公开(公告)号：US07811934B2

公开(公告)日：2010-10-12

申请号：US12045769

申请日：2008-03-11

申请人： Mi Hee Jeong ,  Hyo Young Lee ,  Nak Jin Choi ,  Kang Ho Park

发明人： Mi Hee Jeong ,  Hyo Young Lee ,  Nak Jin Choi ,  Kang Ho Park

IPC分类号： H01L21/033 ,  H01L21/311

CPC分类号： H01L21/31144 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/0331 ,  H01L51/0022 ,  Y10S977/889

摘要： Provided are a method of manufacturing nanoelectrode lines. The method includes the steps of: sequentially forming an insulating layer, a first photoresist layer, and a drop-shaped second photoresist on a substrate; disposing an imprint mold having a plurality of molding patterns over the second photoresist; applying pressure to the mold to allow the second photoresist to flow into the mold patterns; irradiating ultraviolet (UV) light onto the mold to cure the second photoresist; removing the mold from the cured second photoresist and patterning the second photoresist; patterning the first photoresist layer using the patterned second photoresist as a mask; patterning the insulating layer; and forming a metal layer between the patterned insulating layers. In this method, metal electrode lines are formed between insulating layers using an imprint lithography process, so that nanoelectronic devices can be freed from crosstalk between the metal electrode lines.

摘要翻译： 提供一种制造纳米电极线的方法。 该方法包括以下步骤：在衬底上依次形成绝缘层，第一光致抗蚀剂层和滴形第二光致抗蚀剂; 在所述第二光致抗蚀剂上设置具有多个模制图案的压印模具; 向模具施加压力以允许第二光致抗蚀剂流入模具图案; 将UV（UV）光照射到模具上以固化第二光致抗蚀剂; 从固化的第二光致抗蚀剂移除模具并图案化第二光致抗蚀剂; 使用图案化的第二光致抗蚀剂作为掩模来图案化第一光致抗蚀剂层; 图案化绝缘层; 以及在图案化的绝缘层之间形成金属层。 在该方法中，使用压印光刻工艺在绝缘层之间形成金属电极线，使得纳米电子器件可以免除金属电极线之间的串扰。

公开(公告)号：US20090023288A1

公开(公告)日：2009-01-22

申请号：US12045769

申请日：2008-03-11

申请人： Mi Hee Jeong ,  Hyo Young Lee ,  Nak Jin Choi ,  Kang Ho Park

发明人： Mi Hee Jeong ,  Hyo Young Lee ,  Nak Jin Choi ,  Kang Ho Park

IPC分类号： H01L21/768

CPC分类号： H01L21/31144 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/0331 ,  H01L51/0022 ,  Y10S977/889

摘要： Provided are a method of manufacturing nanoelectrode lines. The method includes the steps of: sequentially forming an insulating layer, a first photoresist layer, and a drop-shaped second photoresist on a substrate; disposing an imprint mold having a plurality of molding patterns over the second photoresist; applying pressure to the mold to allow the second photoresist to flow into the mold patterns; irradiating ultraviolet (UV) light onto the mold to cure the second photoresist; removing the mold from the cured second photoresist and patterning the second photoresist; patterning the first photoresist layer using the patterned second photoresist as a mask; patterning the insulating layer; and forming a metal layer between the patterned insulating layers. In this method, metal electrode lines are formed between insulating layers using an imprint lithography process, so that nanoelectronic devices can be freed from crosstalk between the metal electrode lines.

