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公开(公告)号:US20240170074A1
公开(公告)日:2024-05-23
申请号:US18091839
申请日:2022-12-30
申请人: NSCore, Inc.
发明人: Kazuhiko Oyama , Tadahiko Horiuchi
CPC分类号: G11C16/26 , G11C16/0483 , G11C16/08 , G11C16/24 , G11C16/30
摘要: A semiconductor memory device includes a bit line pairs, a source line, a word line, and a memory cell array including a plurality of memory cells arranged in a row and column directions, wherein the memory cell is a pair of p-type transistors formed on an n-type well, wherein one of terminals of the transistor is a Schottky barrier junction consisting of a metal thin film formed on the n-type well, and the other terminal is connected to the source line.
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公开(公告)号:US10727235B2
公开(公告)日:2020-07-28
申请号:US16048844
申请日:2018-07-30
申请人: NSCore, Inc.
发明人: Tadahiko Horiuchi
IPC分类号: H01L27/11 , H01L29/08 , H01L27/02 , H01L29/78 , H04L9/32 , G11C11/418 , G11C11/412 , H01L29/47 , G11C11/419
摘要: It is provided a circuit for generating finger print code data comprising: plural pairs of first transistors, each of the first transistors having a source formed in the substrate, a drain formed in the substrate, a channel formed in the substrate between the source and the drain, a gate insulating layer formed on the channel, a gate electrode formed over the gate insulating layer, and an insulating sidewall formed at a side surface of the gate electrode; plural pairs of cross coupled second transistors, each of the plural pairs of cross coupled second transistors having drains and commonly connected sources, corresponding to each of the plural pairs of first transistors; and plural pairs of third transistors, each of the plural pairs of third transistors corresponding to each of the plural pairs of cross coupled second transistors.
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公开(公告)号:US09966141B2
公开(公告)日:2018-05-08
申请号:US15047759
申请日:2016-02-19
申请人: NSCore, Inc.
发明人: Tadahiko Horiuchi
IPC分类号: G11C16/04 , G11C7/06 , G11C16/26 , H01L29/47 , H01L29/792 , H01L29/78 , H01L29/08 , G11C16/10
CPC分类号: G11C16/0466 , G11C7/06 , G11C7/065 , G11C11/418 , G11C11/419 , G11C16/0475 , G11C16/10 , G11C16/26 , H01L28/00 , H01L29/0847 , H01L29/47 , H01L29/66492 , H01L29/66833 , H01L29/7835 , H01L29/7839 , H01L29/792
摘要: A nonvolatile memory cell includes a first-conductivity-type silicon substrate, a metal layer formed in a surface of the first-conductivity-type silicon substrate, a second-conductivity-type diffusion layer formed in the surface of the first-conductivity-type silicon substrate and spaced apart from the metal layer, an insulating film disposed on the surface of the first-conductivity-type silicon substrate between the metal layer and the second-conductivity-type diffusion layer, a gate electrode disposed on the insulating film between the metal layer and the second-conductivity-type diffusion layer, and a sidewall disposed at a same side of the gate electrode as the metal layer and situated between the gate electrode and the metal layer, the sidewall being made of insulating material.
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公开(公告)号:US09159404B2
公开(公告)日:2015-10-13
申请号:US14190292
申请日:2014-02-26
申请人: NSCore, Inc.
发明人: Tadahiko Horiuchi
IPC分类号: G11C5/06 , G11C11/419
CPC分类号: G11C11/419 , G11C11/41 , G11C14/00 , G11C16/0466
摘要: A nonvolatile memory device includes a word line, four or more bit lines, three or more MIS transistors having gate nodes thereof connected to the word line, the N-th (N: positive integer) one of the MIS transistors having two source/drain nodes thereof connected to the N-th and N+1-th ones of the bit lines, respectively, a sense circuit having two nodes and configured to amplify a difference between potentials of the two nodes, and a switch circuit configured to electrically couple the N-th and N+2-th ones of the bit lines to the two nodes of the sense circuit, respectively, and to electrically couple the N+1-th one of the bit lines to a fixed potential, for any numerical number N selected to detect single-bit data stored in the N-th and N+1-th ones of the MIS transistors.
摘要翻译: 非易失性存储器件包括字线,四个或更多个位线,三个或更多个MIS晶体管,其栅极节点连接到字线,第三(N:正整数)一个MIS晶体管具有两个源极/漏极 其节点分别连接到位线的第N和第N + 1位,具有两个节点并被配置为放大两个节点的电位之间的差异的感测电路,以及被配置为电耦合 第N和第N + 2个位线分别连接到感测电路的两个节点,并且将N + 1个位线电耦合到固定电位,对于任何数字N 被选择以检测存储在第N和第N + 1个MIS晶体管中的单位数据。
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公开(公告)号:US09893208B2
公开(公告)日:2018-02-13
申请号:US15592588
申请日:2017-05-11
申请人: NSCORE, INC.
发明人: Tadahiko Horiuchi
IPC分类号: G11C16/04 , H01L29/792 , H01L29/08 , H01L29/47 , H01L29/78 , H01L29/66 , G11C11/419 , G11C11/418
CPC分类号: G11C16/0466 , G11C7/06 , G11C7/065 , G11C11/418 , G11C11/419 , G11C16/0475 , G11C16/10 , G11C16/26 , H01L28/00 , H01L29/0847 , H01L29/47 , H01L29/66492 , H01L29/66833 , H01L29/7835 , H01L29/7839 , H01L29/792
摘要: A nonvolatile memory cell includes a first-conductivity-type silicon substrate, a metal layer formed in a surface of the first-conductivity-type silicon substrate, a second-conductivity-type diffusion layer formed in the surface of the first-conductivity-type silicon substrate and spaced apart from the metal layer, an insulating film disposed on the surface of the first-conductivity-type silicon substrate between the metal layer and the second-conductivity-type diffusion layer, a gate electrode disposed on the insulating film between the metal layer and the second-conductivity-type diffusion layer, and a sidewall disposed at a same side of the gate electrode as the metal layer and situated between the gate electrode and the metal layer, the sidewall being made of insulating material.
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