公开(公告)号：US07033461B2

公开(公告)日：2006-04-25

申请号：US10284287

申请日：2002-10-31

申请人： Noriaki Tani ,  Toshihiro Suzuki ,  Satoshi Ikeda ,  Hiroaki Kawamura ,  Satoru Ishibashi ,  Kouichi Hanzawa ,  Takafumi Matsumoto

发明人： Noriaki Tani ,  Toshihiro Suzuki ,  Satoshi Ikeda ,  Hiroaki Kawamura ,  Satoru Ishibashi ,  Kouichi Hanzawa ,  Takafumi Matsumoto

IPC分类号： C23C14/35 ,  C23C16/00

CPC分类号： C23C14/044 ,  C23C14/545

摘要： The present invention provides an efficient thin film forming apparatus which is capable of correcting a film thickness so as to take care of a variation in distribution in the film thickness and to take care of the circumferential distribution of the film thickness, as well as a method for forming a thin film using this film forming apparatus. The method comprises the first step of first forming a thin film to a predetermined percentage out of thickness through an opening 8a in a shutter 8, the second step of then using a film thickness monitor 10 to measure the distribution of the thickness of the thin film formed in the first step, and the third step of reducing a film formation rate by an opening 8b in the shutter 8 between a substrate 4 and a sputtering cathode 6 as compared to that of the first step and correcting the thickness of the thin film by an opening 13a in the first film thickness correcting plate 13 between the substrate 4 and the sputtering cathode 6 corresponding to the distribution of the film thickness measured by the film thickness monitor 10 in the second step. Then, the second step is carried out again, during which the film thickness monitor 10 is used to measure the distribution of the thickness of the thin film formed in the third step. Further, the third and second steps are repeatedly carried out.

摘要翻译： 本发明提供了一种有效的薄膜形成装置，该薄膜形成装置能够校正膜厚度，以便保证薄膜厚度分布的变化，并且能够保证薄膜厚度的周向分布，以及方法 用于使用该成膜装置形成薄膜。 该方法包括首先通过快门8中的开口8a将薄膜首先形成预定百分比的厚度的第一步骤，然后使用薄膜厚度监测器10来测量薄膜厚度的分布的第二步骤 在第一步骤中形成的薄膜，以及第三步骤，通过与第一步骤相比在基板4和溅射阴极6之间的快门8中的开口8b降低成膜速率，并且校正薄膜的厚度 在第二步骤中，由基板4和溅射阴极6之间的第一膜厚校正板13的开口部分13a对应于由膜厚度监视器10测量的膜厚度的分布。 然后，再次进行第二步骤，在此期间，膜厚度监测器10用于测量在第三步骤中形成的薄膜的厚度分布。 此外，重复执行第三和第二步骤。

公开(公告)号：US20080011229A1

公开(公告)日：2008-01-17

申请号：US11819838

申请日：2007-06-29

申请人： Haruo Takahashi ,  Kouichi Hanzawa ,  Takafumi Matsumoto

发明人： Haruo Takahashi ,  Kouichi Hanzawa ,  Takafumi Matsumoto

IPC分类号： B05C11/10

CPC分类号： G02B5/288 ,  G01B11/0616 ,  G01B11/0683

摘要： To provide a method of controlling film thickness of dielectric multilayer film, such as optical thin film, with high precision, an optical film thickness controlling apparatus and a dielectric multilayer film manufacturing apparatus that can control the film thickness based on the same method, and dielectric multilayer film manufactured using the controlling apparatus or manufacturing apparatus. An optical film thickness controlling apparatus includes a film formation device 15 having a rotatable substrate 23 and a sputtering target 28, a photodiode 16 that detects each of a plurality of monochromatic light beams applied to the rotatable substrate along a radius thereof at predetermined intervals, and an A/D converter 17, in which a movable shutter 29 that moves along the direction of the radius of the rotatable substrate 23 to shut off film formation on the substrate 23 is provided between the substrate 23 and the target 28. From each of the monochromatic light beams detected by the photodiode 16 and the A/D converter 17, a quadratic regression function of reciprocal transmittance is calculated by a least squares method, and a CPU 18 and a motor driver 19, which indicate motion of the movable shutter based on each predicted value of the film growing time when the latest surface layer film reaches to predetermined optical film thickness, move the movable shutter 29 to shut off the film formation at the film formation region where the predetermined optical film thickness is reached to.