摘要翻译： 提供一种制造纳米电极线的方法。 该方法包括以下步骤：在衬底上依次形成绝缘层，第一光致抗蚀剂层和滴形第二光致抗蚀剂; 在所述第二光致抗蚀剂上设置具有多个模制图案的压印模具; 向模具施加压力以允许第二光致抗蚀剂流入模具图案; 将UV（UV）光照射到模具上以固化第二光致抗蚀剂; 从固化的第二光致抗蚀剂移除模具并图案化第二光致抗蚀剂; 使用图案化的第二光致抗蚀剂作为掩模来图案化第一光致抗蚀剂层; 图案化绝缘层; 以及在图案化的绝缘层之间形成金属层。 在该方法中，使用压印光刻工艺在绝缘层之间形成金属电极线，使得纳米电子器件可以免除金属电极线之间的串扰。

公开(公告)号：US20080107906A1

公开(公告)日：2008-05-08

申请号：US11856484

申请日：2007-09-17

申请人： Nak Jin Choi ,  Jung Hyun Lee ,  Kang Ho Park ,  Hyo Young Lee ,  Hyung Kun Lee ,  Jong Dae Kim

发明人： Nak Jin Choi ,  Jung Hyun Lee ,  Kang Ho Park ,  Hyo Young Lee ,  Hyung Kun Lee ,  Jong Dae Kim

IPC分类号： B32B27/06 ,  B05D5/12 ,  B32B15/08

CPC分类号： B32B15/08 ,  Y10T428/31544 ,  Y10T428/31678

摘要： Provided are a method for preparing polymer actuators with high stability and polymer actuators prepared by the method, and more specifically, to a method for preparing polymer actuators with high stability that use low power, are extremely thin, and can be substituted in a motor of a camera module, and polymer actuators prepared by the method. The method includes the steps of: preparing an Ionic Polymer Metal Composite (IPMC) in which metal electrodes are plated on both surfaces of a ionic polymer film; removing water from the ionic polymer film of the IPMC; and expanding the IPMC in a polar solvent that has a higher boiling point and a lower freezing point than water.

摘要翻译： 提供一种制备具有高稳定性的聚合物致动器和通过该方法制备的聚合物致动器的方法，更具体地说，涉及一种制备具有高功率，非常薄的高稳定性的聚合物致动器的方法，并且可以在 相机模块和通过该方法制备的聚合物致动器。 该方法包括以下步骤：制备在离子聚合物膜的两个表面上镀金属电极的离子聚合物金属复合物（IPMC）; 从IPMC的离子聚合物膜中除去水分; 并在具有比水更高的沸点和更低的凝固点的极性溶剂中扩展IPMC。

公开(公告)号：US07420058B2

公开(公告)日：2008-09-02

申请号：US11602982

申请日：2006-11-22

申请人： Hyo Young Lee ,  Jung Hyun Lee ,  Gyeong Sook Bang ,  Nak Jin Choi ,  Jong Hyurk Park

发明人： Hyo Young Lee ,  Jung Hyun Lee ,  Gyeong Sook Bang ,  Nak Jin Choi ,  Jong Hyurk Park

IPC分类号： C07D401/14 ,  C07F15/00 ,  H05B33/14

CPC分类号： H01L51/0086 ,  G11C13/0014 ,  H01L27/285 ,  Y10S428/917

摘要： Provided are a compound for a molecular electronic device which includes a terpyridine-ruthenium organic metal compound including a thiol anchoring group of the formula below, a method of synthesizing the compound and a molecular electronic device including a molecular active layer obtained from the compound. In the formula, R1 and R2 are each a thioacetyl group or a hydrogen atom, at least one of R1 and R2 is a thioacetyl group, and m and n are each integers from 0 to 20. The molecular active layer, which is formed by self-assembling the compound on an electrode surface, composes a switching element and a memory element.

