公开(公告)号：US4410338A

公开(公告)日：1983-10-18

申请号：US388577

申请日：1982-06-15

申请人： Minoru Yamamoto ,  Masana Hirai ,  Jiro Sakata

发明人： Minoru Yamamoto ,  Masana Hirai ,  Jiro Sakata

IPC分类号： B01D53/22 ,  B01D57/00 ,  B01D67/00 ,  B01D69/02 ,  B01D71/70 ,  C08G77/06

CPC分类号： B01D69/127 ,  C08G77/06

摘要： A gas separating member of the present invention comprises a porous substrate in the form of a film, wall or hollow fiber and a polymer film formed on a surface of the substrate by plasma polymerization. The gas separation factor (O.sub.2 /N.sub.2) ranges from 2.3 to 3.9 with the corresponding gas permeability ranging from 12 to 0.16 liter/min. m.sup.2 atm. pres.-air.A modified gas separating member of the present invention, which comprises a porous substrate in the aforementioned form and two polymer films formed on a surface of the substrate by plasma polymerization, has the gas separation factor (He/H.sub.2) ranging from 14 to 45.

摘要翻译： 本发明的气体分离部件包括膜，壁或中空纤维形式的多孔基材和通过等离子体聚合在基材的表面上形成的聚合物膜。 气体分离因子（O 2 / N 2）为2.3至3.9，相应的气体渗透率为12至0.16升/分钟。 m2 atm。 空气。 本发明的改性气体分离部件的气体分离系数（He / H 2）为14〜45，包括上述形式的多孔基材和通过等离子体聚合形成于基材表面的2个聚合物膜。

公开(公告)号：US4481808A

公开(公告)日：1984-11-13

申请号：US234069

申请日：1981-02-12

申请人： Jiro Sakata ,  Masana Hirai ,  Minoru Yamamoto

发明人： Jiro Sakata ,  Masana Hirai ,  Minoru Yamamoto

IPC分类号： G01N13/00 ,  G01N7/10 ,  G01N13/04 ,  G01N33/28

CPC分类号： G01N7/10 ,  G01N33/2852

摘要： Method and apparatus for determination of the concentration of a component in a solution, such as ethyl alcohol in gasohol, acetic acid in hexane-acetic acid solution, or the like. Such determination is made with ease and accuracy based on a rate of pressure change caused in a closed container due to mass transfer occurring between two liquids through porous material.

摘要翻译： 用于测定溶液中的组分浓度的方法和装置，如乙醇在汽油中，乙酸在己烷 - 乙酸溶液中等。 基于由于通过多孔材料在两种液体之间发生质量传递而在密闭容器中引起的压力变化的速率，这种确定是容易且准确的。

公开(公告)号：US4521236A

公开(公告)日：1985-06-04

申请号：US528789

申请日：1983-09-02

申请人： Minoru Yamamoto ,  Jiro Sakata ,  Haruo Doi

发明人： Minoru Yamamoto ,  Jiro Sakata ,  Haruo Doi

IPC分类号： B01D53/22 ,  B01D71/04 ,  B81C1/00 ,  C03B8/00 ,  C03B20/00 ,  C03B37/075 ,  C03C11/00 ,  C03C13/00 ,  C03C25/68 ,  C03C25/06

CPC分类号： B01D71/04 ,  B01D63/021 ,  C03C11/005 ,  C03C13/00 ,  C03C13/005

摘要： There is provided a method for preparation of porous glass films, preferably in the form of a hollow filament, comprising heating glass films, formed from sodium borosilicate glass having a composition which can be phase-separated by heat-treatment into a soft phase easily eluted with a hot acid solution and a hard phase not easily eluted with the same solution, to separate the glass phase into the two phases and then subjecting the glass film to plasma etching in an atmosphere containing gaseous fluorine-containing compound(s) before or after acid elution of the soft phase. The thus obtained porous glass films have a uniform pore diameter and smooth surfaces and can be used as a variety of separating membranes.