摘要翻译： 为了提供一种以高精度控制诸如光学薄膜的电介质多层膜的膜厚的方法，可以基于相同的方法控制膜厚度的光学膜厚控制装置和电介质多层膜制造装置以及电介质 使用所述控制装置或制造装置制造的多层膜。 光学膜厚控制装置包括具有可旋转基板23和溅射靶28的成膜装置15，光电二极管16，其沿预定间隔沿其半径检测施加到可旋转基板的多个单色光束;以及 A / D转换器17，其中在基板23和目标28之间设置有沿着可旋转基板23的半径方向移动以截止基板23上的成膜的活动快门29。 从由光电二极管16和A / D转换器17检测的每个单色光束中，通过最小二乘法计算倒数透射率的二次回归函数，并且CPU 18和电机驱动器19指示 基于当最新表面层膜达到预定的光学膜厚度时的成膜时间的每个预测值的可移动快门，移动活动快门29以关闭到达预定光学膜厚度的成膜区域处的成膜， 。

公开(公告)号：US08011315B2

公开(公告)日：2011-09-06

申请号：US10588507

申请日：2005-02-10

申请人： Takafumi Matsumoto ,  Shun Mikami ,  Kouichi Hanzawa ,  Mineharu Moriya ,  Hideyuki Odagi ,  Tetsuya Shimada ,  Masashi Kubo ,  Susumu Ikeda

发明人： Takafumi Matsumoto ,  Shun Mikami ,  Kouichi Hanzawa ,  Mineharu Moriya ,  Hideyuki Odagi ,  Tetsuya Shimada ,  Masashi Kubo ,  Susumu Ikeda

IPC分类号： B05C11/02

CPC分类号： H01L21/68707 ,  C23C14/0078 ,  C23C14/505 ,  C23C14/568 ,  C23C16/4584 ,  C23C16/54 ,  H01L21/67201 ,  H01L21/67207 ,  H01L21/68721 ,  H01L21/68764 ,  H01L21/68771

摘要： A thin film forming apparatus such that a substrate can be easily fixed/removed to/from the outer circumferential surface of a drum type substrate holder through a simple arrangement.The drum type substrate holder (5) is supported in a horizontal posture rotatably about a horizontal rotational shaft in a film deposition chamber A jig (13) holding a substrate (12) fixedly is transferred by an arm horizontally onto the outer circumferential surface of the drum type substrate holder (5), and an end part (13b) of the substrate fixing jig (13) can be secured by a securing device (14) provided at the corner part (5a) of the outer circumferential surface of the drum type substrate holder (5).

摘要翻译： 一种薄膜形成装置，使得可以通过简单的布置容易地将基板固定/移出到滚筒式基板保持器的外周表面。 滚筒式基板保持件（5）在成膜室中以水平旋转轴为中心旋转的水平姿态被支撑。固定有基板（12）的夹具（13）固定地通过手臂水平地移动到 鼓型衬底保持器（5）和衬底固定夹具（13）的端部（13b）可以通过设置在滚筒类型的外周面的角部（5a）处的固定装置（14）来固定 衬底保持器（5）。

公开(公告)号：US07927472B2

公开(公告)日：2011-04-19

申请号：US11819838

申请日：2007-06-29

申请人： Haruo Takahashi ,  Kouichi Hanzawa ,  Takafumi Matsumoto

发明人： Haruo Takahashi ,  Kouichi Hanzawa ,  Takafumi Matsumoto

IPC分类号： C23C14/35 ,  C23C16/00

CPC分类号： G02B5/288 ,  G01B11/0616 ,  G01B11/0683

摘要： To provide a method of controlling film thickness of dielectric multilayer film, such as optical thin film, with high precision, an optical film thickness controlling apparatus and a dielectric multilayer film manufacturing apparatus that can control the film thickness based on the same method, and dielectric multilayer film manufactured using the controlling apparatus or manufacturing apparatus. An optical film thickness controlling apparatus includes a film formation device 15 having a rotatable substrate 23 and a sputtering target 28, a photodiode 16 that detects each of a plurality of monochromatic light beams applied to the rotatable substrate along a radius thereof at predetermined intervals, and an A/D converter 17, in which a movable shutter 29 that moves along the direction of the radius of the rotatable substrate 23 to shut off film formation on the substrate 23 is provided between the substrate 23 and the target 28. From each of the monochromatic light beams detected by the photodiode 16 and the A/D converter 17, a quadratic regression function of reciprocal transmittance is calculated by a least squares method, and a CPU 18 and a motor driver 19, which indicate motion of the movable shutter based on each predicted value of the film growing time when the latest surface layer film reaches to predetermined optical film thickness, move the movable shutter 29 to shut off the film formation at the film formation region where the predetermined optical film thickness is reached to.

