2T and flash memory array
    1.
    发明授权
    2T and flash memory array 有权
    2T和闪存阵列

    公开(公告)号:US08958248B2

    公开(公告)日:2015-02-17

    申请号:US13827880

    申请日:2013-03-14

    Applicant: NXP B.V.

    Abstract: Flash memory arrays are described. In one embodiment, a flash memory array includes memory sectors of Two-Transistor (2T) AND memory cells. Within each of the memory sectors, a row of sector selection transistors is configured such that writing data onto a memory column within the memory sector is controlled by applying a voltage to a bit line, independent from the row of sector selection transistors. Other embodiments are also described.

    Abstract translation: 描述闪存阵列。 在一个实施例中,闪存阵列包括双晶体管(2T)和存储器单元的存储扇区。 在每个存储器扇区中,一行扇区选择晶体管被配置为使得将数据写入存储器区段中的存储器列,通过将电压施加到与行行选择晶体管无关的位线来控制。 还描述了其它实施例。

    2T AND FLASH MEMORY ARRAY
    3.
    发明申请
    2T AND FLASH MEMORY ARRAY 有权
    2T和闪存存储阵列

    公开(公告)号:US20140269075A1

    公开(公告)日:2014-09-18

    申请号:US13827880

    申请日:2013-03-14

    Applicant: NXP B.V.

    Abstract: Flash memory arrays are described. In one embodiment, a flash memory array includes memory sectors of Two-Transistor (2T) AND memory cells. Within each of the memory sectors, a row of sector selection transistors is configured such that writing data onto a memory column within the memory sector is controlled by applying a voltage to a bit line, independent from the row of sector selection transistors. Other embodiments are also described.

    Abstract translation: 描述闪存阵列。 在一个实施例中,闪存阵列包括双晶体管(2T)和存储器单元的存储扇区。 在每个存储器扇区中,一行扇区选择晶体管被配置为使得将数据写入存储器区段中的存储器列,通过将电压施加到与行行选择晶体管无关的位线来控制。 还描述了其它实施例。

    METHOD OF PROCESSING A SILICON WAFER AND A SILICON INTEGRATED CIRCUIT
    4.
    发明申请
    METHOD OF PROCESSING A SILICON WAFER AND A SILICON INTEGRATED CIRCUIT 有权
    加工硅晶圆和硅集成电路的方法

    公开(公告)号:US20140167055A1

    公开(公告)日:2014-06-19

    申请号:US14098923

    申请日:2013-12-06

    Applicant: NXP B.V.

    CPC classification number: H01L27/0623 H01L21/8249 H01L27/11546

    Abstract: Methods and systems for processing a silicon wafer are disclosed. A method includes providing a flash memory region in the silicon wafer and providing a bipolar transistor with a polysilicon external base in the silicon wafer. The flash memory region and the bipolar transistor are formed by depositing a single polysilicon layer common to both the flash memory region and the bipolar transistor.

    Abstract translation: 公开了用于处理硅晶片的方法和系统。 一种方法包括在硅晶片中提供闪速存储区域,并在硅晶片中提供具有多晶硅外部基极的双极晶体管。 闪存区域和双极晶体管通过沉积闪存区域和双极晶体管两者共同的单个多晶硅层来形成。

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