公开(公告)号：US20070098916A1

公开(公告)日：2007-05-03

申请号：US11264596

申请日：2005-11-01

Applicant: Michael Stowell

Inventor： Michael Stowell

IPC: B05D3/00 ,  H05H1/24

CPC classification number: C23C16/515 ,  C23C16/029 ,  C23C16/308 ,  C23C16/401 ,  C23C16/52 ,  H01J37/32201

Abstract: A method of generating a film during a chemical vapor deposition process is disclosed. One embodiment includes generating a first electrical pulse having a first pulse amplitude; using the first electrical pulse to generate a first density of radicalized species; disassociating a feedstock gas using the radicalized species in the first density of radicalized species, thereby creating a first deposition material; depositing the first deposition material on a substrate; generating a second electrical pulse having a second pulse amplitude, wherein the second pulse amplitude is different from the first pulse width; using the second electrical pulse to generate a second density of radicalized species; disassociating a feedstock gas using the radicalized species in the second density of radicalized species, thereby creating a second deposition material; and depositing the second plurality of deposition materials on the first deposition material.

Abstract translation: 公开了一种在化学气相沉积工艺期间产生膜的方法。 一个实施例包括产生具有第一脉冲幅度的第一电脉冲; 使用第一电脉冲产生第一密度的自由基化物种; 使用第一密度的自由基化物质中的自由基化物质分离原料气体，从而产生第一沉积材料; 将第一沉积材料沉积在基底上; 产生具有第二脉冲幅度的第二电脉冲，其中所述第二脉冲幅度不同于所述第一脉冲宽度; 使用第二电脉冲来产生第二密度的激进化物种; 使用第二密度的自由基化物质中的自由基化物质分解原料气体，从而产生第二沉积材料; 以及将所述第二多个沉积材料沉积在所述第一沉积材料上。

公开(公告)号：US20070098893A1

公开(公告)日：2007-05-03

申请号：US11492628

申请日：2006-07-25

Applicant: Michael Stowell

Inventor： Michael Stowell

IPC: C23C16/00 ,  B05D3/00 ,  H05H1/24

CPC classification number: C23C16/515 ,  C23C16/029 ,  C23C16/308 ,  C23C16/401 ,  C23C16/52 ,  H01J37/32201

Abstract: A method of generating a film during a chemical vapor deposition process is disclosed. One embodiment includes creating a substrate by generating a first electrical pulse having a first pulse amplitude; using the first electrical pulse to generate a first density of radicalized species; disassociating a feedstock gas using the radicalized species in the first density of radicalized species, thereby creating a first deposition material; depositing the first deposition material on a substrate; generating a second electrical pulse having a second pulse amplitude, wherein the second pulse amplitude is different from the first pulse width; using the second electrical pulse to generate a second density of radicalized species; disassociating a feedstock gas using the radicalized species in the second density of radicalized species, thereby creating a second deposition material; and depositing the second plurality of deposition materials on the first deposition material.

Abstract translation: 公开了一种在化学气相沉积工艺期间产生膜的方法。 一个实施例包括通过产生具有第一脉冲幅度的第一电脉冲来产生衬底; 使用第一电脉冲产生第一密度的自由基化物种; 使用第一密度的自由基化物质中的自由基化物质分离原料气体，从而产生第一沉积材料; 将第一沉积材料沉积在基底上; 产生具有第二脉冲幅度的第二电脉冲，其中所述第二脉冲幅度不同于所述第一脉冲宽度; 使用第二电脉冲来产生第二密度的激进化物种; 使用第二密度的自由基化物质中的自由基化物质分解原料气体，从而产生第二沉积材料; 以及将所述第二多个沉积材料沉积在所述第一沉积材料上。

公开(公告)号：US20130248352A1

公开(公告)日：2013-09-26

申请号：US13609178

申请日：2012-09-10

Applicant: Chong Jiang ,  Byung-Sung Leo Kwak ,  Michael Stowell ,  Karl Armstrong

Inventor： Chong Jiang ,  Byung-Sung Leo Kwak ,  Michael Stowell ,  Karl Armstrong

IPC: C23C14/34

CPC classification number: C23C14/345 ,  C23C14/00 ,  C23C14/3471 ,  H01J37/32165 ,  H01J37/3405

Abstract: A method of sputter depositing dielectric thin films may comprise: providing a substrate on a substrate pedestal in a process chamber, the substrate being positioned facing a sputter target; simultaneously applying a first RF frequency from a first power supply and a second RF frequency from a second power supply to the sputter target; and forming a plasma in the process chamber between the substrate and the sputter target, for sputtering the target; wherein the first RF frequency is less than the second RF frequency, the first RF frequency is chosen to control the ion energy of the plasma and the second RF frequency is chosen to control the ion density of the plasma. The self-bias of surfaces within said process chamber may be selected; this is enabled by connecting a blocking capacitor between the substrate pedestal and ground.

