利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

30 条记录 (耗时 0.022 秒)

    Radiation sensitive resin composition
    1.
    再颁专利
    Radiation sensitive resin composition 有权
    辐射敏感树脂组合物

    公开(公告)号：USRE37179E1

    公开(公告)日：2001-05-15

    申请号：US09420604

    申请日：1999-10-21

    申请人： Mikio Yamachika ,  Eiichi Kobayashi ,  Akira Tsuji ,  Toshiyuki Ota

    发明人： Mikio Yamachika ,  Eiichi Kobayashi ,  Akira Tsuji ,  Toshiyuki Ota

    IPC分类号： G03F7023

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/11 ,  Y10S430/111

    摘要： A radiation sensitive resin composition which comprises (A) a polymer which becomes alkali-soluble in the presence of an acid and (B) a radiation sensitive acid generator which generates an acid upon irradiation with a radiation, said polymer (A) comprising two recurring units represented by the general formulas (1) and (2) and a recurring unit which acts to reduce the solubility of the polymer is an alkali developer after the irradiation: wherein R1 represents a hydrogen atom or a methyl group and R2 represents a hydrogen atom or a methyl group. Said composition provides a chemically amplified positive resist which can give a fine pattern with a good pattern shape, and said resist is freed from volume shrinkage, peeling failure and adhesive failure, is excellent in dry etching resistance and effectively reacts with various radiations to give a good pattern shape which is excellent in photolithographic process stability, said pattern shape having no thinned portion at the upper part.

    摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）在酸存在下变为碱溶性的聚合物和（B）辐射敏感的酸产生剂，其在辐射时产生酸，所述聚合物（A）包含两个重复 由通式（1）和（2）表示的单元和降低聚合物溶解度的重复单元是照射后的碱显影剂：其中R1表示氢原子或甲基，R2表示氢原子 或甲基。 所述组合物提供化学放大的正性抗蚀剂，其可以产生具有良好图案形状的精细图案，并且所述抗蚀剂没有体积收缩，剥离破坏和粘合剂破坏，具有优异的耐干蚀刻性，并且与各种辐射有效反应以产生 良好的图案形状，其光刻工艺稳定性优异，所述图案形状在上部没有变薄部分。

    Radiation sensitive resin composition
    3.
    发明授权
    Radiation sensitive resin composition 失效
    辐射敏感树脂组合物

    公开(公告)号：US5679495A

    公开(公告)日：1997-10-21

    申请号：US352848

    申请日：1994-12-02

    申请人： Mikio Yamachika ,  Eiichi Kobayashi ,  Toshiyuki Ota ,  Akira Tsuji

    发明人： Mikio Yamachika ,  Eiichi Kobayashi ,  Toshiyuki Ota ,  Akira Tsuji

    IPC分类号： G03F7/004 ,  G03F7/028 ,  G03F7/039 ,  H01L21/027 ,  G03F7/023

    CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/11 ,  Y10S430/111

    摘要： A radiation sensitive resin composition which comprises (A) a polymer which becomes alkali-soluble in the presence of an acid and (B) a radiation sensitive acid generator which generates an acid upon irradiation with a radiation, said polymer (A) comprising two recurring units represented by the general formulas (1) and (2) and a recurring unit which acts to reduce the solubility of the polymer in an alkali developer after the irradiation: ##STR1## wherein R.sup.1 represents a hydrogen atom or a methyl group and R.sup.2 represents a hydrogen atom or a methyl group. Said composition provides a chemically amplified positive resist which can give a fine pattern with a good pattern shape, and said resist is freed from volume shrinkage, peeling failure and adhesive failure, is excellent in dry etching resistance and effectively reacts with various radiations to give a good pattern shape which is excellent in photolithographic process stability, said pattern shape having no thinned portion at the upper part.

    摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）在酸存在下变为碱溶性的聚合物和（B）辐射敏感的酸产生剂，其在辐射时产生酸，所述聚合物（A）包含两个重复 由通式（1）和（2）表示的单元和反应单元，其用于降低聚合物在照射后的碱显影剂中的溶解度：其中R1表示 氢原子或甲基，R 2表示氢原子或甲基。 所述组合物提供化学放大的正性抗蚀剂，其可以产生具有良好图案形状的精细图案，并且所述抗蚀剂没有体积收缩，剥离破坏和粘合剂破坏，具有优异的耐干蚀刻性，并且与各种辐射有效反应以产生 良好的图案形状，其光刻工艺稳定性优异，所述图案形状在上部没有变薄部分。

    Chemically amplified resist composition
    4.
    发明授权
    Chemically amplified resist composition 失效
    化学扩增抗蚀剂组合物

    公开(公告)号：US5629135A

    公开(公告)日：1997-05-13

    申请号：US590677

    申请日：1996-01-29

    申请人： Eiichi Kobayashi ,  Makoto Murata ,  Toshiyuki Ota ,  Akira Tsuji

    发明人： Eiichi Kobayashi ,  Makoto Murata ,  Toshiyuki Ota ,  Akira Tsuji

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/039 ,  G03F7/0048 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

    摘要： Positive-tone and negative-tone chemically amplified resist compositions comprising: (a-1) a blocked resin, (a-2) a combination of an alkali-soluble resin and a dissolution controlling agents, or (a-3) a combination of an alkali-soluble resin and a crosslinking agent, (b) a photoacid generator, and (c) specific kinds of solvents. The both positive-tone and negative-tone resist compositions exhibits superior sensitivity, high resolution capability, and excellent storage stability, and can be excellently applied especially to large sized substrates by spincoating for producing excellently shaped patterns by irradiation. The compositions can be used with advantage as a chemically amplified resist for the manufacture of semiconductor devices or integrated circuits (ICs).

    摘要翻译： 正色调和负色度化学放大抗蚀剂组合物，其包含：（a-1）封端树脂，（a-2）碱溶性树脂和溶解控制剂的组合，或（a-3） 碱溶性树脂和交联剂，（b）光致酸发生剂，和（c）特定种类的溶剂。 正色调和负色调抗蚀剂组合物显示出优异的灵敏度，高分辨能力和优异的储存稳定性，并且可以通过旋涂来优异地应用于大尺寸基材，以通过照射制造出优异的图案。 组合物可以有利地用作制造半导体器件或集成电路（IC）的化学放大抗蚀剂。

    Chemically amplified resist composition
    5.
    发明授权
    Chemically amplified resist composition 有权
    化学放大抗蚀剂组合物

    公开(公告)号：US6114086A

    公开(公告)日：2000-09-05

    申请号：US288848

    申请日：1999-04-09

    申请人： Eiichi Kobayashi ,  Makoto Murata ,  Toshiyuki Ota ,  Akira Tsuji

    发明人： Eiichi Kobayashi ,  Makoto Murata ,  Toshiyuki Ota ,  Akira Tsuji

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/039 ,  G03F7/0048 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

    摘要： Positive-tone and negative-tone chemically amplified resist compositions comprising: (a-1) a blocked resin, (a-2) a combination of an alkali-soluble resin and a dissolution controlling agents, or (a-3) a combination of an alkali-soluble resin and a crosslinking agent, (b) a photoacid generator, and (c) specific kinds of solvents. The both positive-tone and negative-tone resist compositions exhibits superior sensitivity, high resolution capability, and excellent storage stability, and can be excellently applied especially to large sized substrates by spincoating for producing excellently shaped patterns by irradiation. The compositions can be used with advantage as a chemically amplified resist for the manufacture of semiconductor devices or integrated circuits (ICs).

