公开(公告)号：US20150152548A1

公开(公告)日：2015-06-04

申请号：US14617517

申请日：2015-02-09

Applicant: Poole Ventura, Inc.

Inventor： Mark R. Erickson ,  Aaron L. Dingus ,  Arthur W. Custer, III ,  Henry J. Poole ,  Nader Jamshidi

IPC: C23C16/44 ,  C23C16/52

CPC classification number: C23C16/4411 ,  C23C16/45578 ,  C23C16/463 ,  C23C16/466 ,  C23C16/52 ,  F28C3/005 ,  F28D1/0477 ,  F28D2021/0077 ,  F28F1/32 ,  G05D23/1927 ,  G05D23/193 ,  G05D23/1932 ,  G05D23/1934 ,  G05D23/22 ,  H01L21/67109

Abstract: Preferably, obtaining internal and external thermal measurement values of a sealed process chamber allows a control system to generate a control signal based on a comparison of the internal and external thermal measurement values to the predetermined value. The control signal is provided to a fluid handling system, wherein the fluid handling system modulates flow of a first fluid around the exterior of the sealed process chamber. The control signal is further provided to a closed loop heat exchange system, wherein the closed loop heat exchange system modulates flow of a second fluid within an interior cavity of the sealed process chamber based on the control signal. The control signal is still further provided to an open loop heat exchange system, wherein the open loop heat exchange system modulates flow of a third fluid within the interior of cavity of the sealed process chamber.

Abstract translation: 优选地，获得密封处理室的内部和外部热测量值允许控制系统基于内部和外部热测量值与预定值的比较来产生控制信号。 控制信号被提供给流体处理系统，其中流体处理系统调节围绕密封处理室的外部的第一流体的流动。 控制信号进一步提供给闭环热交换系统，其中闭环热交换系统基于控制信号调节密封处理室的内腔内的第二流体的流动。 控制信号还被提供给开环热交换系统，其中开环热交换系统调节密封处理室的空腔内部的第三流体的流动。

公开(公告)号：US20130192522A1

公开(公告)日：2013-08-01

申请号：US13803726

申请日：2013-03-14

Applicant: Poole Ventura, Inc.

Inventor： Mark R. Erickson ,  Henry J. Poole ,  Nader Jamshidi ,  Arthur W. Custer, III ,  Aaron L. Dingus

IPC: H01L31/18

CPC classification number: H01L31/18 ,  F28C3/005 ,  F28D1/0477 ,  F28D2021/0077 ,  F28F1/32 ,  H01L21/67017 ,  H01L21/67109 ,  H01L21/6719 ,  H01L21/67754 ,  H01L31/0322 ,  H01L31/1864 ,  Y02E10/541 ,  Y02P70/521

Abstract: Preferably, a frame supporting a containment chamber, with a sealed process chamber confined within the containment chamber, and at least one fluid inlet structure in fluidic communication with an exterior of the sealed process chamber, the fluid inlet structure including at least a flow adjustment structure to control a fluid flow from a fluid source around the exterior of the sealed process chamber; and an open loop fluid convection system in fluidic communication with an interior of the sealed process chamber, wherein the fluid convection system includes a rotary compressor assembly that extends into the sealed process chamber is disclosed.

Abstract translation: 优选地，支撑容纳室的框架具有限制在容纳室内的密封处理室，以及与密封处理室的外部流体连通的至少一个流体入口结构，所述流体入口结构至少包括流动调节结构 以控制来自密封处理室外部的流体源的流体流动; 以及与所述密封处理室的内部流体连通的开环流体对流系统，其中所述流体对流系统包括延伸到所述密封处理室中的旋转压缩机组件。

公开(公告)号：US20130153201A1

公开(公告)日：2013-06-20

申请号：US13769433

申请日：2013-02-18

Applicant: Poole Ventura, Inc.

Inventor： Mark R. Erickson ,  Henry J. Poole ,  Nader Jamshidi ,  Arthur W. Custer, III ,  Aaron L. Dingus

IPC: F28F27/00 ,  F28F1/00

CPC classification number: F28F27/00 ,  F28C3/005 ,  F28D1/0477 ,  F28D2021/0077 ,  F28F1/00 ,  F28F1/32 ,  H01L21/67109 ,  H01L21/6719

Abstract: Preferably, a frame supporting a containment chamber, which in turn confines a sealed process chamber, is provided. Further, at least one fluid inlet box in fluidic communication with an exterior of the sealed process chamber is presented, in which the fluid inlet box includes at least a flow adjustment structure to control a fluid flow from a fluid source around the exterior of the sealed process chamber; and an open loop heat exchange system in fluidic communication with an interior of the sealed process chamber is present, within at least a portion of the open loop heat exchange system resides internal to the sealed process chamber.