摘要翻译： 提供了一种制备多孔玻璃膜的方法，优选为中空丝的形式，其包括将具有可通过热处理相分离的组成的硼硅酸钠玻璃形成的玻璃膜加热到容易洗脱的软相中 用热酸溶液和硬相不容易用相同的溶液洗脱，将玻璃相分离成两相，然后在含有气态含氟化合物的气氛之前或之后对玻璃膜进行等离子体蚀刻 软相的酸洗脱。 由此获得的多孔玻璃膜具有均匀的孔径和光滑的表面，并且可以用作各种分离膜。

公开(公告)号：US4594079A

公开(公告)日：1986-06-10

申请号：US682145

申请日：1984-12-17

申请人： Minoru Yamamoto ,  Jiro Sakata

发明人： Minoru Yamamoto ,  Jiro Sakata

IPC分类号： B01D53/22 ,  B01D69/00 ,  B01D69/12 ,  B01D71/70

CPC分类号： B01D69/00 ,  B01D69/127 ,  Y10T428/249978

摘要： A gas separation member comprises a porous substrate, e.g., a membrane or a wall, and a polymer film deposited by plasma polymerization on the surface of the substrate and composed of at least two layers, i.e., a first layer contiguous with the substrate and a second layer superimposed on the first layer. The polymer film of the first layer possesses a uniform chemical composition or chemical structure in the direction of film thickness, while the polymer film of the second layer has a chemical composition or chemical structure which changes continuously or stepwise in the direction of film thickness. The gas separation member combines high gas separation factor and a high gas permeation rate, permitting separation of a specific gas in a concentrated form from a mixed gas. It also excels in weatherability.

摘要翻译： 气体分离构件包括多孔基底，例如膜或壁，以及通过等离子体聚合沉积在基底表面上并由至少两个层构成的聚合物膜，即至少两层，即与基底邻接的第一层和 第二层叠加在第一层上。 第一层的聚合物膜在膜厚方向上具有均匀的化学组成或化学结构，而第二层的聚合物膜具有在膜厚度方向上连续或逐步变化的化学组成或化学结构。 气体分离部件结合高气体分离因子和高气体渗透速率，允许浓缩形式的特定气体与混合气体分离。 它还具有耐候性。

公开(公告)号：US4583996A

公开(公告)日：1986-04-22

申请号：US667745

申请日：1984-11-02

申请人： Jiro Sakata ,  Minoru Yamamoto

发明人： Jiro Sakata ,  Minoru Yamamoto

IPC分类号： B01D53/22 ,  B01D53/26 ,  B01D53/38 ,  B01D53/74 ,  B01D71/04

CPC分类号： B01D71/04 ,  B01D53/22 ,  B01D53/228 ,  B01D53/268 ,  B01D63/02 ,  B01D2313/18

摘要： This invention provides an apparatus for separating condensable gas, which is provided with, as a membrane for separating condensable gas, an inorganic porous membrane which has a layer having a multiplicity of micropores communicating in the thickness direction of the membrane and having a pore radius, as determined by the nitrogen absorption method, of up to 50 .ANG., and preferably up to 20 .ANG., and which has an affinity for said condensable gas or is hydrophilic. This apparatus yields highly selective permeation of condensable gas, such as water vapor or organic gases.

摘要翻译： 本发明提供了一种用于分离可冷凝气体的装置，其具有作为用于分离可冷凝气体的膜的无机多孔膜，所述无机多孔膜具有在膜的厚度方向上连通并具有孔半径的多个微孔的层， 如通过氮气吸收法测定的，高达50安培姆，优选高达20安培姆，并且对所述可冷凝气体具有亲和力或者是亲水性的。 该装置产生可冷凝气体（例如水蒸汽或有机气体）的高度选择性渗透。

公开(公告)号：US07021154B2

公开(公告)日：2006-04-04

申请号：US10659294

申请日：2003-09-11

申请人： Shoji Hashimoto ,  Kouji Tsukada ,  Kentaro Mizuno ,  Jiro Sakata ,  Yoshiteru Omura ,  Yumi Masuoka

发明人： Shoji Hashimoto ,  Kouji Tsukada ,  Kentaro Mizuno ,  Jiro Sakata ,  Yoshiteru Omura ,  Yumi Masuoka

IPC分类号： G01B7/16

CPC分类号： G01L23/08

摘要： A force sensing element is provided with a gauge portion and a plurality of electrodes. The gauge portion is formed of an n-type semiconductor substrate whose (100)-face serves as a main face, a p-type semiconductor substrate whose (110)-face serves as a main face, or a p-type semiconductor substrate whose (111)-face serves as a main face, and is pressed in a thickness direction of the semiconductor substrate upon receiving a force. The electrodes are electrically connected to the gauge portion such that a current path extending in a direction corresponding to the thickness direction of the semiconductor substrate is formed in the gauge portion. The force sensing element thus constructed makes it possible to detect a force with high precision.

