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公开(公告)号：US20090070946A1
公开(公告)日：2009-03-19
申请号：US12211549
申请日：2008-09-16
申请人： Osamu Tamada , Masakazu Sanada , Tadashi Miyagi , Shuichi Yasuda
发明人： Osamu Tamada , Masakazu Sanada , Tadashi Miyagi , Shuichi Yasuda
CPC分类号： B08B3/02 , B08B2203/0288 , H01L21/67051
摘要： A cleaning processing part including an edge cleaning processing unit for cleaning an edge of a substrate is provided in an indexer block. An indexer robot provided in the indexer block transports an unprocessed substrate taken out of a cassette to the cleaning processing part before transporting the unprocessed substrate to an anti-reflection film processing block serving as a processor. The cleaning processing part cleans an edge and a back surface of a substrate.
摘要翻译： 在分度块中设置有包括用于清洁基板的边缘的边缘清洁处理单元的清洁处理部。 设置在分度器块中的分度器机器人将将未处理的基板输送到用作处理器的防反射膜处理块之前，将从盒中取出的未处理基板输送到清洁处理部。 清洁处理部件清洁基板的边缘和背面。
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公开(公告)号：US20090269936A1
公开(公告)日：2009-10-29
申请号：US12242296
申请日：2008-09-30
申请人： Osamu Tamada , Masakazu Sanada , Tadashi Miyagi
发明人： Osamu Tamada , Masakazu Sanada , Tadashi Miyagi
IPC分类号： H01L21/302 , B05B12/04
CPC分类号： H01L21/6715 , G03F7/16
摘要： A thermal processing unit of a thermal processor for anti-reflection films includes: a covering nozzle for covering a substrate from above supported by a thermal processing plate and discharging an adhesion enhancing agent to a periphery of a substrate supported by the thermal processing plate; and a vaporization processor for supplying an adhesion enhancing agent in the vapor phase to the covering nozzle. While a substrate placed over the thermal processing plate is being subjected to thermal process, a control part causes the covering nozzle to discharge an adhesion enhancing agent in the vapor phase onto a periphery of a substrate to realize adhesion enhancement process. Thus, the adhesion between a resist coating film and a substrate surface in the periphery of a substrate is enhanced. Further, parallel implementation of thermal process and adhesion enhancement process exerts no influence on throughput.
摘要翻译： 用于防反射膜的热处理器的热处理单元包括：覆盖喷嘴，用于从由热处理板支撑的上方覆盖基板，并将粘附增强剂排放到由热处理板支撑的基板的周边; 以及用于将气相中的粘附增强剂供给到覆盖喷嘴的蒸发处理器。 当放置在热处理板上的基板经受热处理时，控制部分使得覆盖喷嘴将气相中的粘附增强剂排出到基板的周边上，以实现粘附增强过程。 因此，增强了抗蚀剂涂膜与基板周边的基板表面之间的粘合性。 此外，热处理和附着增强过程的并行实施对生产量没有影响。
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公开(公告)号：US08286576B2
公开(公告)日：2012-10-16
申请号：US12242296
申请日：2008-09-30
申请人： Osamu Tamada , Masakazu Sanada , Tadashi Miyagi
发明人： Osamu Tamada , Masakazu Sanada , Tadashi Miyagi
CPC分类号： H01L21/6715 , G03F7/16
摘要： A thermal processing unit of a thermal processor for anti-reflection films includes: a covering nozzle for covering a substrate from above supported by a thermal processing plate and discharging an adhesion enhancing agent to a periphery of a substrate supported by the thermal processing plate; and a vaporization processor for supplying an adhesion enhancing agent in the vapor phase to the covering nozzle. While a substrate placed over the thermal processing plate is being subjected to thermal process, a control part causes the covering nozzle to discharge an adhesion enhancing agent in the vapor phase onto a periphery of a substrate to realize adhesion enhancement process. Thus, the adhesion between a resist coating film and a substrate surface in the periphery of a substrate is enhanced. Further, parallel implementation of thermal process and adhesion enhancement process exerts no influence on throughput.
