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公开(公告)号:US10010853B2
公开(公告)日:2018-07-03
申请号:US14660852
申请日:2015-03-17
Applicant: Matheson Tri-Gas, Inc.
Inventor: Mark W. Raynor , Daniel J. Tempel , Junpin Yao , Larry Wagg , Adam Seymour
CPC classification number: B01J19/02 , B01D9/0004 , B01D53/0415 , B01D2253/116 , B01D2253/308 , B01D2256/26 , B01D2257/204 , B01J2219/0204 , B01J2219/0209 , B01J2219/0218 , C01B35/061 , C10G65/04
Abstract: The present invention relates, in general, to the purification of boron trichloride (BCl3). More particularly, the invention relates to a process for minimizing silicon tetrachloride (SiCl4) formation in BCl3 production and/or the removal of SiCl4 in BCl3 product stream by preventing/minimizing the silicon source in the reaction chambers. In addition, a hydride material may be used to convert any SiCl4 present to SiH4 which is easier to remove. Lastly freeze separation would replace fractional distillation to remove SiCl4 from BCl3 that has been partially purified to remove light boilers.
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公开(公告)号:US20150266744A1
公开(公告)日:2015-09-24
申请号:US14660786
申请日:2015-03-17
Applicant: Matheson Tri-Gas, Inc.
Inventor: Mark W. Raynor , Daniel J. Tempel , Junpin Yao , Larry Wagg , Adam Seymour
CPC classification number: B01J19/02 , B01D9/0004 , B01D53/0415 , B01D2253/116 , B01D2253/308 , B01D2256/26 , B01D2257/204 , B01J2219/0204 , B01J2219/0209 , B01J2219/0218 , C01B35/061 , C10G65/04
Abstract: The present invention relates, in general, to the purification of boron trichloride (BCl3). More particularly, the invention relates to a process for minimizing silicon tetrachloride (SiCl4) formation in BCl3 production and/or the removal of SiCl4 in BCl3 product stream by preventing/minimizing the silicon source in the reaction chambers. In addition, a hydride material may be used to convert any SiCl4 present to SiH4 which is easier to remove. Lastly freeze separation would replace fractional distillation to remove SiCl4 from BCl3 that has been partially purified to remove light boilers.
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公开(公告)号:US20150265996A1
公开(公告)日:2015-09-24
申请号:US14660852
申请日:2015-03-17
Applicant: Matheson Tri-Gas, Inc.
Inventor: Mark W. Raynor , Daniel J. Tempel , Junpin Yao , Larry Wagg , Adam Seymour
CPC classification number: B01J19/02 , B01D9/0004 , B01D53/0415 , B01D2253/116 , B01D2253/308 , B01D2256/26 , B01D2257/204 , B01J2219/0204 , B01J2219/0209 , B01J2219/0218 , C01B35/061 , C10G65/04
Abstract: The present invention relates, in general, to the purification of boron trichloride (BCl3). More particularly, the invention relates to a process for minimizing silicon tetrachloride (SiCl4) formation in BCl3 production and/or the removal of SiCl4 in BCl3 product stream by preventing/minimizing the silicon source in the reaction chambers. In addition, a hydride material may be used to convert any SiCl4 present to SiH4 which is easier to remove. Lastly freeze separation would replace fractional distillation to remove SiCl4 from BCl3 that has been partially purified to remove light boilers.
Abstract translation: 本发明一般涉及三氯化硼(BCl 3)的纯化。 更具体地说,本发明涉及通过防止/最小化反应室中的硅源来最小化BCl 3生产中四氯化硅(SiCl 4)形成和/或在BCl 3产物流中除去SiCl 4的方法。 此外,氢化物材料可用于将存在的任何SiCl 4转化为更容易除去的SiH 4。 最后,冷冻分离将取代分馏,以从已经部分纯化以除去轻质锅炉的BCl 3中除去SiCl4。
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公开(公告)号:US20170182558A1
公开(公告)日:2017-06-29
申请号:US15389629
申请日:2016-12-23
Applicant: Matheson Tri-Gas, Inc.
Inventor: Hideharu Shimizu , Mark W. Raynor , Daniel Tempel , Junpin Yao , Larry Wagg , Robert Torres, JR.
IPC: B22F3/105 , B33Y50/02 , B33Y30/00 , B33Y80/00 , B22F3/10 , B23K15/00 , B23K26/342 , B23K26/60 , C23C8/24 , C23C8/20 , C23C8/10 , C23C8/28 , C23C8/36 , C23C10/08 , C23C12/02 , B33Y10/00
CPC classification number: B22F3/1055 , B22F2003/1056 , B22F2999/00 , B23K10/027 , B23K15/0086 , B23K15/0093 , B23K15/10 , B23K26/126 , B23K26/127 , B23K26/342 , B23K26/38 , B23K26/60 , B29C64/10 , B29C64/314 , B33Y10/00 , B33Y30/00 , C23C24/103 , Y02P10/295 , B22F3/101 , B22F2201/013 , B22F2201/02 , B22F2201/03 , B22F2201/04 , B22F2201/10 , B22F2201/30 , B22F2201/32
Abstract: The present invention generally relates to methods and apparatuses adapted to perform additive manufacturing (AM) processes and the resulting products made therefrom, and specifically, to AM processes that employ an energy beam to selectively fuse a base material to produce an object. More particularly, the invention relates to methods and systems that use reactive fluids to actively manipulate the surface chemistry of the base material prior to, during and/or after the AM process.
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公开(公告)号:US09669378B2
公开(公告)日:2017-06-06
申请号:US14660786
申请日:2015-03-17
Applicant: Matheson Tri-Gas, Inc.
Inventor: Mark W. Raynor , Daniel J. Tempel , Junpin Yao , Larry Wagg , Adam Seymour
CPC classification number: B01J19/02 , B01D9/0004 , B01D53/0415 , B01D2253/116 , B01D2253/308 , B01D2256/26 , B01D2257/204 , B01J2219/0204 , B01J2219/0209 , B01J2219/0218 , C01B35/061 , C10G65/04
Abstract: The present invention relates, in general, to the purification of boron trichloride (BCl3). More particularly, the invention relates to a process for minimizing silicon tetrachloride (SiCl4) formation in BCl3 production and/or the removal of SiCl4 in BCl3 product stream by preventing/minimizing the silicon source in the reaction chambers. In addition, a hydride material may be used to convert any SiCl4 present to SiH4 which is easier to remove. Lastly freeze separation would replace fractional distillation to remove SiCl4 from BCl3 that has been partially purified to remove light boilers.
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