摘要:
According to a certain embodiment, a control setup deice (200) includes an execution parameter information storage area (206d) for storing execution parameter information, an SGF table storage area (206b) for storing SGF tables, a finish spray code table storage area (206c) for storing finish spray code tables, a composition data storage area (206e) for storing composition data tables representing composition data of steel type families, and a control setup determiner (201b) operable when a detemination of a set of control set-points in steel type families is requested, to determine a set of control set-points based on a composition data table, a composition data and a combination of a target plate thickness and a target plate width contained in a setup request signal, first control information, and execution parameter information, and when a determination of a set of control set-points in steel types is requested, to determine a set of control set-points based on second control information, a steel type and a combination of a target plate thickness and a target plate width contained in the setup request signal, and execution parameter information.
摘要:
A microstructural feature and material property monitoring device for a metallic material that can easily adjust relative position between an irradiation position of laser beams applied to the metallic material to propagate pulsed ultrasonic waves in the metallic material and detection position of a laser interferometer, and therefore can accurately monitor the microstructural feature and material property of the metallic material. The device relatively moves the irradiation position of the laser beams generated by a laser oscillator and the detection position of the laser interferometer. The irradiation position of the laser beams generated from a laser oscillator and the detection position of the laser interferometer are controlled to be aligned with a relative position according to the microstructural feature and material property of the metallic material based on the time from the transmission of the pulsed ultrasonic waves to the detection by the laser interferometer. After the alignment, the microstructural feature and material property of the metallic material is calculated based on the waveform of the pulsed ultrasonic waves generated as an electrical signal by the laser interferometer.
摘要:
This invention matches the material quality of a product to target data, even when a materials quality model is insufficient in prediction accuracy. Heating a metallic material, rolling, forging, or leveling the metallic material, and cooling the metallic material are each conducted at least once. Prior to manufacture of a metallic product of a desired size and shape, qualitative data of the metallic material are measured at a position by a materials quality sensor in a manufacturing line, and modifications based on measured data are made to heating, processing, or cooling conditions in at least one of the steps, upstream of the materials measured data sensor so that the quality of the metallic material at the measuring position agrees with target data.
摘要:
The invention matches the material quality of a product to target data, even when a materials quality model is insufficient in prediction accuracy. Heating a metallic material, rolling, forging, or leveling the metallic material, and cooling the metallic material are each conducted at least once. Prior to manufacture of a metallic product of a desired size and shape, qualitative data of the metallic material are measured at a position by materials, quality sensor in a manufacturing line, and modifications based on measured data are made to heating, processing, or cooling conditions in at least one of the steps, upstream of the materials measured data sensor so that the quality of the metallic material at the measuring position agrees with target data.
摘要:
A microstructural feature and material property monitoring device for a metallic material that can easily adjust relative position between an irradiation position of laser beams applied to the metallic material to propagate pulsed ultrasonic waves in the metallic material and detection position of a laser interferometer, and therefore can accurately monitor the microstructural feature and material property of the metallic material. The device relatively moves the irradiation position of the laser beams generated by a laser oscillator and the detection position of the laser interferometer. The irradiation position of the laser beams generated from a laser oscillator and the detection position of the laser interferometer are controlled to be aligned with a relative position according to the microstructural feature and material property of the metallic material based on the time from the transmission of the pulsed ultrasonic waves to the detection by the laser interferometer. After the alignment, the microstructural feature and material property of the metallic material is calculated based on the waveform of the pulsed ultrasonic waves generated as an electrical signal by the laser interferometer.
摘要:
A process line control apparatus which controls a process line including an annealing furnace (3) including a heating process apparatus executing a heating process and a cooling process apparatus executing a cooling process, the heating and cooling processes being continuously executed on a steel material, the apparatus having feed forward control means (112, 113) for measuring quality of the steel material by a material quality measuring apparatus (6) installed in an inlet stage (1) preceding the heating process in the annealing furnace (3), and on the basis of measurement results, determining modifications for respective temperature set values set by temperature setting means (111) for the heating and cooling apparatuses in the annealing furnace (3), and feedback control means (114, 115) for measuring the quality of the steel material by a material quality measuring apparatus (7) installed in an outlet stage (5) succeeding the cooling process in the annealing furnace (3), and on the basis of measurement results, determining modifications for the respective temperature set values set by the temperature setting means (111) for the heating and cooling apparatuses in the annealing furnace (3).
摘要:
A display system 100 in which light from source (102) is focused onto a spinning color wheel (104). The spinning color wheel (104) creates of beam of light that changes from one primary color to the next in rapid sequence. The primary colored beam of light impinges a spatial light modulator (106), in this case a DMD. A controller (108) receives an input video signal and sends image data to the spatial light modulator (106) in synchronization with the color wheel (104)—image data representing the red portions of the image is sent during the period in which the red color filter is passing through the beam of light. The modulated red beam of light is focused onto an image plane (110) by projection lens (112) to form a red image. The process repeats as the green and blue filters pass through the path of the light beam. The eye of the viewer integrates the three primary color images giving the perception of a single full-color image. The display system uses a single nominal color wheel speed to display input signals having various frame rates. The nominal color wheel speed is selected to allow the same color wheel rate to be used for a variety of input frame rates. The color wheel speed is selected to provide a sub-frame rate that is an integer multiple the frame rate of each potential input format.
摘要:
An improved processing system (10) for video signal processing. The system uses only one newer version scan-line video processor (12) at nearly maximum efficiency, with a digital input that is at a common rate. The processor performs motion detection, motion adaptive scan conversion, horizontal and vertical scaling and applies sharpness control within a limited amount of instruction space, and applies these functions to four different video formats.
摘要:
An automatic color control and chroma killer circuit 3 and video processing system is provided that is capable of controlling an amplitude of a color signal and of performing a killer function with a simple construction without using a divider and/or vertical filter. The ACC/ACK device includes ACC and ACK circuitry which may be selectively enabled with operating signals to a selector 27. When the selector 27 enables amplitude detector 25, the amplitude detector 25 detects amplitude of the input color signal and a coefficient controller 26 compares it with a killer level. If the input color signal fails to meet the killer level then the coefficient controller 26 controls a coefficient generated by the coefficient generator 22 to perform a killer operation. The ACC operation and circuitry is thereby ACK controlled until an input color signal meets or exceeds the killer level. When the selector 27 enables the multiplier circuit 11 according to an operating signal input, the input color signal is ACC controlled by the multiplier circuit 11, and amplitude detector 21, a coefficient generator 22, a coefficient memory 23 and a delay circuit 24.
摘要:
A plasma processing apparatus including a microwave generator, a waveguide for supplying microwaves generated by the microwave generator, a cavity resonator for resonating the microwaves supplied by the waveguide, and a plasma processing chamber. The plasma processing chamber is coupled to the cavity resonator for receiving resonated microwaves therefrom and for generating a plasma therein. The plasma processing chamber is provided with a stage for holding a substrate for plasma processing, and apparatus for introducing a plasma processing gas to the plasma processing chamber for exhausting gas therefrom. A separation plate separates the cavity resonator and the plasma processing chamber and enables resonated microwaves to be transmitted therethrough from the cavity resonator means to the plasma processing chamber. A slot plate functioning as an antenna is disposed in the cavity resonator in opposition to a surface of the substrate for enabling radiation of the resonated microwaves to the plasma processing chamber through the separation plate, the slot plate including at least one set of circumferentially extending slots for enabling radiation of resonated microwaves.