Abstract translation: 溅射沉积电介质薄膜的方法可以包括：在处理室中的衬底基座上提供衬底，衬底被定位成面对溅射靶; 同时将来自第一电源的第一RF频率和来自第二电源的第二RF频率施加到溅射靶; 以及在所述基板和所述溅射靶之间的所述处理室中形成等离子体，用于溅射所述靶; 其中所述第一RF频率小于所述第二RF频率，选择所述第一RF频率以控制所述等离子体的离子能量，并且选择所述第二RF频率以控制所述等离子体的离子密度。 可以选择所述处理室内的表面的自偏压; 这可以通过在衬底基座和接地之间连接隔离电容器来实现。

公开(公告)号：US08568571B2

公开(公告)日：2013-10-29

申请号：US12124918

申请日：2008-05-21

Applicant: Byung Sung Kwak ,  Michael Stowell ,  Nety Krishna

Inventor： Byung Sung Kwak ,  Michael Stowell ,  Nety Krishna

IPC: C23C14/00

CPC classification number: C23C14/088 ,  C23C14/3414 ,  H01M4/0426 ,  H01M4/1391 ,  H01M4/525 ,  H01M4/5825 ,  H01M6/40 ,  H01M10/052 ,  H01M10/0585

Abstract: A method of fabricating a layer of a thin film battery comprises providing a sputtering target and depositing the layer on a substrate using a physical vapor deposition process enhanced by a combination of plasma processes. The deposition process may include: (1) generation of a plasma between the target and the substrate; (2) sputtering the target; (3) supplying microwave energy to the plasma; and (4) applying radio frequency power to the substrate. A sputtering target for a thin film battery cathode layer has an average composition of LiMaNbZc, wherein 0.20>{b/(a+b)}>0 and the ratio of a to c is approximately equal to the stoichiometric ratio of a desired crystalline structure of the cathode layer, N is an alkaline earth element, M is selected from the group consisting of Co, Mn, Al, Ni and V, and Z is selected from the group consisting of (PO4), O, F and N.

Abstract translation: 制造薄膜电池层的方法包括提供溅射靶并使用通过等离子体处理的组合增强的物理气相沉积工艺将该层沉积在衬底上。 沉积过程可以包括：（1）在靶和衬底之间产生等离子体; （2）溅射目标; （3）向等离子体提供微波能量; 和（4）向基板施加射频功率。 用于薄膜电池阴极层的溅射靶具有LiMaNbZc的平均组成，其中0.20> {b /（a + b）}> 0，并且a与c的比值近似等于所需晶体结构的化学计量比 的阴极层，N是碱土金属元素，M选自Co，Mn，Al，Ni和V，Z选自（PO4），O，F和N.

公开(公告)号：US20070095281A1

公开(公告)日：2007-05-03

申请号：US11264540

申请日：2005-11-01

Applicant: Michael Stowell ,  Michael Liehr ,  Stephan Wieder ,  Jose Dieguez-Campo

Inventor： Michael Stowell ,  Michael Liehr ,  Stephan Wieder ,  Jose Dieguez-Campo

IPC: C23C16/00

CPC classification number: C23C16/515

Abstract: One embodiment of the present invention is a system for depositing films on a substrate. This systems includes a vacuum chamber; a linear discharge tube housed inside the vacuum chamber; a magnetron configured to generate a microwave power signal that can be applied to the linear discharge tube; a power supply configured to provide a signal to the magnetron; and a pulse control connected to the power supply. The pulse control is configured to control the duty cycle of the plurality of pulses, the frequency of the plurality of pulses, and/or the contour of the plurality of pulses.

