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1.发明授权公开(公告)号：US06549010B2
公开(公告)日：2003-04-15
申请号：US10012022
申请日：2001-12-05
IPC分类号： G01V300
CPC分类号： G01R33/3854
摘要： Vibrations of the gradient coil carrier (18) medical MRI apparatus should be counteracted because they give rise to disturbing noise and macroscopic movements that deteriorate the image quality. In accordance with the invention the gradient coil system is suspended by means of weak resilient suspension elements (22) that are connected in series with piezo actuators (21). The actuators are controlled in such a way that macroscopic movements at low-frequency vibrations (order of magnitude of 10 Hz) that are due to the very resilient suspension are counteracted, and also that the high-frequency vibrations (order of magnitude of 700 Hz) that result from internal Lorentz forces are hardly transferred to the frame of the apparatus.
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2.发明授权公开(公告)号：US06518761B2
公开(公告)日：2003-02-11
申请号：US10015710
申请日：2001-11-30
IPC分类号： G01V300
CPC分类号： G01R33/3854
摘要： The transfer of vibrations that generate noise should be avoided in medical MRI apparatus. In accordance with the invention the gradient coil system 40 is suspended by means of suspension elements 48 whose transverse stiffness is much smaller than their axial stiffness. Such suspension elements should be attached to the coil carrier 40 at a vibration-free point, that is, a point that does not exhibit vibrations in all three co-ordinate directions. The longitudinal direction of the suspension element 48 should coincide with the vibration-free direction. Preferably, the suspension element is provided with an active drivable element 37 (a piezo element) for virtually reducing the stiffness of the suspension element in the axial direction, thus compensating also for residual vibrations that could still be present in the vibration-free direction.
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公开(公告)号：US20050041233A1
公开(公告)日：2005-02-24
申请号：US10880606
申请日：2004-07-01
申请人： Gerard Van Schothorst , Jan Van Eijk , Erik Loopstra , Robert-Han Munnig Schmidt , Felix Godfried Peeters
发明人： Gerard Van Schothorst , Jan Van Eijk , Erik Loopstra , Robert-Han Munnig Schmidt , Felix Godfried Peeters
IPC分类号： F16F15/02 , G03B27/42 , G03F7/20 , H01L21/027
CPC分类号： F16F7/1005 , G03F7/709
摘要： A lithographic apparatus is presented in which vibrations induced by reaction forces exerted on a base frame BF by accelerations within the apparatus are eliminated without the need for complex positioning systems and several balance masses. This is achieved by using feed-forward control to apply a compensating force using actuators to the base frame, based on knowledge of the movements and accelerations of the substrate table and other parts within the apparatus.
摘要翻译： 提出了一种光刻设备，其中消除了由设备内的加速度施加在基架BF上的反作用力引起的振动，而不需要复杂的定位系统和几个平衡块。 这是通过使用前馈控制来实现的，其基于对基板台和设备内的其它部件的运动和加速度的了解，将使用致动器的补偿力施加到基架上。
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公开(公告)号：US07612867B2
公开(公告)日：2009-11-03
申请号：US12222483
申请日：2008-08-11
申请人： Gerard Van Schothorst , Fransiscus Hendrikus Van Deuren , Jan Van Eijk , Erik Roelof Loopstra , Robert-Han Munnig Schmidt , Felix Godfried Peter Peeters
发明人： Gerard Van Schothorst , Fransiscus Hendrikus Van Deuren , Jan Van Eijk , Erik Roelof Loopstra , Robert-Han Munnig Schmidt , Felix Godfried Peter Peeters
CPC分类号： G03F7/70066 , G03F7/70191
摘要： A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.
摘要翻译： 一种光刻设备，包括用于在将图案化的投影光束成像到衬底上之前选择性地透射投影光束的装置。 该装置可以包括以下任何一种：在投影光束的方向上布置在图案形成装置的下游的选择性发射装置，扫描系统中的固定的和可移动的掩蔽刀片组，或可切换元件的阵列。 该装置可以提供给掩模台/保持器或光刻投影装置的框架或结构。
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公开(公告)号：US07554105B2
公开(公告)日：2009-06-30
申请号：US11263012
申请日：2005-11-01
申请人： Dominicus Jacobus Petrus A. Franken , Erik Roelof Loopstra , Pertrus Rutgerus Bartray , Marc Wilhelmus Maria Van Der Wijst , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Juliana Dries
发明人： Dominicus Jacobus Petrus A. Franken , Erik Roelof Loopstra , Pertrus Rutgerus Bartray , Marc Wilhelmus Maria Van Der Wijst , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Juliana Dries
IPC分类号： G21K5/10
CPC分类号： G03F7/70833 , G03F7/709
摘要： A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.
