公开(公告)号：US20230260748A1

公开(公告)日：2023-08-17

申请号：US18148761

申请日：2022-12-30

Applicant: NuFlare Technology, Inc.

Inventor： Kota IWASAKI

IPC: H01J37/317

CPC classification number: H01J37/3177 ,  H01J2237/0437 ,  H01J2237/31764 ,  H01J2237/10

Abstract: A multi-electron beam writing apparatus includes a light source array to include plural light sources and generate plural first lights, a multi-lens array to include plural first lenses, and to divide the plural first lights into plural second lights by that each of the plural first lights illuminates a corresponding lens set of plural lens sets each composed of plural second lenses being a portion of the plural first lenses and by that each of lenses, being at least a part of the plural second lenses, is irradiated with two or more first lights of the plural first lights, a photoemissive surface to receive the plural second lights through its upper surface, and emit multiple photoelectron beams from its back surface, and a blanking aperture array mechanism to perform an individual blanking control by individually switching between ON and OFF of each of the multiple photoelectron beams.

公开(公告)号：US20230290605A1

公开(公告)日：2023-09-14

申请号：US18020989

申请日：2021-06-09

Applicant: HAMAMATSU PHOTONICS K.K. ,  NuFlare Technology, Inc.

Inventor： Tomohiko HIRANO ,  Hiroyuki TAKETOMI ,  Motohiro SUYAMA ,  Wataru MATSUDAIRA ,  Akihiro KAGEYAMA ,  Kota IWASAKI ,  Taku YAMADA

IPC: H01J37/06 ,  H01J37/10

CPC classification number: H01J37/06 ,  H01J37/10 ,  H01J2237/026

Abstract: A photoelectric surface electron source includes a glass substrate configured to receive laser light incident from a substrate back surface to emit the laser light from a substrate main surface, a photoelectric surface provided on the substrate main surface and configured to receive the laser light and emit a photoelectron, a lens array disposed on the substrate back surface and including a plurality of microlenses for condensing the laser light toward the photoelectric surface, and a light shielding portion provided on the glass substrate. The light shielding portion has a back surface-side light shielding layer provided on a back surface-side light shielding surface interposed between the plurality of microlenses on the substrate back surface, and a main surface-side light shielding layer provided on a main surface-side light shielding surface.

公开(公告)号：US20220059310A1

公开(公告)日：2022-02-24

申请号：US17305607

申请日：2021-07-12

Applicant: NuFlare Technology, Inc.

Inventor： Kota IWASAKI ,  Taku YAMADA

IPC: H01J37/04 ,  H01J37/317 ,  H01J37/10 ,  H01J37/24

Abstract: A multiple electron beam writing apparatus includes an excitation light source to emit an excitation light, a multi-lens array to divide the excitation light into a plurality of lights, a photoemissive surface to receive the plurality of lights incident through its upper side, and emit multiple photoelectron beams from its back side, a blanking aperture array mechanism to provide, by deflecting each beam of the multiple photoelectron beams, an individual blanking control which individually switches each beam between ON and OFF, an electron optical system to include an electron lens, and to irradiate, using the electron lens, a target object with the multiple photoelectron beams having been controlled to be beam ON, and a control circuit to interconnect, for each shot of the multiple photoelectron beams, a timing of switching the excitation light between emission and non-emission with a timing of switching the each beam between ON and OFF.

公开(公告)号：US20220189734A1

公开(公告)日：2022-06-16

申请号：US17643727

申请日：2021-12-10

Applicant: NuFlare Technology, Inc.

Inventor： Taku YAMADA ,  Kota IWASAKI

IPC: H01J37/30 ,  H01J37/04

Abstract: According to one aspect of the present invention, an electron beam irradiation apparatus includes a photoelectric surface configured to receive irradiation of excitation light on a side of a front surface, and generate electron beams from a side of a back surface; a blanking aperture array mechanism provided with passage holes corresponding to the electron beams and configured to perform deflection control on each of the plurality of electron beams passing through the passage holes; and an adjustment mechanism configured to adjust at least one of an orbit of transmitted light that passes through at least one of arrangement objects including the photoelectric surface, the blanking aperture array mechanism, and the limit aperture substrate up to the stage and reaches the stage, among an irradiated excitation light, and an orbit of the electron beams, wherein the arrangement objects shield at least a part of the transmitted light.