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公开(公告)号:US20230017241A1
公开(公告)日:2023-01-19
申请号:US17933227
申请日:2022-09-19
Applicant: Micron Technology, Inc.
Inventor: S M Istiaque Hossain , Tom J. John , Darwin A. Clampitt , Anilkumar Chandolu , Prakash Rau Mokhna Rau , Christopher J. Larsen , Kye Hyun Baek
IPC: H01L27/11582 , H01L21/768
Abstract: An electronic device comprising lower and upper decks adjacent to a source. The lower and upper decks comprise tiers of alternating conductive materials and dielectric materials. Memory pillars in the lower and upper decks are configured to be operably coupled to the source. The memory pillars comprise contact plugs in the upper deck, cell films in the lower and upper decks, and fill materials in the lower and upper decks. The cell films in the upper deck are adjacent to the contact plugs and the fill materials in the upper deck are adjacent to the contact plugs. Dummy pillars are in a central region of the lower deck and the upper deck. The dummy pillars comprise an oxide material in the upper deck, the oxide material contacting the contact plugs and the fill materials. Additional electronic devices and related systems and methods are also disclosed.
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公开(公告)号:US20220028881A1
公开(公告)日:2022-01-27
申请号:US16937303
申请日:2020-07-23
Applicant: Micron Technology, Inc.
Inventor: S M Istiaque Hossain , Tom J. John , Darwin A. Clampitt , Anilkumar Chandolu , Prakash Rau Mokhna Rau , Christopher J. Larsen , Kye Hyun Baek
IPC: H01L27/11582 , H01L21/768
Abstract: An electronic device comprising lower and upper decks adjacent to a source. The lower and upper decks comprise tiers of alternating conductive materials and dielectric materials. Memory pillars in the lower and upper decks are configured to be operably coupled to the source. The memory pillars comprise contact plugs in the upper deck, cell films in the lower and upper decks, and fill materials in the lower and upper decks. The cell films in the upper deck are adjacent to the contact plugs and the fill materials in the upper deck are adjacent to the contact plugs. Dummy pillars are in a central region of the lower deck and the upper deck. The dummy pillars comprise an oxide material in the upper deck, the oxide material contacting the contact plugs and the fill materials. Additional electronic devices and related systems and methods are also disclosed.
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公开(公告)号:US11903196B2
公开(公告)日:2024-02-13
申请号:US17127971
申请日:2020-12-18
Applicant: Micron Technology, Inc.
Inventor: Yoshiaki Fukuzumi , Jun Fujiki , Matthew J. King , Sidhartha Gupta , Paolo Tessariol , Kunal Shrotri , Kye Hyun Baek , Kyle A. Ritter , Shuji Tanaka , Umberto Maria Meotto , Richard J. Hill , Matthew Holland
Abstract: A microelectronic device comprises a stack structure comprising a stack structure comprising a vertically alternating sequence of conductive structures and insulative structures arranged in tiers, the stack structure divided into block structures separated from one another by slot structures, strings of memory cells vertically extending through the block structures of the stack structure, the strings of memory cells individually comprising a channel material vertically extending through the stack structure, an additional stack structure vertically overlying the stack structure and comprising a vertical sequence of additional conductive structures and additional insulative structures arranged in additional tiers, first pillars extending through the additional stack structure and vertically overlying the strings of memory cells, each of the first pillars horizontally offset from a center of a corresponding string of memory cells, second pillars extending through the additional stack structure and vertically overlying the strings of memory cells, and additional slot structures comprising a dielectric material extending through at least a portion of the additional stack structure and sub-dividing each of the block structures into sub-block structures, the additional slot structures horizontally neighboring the first pillars. Related microelectronic devices, electronic systems, and methods are also described.
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公开(公告)号:US12041775B2
公开(公告)日:2024-07-16
申请号:US17933227
申请日:2022-09-19
Applicant: Micron Technology, Inc.
Inventor: S M Istiaque Hossain , Tom J. John , Darwin A. Clampitt , Anilkumar Chandolu , Prakash Rau Mokhna Rau , Christopher J. Larsen , Kye Hyun Baek
IPC: H10B43/27 , H01L21/768
CPC classification number: H10B43/27 , H01L21/76802 , H01L21/76877 , H01L21/76897
Abstract: An electronic device comprising lower and upper decks adjacent to a source. The lower and upper decks comprise tiers of alternating conductive materials and dielectric materials. Memory pillars in the lower and upper decks are configured to be operably coupled to the source. The memory pillars comprise contact plugs in the upper deck, cell films in the lower and upper decks, and fill materials in the lower and upper decks. The cell films in the upper deck are adjacent to the contact plugs and the fill materials in the upper deck are adjacent to the contact plugs. Dummy pillars are in a central region of the lower deck and the upper deck. The dummy pillars comprise an oxide material in the upper deck, the oxide material contacting the contact plugs and the fill materials. Additional electronic devices and related systems and methods are also disclosed.