Abstract translation: 本发明的一个实施例是用于在衬底上沉积膜的系统。 该系统包括真空室; 容纳在真空室内的线性放电管; 磁控管，其被配置为产生可施加到所述线性放电管的微波功率信号; 电源，被配置为向磁控管提供信号; 以及连接到电源的脉冲控制。 脉冲控制被配置为控制多个脉冲的占空比，多个脉冲的频率和/或多个脉冲的轮廓。

公开(公告)号：US20060278524A1

公开(公告)日：2006-12-14

申请号：US11152470

申请日：2005-06-14

Applicant: Michael Stowell

Inventor： Michael Stowell

IPC: C23C14/00

CPC classification number: H01J37/32137 ,  H01J37/32027 ,  H01J37/32036 ,  H01J37/32743 ,  H01J37/32752 ,  H01J37/34

Abstract: One embodiment includes a sputtering system that includes a vacuum chamber; a substrate transport system configured to transport a substrate through the vacuum chamber; a cathode for supporting a sputtering target, the cathode at least partially inside the vacuum chamber; and a power supply configured to supply power to the cathode and the power supply configured to output a modulated power signal. Depending upon the implementation, the power supply can be configured to output an amplitude-modulated power signal; a frequency-modulated power signal; a pulse-width power signal; a pulse-position power signal; a pulse-amplitude modulated power signal; or any other type of modulated power or energy signal.

Abstract translation: 一个实施例包括一个包括真空室的溅射系统; 衬底输送系统，被配置为将衬底输送通过所述真空室; 用于支撑溅射靶的阴极，所述阴极至少部分地在所述真空室内; 以及被配置为向阴极供电的电源和被配置为输出调制功率信号的电源。 根据实施方案，可以将电源配置为输出调幅功率信号; 频率调制功率信号; 脉冲宽度功率信号; 脉冲位置功率信号; 脉冲幅度调制功率信号; 或任何其他类型的调制功率或能量信号。

公开(公告)号：US20090288943A1

公开(公告)日：2009-11-26

申请号：US12124918

申请日：2008-05-21

Applicant: Byung Sung Kwak ,  Michael Stowell ,  Nety Krishna

Inventor： Byung Sung Kwak ,  Michael Stowell ,  Nety Krishna

IPC: C23C14/34

CPC classification number: C23C14/088 ,  C23C14/3414 ,  H01M4/0426 ,  H01M4/1391 ,  H01M4/525 ,  H01M4/5825 ,  H01M6/40 ,  H01M10/052 ,  H01M10/0585

Abstract: A method of fabricating a layer of a thin film battery comprises providing a sputtering target and depositing the layer on a substrate using a physical vapor deposition process enhanced by a combination of plasma processes. The deposition process may include: (1) generation of a plasma between the target and the substrate; (2) sputtering the target; (3) supplying microwave energy to the plasma; and (4) applying radio frequency power to the substrate. A sputtering target for a thin film battery cathode layer has an average composition of LiMaNbZc, wherein 0.20>{b/(a+b)}>0 and the ratio of a to c is approximately equal to the stoichiometric ratio of a desired crystalline structure of the cathode layer, N is an alkaline earth element, M is selected from the group consisting of Co, Mn, Al, Ni and V, and Z is selected from the group consisting of (PO4), O, F and N.

Abstract translation: 制造薄膜电池层的方法包括提供溅射靶并使用通过等离子体处理的组合增强的物理气相沉积工艺将该层沉积在衬底上。 沉积过程可以包括：（1）在靶和衬底之间产生等离子体; （2）溅射目标; （3）向等离子体提供微波能量; 和（4）向基板施加射频功率。 用于薄膜电池阴极层的溅射靶具有LiMaNbZc的平均组成，其中0.20> {b /（a + b）}> 0，并且a与c的比值近似等于所需晶体结构的化学计量比 的阴极层，N是碱土金属元素，M选自Co，Mn，Al，Ni和V，Z选自（PO4），O，F和N.

公开(公告)号：US20060278521A1

公开(公告)日：2006-12-14

申请号：US11152469

申请日：2005-06-14

Applicant: Michael Stowell

Inventor： Michael Stowell

IPC: C23C14/32

CPC classification number: H01J37/32935 ,  C23C14/34 ,  C23C14/54 ,  H01J37/3405

Abstract: A method for controlling ion density and sputtering rate in a sputtering system is disclosed. In one embodiment, a first pulse-width power signal is applied to the cathode to thereby generate a higher concentration of ions. The pulse-width of the first pulse-width power signal is then decreased to thereby increase the sputtering rate and decrease the ion density around the cathode. Next, the process is repeated to create a modulated signal.