摘要翻译： 本发明提供一种分子电子器件的化合物，其包括三联吡啶 - 钌有机金属化合物，其包含下式的硫醇锚定基团，合成该化合物的方法和包含由该化合物获得的分子活性层的分子电子器件。 在该式中，R 1和R 2各自为硫代乙酰基或氢原子，R 1和R 2中的至少一个 > 2是硫代乙酰基，m和n各自为0〜20的整数。通过在电极表面上自组装化合物形成的分子活性层构成开关元件和存储元件 。

公开(公告)号：US07419764B2

公开(公告)日：2008-09-02

申请号：US11505395

申请日：2006-08-17

申请人： Jong Hyurk Park ,  Hyo Young Lee ,  Nak Jin Choi ,  Jung Hyun Lee ,  Gyeong Sook Bang

发明人： Jong Hyurk Park ,  Hyo Young Lee ,  Nak Jin Choi ,  Jung Hyun Lee ,  Gyeong Sook Bang

IPC分类号： G03C5/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0035 ,  G03F9/00 ,  Y10S430/143

摘要： Provided is a method of fabricating a nanoimprint mold which can form sub-100 nm fine pattern structures. The method includes forming patterns on a first substrate using an E-beam lithography (EBL) process, and transferring the patterns formed on the first substrate to a second substrate using a nanoimprint lithography (NIL) process to complete an NIL mold. Accordingly, the method can easily fabricate the nanoimprint mold at low costs on a quartz or glass substrate, which is not suitable for an EBL process to produce sub-100 nm patterns, by utilizing the advantages of the EBL process with a resolution of tens of nanometers.

摘要翻译： 提供一种制造能够形成亚100nm精细图案结构的纳米压印模具的方法。 该方法包括使用电子束光刻（EBL）工艺在第一衬底上形成图案，并使用纳米压印光刻（NIL）工艺将形成在第一衬底上的图案转移到第二衬底以完成NIL模具。 因此，该方法可以容易地在石英或玻璃基板上以低成本制造纳米压印模具，其不适用于生产亚100nm图案的EBL工艺，通过利用具有数十个分辨率的EBL工艺的优点 纳米。

公开(公告)号：US20090148607A1

公开(公告)日：2009-06-11

申请号：US12195295

申请日：2008-08-20

申请人： Mi Hee JEONG ,  Hyo Young Lee

发明人： Mi Hee JEONG ,  Hyo Young Lee

IPC分类号： B05D3/12

CPC分类号： G03F7/0002 ,  B01J23/007 ,  B01J23/80 ,  B01J37/0215 ,  B01J37/03 ,  B82Y10/00 ,  B82Y40/00

摘要： Provided is a method of patterning a catalyst using nano imprint lithography. The method includes slurrying a catalyst, preparing a stamp for forming a catalyst pattern, forming the catalyst pattern by coating a substrate with the catalyst slurry, imprinting the stamp on the catalyst slurry and performing patterning simultaneously with calcination through nano imprint lithography, and drying the patterned catalyst. As the catalyst pattern is formed through the nano imprint lithography, a surface area of the catalyst increases and it is easy to pattern the catalyst according to the shape of the stamp.

摘要翻译： 提供了使用纳米压印光刻图案化催化剂的方法。 该方法包括使催化剂浆化，制备用于形成催化剂图案的印模，通过用催化剂浆料涂布基材形成催化剂图案，将印模印在催化剂浆料上，并通过纳米压印光刻法同时进行煅烧，并干燥 图案化催化剂。 当通过纳米压印光刻法形成催化剂图案时，催化剂的表面积增加，并且容易根据印模的形状图案化催化剂。

公开(公告)号：US08399048B2

公开(公告)日：2013-03-19

申请号：US12195295

申请日：2008-08-20

申请人： Mi Hee Jeong ,  Hyo Young Lee

发明人： Mi Hee Jeong ,  Hyo Young Lee

IPC分类号： B05D5/12 ,  B05D3/02 ,  B05D3/12

CPC分类号： G03F7/0002 ,  B01J23/007 ,  B01J23/80 ,  B01J37/0215 ,  B01J37/03 ,  B82Y10/00 ,  B82Y40/00

摘要： Provided is a method of patterning a catalyst using nano imprint lithography. The method includes slurrying a catalyst, preparing a stamp for forming a catalyst pattern, forming the catalyst pattern by coating a substrate with the catalyst slurry, imprinting the stamp on the catalyst slurry and performing patterning simultaneously with calcination through nano imprint lithography, and drying the patterned catalyst. As the catalyst pattern is formed through the nano imprint lithography, a surface area of the catalyst increases and it is easy to pattern the catalyst according to the shape of the stamp.