摘要翻译： 用于防反射膜的热处理器的热处理单元包括：覆盖喷嘴，用于从由热处理板支撑的上方覆盖基板，并将粘附增强剂排放到由热处理板支撑的基板的周边; 以及用于将气相中的粘附增强剂供给到覆盖喷嘴的蒸发处理器。 当放置在热处理板上的基板经受热处理时，控制部分使得覆盖喷嘴将气相中的粘附增强剂排出到基板的周边上，以实现粘附增强过程。 因此，增强了抗蚀剂涂膜与基板周边的基板表面之间的粘合性。 此外，热处理和附着增强过程的并行实施对生产量没有影响。
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公开(公告)号：US20080053487A1
公开(公告)日：2008-03-06
申请号：US11846890
申请日：2007-08-29
IPC分类号： B08B1/02
CPC分类号： B08B3/024 , F26B5/08 , H01L21/02057 , H01L21/67028 , H01L21/67034 , H01L21/67051
摘要： A method capable of eliminating occurrence of a development failure when a DI water discharge nozzle 20 is scanned to dry a substrate by spinning is provided. A substrate W is held in a horizontal posture by a spin chuck 10 and rotated about a vertical axis by a rotation motor 14, and when an outlet of the nozzle 20 is scanned from a position opposed to a center of the substrate W to a position opposed to a circumferential edge while a cleaning solution being discharged, immediately after the nozzle 20 has started to move, only one dried core is produced in the vicinity of the center of the substrate W, and thus production of not less than two dried cores in the vicinity of the center of the substrate W is prevented. The dried region is spread all over the surface of the substrate W.
摘要翻译： 提供了当去除去离子水喷嘴20被扫描以通过纺丝干燥基板时能够消除显影破坏的发生的方法。 基板W由旋转卡盘10保持在水平姿态，并通过旋转马达14绕垂直轴旋转，并且当喷嘴20的出口从与基板W的中心相对的位置扫描到位置 在喷嘴20开始移动之后立即排出清洗液时，与圆周边缘相对，在基板W的中心附近仅产生一个干燥的芯，从而在基板W的中心生成不少于2个的干燥芯 防止了基板W的中心附近。 干燥的区域遍布衬底W的整个表面。
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公开(公告)号：US09059221B2
公开(公告)日：2015-06-16
申请号：US11846890
申请日：2007-08-29
CPC分类号： B08B3/024 , F26B5/08 , H01L21/02057 , H01L21/67028 , H01L21/67034 , H01L21/67051
摘要： A method capable of eliminating occurrence of a development failure when a DI water discharge nozzle 20 is scanned to dry a substrate by spinning is provided. A substrate W is held in a horizontal posture by a spin chuck 10 and rotated about a vertical axis by a rotation motor 14, and when an outlet of the nozzle 20 is scanned from a position opposed to a center of the substrate W to a position opposed to a circumferential edge while a cleaning solution being discharged, immediately after the nozzle 20 has started to move, only one dried core is produced in the vicinity of the center of the substrate W, and thus production of not less than two dried cores in the vicinity of the center of the substrate W is prevented. The dried region is spread all over the surface of the substrate W.
摘要翻译： 提供了当去除去离子水喷嘴20被扫描以通过纺丝干燥基板时能够消除显影破坏的发生的方法。 基板W由旋转卡盘10保持在水平姿态，并通过旋转马达14绕垂直轴旋转，并且当喷嘴20的出口从与基板W的中心相对的位置扫描到位置 在喷嘴20开始移动之后立即排出清洗液时，与圆周边缘相对，在基板W的中心附近仅产生一个干燥的芯，从而在基板W的中心生成不少于2个的干燥芯 防止了基板W的中心附近。 干燥的区域遍布衬底W的整个表面。
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公开(公告)号：US10134610B2
公开(公告)日：2018-11-20
申请号：US12208992
申请日：2008-09-11
摘要： After a development liquid on a substrate is washed away with a rinse liquid, the rotational speed of the substrate is reduced, so that a liquid layer of the rinse liquid is formed over a top surface of the substrate. Thereafter, the rotational speed of the substrate is increased. The increase in the rotational speed of the substrate causes a centrifugal force to be slightly greater than tension, thereby causing the liquid layer to be held on the substrate with the thickness thereof in its peripheral portion increased and the thickness thereof at the center thereof decreased. Then, gas is discharged toward the center of the liquid layer from a gas supply nozzle, so that a hole is formed at the center of the liquid layer. This causes tension that is balanced with a centrifugal force exerted on the peripheral portion of the liquid layer to disappear. Furthermore, the rotational speed of the substrate is further increased while the gas is discharged. Thus, the liquid layer moves outward from the substrate.
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公开(公告)号：US08894775B2
公开(公告)日：2014-11-25
申请号：US12209039
申请日：2008-09-11
CPC分类号： H01L21/67051
摘要： After a substrate is cleaned, a liquid layer of a rinse liquid is formed so as to cover one surface of the substrate. Then, a liquid supply nozzle moves outward from above the center of the substrate. The liquid supply nozzle is stopped once at the time point where it moves by a predetermined distance from above the center of the substrate. In this time period, the liquid layer is divided within a thin layer region by a centrifugal force, so that a drying core is formed at the center of the liquid layer. Thereafter, the liquid supply nozzle moves outward again, so that a drying region where no rinse liquid exists expands on the substrate with the drying core as its starting point.
