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公开(公告)号：US20150009504A1
公开(公告)日：2015-01-08
申请号：US14494981
申请日：2014-09-24
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Moshe FINAROV , Boaz BRILL
Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure
Abstract translation: 提出了一种用于确定图案化结构中的线轮廓的方法和系统，其目的在于控制该结构的制造过程。 图案化结构包括多个不同的层，结构中的图案由图案化区域和未图案化区域形成。 进行至少第一次和第二次测量，每次利用具有在一定入射角度指向结构的入射光的宽波长带的结构照明，检测从该结构返回的光的光谱特性，以及产生测量 数据代表。 分析通过第一测量获得的测量数据，从而确定结构的至少一个参数。 然后，利用该确定的参数，同时分析通过第二测量获得的测量数据，使得能够确定结构的轮廓
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公开(公告)号：US20180182089A1
公开(公告)日：2018-06-28
申请号：US15902150
申请日：2018-02-22
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Boaz BRILL
CPC classification number: G06T7/0004 , G01B11/02 , G01B21/02 , G01B2210/56 , G03F7/70625 , G06T7/80 , G06T2207/30148
Abstract: A system and method are presented for use in inspection of patterned structures. The system comprises: data input utility for receiving first type of data indicative of image data on at least a part of the patterned structure, and data processing and analyzing utility configured and operable for analyzing the image data, and determining a geometrical model for at least one feature of a pattern in said structure, and using said geometrical model for determining an optical model for second type of data indicative of optical measurements on a patterned structure.
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公开(公告)号：US20160109225A1
公开(公告)日：2016-04-21
申请号：US14935806
申请日：2015-11-09
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Moshe FINAROV , Boaz BRILL
IPC: G01B11/24
Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure
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公开(公告)号：US20130128270A1
公开(公告)日：2013-05-23
申请号：US13747937
申请日：2013-01-23
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Boaz BRILL , Moshe FINAROV , David SCHIENER
IPC: G01B11/27
CPC classification number: G03F7/70633 , G01B11/14 , G01B11/27 , G01N21/4788 , G01N21/9501 , G01N21/956 , H01L22/12
Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.
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公开(公告)号：US20160284077A1
公开(公告)日：2016-09-29
申请号：US15050613
申请日：2016-02-23
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Boaz BRILL
CPC classification number: G06T7/0004 , G01B11/02 , G01B21/02 , G01B2210/56 , G03F7/70625 , G06T7/80 , G06T2207/30148
Abstract: A system and method are presented for use in inspection of patterned structures. The system comprises: data input utility for receiving first type of data indicative of image data on at least a part of the patterned structure, and data processing and analyzing utility configured and operable for analyzing the image data, and determining a geometrical model for at least one feature of a pattern in said structure, and using said geometrical model for determining an optical model for second type of data indicative of optical measurements on a patterned structure.
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Patent Agency Ranking
6.发明申请公开(公告)号：US20140142869A1
公开(公告)日：2014-05-22
申请号：US14139913
申请日：2013-12-24
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Yoel COHEN , Boaz BRILL
IPC: G01N21/95
CPC classification number: G01N21/9501 , G01B11/0625 , G01B11/24 , G06F15/00
Abstract: A method and system are presented for use in characterizing properties of an article having a structure comprising a multiplicity of sites comprising different periodic patterns, where method includes providing a theoretical model of prediction indicative of optical properties of different stacks defined by geometrical and material parameters of corresponding sites, said sites being common in at least one of geometrical parameter and material parameter; performing optical measurements on at least two different stacks of the article and generating optical measured data indicative of the geometrical parameters and material composition parameters for each of the measured stacks; processing the optical measured data, said processing comprising simultaneously fitting said optical measured data for the multiple measured stacks with said theoretical model and extracting said at least one common parameter, thereby enabling to characterize the properties of the multi-layer structure within the single article.
Abstract translation: 提供了一种用于表征具有包括多个不同周期图案的位置的结构的物品的性质的方法和系统，其中方法包括提供指示由几何和材料参数限定的不同叠层的光学性质的预测的理论模型 所述位置在几何参数和材料参数中的至少一个中是常见的; 对物品的至少两个不同堆叠执行光学测量，并产生指示每个所测量的叠层的几何参数和材料组成参数的光学测量数据; 处理所述光学测量数据，所述处理包括同时将所述多个测量堆叠的所述光学测量数据与所述理论模型拟合并提取所述至少一个公共参数，从而能够表征单个物品内的多层结构的属性。
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公开(公告)号：US20180031983A1
公开(公告)日：2018-02-01
申请号：US15728744
申请日：2017-10-10
Applicant: Nova Measuring Instruments Ltd.
Inventor： Boaz BRILL , Moshe FINAROV , David SCHEINER
Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.
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公开(公告)号：US20160327384A1
公开(公告)日：2016-11-10
申请号：US15093242
申请日：2016-04-07
Applicant: Nova Measuring Instruments Ltd.
Inventor： Boaz BRILL , Moshe FINAROV , David SCHIENER
IPC: G01B11/27 , G01N21/95 , G01N21/956 , G01N21/47
CPC classification number: G03F7/70633 , G01B11/14 , G01B11/27 , G01N21/4788 , G01N21/9501 , G01N21/956 , H01L22/12
Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.
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公开(公告)号：US20150124255A1
公开(公告)日：2015-05-07
申请号：US14594627
申请日：2015-01-12
Applicant: Nova Measuring Instruments Ltd.
Inventor： Boaz BRILL , Moshe FINAROV , David SCHIENER
IPC: G01B11/27
CPC classification number: G03F7/70633 , G01B11/14 , G01B11/27 , G01N21/4788 , G01N21/9501 , G01N21/956 , H01L22/12
Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.
Abstract translation: 通过对样品中的测量部位进行光学测量来控制多层样品的制造期间层的对准。 测量部位包括两个分别位于两个不同层之间的衍射结构。 光学测量包括具有不同入射光偏振态的至少两次测量，每个测量包括照亮测量位置，以便通过另一个照射衍射结构之一。 测量部位的衍射特性表示衍射结构之间的横向偏移。 对入射光的不同极化状态分析检测的衍射特性，以确定层之间现有的横向偏移。
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公开(公告)号：US20140009760A1
公开(公告)日：2014-01-09
申请号：US14021765
申请日：2013-09-09
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Moshe FINAROV , Boaz BRILL
IPC: G01N21/21
Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure
Abstract translation: 提出了一种用于确定图案化结构中的线轮廓的方法和系统，其目的在于控制该结构的制造过程。 图案化结构包括多个不同的层，结构中的图案由图案化区域和未图案化区域形成。 进行至少第一次和第二次测量，每次利用具有在一定入射角度指向结构的入射光的宽波长带的结构照明，检测从该结构返回的光的光谱特性，以及产生测量 数据代表。 分析通过第一测量获得的测量数据，从而确定结构的至少一个参数。 然后，利用该确定的参数，同时分析通过第二测量获得的测量数据，使得能够确定结构的轮廓
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