METHOD FOR PURIFYING MIXTURES COMPRISING 4,4'-METHYLENEDIPHENYL DIISOCYANATE
    1.
    发明申请
    METHOD FOR PURIFYING MIXTURES COMPRISING 4,4'-METHYLENEDIPHENYL DIISOCYANATE 有权
    净化包含4,4'-亚甲基二苯基二异氰酸酯的混合物的方法

    公开(公告)号:US20120142960A1

    公开(公告)日:2012-06-07

    申请号:US13296665

    申请日:2011-11-15

    IPC分类号: C07C263/20

    CPC分类号: C07C263/20 C07C265/14

    摘要: The invention relates to a method for purifying mixtures comprising 4,4′-methylenediphenyl diisocyanate, which comprises purifying by distillation a mixture I comprising 4,4′-methylenediphenyl diisocyanate having a hydrolyzable chlorine content as specified in ASTM D4663-10 of greater than 100 ppm by means of a column K1, wherein the gaseous stream comprising the mixture I is brought into contact in the column K1 with at least one liquid compound A which has the same or higher boiling point than 4,4′-methylenediphenyl diisocyanate and which has a hydrolyzable chlorine content as specified in ASTM D4663-10 of a maximum of 100 ppm, and wherein the gaseous stream O obtained at the top of the column comprises 4,4′-methylenediphenyl diisocyanate has a hydrolyzable chlorine content as specified in ASTM D4663-10 of a maximum of 100 ppm.

    摘要翻译: 本发明涉及一种用于纯化包含4,4'-亚甲基二苯基二异氰酸酯的混合物的方法,其包括通过蒸馏纯化包含如ASTM D4663-10中规定的可水解氯含量的4,4'-亚甲基二苯基二异氰酸酯的混合物I大于100 通过柱K1,其中包含混合物I的气流在柱K1中与至少一种液体化合物A接触,该液体化合物A具有与4,4'-亚甲基二苯基二异氰酸酯相同或更高的沸点, ASTM D4663-10中规定的可水解氯含量最高为100ppm,其中在塔顶获得的气流O包含4,4'-亚甲基二苯基二异氰酸酯,其具有如ASTM D4663- 10最大为100 ppm。

    Method for purifying mixtures comprising 4,4′-methylenediphenyl diisocyanate
    2.
    发明授权
    Method for purifying mixtures comprising 4,4′-methylenediphenyl diisocyanate 有权
    纯化包含4,4'-亚甲基二苯基二异氰酸酯的混合物的方法

    公开(公告)号:US09505711B2

    公开(公告)日:2016-11-29

    申请号:US13296665

    申请日:2011-11-15

    IPC分类号: C07C249/00 C07C263/20

    CPC分类号: C07C263/20 C07C265/14

    摘要: The invention relates to a method for purifying mixtures comprising 4,4′-methylenediphenyl diisocyanate, which comprises purifying by distillation a mixture I comprising 4,4′-methylenediphenyl diisocyanate having a hydrolyzable chlorine content as specified in ASTM D4663-10 of greater than 100 ppm by means of a column K1, wherein the gaseous stream comprising the mixture I is brought into contact in the column K1 with at least one liquid compound A which has the same or higher boiling point than 4,4′-methylenediphenyl diisocyanate and which has a hydrolyzable chlorine content as specified in ASTM D4663-10 of a maximum of 100 ppm, and wherein the gaseous stream O obtained at the top of the column comprises 4,4′-methylenediphenyl diisocyanate has a hydrolyzable chlorine content as specified in ASTM D4663-10 of a maximum of 100 ppm.

    摘要翻译: 本发明涉及一种用于纯化包含4,4'-亚甲基二苯基二异氰酸酯的混合物的方法,其包括通过蒸馏纯化包含具有大于100的ASTM D4663-10中规定的可水解氯含量的4,4'-亚甲基二苯基二异氰酸酯的混合物I 通过柱K1,其中包含混合物I的气流在柱K1中与至少一种液体化合物A接触,该液体化合物A具有与4,4'-亚甲基二苯基二异氰酸酯相同或更高的沸点, ASTM D4663-10中规定的可水解氯含量最高为100ppm,其中在塔顶获得的气流O包含4,4'-亚甲基二苯基二异氰酸酯,其具有如ASTM D4663- 10最大为100 ppm。

    Process for preparing aromatic isocyanates
    5.
    发明授权
    Process for preparing aromatic isocyanates 有权
    制备芳族异氰酸酯的方法

    公开(公告)号:US08829232B2

    公开(公告)日:2014-09-09

    申请号:US13057869

    申请日:2009-08-06

    IPC分类号: C07C263/00 C07C263/10

    CPC分类号: C07C263/10 C07C265/14

    摘要: The invention relates to a process for preparing isocyanates by reacting the corresponding amines with phosgene in the liquid phase, if appropriate in the presence of at least one inert medium, in which the amine and the phosgene are first mixed in a mixing chamber (1) to give a reaction mixture and the reaction mixture is fed to a reactor, the amine being added through an orifice (3) arranged coaxially to the mixing chamber (1) and the phosgene being added through feed orifices (5) in at least two planes (7, 9) arranged at right angles to the axis (11) of the mixing chamber (1), or the phosgene being added through the orifice (3) arranged coaxially to the mixing chamber and the amine through the feed orifices (5) in at least two planes (7, 9) arranged at right angles to the axis (11) of the mixing chamber (1). At least one plane (9) is arranged upstream and at least one plane (7) downstream of the orifice (3) arranged coaxially to the mixing chamber (1) in main flow direction of the reaction mixture. The mean residence time of the reaction mixture in the mixing chamber (1) is not more than 20 ms.

