摘要:
Hydrogen peroxide in a hydrogen peroxide reservoir is supplied to an effluent. Ozone gas generated in an ozone generating apparatus is delivered through branched piping to two ozone supplying points and is supplied to the effluent. The ozone and the supplied hydrogen peroxide react to generate hydroxyl radicals. The hydroxyl radicals react with the materials in the effluent to decompose and remove them.
摘要:
A process for treating organic wastewater which comprises treating organic wastewater with ozone and successively with alkali and introducing said alkali treated organic wastewater into an anaerobic digestion tank for anaerobic digestion. Instead of the ozone and successive alkali treatments, ozone treatment in the presence of hydrogen peroxide or ozone treatment under UV radiation is applicable. Prior to introduction into the anaerobic digestion tank, the treated wastewater may be separated into solids and phosphorus is preferably recovered from the solution. Solubilization of solids in the organic wastewater and transformation of organic substances into methane are greatly enhanced and sludge to be disposed is greatly reduced. Moreover, phosphorus is efficiently eluted out and recovered from solids in the organic wastewater.
摘要:
In a process of eluting phosphorus from sludge into a liquid phase and recovering the phosphorus efficiently, cell walls of microorganisms in the sludge are ruptured by a process selected from crushing sludge (for example, treating with an ultrasonic wave homogenizer), treating with ozone, and treating with heat. Then the liquid phase is treated with alkali, thereby eluting the phosphorus into a liquid phase efficiently in a short time. By coagulating and precipitating, the phosphorus eluted into the liquid phase is recovered.
摘要:
A sludge treatment method allowing an improvement in a phosphorus recovery rate and sludge volume reduction by efficiently eluting phosphorus in the sludge. The sludge treatment method includes: a step of foaming a sludge-containing liquid by blowing an ozone-containing gas into the sludge-containing liquid; and a step of eluting phosphorus in the sludge-containing liquid by bringing sludge adsorbed on bubbles and a sludge-dissolving agent into contact with each other. The sludge treatment method may further include the steps of: separating the phosphorus eluted sludge-containing liquid into a phosphorus eluate and a residual sludge; and precipitating a phosphorus compound by adding a coagulant to the separated phosphorus eluate.
摘要:
A sludge treatment method allowing an improvement in a phosphorus recovery rate and sludge volume reduction by efficiently eluting phosphorus in the sludge. The sludge treatment method includes: a step of foaming a sludge-containing liquid by blowing an ozone-containing gas into the sludge-containing liquid; and a step of eluting phosphorus in the sludge-containing liquid by bringing sludge adsorbed on bubbles and a sludge-dissolving agent into contact with each other. The sludge treatment method may further include the steps of: separating the phosphorus eluted sludge-containing liquid into a phosphorus eluate and a residual sludge; and precipitating a phosphorus compound by adding a coagulant to the separated phosphorus eluate.
摘要:
A sludge treatment method allowing an improvement in a phosphorus recovery rate and sludge volume reduction by efficiently eluting phosphorus in the sludge. The sludge treatment method includes: a step of foaming a sludge-containing liquid by blowing an ozone-containing gas into the sludge-containing liquid; and a step of eluting phosphorus in the sludge-containing liquid by bringing sludge adsorbed on bubbles and a sludge-dissolving agent into contact with each other. The sludge treatment method may further include the steps of: separating the phosphorus eluted sludge-containing liquid into a phosphorus eluate and a residual sludge; and precipitating a phosphorus compound by adding a coagulant to the separated phosphorus eluate.
摘要:
A sludge treatment method allowing an improvement in a phosphorus recovery rate and sludge volume reduction by efficiently eluting phosphorus in the sludge. The sludge treatment method includes: a step of foaming a sludge-containing liquid by blowing an ozone-containing gas into the sludge-containing liquid; and a step of eluting phosphorus in the sludge-containing liquid by bringing sludge adsorbed on bubbles and a sludge-dissolving agent into contact with each other. The sludge treatment method may further include the steps of: separating the phosphorus eluted sludge-containing liquid into a phosphorus eluate and a residual sludge; and precipitating a phosphorus compound by adding a coagulant to the separated phosphorus eluate.
摘要:
A water treatment method sufficiently decomposes low-degradable organic substances while suppressing production of bromate ions and consumption of hydrogen peroxide. A water treatment method for purifying water using radicals includes injecting an electron-donating substance selected from the group consisting of saccharides, amino acids, lipids, humic acid, and mixtures thereof into water. The radicals are preferably produced using ozone and hydrogen peroxide in combination. Further, the electron-donating substance is preferably injected into the water in a concentration of 0.1 μmol/L to 30 μmol/L.
摘要:
A cleaning method of a silicon substrate includes a first step of etching a surface of a silicon substrate by a metal-ion-containing mixed aqueous solution of an oxidizing agent and hydrofluoric acid and of forming a porous layer on the surface of the silicon substrate, a second step of etching a pore of the porous layer by mixed acid mainly containing hydrofluoric acid and nitric acid and of forming texture on the surface of the silicon substrate, a third step of etching the surface of the silicon substrate on which the texture is formed with an alkaline chemical solution, and a fourth step of treating the silicon substrate etched by the alkaline chemical solution by ozone-containing water, of generating an air bubble within the pore formed in the silicon substrate, and of removing metal and organic impurities from within the pore.
摘要:
A cleaning method of a silicon substrate includes a first step of etching a surface of a silicon substrate by a metal-ion-containing mixed aqueous solution of an oxidizing agent and hydrofluoric acid and of forming a porous layer on the surface of the silicon substrate, a second step of etching a pore of the porous layer by mixed acid mainly containing hydrofluoric acid and nitric acid and of forming texture on the surface of the silicon substrate, a third step of etching the surface of the silicon substrate on which the texture is formed with an alkaline chemical solution, and a fourth step of treating the silicon substrate etched by the alkaline chemical solution by ozone-containing water, of generating an air bubble within the pore formed in the silicon substrate, and of removing metal and organic impurities from within the pore.