摘要翻译： 力感测元件设置有量规部分和多个电极。 仪表部分由（100）面用作主面的n型半导体衬底，（110）面用作主面的p型半导体衬底或p型半导体衬底形成，p型半导体衬底 （111）面用作主面，并且在接收到力时在半导体衬底的厚度方向上被按压。 电极与计量部电连接，使得在规格部分上形成与半导体基板的厚度方向对应的方向延伸的电流路径。 如此构造的力传感元件可以高精度地检测力。

公开(公告)号：US20050061670A1

公开(公告)日：2005-03-24

申请号：US10944426

申请日：2004-09-20

申请人： Akio Tanaka ,  Toshitaka Saito ,  Tadashi Nakamura ,  Tadashi Inaba ,  Keiichi Saji ,  Jiro Sakata

发明人： Akio Tanaka ,  Toshitaka Saito ,  Tadashi Nakamura ,  Tadashi Inaba ,  Keiichi Saji ,  Jiro Sakata

IPC分类号： G01N27/41 ,  G01N27/416 ,  G01N27/419 ,  G01N27/26

CPC分类号： G01N27/419 ,  Y10T29/49002

摘要： A NOx sensing cell includes a solid electrolyte having oxide ion conductivity and a pair of electrodes electrically connected to the solid electrolyte. The measuring electrode includes an oxide portion and a noble metallic portion. The oxide portion includes the solid solution of zirconia containing at least ceria. The noble metallic portion contains at least two kinds of metallic elements selected from platinum group elements. In addition to the NOx sensing cell, a NOx sensing device includes a measuring chamber into which a sensing objective gas is introduced, and an oxygen pump cell which is capable of electrochemically removing the oxygen from the measuring chamber. The measuring electrode of the NOx sensing cell is positioned in the measuring chamber.

摘要翻译： NOx感测单元包括具有氧化物离子传导性的固体电解质和与固体电解质电连接的一对电极。 测量电极包括氧化物部分和贵金属部分。 氧化物部分包括至少含有二氧化铈的氧化锆固溶体。 贵金属部分含有选自铂族元素中的至少两种金属元素。 除了NOx感测单元之外，NOx感测装置还包括测量室，导入检测对象气体的测量室以及能够从测量室电化学除去氧气的氧气泵室。 NOx感测单元的测量电极位于测量室中。

公开(公告)号：US06843132B2

公开(公告)日：2005-01-18

申请号：US10845196

申请日：2004-05-14

申请人： Kentaro Mizuno ,  Kouji Tsukada ,  Yoshiteru Omura ,  Shoji Hashimoto ,  Jiro Sakata

发明人： Kentaro Mizuno ,  Kouji Tsukada ,  Yoshiteru Omura ,  Shoji Hashimoto ,  Jiro Sakata

IPC分类号： G01L19/04 ,  G01L7/08 ,  G01L23/08

CPC分类号： G01L23/10 ,  G01L23/18

摘要： A pressure sensor is realized wherein output error of sensor element can be reduced even in the case where the pressure sensor is utilized in high temperature conditions. A pressure sensor is provided with a housing 20, a diaphragm 24 that partitions the interior and the exterior of the housing 20, a sensor element 54 provided within the housing 20, output value of the sensor element 54 varying in accordance with force exerted thereupon, and a force transmitting rod 52 provided within the housing, the force transmitting rod 52 moving downwardly when a pressure is exerted upon the diaphragm 24, the force transmitting rod 52 thereby exerting force upon the sensor element 54. The diaphragm 24 has a central region 26 contacting with the force transmitting rod 52, and a surrounding region 27 surrounding the periphery of the central region 26 and connecting the central region 26 with the housing 20. The surrounding region 27, viewed cross-sectionally along the radius, is V-shaped or U-shaped, and cancels thermal expansion.

