Abstract:
A phase-change device capable of realizing a multi-level record in a superlattice phase-change memory cell in which a superlattice phase-change material is used as a recording film, and thereby achieving the reduction in power consumption and the capacity increase is provided. To a phase-change memory cell composed of GeTe/Sb2Te3 superlattice or SnTe/Sb2Te3 superlattice, a SET pulse is once applied to form a SET state (low resistance state). Thereafter, recording pulses having respectively different voltage values between a voltage value forming the SET state and a voltage value forming a RESET state (high resistance state) are respectively applied to the superlattice phase-change memory cell twice or more. In this manner, a read resistance (SET resistance) corresponding to a recording pulse (SET pulse) and read resistances corresponding to each of the recording pulses are obtained, so that the multi-level record can be realized.
Abstract:
Technology capable of improving performance of a phase-change memory is provided. A recording/reproducing film contains Sn (tin), Sb (antimony), and Te (tellurium) and also contains an element X having a bonding strength with Te stronger than a bonding strength between Sn and Te and a bonding strength between Sb and Te. Here, the recording/reproducing film has a (SnXSb)Te alloy phase, and this (SnXSb)Te alloy phase includes a self-assembled superlattice structure.
Abstract:
A phase-change device capable of realizing a multi-level record in a superlattice phase-change memory cell in which a superlattice phase-change material is used as a recording film, and thereby achieving the reduction in power consumption and the capacity increase is provided. To a phase-change memory cell composed of GeTe/Sb2Te3 superlattice or SnTe/Sb2Te3 superlattice, a SET pulse is once applied to form a SET state (low resistance state). Thereafter, recording pulses having respectively different voltage values between a voltage value forming the SET state and a voltage value forming a RESET state (high resistance state) are respectively applied to the superlattice phase-change memory cell twice or more. In this manner, a read resistance (SET resistance) corresponding to a recording pulse (SET pulse) and read resistances corresponding to each of the recording pulses are obtained, so that the multi-level record can be realized.
Abstract:
A phase-change memory and a semiconductor recording reproducing device capable of reducing consumed power are provided. A SnxTe100-x/Sb2Te3 SL film obtained by depositing a SnxTe100-x film and a Sb2Te3 film layer by layer contains a SnTe/Sb2Te3 superlattice phase formed of SnTe and Sb2Te3, a SnSbTe alloy phase, and a Te phase. The SnTe/Sb2Te3 superlattice phase is diluted by the SnSbTe alloy phase and the Te phase. Here, X of the SnxTe100-x film is represented by 4 at. %≦X≦55 at. %.
Abstract translation:提供了能够降低消耗功率的相变存储器和半导体记录再现装置。 通过层叠Sn x Te100-x膜和Sb 2 Te 3膜而形成的Sn xTe100-x / Sb 2 Te 3 SL膜包含由SnTe,Sb 2 Te 3,SnSbTe合金相和Te相形成的SnTe / Sb2Te3超晶格相。 SnTe / Sb2Te3超晶相被SnSbTe合金相和Te相稀释。 这里,SnxTe100-x膜的X由4at表示。 %≦̸ X≦̸ 55 at。 %。
Abstract:
A phase-change memory and a semiconductor recording/reproducing device capable of reducing consumed power are provided. A SnxTe100-x/Sb2Te3 SL film obtained by depositing a SnxTe100-x film and a Sb2Te3 film layer by layer contains a SnTe/Sb2Te3 superlattice phase formed of SnTe and Sb2Te3, a SnSbTe alloy phase, and a Te phase. The SnTe/Sb2Te3 superlattice phase is diluted by the SnSbTe alloy phase and the Te phase. Here, X of the SnxTe100-x film is represented by 4 at. %≦X≦55 at. %.
Abstract translation:提供了能够降低消耗功率的相变存储器和半导体记录/再现装置。 通过层叠Sn xTe100-x膜和Sb 2 Te 3膜而形成的Sn xTe100-x / Sb 2 Te 3 SL膜包含由SnTe和Sb 2 Te 3,SnSbTe合金相和Te相形成的SnTe / Sb2Te3超晶格相。 SnTe / Sb2Te3超晶相被SnSbTe合金相和Te相稀释。 这里,SnxTe100-x膜的X由4at表示。 %≦̸ X≦̸ 55 at。 %。
Abstract:
Technology capable of improving performance of a phase-change memory is provided. A recording/reproducing film contains Sn (tin), Sb (antimony), and Te (tellurium) and also contains an element X having a bonding strength with Te stronger than a bonding strength between Sn and Te and a bonding strength between Sb and Te. Here, the recording/reproducing film has a (SnXSb)Te alloy phase, and this (SnXSb)Te alloy phase includes a self-assembled superlattice structure.