    摘要翻译: 本发明涉及通过使相应的胺与液相中的光气反应制备异氰酸酯的方法,如果合适的话,在至少一种惰性介质存在下,其中胺和光气首先在混合室(1)中混合, 得到反应混合物并将反应混合物加入到反应器中,通过与混合室(1)同轴设置的孔口(3)加入胺,通过进料孔(5)在至少两个平面中加入光气 (7,9),其与所述混合室(1)的轴线(11)成直角排列,或者通过所述孔(3)加入的光气通过所述孔(3)同轴地配置到所述混合室,所述胺通过所述进料孔(5) 在与所述混合室(1)的轴线(11)成直角布置的至少两个平面(7,9)中。 至少一个平面(9)布置在上游,并且孔(3)下游的至少一个平面(7)在反应混合物的主流动方向上与混合室(1)同轴布置。 反应混合物在混合室(1)中的平均停留时间不超过20ms。

    Lithographic apparatus and device manufacturing method
    9.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号:US20060187427A1

    公开(公告)日:2006-08-24

    申请号:US11062763

    申请日:2005-02-22

    IPC分类号: G03B27/52

    CPC分类号: G03F7/70341 G03F7/709

    摘要: Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer volume/damper to compensate for pressure fluctuation.

    摘要翻译: 公开了各种类型的压力调节装置,以减少光刻设备的液体供应系统中的压力梯度,液体供应系统具有液体限制结构,其被配置为至少部分地限制液体在投影系统和基板台之间的液体 光刻设备 高压梯度可能导致液体供应系统和/或液体限制结构中的颗粒污染。 压力梯度可以通过例如在一个或多个阀门中使用缓慢的切换,绕过或通过一个或多个阀门的泄放流量来减少,而不是或者除了切换阀门之外将液体转移到排水管, 用于防止冲击波的压力调节器或限流器,以及用于补偿压力波动的缓冲体积/阻尼器。

    Method of manufacturing an optical data storage medium, optical data storage medium and apparatus for performing said method
    10.
    发明申请
    Method of manufacturing an optical data storage medium, optical data storage medium and apparatus for performing said method 失效
    光学数据存储介质的制造方法,光学数据存储介质以及用于执行所述方法的装置

    公开(公告)号:US20060059501A1

    公开(公告)日:2006-03-16

    申请号:US10541977

    申请日:2003-11-04

    IPC分类号: G11B7/24

    摘要: A method of manufacturing an optical data storage medium, comprising at least one substrate (11) and a plurality of layers deposited on the substrate (11) is described. The medium includes at least one of a transparent spacer layer and transparent cover layer (12). The layer (12) is provided by applying a liquid onto the rotating substrate (11) and rotating the substrate (11) further in order to spread out the liquid into a layer substantially uniformly between an inner radius ri and an outer radius ro, and solidifying the liquid layer (12) by means of exposure to UV radiation. After applying the liquid onto the rotating substrate the liquid layer (12) is heated by heating means (14) in such a way that the temperature rise of the liquid layer (12) at ri has a value dTri, while the temperature rise of the liquid layer (12) between ri and ro gradually increases, and the temperature rise of the liquid layer (12) at ro has a value dTro>dTri. In this way the spacer layer or cover layer has a variation in thickness smaller than +/−1 μm, measured over the information storage area. Further a medium manufactured using said method and an apparatus for performing the method are described.

    摘要翻译: 描述了一种制造光学数据存储介质的方法,其包括至少一个衬底(11)和沉积在衬底(11)上的多个层。 介质包括透明间隔层和透明覆盖层(12)中的至少一个。 通过将液体施加到旋转基板(11)上并进一步旋转基板(11)以便将液体基本上均匀地分布在内半径ri和外半径ro之间的层中来提供层(12),以及 通过暴露于UV辐射来固化液体层(12)。 在将液体施加到旋转基板上之后,通过加热装置(14)将液体层(12)加热,使得在ri处的液体层(12)的温度升高值为dTri,同时温度升高 ri和ro之间的液体层(12)逐渐增加,并且在ro处的液体层(12)的温度升高值为dTro> dTri。 以这种方式,在信息存储区域上测量的间隔层或覆盖层具有小于+/-1μm的厚度变化。 此外,描述使用所述方法制造的介质和用于执行该方法的装置。