摘要翻译： 光刻设备包括安装在参考框架上的投影系统，投影系统又安装在支撑设备的基座上。 基座中的振动和位移误差通过两组隔离安装件在基座和参考框架之间以及参考框架和投影系统的投影框架之间进行过滤，因此减小了投影系统的干扰。
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公开(公告)号：US20110001254A1
公开(公告)日：2011-01-06
申请号：US12820492
申请日：2010-06-22
申请人： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
发明人： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
CPC分类号： G03F9/7042 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.
摘要翻译： 公开了一种压印光刻设备，其包括布置成保持压印模板的压印模板保持器和被配置为测量压印模板的尺寸和/或形状的变化的多个位置传感器，其中位置传感器与 印记模板 还公开了一种光刻方法，其包括使用压印模板将图案印刷到基板上，以及在将图案压印到基板上的同时测量压印模板的尺寸和/或形状的变化。
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公开(公告)号：US20090002676A1
公开(公告)日：2009-01-01
申请号：US12222483
申请日：2008-08-11
申请人： Gerard Van Schothorst , Fransiscus Hendrikus Van Deuren , Jan Van Eijk , Erik Roelof Loopstra , Robert-Han Munnig Schmidt , Felix Godfried Peter Peeters
发明人： Gerard Van Schothorst , Fransiscus Hendrikus Van Deuren , Jan Van Eijk , Erik Roelof Loopstra , Robert-Han Munnig Schmidt , Felix Godfried Peter Peeters
IPC分类号： G03B27/72
CPC分类号： G03F7/70066 , G03F7/70191
摘要： A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.
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公开(公告)号：US07423730B2
公开(公告)日：2008-09-09
申请号：US10848586
申请日：2004-05-19
申请人： Gerard Van Schothorst , Fransiscus Hendrikus Van Deuren , Jan Van Eijk , Erik Roelof Loopstra , Robert-Han Munnig Schmidt , Felix Godfried Peter Peeters
发明人： Gerard Van Schothorst , Fransiscus Hendrikus Van Deuren , Jan Van Eijk , Erik Roelof Loopstra , Robert-Han Munnig Schmidt , Felix Godfried Peter Peeters
IPC分类号： G03B27/72
CPC分类号： G03F7/70066 , G03F7/70191
摘要： A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.
摘要翻译： 一种光刻设备，包括用于在将图案化的投影光束成像到衬底上之前选择性地透射投影光束的装置。 该装置可以包括以下任何一种：在投影光束的方向上布置在图案形成装置的下游的选择性发射装置，扫描系统中的固定的和可移动的掩蔽刀片组，或可切换元件的阵列。 该装置可以提供给掩模台/保持器或光刻投影装置的框架或结构。
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公开(公告)号：US20130182236A1
公开(公告)日：2013-07-18
申请号：US13812844
申请日：2011-06-14
申请人： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
发明人： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
IPC分类号： G03F7/00
CPC分类号： G03F7/7035 , B29C43/021 , B29C43/04 , B29C43/14 , B29C2043/142 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/70775 , G03F7/70825 , G03F7/7085 , G03F7/709 , G03F9/7042
摘要： An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
摘要翻译： 一种压印光刻设备，具有要安装在地板上的第一框架，通过运动耦合安装在第一框架上的第二框架，安装在第二框架上的对准传感器，以将压印光刻模板布置与目标部分对准 基板和位置传感器，用于测量压印光刻模板布置和/或基板台相对于第二框架的位置。
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公开(公告)号：US09864279B2
公开(公告)日：2018-01-09
申请号：US13812844
申请日：2011-06-14
申请人： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
发明人： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
CPC分类号： G03F7/7035 , B29C43/021 , B29C43/04 , B29C43/14 , B29C2043/142 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/70775 , G03F7/70825 , G03F7/7085 , G03F7/709 , G03F9/7042
摘要： An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
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