    摘要翻译： 正色调和负色度化学放大抗蚀剂组合物，其包含：（a-1）封端树脂，（a-2）碱溶性树脂和溶解控制剂的组合，或（a-3） 碱溶性树脂和交联剂，（b）光致酸发生剂，和（c）特定种类的溶剂。 正色调和负色调抗蚀剂组合物显示出优异的灵敏度，高分辨能力和优异的储存稳定性，并且可以通过旋涂来优异地应用于大尺寸基材，以通过照射制造出优异的图案。 组合物可以有利地用作制造半导体器件或集成电路（IC）的化学放大抗蚀剂。

    Radiation sensitive resin composition containing quinone diazide ester having two hindered phenol groups
    7.
    发明授权
    Radiation sensitive resin composition containing quinone diazide ester having two hindered phenol groups 失效
    含有具有两个受阻酚基团的醌二叠氮酯的辐射敏感性树脂组合物

    公开(公告)号：US5672459A

    公开(公告)日：1997-09-30

    申请号：US621008

    申请日：1996-03-22

    申请人： Katsumi Inomata ,  Masahiro Akiyama ,  Toshiyuki Ota ,  Akira Tsuji

    发明人： Katsumi Inomata ,  Masahiro Akiyama ,  Toshiyuki Ota ,  Akira Tsuji

    IPC分类号： G03F7/022 ,  G03F7/023

    CPC分类号： G03F7/022

    摘要： The present invention provides a radiation sensitive resin composition which contains an alkali soluble resin and a 1,2-quinonediazide compound represented by the following formula, for example. ##STR1## The radiation sensitive resin composition of the present invention has an excellent developability, provides an excellent pattern shape, is superior in sensitivity and resolution, and has greatly improved focus latitude and heat resistance in particular. Therefore, the radiation sensitive resin composition of the present invention can be suitably used as a resist for the production of LSIs.

    摘要翻译： 本发明提供了含有碱溶性树脂和下式所示的1,2-醌二叠氮化合物的辐射敏感性树脂组合物。 本发明的辐射敏感性树脂组合物具有优异的显影性，提供优异的图案形状，灵敏度和分辨率优异，特别是大大提高了聚焦纬度和耐热性。 因此，本发明的感光性树脂组合物可以适合用作制造LSI的抗蚀剂。

    Negative type radiation-sensitive resin composition
    8.
    发明授权
    Negative type radiation-sensitive resin composition 失效
    负型辐射敏感树脂组合物

    公开(公告)号：US5376498A

    公开(公告)日：1994-12-27

    申请号：US975713

    申请日：1992-11-13

    申请人： Toru Kajita ,  Eiichi Kobayashi ,  Toshiyuki Ota ,  Takao Miura

    发明人： Toru Kajita ,  Eiichi Kobayashi ,  Toshiyuki Ota ,  Takao Miura

    IPC分类号： C07C37/16 ,  G03F7/004 ,  G03F7/022 ,  G03F7/029 ,  G03F7/038 ,  G03F7/075 ,  H01L21/027 ,  G03C1/52

    CPC分类号： G03F7/0755 ,  C07C37/16 ,  C07C37/20 ,  G03F7/0045 ,  G03F7/0226 ,  G03F7/038

    摘要： A negative type radiation-sensitive resin composition which comprises (A) an alkali-soluble resin, (B) a compound which generates an acid upon irradiation, and (C) an aromatic compound having, as functional groups, an --OR group and a --CH.sub.2 OX group, both directly bonded to the aromatic ring in which R represents a substituted methyl group, a substituted ethyl group, a silyl group, an alkoxycarbonyl group or an acyl group and in which X represents a hydrogen atom, an alkyl group having 1-5 carbon atoms or an R group which is as defined above, said aromatic compound being capable of cross-linking the alkali-soluble resin (A) in the presence of an acid, and optionally (D) a specific phenolic compound. The negative type radiation-sensitive resin composition is excellent in developability, pattern-formation, resolution and thermal durability.

    摘要翻译： 一种负型辐射敏感性树脂组合物，其包含（A）碱溶性树脂，（B）照射时产生酸的化合物和（C）具有作为官能团的-OR基团和 -CH 2 X基团，其直接键合到其中R表示取代的甲基，取代的乙基，甲硅烷基，烷氧基羰基或酰基的芳环，其中X表示氢原子，具有1个 -5个碳原子或如上所定义的R基团，所述芳香族化合物能够在酸的存在下交联碱溶性树脂（A），和任选地（D）特定的酚类化合物。 负型辐射敏感性树脂组合物的显影性，图案形成，分辨率和热耐久性优异。