Abstract translation: 公开了一种用于控制溅射系统中的离子密度和溅射速率的方法。 在一个实施例中，向阴极施加第一脉冲宽度功率信号，从而产生较高浓度的离子。 然后降低第一脉冲宽度功率信号的脉冲宽度，从而提高溅射速率并降低阴极周围的离子密度。 接下来，重复该过程以产生调制信号。

公开(公告)号：US20060008461A1

公开(公告)日：2006-01-12

申请号：US11064416

申请日：2005-02-22

Applicant: Milton Yatvin ,  Michael Stowell ,  Vincent Gallicchio ,  Michael Meredith

Inventor： Milton Yatvin ,  Michael Stowell ,  Vincent Gallicchio ,  Michael Meredith

IPC: A61K39/395 ,  C12N5/06 ,  C07K16/46

CPC classification number: A61K9/167 ,  A61K47/543 ,  A61K47/544 ,  A61K47/645 ,  A61K47/6929 ,  B82Y5/00 ,  C07H19/06 ,  C07H19/10 ,  Y10S530/811 ,  Y10S530/813 ,  Y10S530/814 ,  Y10S530/815

Abstract: This invention provides novel methods and reagents for specifically delivering biologically active compounds to phagocytic mammalian cells. The invention also relates to specific uptake of such biologically active compounds by phagocytic cells and delivery of such compounds to specific sites intracellularly. The invention specifically relates to methods of facilitating the entry of antiviral and antimicrobial drugs and other agents into phagocytic cells and for targeting such compounds to specific organelles within the cell. The invention specifically provides compositions of matter and pharmaceutical embodiments of such compositions comprising conjugates of such antimicrobial drugs and agents covalently linked to particulate carriers generally termed microparticles. In particular embodiments, the antimicrobial drug is covalently linked to a microparticle via a cleavable linker moiety that is non-specifically cleaved in a phagocytic cell. In additional embodiments, the biologically-active compound is provided in an inactive, prodrug form that is activated by a chemical or enzymatic activity specific for cells infected by a microorganism, particularly a pathological or disease-causing microorganism. Thus, the invention provides cell targeting of drugs wherein the targeted drug is only activated in cells infected with a particular microorganism. Alternative embodiments of such specific drug delivery compositions also contain polar lipid carrier molecules effective in achieving intracellular organelle targeting in infected phagocytic mammalian cells. Particular embodiments of such conjugates comprise antimicrobial drugs covalently linked both to a microparticle via a cleavable linker molecule and to a polar lipid compound, to facilitate targeting of such drugs to particular subcellular organelles within the cell. Also provided are porous microparticles impregnated with antiviral and antimicrobial drugs and agents wherein the surface or outside extent of the microparticle is covered with a degradable coating that is degraded within a phagocytic mammalian cell. Also provided are nonporous microparticles coated with an antiviral or antimicrobial drug and further coated wherein the surface or outside extent of the microparticle is covered with a degradable coating that is degraded within a phagocytic mammalian cell. Methods of inhibiting, attenuating, arresting, combating and overcoming microbial infection of phagocytic mammalian cells in vivo and in vitro are also provided.

公开(公告)号：US20050020459A1

公开(公告)日：2005-01-27

申请号：US10805898

申请日：2004-03-22

Applicant: Michael Stowell

Inventor： Michael Stowell

IPC: A61K8/37 ,  A61K8/42 ,  A61Q13/00 ,  D06L1/00

CPC classification number: A61K8/42 ,  A61K8/37 ,  A61Q13/00

Abstract: This invention provides fragrance compositions comprising a carrier solution used for cleaning purposes or for topical administration and nonfragrant photoresponsive agents that are capable of undergoing intramolecular photorearrangements to release a fragrance. The photoresponsive fragrance composition may comprise the prephotorearrangement first fragrance agent, the photorearranged and released fragrance agent, a combination of the first and second agents, or any of the above in combination with a known fragrance agent.

Abstract translation: 本发明提供了包含用于清洁目的的载体溶液或用于局部给药的芳香剂组合物，以及能够进行分子内光谱以释放香料的非赋形剂光响应剂。 光响应性香料组合物可以包含预光学排列第一香料剂，光分解和释放的香料剂，第一和第二剂的组合，或上述任何一种与已知的香料组合。