Apparatus for measuring diameter of crystal
    1.
    发明授权
    Apparatus for measuring diameter of crystal 失效
    用于测量晶体直径的装置

    公开(公告)号:US4926357A

    公开(公告)日:1990-05-15

    申请号:US249004

    申请日:1988-09-23

    IPC分类号: C30B15/26 G01B11/08

    CPC分类号: G01B11/08

    摘要: An apparatus is used in the production of a monocrystalline rod by Czochralski method and is adapted for measuring the diameter of the monocrystalline rod at the melt surface of the melt by processing image signal derived from an image sensor. The measurement of the diameter is conducted by determining the diameter of the monocrystalline rod at the melt surface by processing the output signal from the image sensor, and multiplying the rod image diameter with a function of the difference between the initial melt surface level and a melt surface corrected in accordance with a change in the temperature in the apparatus chamber or a change in the leval of the electrical power supplied to a heater for heating a crucible.

    Method for measuring the diameter of a single crystal ingot
    2.
    发明授权
    Method for measuring the diameter of a single crystal ingot 失效
    测量单晶锭直径的方法

    公开(公告)号:US5584930A

    公开(公告)日:1996-12-17

    申请号:US487507

    申请日:1995-06-07

    摘要: A method for measuring a diameter of a single crystal ingot pulled up in a single crystal pulling apparatus comprising: calculating the weight of the pulled-up single crystal, calculating the descent amount of the melt surface relative to the crucible wall from the calculated pulled-up weight of the grown single crystal, and then either correcting the value of the ingot diameter actually measured by the optical sensor in response to the descent amount of the melt surface level or raising the crucible by an amount equal to the descent amount of the surface level.

    摘要翻译: 一种用于测量在单晶拉制装置中拉起的单晶锭的直径的方法,包括:计算上拉单晶的重量,从计算的拉伸单元计算熔融表面相对于坩埚壁的下降量, 生长的单晶的重量,然后响应于熔体表面水平的下降量或者将坩埚升高等于表面下降量的量来校正由光学传感器实际测量的锭直径的值 水平。

    Crystal diameter controlling method
    4.
    发明授权
    Crystal diameter controlling method 失效
    晶体直径控制方法

    公开(公告)号:US4973377A

    公开(公告)日:1990-11-27

    申请号:US174583

    申请日:1988-03-28

    IPC分类号: C30B15/20 C30B15/26

    CPC分类号: C30B15/26

    摘要: Disclosed is a method of controlling the diameter of a single crystal produced by the Czochralski method. The diameter of a tapered portion of the single crystal is controlled by controlling the temperature of a melt in a crucible and the rotational speed of the crucible. The control range of the rotational speed of the crucible is made narrower as the diameter of the tapered portion approaches closer to that of a body portion, and the rotational speed is made constant while the body portion is grown.

    Apparatus for adjusting initial position of melt surface
    5.
    发明授权
    Apparatus for adjusting initial position of melt surface 失效
    用于调节熔体表面初始位置的装置

    公开(公告)号:US4915775A

    公开(公告)日:1990-04-10

    申请号:US222438

    申请日:1988-07-21

    IPC分类号: C30B15/00 C30B15/20 C30B15/26

    摘要: A melt-surface initial position adjusting apparatus which is suitable for use in a monocrystal growing system employing the Czochralski method to adjust the vertical position of the melt surface before the growing of a monocrystal. The apparatus can ensure a highly precise measurement of a crystal-diameter measuring device, thereby enabling a reduction in the costs of producing a monocrystal bar. Before the growing of a crystal, the vertical position (H) of the surface (16A) of a melt within a crucible is measured. The crucible is moved vertically on the basis of the measured value in such a manner as to maintain the distance (L) between the melt surface (16A) and an image sensor (28) for measuring the crystal diameter at a predetermined value.

    Apparatus for measuring crystal diameter
    6.
    发明授权
    Apparatus for measuring crystal diameter 失效
    用于测量晶体直径的装置

    公开(公告)号:US4794263A

    公开(公告)日:1988-12-27

    申请号:US109722

    申请日:1987-10-19

    IPC分类号: C30B15/26 G01B11/08 H01L21/18

    摘要: An apparatus for measuring the diameter of a crystal in which an optical sensor scans along a sensing line which crosses at one point a luminous ring formed at the interface between a crystalline rod and a melt; the picture element position corresponding to a maximum luminance is discriminated when the optical sensor scans; the mean value of the picture element position is calculated over at least one revolution of the crystalline rod; and the diameter D of the crystalline rod at a portion thereof interfacing with the melt is calculated from the mean value and the level of the melt. Similarly, the minimum crystal diameter can be calculated by obtaining the picture element position corresponding to the minimum crystal diameter instead of obtaining the mean of the picture element position.

    摘要翻译: 一种用于测量晶体直径的装置,其中光学传感器沿着在结晶棒和熔体之间的界面处形成的发光环的一个点处的感测线扫描; 当光学传感器扫描时,判别对应于最大亮度的像素位置; 在结晶棒的至少一圈上计算像素位置的平均值; 并且根据熔融物的平均值和水平计算结晶棒在与熔体相接合的部分的直径D. 类似地,可以通过获得与最小晶体直径相对应的像素位置而不是获得像素位置的平均值来计算最小晶体直径。

    Device for detecting the position of crystallization interface
    7.
    发明授权
    Device for detecting the position of crystallization interface 失效
    用于检测结晶界面位置的装置

    公开(公告)号:US4918520A

    公开(公告)日:1990-04-17

    申请号:US185894

    申请日:1988-04-25

    IPC分类号: G01B11/00 C30B13/28 C30B13/30

    CPC分类号: C30B13/30 Y10T117/1004

    摘要: A device for use in a monocrystal producing apparatus based on the FZ method and designed to detect a crystallization interface (20) between a melt (16) and a monocrystalline rod (12) even if the luminous line of the crystallization interface is partly curved downward. This device samples a series of luminance signals from the side of the melt to the side of the monocrystalline rod along a sensing line intersecting the crystallization interface, thereby successively outputs a series of sampled luminance signals (Sj), determines a value as a reference level (S.sub.0) relative to this specific level of the luminance signals, e.g., a peak value thereof, and discriminates the crystallization interface when one of the series of sampled luminance signals exceeds the reference level. A pixel position corresponding to this discrimination is determined as a pixel position corresponding to the crystallization interface.