公开(公告)号：US20230078311A1

公开(公告)日：2023-03-16

申请号：US17885774

申请日：2022-08-11

Applicant: NuFlare Technology, Inc.

Inventor： Taku YAMADA ,  Takahito NAKAYAMA

IPC: H01J37/304 ,  H01J37/317 ,  H01J37/04 ,  H01J37/147 ,  G03F7/20

Abstract: In one embodiment, a multi-charged-particle-beam writing method includes dividing a data path into a plurality of first blocks based on at least either one of each of a plurality of input/output circuits and a plurality of wiring groups, and calculating a first shift amount for multiple beams for each of the plurality of first blocks. The data path is for inputting control data to a cell array on a blanking aperture array substrate. The control data is for controlling ON/OFF of each beam of the multiple beams. Each of the plurality of wiring groups includes a plurality of pieces of wiring connected to the plurality of input/output circuits and grouped together based on inter-wiring distance. The first shift amount is due to at least one of an electric field and a magnetic field for each of the plurality of first blocks. An irradiation position or a dose of the multiple beams is corrected based on the first shift amount, and irradiation is performed.

公开(公告)号：US20220367143A1

公开(公告)日：2022-11-17

申请号：US17811985

申请日：2022-07-12

Applicant: NuFlare Technology, Inc.

Inventor： Taku YAMADA

IPC: H01J37/153 ,  H01J37/147 ,  H01J37/317 ,  G03F7/20

Abstract: A difference between a calculated amount of drift and an actual amount of drift is reduced. According to one aspect of the present invention, a charged particle beam writing apparatus includes a deflector adjusting an irradiation position of the charged particle beam with respect to a substrate placed on a stage, a shot data generator generating shot data from writing data, the shot data including a shot position and beam ON and OFF times for each shot, a drift corrector referring to a plurality of pieces of the generated shot data, calculating an amount of drift of the irradiation position of the charged particle beam with which the substrate is irradiated, and generating correction information for correcting an irradiation position deviation based on the amount of drift, a deflection controller controlling a deflection amount achieved by the deflector based on the shot data and the correction information, and a dummy irradiation instructor instructing execution of dummy irradiation in a writing process to irradiate with the charged particle beam in a predetermined irradiation amount at a position different from the substrate on the stage.

公开(公告)号：US20220157553A1

公开(公告)日：2022-05-19

申请号：US17505008

申请日：2021-10-19

Applicant: NuFlare Technology, Inc.

Inventor： Nobuo MIYAMOTO ,  Taku YAMADA

IPC: H01J37/073 ,  H01J37/317 ,  H01J37/304

Abstract: A method for controlling operation of an electron emission source includes acquiring, while varying an emission current of an electron beam, a characteristic between a surface current of a target object at a position on the surface of the target object irradiated with the electron beam, and the emission current, calculating, based on the characteristic, first gradient values each obtained by dividing the surface current of the target object by the emission current, in a predetermined range of the emission current in the characteristic, calculating a second gradient value by dividing a surface current of the target object by an emission current in a state where the electron beam has been adjusted, and adjusting a cathode temperature to make the second gradient value in the state where the electron beam has been adjusted be in the range of the first gradient values in the predetermined range of the emission current.

公开(公告)号：US20230290605A1

公开(公告)日：2023-09-14

申请号：US18020989

申请日：2021-06-09

Applicant: HAMAMATSU PHOTONICS K.K. ,  NuFlare Technology, Inc.

Inventor： Tomohiko HIRANO ,  Hiroyuki TAKETOMI ,  Motohiro SUYAMA ,  Wataru MATSUDAIRA ,  Akihiro KAGEYAMA ,  Kota IWASAKI ,  Taku YAMADA

IPC: H01J37/06 ,  H01J37/10

CPC classification number: H01J37/06 ,  H01J37/10 ,  H01J2237/026

Abstract: A photoelectric surface electron source includes a glass substrate configured to receive laser light incident from a substrate back surface to emit the laser light from a substrate main surface, a photoelectric surface provided on the substrate main surface and configured to receive the laser light and emit a photoelectron, a lens array disposed on the substrate back surface and including a plurality of microlenses for condensing the laser light toward the photoelectric surface, and a light shielding portion provided on the glass substrate. The light shielding portion has a back surface-side light shielding layer provided on a back surface-side light shielding surface interposed between the plurality of microlenses on the substrate back surface, and a main surface-side light shielding layer provided on a main surface-side light shielding surface.

公开(公告)号：US20220059310A1

公开(公告)日：2022-02-24

申请号：US17305607

申请日：2021-07-12

Applicant: NuFlare Technology, Inc.

Inventor： Kota IWASAKI ,  Taku YAMADA

IPC: H01J37/04 ,  H01J37/317 ,  H01J37/10 ,  H01J37/24

Abstract: A multiple electron beam writing apparatus includes an excitation light source to emit an excitation light, a multi-lens array to divide the excitation light into a plurality of lights, a photoemissive surface to receive the plurality of lights incident through its upper side, and emit multiple photoelectron beams from its back side, a blanking aperture array mechanism to provide, by deflecting each beam of the multiple photoelectron beams, an individual blanking control which individually switches each beam between ON and OFF, an electron optical system to include an electron lens, and to irradiate, using the electron lens, a target object with the multiple photoelectron beams having been controlled to be beam ON, and a control circuit to interconnect, for each shot of the multiple photoelectron beams, a timing of switching the excitation light between emission and non-emission with a timing of switching the each beam between ON and OFF.

公开(公告)号：US20210305008A1

公开(公告)日：2021-09-30

申请号：US17265079

申请日：2019-07-04

Applicant: NuFlare Technology, Inc.

Inventor： Taku YAMADA

IPC: H01J37/147 ,  H01J37/317 ,  H01J37/304

Abstract: Drift correction is performed with high accuracy while reducing the calculation amount. According to one aspect of the present invention, a charged particle beam writing apparatus includes an emitter emitting a charged particle beam, a deflector adjusting an irradiation position of the charged particle beam with respect to a substrate placed on a stage, a shot data generator generating shot data from writing data, the shot data including a shot size, a shot position, and a beam ON⋅OFF time per shot, a drift corrector referring to a plurality of pieces of the shot data for every predetermined area irradiated with the charged particle beam, or for every predetermined number of shots of the charged particle beam irradiated, calculating a drift amount of the irradiation position of the charged particle beam with which the substrate is irradiated, based on the shot size, the shot position and the beam ON⋅OFF time, and generating correction information for correcting an irradiation position displacement based on the drift amount, and a deflection controller controlling a deflection amount achieved by the deflector based on the shot data and the correction information.

公开(公告)号：US20220189734A1

公开(公告)日：2022-06-16

申请号：US17643727

申请日：2021-12-10

Applicant: NuFlare Technology, Inc.

Inventor： Taku YAMADA ,  Kota IWASAKI

IPC: H01J37/30 ,  H01J37/04

Abstract: According to one aspect of the present invention, an electron beam irradiation apparatus includes a photoelectric surface configured to receive irradiation of excitation light on a side of a front surface, and generate electron beams from a side of a back surface; a blanking aperture array mechanism provided with passage holes corresponding to the electron beams and configured to perform deflection control on each of the plurality of electron beams passing through the passage holes; and an adjustment mechanism configured to adjust at least one of an orbit of transmitted light that passes through at least one of arrangement objects including the photoelectric surface, the blanking aperture array mechanism, and the limit aperture substrate up to the stage and reaches the stage, among an irradiated excitation light, and an orbit of the electron beams, wherein the arrangement objects shield at least a part of the transmitted light.