摘要翻译： 在清洁基板之后，形成冲洗液体的液体层以覆盖基板的一个表面。 然后，液体供给喷嘴从基板的中心的上方向外侧移动。 液体供给喷嘴在从基板的中心上方移动预定距离的时间点停止一次。 在该时间段内，通过离心力将液体层分割成薄层区域，从而在液体层的中央形成干燥芯。 此后，液体供给喷嘴再次向外移动，使得在干燥芯作为起点的基板上不存在冲洗液体的干燥区域膨胀。
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8.发明授权Substrate processing apparatus with multi-speed drying having rinse liquid supplier that moves from center of rotated substrate to its periphery and stops temporarily so that a drying core can form 有权具有多速干燥的基板处理装置，具有从旋转基板的中心向其周边移动的冲洗液供给体，暂时停止，从而干燥芯可以形成公开(公告)号：US08218124B2
公开(公告)日：2012-07-10
申请号：US12208925
申请日：2008-09-11
IPC分类号： G03B27/52
CPC分类号： H01L21/67034 , H01L21/67051 , H01L21/67225
摘要： After a substrate is cleaned, a liquid supply nozzle moves outward from above the center of the substrate while discharging a rinse liquid with the substrate rotated. In this case, a drying region where no rinse liquid exists expands on the substrate. When the liquid supply nozzle moves to above a peripheral portion of the substrate, the rotational speed of the substrate is reduced. The movement speed of the liquid supply nozzle is maintained as it is. Thereafter, the discharge of the rinse liquid is stopped while the liquid supply nozzle moves outward from the substrate. Thus, the drying region spreads over the whole substrate so that the substrate is dried.
摘要翻译： 在清洁基板之后，液体供应喷嘴从衬底的中心向外移动，同时在衬底旋转的同时排出冲洗液体。 在这种情况下，不存在冲洗液的干燥区域在基板上膨胀。 当液体供给喷嘴移动到基板的周边部分上方时，基板的旋转速度降低。 液体供应喷嘴的运动速度保持原样。 此后，在液体供给喷嘴从基板向外移动的同时停止冲洗液的排出。 因此，干燥区域遍及整个基板，使得基板被干燥。
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公开(公告)号：US20090074402A1
公开(公告)日：2009-03-19
申请号：US12209039
申请日：2008-09-11
IPC分类号： G03D5/00
CPC分类号： H01L21/67051
摘要： After a substrate is cleaned, a liquid layer of a rinse liquid is formed so as to cover one surface of the substrate. Then, a liquid supply nozzle moves outward from above the center of the substrate. The liquid supply nozzle is stopped once at the time point where it moves by a predetermined distance from above the center of the substrate. In this time period, the liquid layer is divided within a thin layer region by a centrifugal force, so that a drying core is formed at the center of the liquid layer. Thereafter, the liquid supply nozzle moves outward again, so that a drying region where no rinse liquid exists expands on the substrate with the drying core as its starting point.
摘要翻译： 在清洁基板之后，形成冲洗液体的液体层以覆盖基板的一个表面。 然后，液体供给喷嘴从基板的中心的上方向外侧移动。 液体供给喷嘴在从基板的中心上方移动预定距离的时间点停止一次。 在该时间段内，通过离心力将液体层分割成薄层区域，从而在液体层的中央形成干燥芯。 此后，液体供给喷嘴再次向外移动，使得在干燥芯作为起点的基板上不存在冲洗液体的干燥区域膨胀。
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公开(公告)号：US20090073394A1
公开(公告)日：2009-03-19
申请号：US12208925
申请日：2008-09-11
CPC分类号： H01L21/67034 , H01L21/67051 , H01L21/67225
摘要： After a substrate is cleaned, a liquid supply nozzle moves outward from above the center of the substrate while discharging a rinse liquid with the substrate rotated. In this case, a drying region where no rinse liquid exists expands on the substrate. When the liquid supply nozzle moves to above a peripheral portion of the substrate, the rotational speed of the substrate is reduced. The movement speed of the liquid supply nozzle is maintained as it is. Thereafter, the discharge of the rinse liquid is stopped while the liquid supply nozzle moves outward from the substrate. Thus, the drying region spreads over the whole substrate so that the substrate is dried.
摘要翻译： 在清洁基板之后，液体供应喷嘴从衬底的中心向外移动，同时在衬底旋转的同时排出冲洗液体。 在这种情况下，不存在冲洗液的干燥区域在基板上膨胀。 当液体供给喷嘴移动到基板的周边部分上方时，基板的旋转速度降低。 液体供应喷嘴的运动速度保持原样。 此后，在液体供给喷嘴从基板向外移动的同时停止冲洗液的排出。 因此，干燥区域遍及整个基板，使得基板被干燥。
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