, when the laser light is made incident through the surface of the wafer and scanned, the position control of the condensing point of the laser light can be performed even at the periphery of the wafer, and a modified region by multi-photon absorption can be formed at a predetermined position inside the wafer.
摘要:
A bead inspection step and a bead inspection apparatus that inspect the quality of a bead are disclosed . . . . The bead inspection apparatus includes a wire-feed-speed measurement device that measures the feed speed of a brazing wire, and an analysis portion that measures and analyzes position coordinate data about surfaces of a first, workpiece, a second workpiece and the bead, and performs a first shape data measurement step of. measuring first shape data before brazing, a second shape data measurement step of measuring second shape data after the brazing, a feature quantity calculation step of calculating predicted values of feature quantities based on the first and second shape data and the brazing wire feed speed, and a throat thickness calculation step of calculating a predicted value of the throat thickness by a regression expression formed based on actual measurements of the feature quantities and of the throat thickness.
摘要:
A yeast including a cell wall having a low mannan content, wherein the yeast has an immunopotentiating capability, and is able to grow in a YPD liquid medium with an osmotic pressure of 300 mOsm, and wherein, when a part of a pre-culture of the yeast grown in a YPDS liquid medium is added to the YPD liquid medium so that OD660 is adjusted to 0.1, followed by incubating at 30° C. for 24 hours, the yeast grows to increase the OD660 of the YPD liquid medium to 1.0 or more.