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公开(公告)号:US20240099007A1
公开(公告)日:2024-03-21
申请号:US18525652
申请日:2023-11-30
Applicant: Micron Technology, Inc.
Inventor: Yoshiaki Fukuzumi , Jun Fujiki , Matthew J. King , Sidhartha Gupta , Paolo Tessariol , Kunal Shrotri , Kye Hyun Baek , Kyle A. Ritter , Shuji Tanaka , Umberto Maria Meotto , Richard J. Hill , Matthew Holland
Abstract: A microelectronic device comprises a stack structure comprising a stack structure comprising a vertically alternating sequence of conductive structures and insulative structures arranged in tiers, the stack structure divided into block structures separated from one another by slot structures, strings of memory cells vertically extending through the block structures of the stack structure, the strings of memory cells individually comprising a channel material vertically extending through the stack structure, an additional stack structure vertically overlying the stack structure and comprising a vertical sequence of additional conductive structures and additional insulative structures arranged in additional tiers, first pillars extending through the additional stack structure and vertically overlying the strings of memory cells, each of the first pillars horizontally offset from a center of a corresponding string of memory cells, second pillars extending through the additional stack structure and vertically overlying the strings of memory cells, and additional slot structures comprising a dielectric material extending through at least a portion of the additional stack structure and sub-dividing each of the block structures into sub-block structures, the additional slot structures horizontally neighboring the first pillars. Related microelectronic devices, electronic systems, and methods are also described.
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公开(公告)号:US11482536B2
公开(公告)日:2022-10-25
申请号:US16937303
申请日:2020-07-23
Applicant: Micron Technology, Inc.
Inventor: S M Istiaque Hossain , Tom J. John , Darwin A. Clampitt , Anilkumar Chandolu , Prakash Rau Mokhna Rau , Christopher J. Larsen , Kye Hyun Baek
IPC: H01L27/11582 , H01L21/768
Abstract: An electronic device comprising lower and upper decks adjacent to a source. The lower and upper decks comprise tiers of alternating conductive materials and dielectric materials. Memory pillars in the lower and upper decks are configured to be operably coupled to the source. The memory pillars comprise contact plugs in the upper deck, cell films in the lower and upper decks, and fill materials in the lower and upper decks. The cell films in the upper deck are adjacent to the contact plugs and the fill materials in the upper deck are adjacent to the contact plugs. Dummy pillars are in a central region of the lower deck and the upper deck. The dummy pillars comprise an oxide material in the upper deck, the oxide material contacting the contact plugs and the fill materials. Additional electronic devices and related systems and methods are also disclosed.
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公开(公告)号:US20220199641A1
公开(公告)日:2022-06-23
申请号:US17127971
申请日:2020-12-18
Applicant: Micron Technology, Inc.
Inventor: Yoshiaki Fukuzumi , Jun Fujiki , Matthew J. King , Sidhartha Gupta , Paolo Tessariol , Kunal Shrotri , Kye Hyun Baek , Kyle A. Ritter , Shuji Tanaka , Umberto Maria Meotto , Richard J. Hill , Matthew Holland
IPC: H01L27/11582 , H01L27/11556
Abstract: A microelectronic device comprises a stack structure comprising a stack structure comprising a vertically alternating sequence of conductive structures and insulative structures arranged in tiers, the stack structure divided into block structures separated from one another by slot structures, strings of memory cells vertically extending through the block structures of the stack structure, the strings of memory cells individually comprising a channel material vertically extending through the stack structure, an additional stack structure vertically overlying the stack structure and comprising a vertical sequence of additional conductive structures and additional insulative structures arranged in additional tiers, first pillars extending through the additional stack structure and vertically overlying the strings of memory cells, each of the first pillars horizontally offset from a center of a corresponding string of memory cells, second pillars extending through the additional stack structure and vertically overlying the strings of memory cells, and additional slot structures comprising a dielectric material extending through at least a portion of the additional stack structure and sub-dividing each of the block structures into sub-block structures, the additional slot structures horizontally neighboring the first pillars. Related microelectronic devices, electronic systems, and methods are also described.
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