摘要翻译： 为了提供一种以高精度控制诸如光学薄膜的电介质多层膜的膜厚的方法，可以基于相同的方法控制膜厚度的光学膜厚控制装置和电介质多层膜制造装置以及电介质 使用所述控制装置或制造装置制造的多层膜。 光学膜厚控制装置包括具有可旋转基板23和溅射靶28的成膜装置15，光电二极管16，其沿预定间隔沿其半径检测施加到可旋转基板的多个单色光束;以及 A / D转换器17，其中在基板23和目标28之间设置有沿着可旋转基板23的半径的方向移动以在基板23上切断膜形成的活动快门29。 由光电二极管16和A / D转换器17检测的单色光束，通过最小二乘法计算倒数透射率的二次回归函数，以及指示可移动快门的运动的CPU 18和电动机驱动器19，其基于 当最新的表面层膜达到预定的光学膜厚度时的成膜时间的每个预测值，移动活动遮板29以切断 在达到预定光学膜厚度的成膜区域形成膜。

公开(公告)号：US20080141943A1

公开(公告)日：2008-06-19

申请号：US10588507

申请日：2005-02-10

申请人： Takafumi Matsumoto ,  Shun Mikami ,  Kouichi Hanzawa ,  Mineharu Moriya ,  Hideyuki Odagi ,  Tetsuya Shimada ,  Masashi Kubo ,  Susumu Ikeda

发明人： Takafumi Matsumoto ,  Shun Mikami ,  Kouichi Hanzawa ,  Mineharu Moriya ,  Hideyuki Odagi ,  Tetsuya Shimada ,  Masashi Kubo ,  Susumu Ikeda

IPC分类号： C23C16/453

CPC分类号： H01L21/68707 ,  C23C14/0078 ,  C23C14/505 ,  C23C14/568 ,  C23C16/4584 ,  C23C16/54 ,  H01L21/67201 ,  H01L21/67207 ,  H01L21/68721 ,  H01L21/68764 ,  H01L21/68771

摘要： [Problems]A thin film forming apparatus such that a substrate can be easily fixed/removed to/from the outer circumferential surface of a drum type substrate holder through a simple arrangement.[Means for Solving Problems]The drum type substrate holder (5) is supported in a horizontal posture rotatably about a horizontal rotational shaft in a film deposition chamber A jig (13) holding a substrate (12) fixedly is transferred by an arm horizontally onto the outer circumferential surface of the drum type substrate holder (5), and an end part (13b) of the substrate fixing jig (13) can be secured by a securing device (14) provided at the corner part (5a) of the outer circumferential surface of the drum type substrate holder(5).

摘要翻译： [问题]通过简单的布置，能够容易地将基板与鼓型基板保持件的外周面进行固定/移除的薄膜形成装置。 [解决问题的手段]滚筒式基板保持件（5）在成膜室中以水平旋转轴为中心旋转的水平姿势被支撑。固定有基板（12）的夹具（13）固定地将手臂水平地移动到 滚筒式基板支架（5）的外圆周表面和基板固定夹具（13）的端部（13b）可以通过设置在角部（5a）的角部（5a）处的固定装置（14）来固定 鼓型基板支架（5）的外周面。

公开(公告)号：US07247345B2

公开(公告)日：2007-07-24

申请号：US10394667

申请日：2003-03-24

申请人： Haruo Takahashi ,  Kouichi Hanzawa ,  Takafumi Matsumoto

发明人： Haruo Takahashi ,  Kouichi Hanzawa ,  Takafumi Matsumoto

IPC分类号： B05D5/06

CPC分类号： G02B5/288 ,  G01B11/0616 ,  G01B11/0683

摘要： A method of controlling film thickness of dielectric multilayer film with high precision, an optical film thickness controlling apparatus and a dielectric multilayer film manufacturing apparatus that can control the film thickness. An optical film thickness controlling apparatus includes a film formation device having a rotatable substrate and a sputtering target, a photodiode that detects each of a plurality of monochromatic light beams applied to the rotatable substrate along a radius thereof at predetermined intervals, in which a movable shutter that moves along the direction of the radius of the rotatable substrate to shut off film formation on the substrate between the substrate and the target. From each of the monochromatic light beams, a quadratic regression function of reciprocal transmittance is calculated by a least squares method, and a CPU and a motor driver move the movable shutter to shut off the film formation at the film formation region.

摘要翻译： 高精度地控制电介质多层膜的膜厚的方法，可以控制膜厚度的光学膜厚控制装置和电介质多层膜制造装置。 光学膜厚度控制装置包括具有可旋转基板和溅射靶的成膜装置，光电二极管，其以预定间隔检测沿其半径施加到可旋转基板的多个单色光束中的每一个，其中活动快门 其沿着可旋转基板的半径的方向移动以截止基板和基板之间的基板上的膜形成。 从每个单色光束，通过最小平方法计算倒数透射率的二次回归函数，并且CPU和电动机驱动器移动可移动快门以切断成膜区域处的成膜。