摘要翻译： 实现了压力传感器，即使在高温条件下使用压力传感器的情况下也能够降低传感器元件的输出误差。 压力传感器设置有壳体20，隔离壳体20的内部和外部的隔膜24，设置在壳体20内的传感器元件54，传感器元件54的输出值根据施加在其上的力而变化， 以及设置在壳体内的力传递杆52，当施加压力施加到隔膜24上时，力传递杆52向下移动，力传递杆52从而对传感器元件54施加力。隔膜24具有中心区域26 与力传递杆52接触，以及围绕中心区域26的周边并将中心区域26与壳体20连接的周围区域27.沿着半径横截面地观察的周边区域27为V形或 U型，取消热膨胀。

公开(公告)号：US20090050493A1

公开(公告)日：2009-02-26

申请号：US12224887

申请日：2007-03-15

申请人： Keiichi Saji ,  Jiro Sakata ,  Tadashi Inaba ,  Keiichiro Aoki ,  Yusuke Suzuki ,  Susumu Naitoh

发明人： Keiichi Saji ,  Jiro Sakata ,  Tadashi Inaba ,  Keiichiro Aoki ,  Yusuke Suzuki ,  Susumu Naitoh

IPC分类号： G01N27/40 ,  F02D41/14

CPC分类号： G01N27/4071 ,  F02D41/1456

摘要： A gas sensor has a gas diffusion barrier that supports therein a catalyst that catalyzes a reaction between combustible components and oxygen; a solid electrolyte having oxide ion conductivity; and electrodes formed on opposite surfaces of the solid electrolyte. The electrode is formed in a region into which ambient gas diffuses at a rate limited by the gas diffusion barrier. The electrode also catalyzes the reaction between combustible gas and oxygen. The electrode is formed in a region into which atmosphere is introduced.

摘要翻译： 气体传感器具有气体扩散阻挡层，其在其中支撑催化可燃组分和氧气之间的反应的催化剂; 具有氧化物离子传导性的固体电解质; 以及形成在固体电解质的相对表面上的电极。 电极形成在环境气体以由气体扩散阻挡层限制的速率扩散到的区域中。 电极还催化可燃气体和氧气之间的反应。 电极形成在引入大气的区域中。

公开(公告)号：US20080257497A1

公开(公告)日：2008-10-23

申请号：US12022811

申请日：2008-01-30

申请人： Keiichi Shimaoka ,  Jiro Sakata ,  Takanori Mizuno ,  Katsuharu Okuda ,  Masayuki Matsui ,  Yasuhiko Suzuki

发明人： Keiichi Shimaoka ,  Jiro Sakata ,  Takanori Mizuno ,  Katsuharu Okuda ,  Masayuki Matsui ,  Yasuhiko Suzuki

IPC分类号： H01L21/306

CPC分类号： H01L21/31116 ,  H01L21/3065 ,  H01L21/32135 ,  H01L21/67069

摘要： A process for manufacturing a hollow silicon structure is simplified. A device for manufacturing the silicon structure is a device that manufactures the hollow silicon structure by processing a silicon structure, the silicon structure consisting of a silicon oxide layer formed on a silicon substrate, the silicon oxide layer being covered by a silicon layer. The device is provided with first gas supply members 20 and 21, second gas supply members 30 and 31, an etching reaction chamber 10, selective connecting means 23 to 26, 34 and 35, and a gas discharging means 42. The first gas etches silicon. The second gas etches silicon oxide and barely etches silicon. The selective connecting means 23 to 26, 34 and 35 selectively connect the etching reaction chamber 10 with either the first gas supply members 20 and 21 or the second gas supply members 30 and 31. The gas discharging means 42 discharges gas from the etching reaction chamber 10.

摘要翻译： 制造中空硅结构的方法简化。 用于制造硅结构的器件是通过处理硅结构制造中空硅结构的器件，由在硅衬底上形成的氧化硅层构成的硅结构，氧化硅层被硅层覆盖。 该装置设置有第一气体供给构件20和21，第二气体供给构件30和31，蚀刻反应室10，选择性连接装置23至26,34和35以及气体排出装置42。 第一个气体蚀刻硅。 第二种气体蚀刻氧化硅，几乎不蚀刻硅。 选择性连接装置23至26,34和35选择性地将蚀刻反应室10与第一气体供应构件20和21或第二气体供应构件30和31连接。 气体排出装置42从蚀刻反应室10排出气体。