公开(公告)号：US08999627B1

公开(公告)日：2015-04-07

申请号：US14198145

申请日：2014-03-05

Applicant: Multibeam Corporation

Inventor： David K. Lam ,  Kevin M. Monahan ,  Theodore A. Prescop ,  Cong Tran

IPC: G03F7/20 ,  H01J37/30 ,  G06F17/50

CPC classification number: H01J37/3177 ,  G03F7/2051 ,  G03F7/2059 ,  G06F17/5081 ,  H01J37/30 ,  H01J37/3005 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/04 ,  H01J2237/049 ,  H01J2237/1501 ,  H01J2237/24592 ,  H01J2237/30416 ,  H01J2237/30472 ,  H01J2237/31761 ,  H01J2237/31774 ,  H01J2237/31798 ,  H01L22/12 ,  H01L22/20

Abstract: The present application discloses methods, systems and devices for using charged particle beam tools to pattern and inspect a substrate. The inventors have discovered that it is highly advantageous to use write and inspection tools that share the same or substantially the same stage and the same or substantially the same designs for respective arrays of multiple charged particle beam columns, and that access the same design layout database to target and pattern or inspect features. By using design-matched charged particle beam tools, correlation of defectivity is preserved between inspection imaging and the design layout database. As a result, image-based defect identification and maskless design correction, of random and systematic errors, can be performed directly in the design layout database, enabling a fast yield ramp.

Abstract translation: 本申请公开了使用带电粒子束工具来图案化和检查衬底的方法，系统和装置。 本发明人已经发现，对于多个带电粒子束列的相应阵列使用共享相同或基本上相同的阶段以及相同或基本上相同的设计是非常有利的，并且访问相同的设计布局数据库 目标和模式或检查功能。 通过使用设计匹配的带电粒子束工具，在检查成像和设计布局数据库之间保留了缺陷度的相关性。 因此，可以在设计布局数据库中直接执行基于图像的缺陷识别和无掩码设计校正（随机和系统错误），从而实现快速生产斜率。

公开(公告)号：US09207539B1

公开(公告)日：2015-12-08

申请号：US14607821

申请日：2015-01-28

Applicant: Multibeam Corporation

Inventor： David K. Lam ,  Kevin M. Monahan ,  Theodore A. Prescop ,  Cong Tran

IPC: H01J37/08 ,  H01J37/30 ,  G03F7/20 ,  H01J37/317 ,  H01J37/304

CPC classification number: H01J37/3177 ,  G03F7/2051 ,  G03F7/2059 ,  G06F17/5081 ,  H01J37/30 ,  H01J37/3005 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/04 ,  H01J2237/049 ,  H01J2237/1501 ,  H01J2237/24592 ,  H01J2237/30416 ,  H01J2237/30472 ,  H01J2237/31761 ,  H01J2237/31774 ,  H01J2237/31798 ,  H01L22/12 ,  H01L22/20

Abstract: The present application discloses methods, systems and devices for using charged particle beam tools to pattern and inspect a substrate. The inventors have discovered that it is highly advantageous to use write and inspection tools that share the same or substantially the same stage and the same or substantially the same designs for respective arrays of multiple charged particle beam columns, and that access the same design layout database to target and pattern or inspect features. By using design-matched charged particle beam tools, correlation of defectivity is preserved between inspection imaging and the design layout database. As a result, image-based defect identification and maskless design correction, of random and systematic errors, can be performed directly in the design layout database, enabling a fast yield ramp.

公开(公告)号：US09620332B1

公开(公告)日：2017-04-11

申请号：US14703306

申请日：2015-05-04

Applicant: Multibeam Corporation

Inventor： David K. Lam ,  Kevin M. Monahan ,  Enden David Liu ,  Cong Tran ,  Theodore A. Prescop

IPC: H01J37/00 ,  H01J37/29 ,  H01J37/20 ,  H01J37/22

CPC classification number: H01J37/292 ,  H01J37/20 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/30494 ,  H01J2237/31761

Abstract: The present application discloses methods, systems and devices for using charged particle beam tools to inspect and perform lithography on a substrate using a combination of vectoring to move a beam to features to be imaged, and raster scanning to obtain an image of the feature(s). The inventors have discovered that it is highly advantageous to use an extra step, a fast raster scan to image the substrate at a lower resolution, to determine which features receive priority for inspection; this extra step can reduce total inspection time, enhance inspection results, and improve beam alignment and manufacturing yield. Using multiple beam-producing columns, with multiple control computers local to the columns, provides various synergies. Preferably, miniature, non-magnetic, electrostatically-driven columns are used.