摘要翻译： 提供了使用纳米压印光刻图案化催化剂的方法。 该方法包括使催化剂浆化，制备用于形成催化剂图案的印模，通过用催化剂浆料涂布基材形成催化剂图案，将印模印在催化剂浆料上，并通过纳米压印光刻法同时进行煅烧，并干燥 图案化催化剂。 当通过纳米压印光刻法形成催化剂图案时，催化剂的表面积增加，并且容易根据印模的形状图案化催化剂。

公开(公告)号：US20130079552A1

公开(公告)日：2013-03-28

申请号：US13638407

申请日：2010-09-01

申请人： Hyo Young Lee ,  In Kyu Moon ,  Jung Hyun Lee

发明人： Hyo Young Lee ,  In Kyu Moon ,  Jung Hyun Lee

IPC分类号： C09K3/00 ,  C01B31/04

CPC分类号： C09K3/00 ,  B01D69/08 ,  B01D71/021 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/192 ,  H01G9/042 ,  H01M4/48 ,  Y10S977/847

摘要： The present invention relates to a novel graphene oxide reducing agent and a method for manufacturing a reduced graphene oxide from graphene oxide using same. More particularly, in the present invention, the reduced graphene oxide is manufactured by reducing a graphene oxide using a reducing agent containing a halogen element, and is applicable as an electric conductor, a semiconductor, and an insulator in various fields.

摘要翻译： 本发明涉及一种新颖的氧化石墨烯氧化物还原剂及其使用氧化石墨烯氧化物的方法。 更具体地，在本发明中，通过使用含有卤素元素的还原剂还原石墨烯氧化物来制造还原型石墨烯氧化物，并且可用作各种领域的导电体，半导体和绝缘体。

公开(公告)号：US10787636B2

公开(公告)日：2020-09-29

申请号：US15706355

申请日：2017-09-15

申请人： Hyo Young Lee

发明人： Hyo Young Lee

IPC分类号： C12M1/00 ,  C12M1/26 ,  C12M1/34

摘要： The present invention relates to a non-powered constant-temperature cell transfer device, in which a first container, which accommodates living animal cells and a culture solution, is accommodated in a second container having a heat generating unit that emits heat generated by oxidation and reduction reactions of metal by introducing oxygen in the atmosphere in order to continuously provide an optimum culture temperature to a culture container even without being supplied with electric power, thereby maintaining activity and viability of the cells by maintaining a culture environment optimal for proliferation of the cells accommodated in the first container.

公开(公告)号：US08987429B2

公开(公告)日：2015-03-24

申请号：US13607961

申请日：2012-09-10

申请人： Hyo Young Lee ,  Luyang Wang

发明人： Hyo Young Lee ,  Luyang Wang

IPC分类号： C07F5/00 ,  C02F1/28 ,  C07F7/10 ,  C07D493/22

CPC分类号： C07F5/00 ,  A61K49/105 ,  C07D493/22 ,  C07F5/003

摘要： Disclosed herein is a GO-Gd-DTPA (gadolinium-diethylenetriamine pentaacetic-graphene oxide) complex, which is formed by an ester bond of graphene oxide (GO) and gadopentetic acid (Gd-DTPA). Since the GO-Gd-DTPA can stably exist in the body because it has high stability in water, it is expected that it can be effectively used as an MRI contrast agent.

摘要翻译： 本文公开了由氧化石墨烯（GO）和钆特酸（Gd-DTPA）的酯键形成的GO-Gd-DTPA（钆 - 二亚乙基三胺五乙酸 - 氧化石墨烯氧化物）络合物。 由于GO-Gd-DTPA由于在水中的稳定性高而能够稳定地存在于体内，因此可以有效地将其用作MRI造影剂。