公开(公告)号：US09184027B1

公开(公告)日：2015-11-10

申请号：US14607799

申请日：2015-01-28

Applicant: Multibeam Corporation

Inventor： David K. Lam ,  Kevin M. Monahan ,  Theodore A. Prescop ,  Cong Tran

IPC: G03F7/20 ,  H01J37/30 ,  H01J37/317 ,  G06F17/50

CPC classification number: H01J37/3177 ,  G03F7/2051 ,  G03F7/2059 ,  G06F17/5081 ,  H01J37/30 ,  H01J37/3005 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/04 ,  H01J2237/049 ,  H01J2237/1501 ,  H01J2237/24592 ,  H01J2237/30416 ,  H01J2237/30472 ,  H01J2237/31761 ,  H01J2237/31774 ,  H01J2237/31798 ,  H01L22/12 ,  H01L22/20

Abstract: The present application discloses methods, systems and devices for using charged particle beam tools to pattern and inspect a substrate. The inventors have discovered that it is highly advantageous to use write and inspection tools that share the same or substantially the same stage and the same or substantially the same designs for respective arrays of multiple charged particle beam columns, and that access the same design layout database to target and pattern or inspect features. By using design-matched charged particle beam tools, correlation of defectivity is preserved between inspection imaging and the design layout database. As a result, image-based defect identification and maskless design correction, of random and systematic errors, can be performed directly in the design layout database, enabling a fast yield ramp.

公开(公告)号：US08999628B1

公开(公告)日：2015-04-07

申请号：US14299891

申请日：2014-06-09

Applicant: Multibeam Corporation

Inventor： David K. Lam ,  Kevin M. Monahan ,  Theodore A. Prescop ,  Cong Tran

IPC: G03F7/20 ,  H01J37/304 ,  H01J37/317 ,  H01J37/30 ,  G06F17/50

CPC classification number: H01J37/3177 ,  G03F7/2051 ,  G03F7/2059 ,  G06F17/5081 ,  H01J37/30 ,  H01J37/3005 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/04 ,  H01J2237/049 ,  H01J2237/1501 ,  H01J2237/24592 ,  H01J2237/30416 ,  H01J2237/30472 ,  H01J2237/31761 ,  H01J2237/31774 ,  H01J2237/31798 ,  H01L22/12 ,  H01L22/20

Abstract: The present application discloses methods, systems and devices for using charged particle beam tools to pattern and inspect a substrate. The inventors have discovered that it is highly advantageous to use write and inspection tools that share the same or substantially the same stage and the same or substantially the same designs for respective arrays of multiple charged particle beam columns, and that access the same design layout database to target and pattern or inspect features. By using design-matched charged particle beam tools, correlation of defectivity is preserved between inspection imaging and the design layout database. As a result, image-based defect identification and maskless design correction, of random and systematic errors, can be performed directly in the design layout database, enabling a fast yield ramp.

Abstract translation: 本申请公开了使用带电粒子束工具来图案化和检查衬底的方法，系统和装置。 本发明人已经发现，对于多个带电粒子束列的相应阵列使用共享相同或基本上相同的阶段以及相同或基本上相同的设计是非常有利的，并且访问相同的设计布局数据库 目标和模式或检查功能。 通过使用设计匹配的带电粒子束工具，在检查成像和设计布局数据库之间保留了缺陷度的相关性。 因此，可以在设计布局数据库中直接执行基于图像的缺陷识别和无掩码设计校正（随机和系统错误），从而实现快速生产斜率。