Abstract translation: 优选地，提供支撑容纳室的框架，其又限制密封的处理室。 此外，呈现与密封处理室的外部流体连通的至少一个流体入口箱，其中流体入口箱至少包括一个流量调节结构，以控制来自围绕密封件的外部的流体源的流体流动 处理室; 并且存在与密封处理室的内部流体连通的开环热交换系统，所述开环热交换系统的至少一部分位于密封处理室内部。

公开(公告)号：US09051638B2

公开(公告)日：2015-06-09

申请号：US13782270

申请日：2013-03-01

Applicant: Poole Ventura, Inc.

Inventor： Mark R. Erickson ,  Henry J. Poole ,  Arthur W. Custer, III ,  Ady Hershcovitch

IPC: C23C14/35 ,  C23C14/04 ,  H01J37/32

CPC classification number: C23C14/046 ,  C23C14/35 ,  C23C14/351 ,  H01J37/32669

Abstract: A sputtering apparatus that includes at least a target presented as an inner surface of a confinement structure, the inner surface of the confinement structure is preferably an internal wall of a circular tube. A cathode is disposed adjacent the internal wall of the circular tube. The cathode preferably provides a hollow core, within which a magnetron is disposed. Preferably, an actuator is attached to the magnetron, wherein a position of the magnetron within the hollow core is altered upon activation of the actuator. Additionally, a carriage supporting the cathode and communicating with the target is preferably provided, and a cable bundle interacting with the cathode and linked to a cable bundle take up mechanism provided power and coolant to the cathode, magnetron, actuator and an anode of the sputtering apparatus.

Abstract translation: 至少包括作为约束结构的内表面的靶的溅射装置，限制结构的内表面优选为圆管的内壁。 阴极靠近圆管的内壁设置。 阴极优选地提供中空芯，其中设置有磁控管。 优选地，致动器附接到磁控管，其中在激活致动器时磁控管在中空芯内的位置被改变。 此外，优选地提供支撑阴极并与靶连通的托架，并且与阴极相互作用并连接到电缆束的电缆束拾取机构向阴极，磁控管，致动器和溅射的阳极提供功率和冷却​​剂 仪器。

公开(公告)号：US20130153202A1

公开(公告)日：2013-06-20

申请号：US13770387

申请日：2013-02-19

Applicant: POOLE VENTURA, INC.

Inventor： Mark R. Erickson ,  Henry J. Poole ,  Nader Jamshidi ,  Arthur W. Custer, III ,  Aaron L. Dingus

IPC: F28F27/00 ,  F28F1/00

CPC classification number: F28F27/00 ,  F28C3/005 ,  F28D1/0477 ,  F28D2021/0077 ,  F28F1/00 ,  F28F1/32 ,  H01L21/67109 ,  H01L21/6719

Abstract: Preferably, a frame supporting a containment chamber, with a sealed process chamber confined within the containment chamber, and at least one fluid inlet vessel in fluidic communication with an exterior of the sealed process chamber, the fluid inlet vessel including at least a flow adjustment structure to control a fluid flow from a fluid source around the exterior of the sealed process chamber; and an open loop fluid convection system in fluidic communication with an interior of the sealed process chamber, wherein the fluid convection system includes a rotary compressor assembly that extends into the sealed process chamber is disclosed.

Abstract translation: 优选地，支撑容纳室的框架具有限制在容纳室内的密封处理室，以及与密封处理室的外部流体连通的至少一个流体入口容器，流体入口容器至少包括流量调节结构 以控制来自密封处理室外部的流体源的流体流动; 以及与所述密封处理室的内部流体连通的开环流体对流系统，其中所述流体对流系统包括延伸到所述密封处理室中的旋转压缩机组件。

公开(公告)号：US20140246313A1

公开(公告)日：2014-09-04

申请号：US13782270

申请日：2013-03-01

Applicant: POOLE VENTURA, INC.

Inventor： Mark R. Erickson ,  Henry J. Poole ,  Arthur W. Custer, III ,  Ady Hershcovitch

IPC: C23C14/04 ,  C23C14/35

CPC classification number: C23C14/046 ,  C23C14/35 ,  C23C14/351 ,  H01J37/32669

Abstract: A sputtering apparatus that includes at least a target presented as an inner surface of a confinement structure, the inner surface of the confinement structure is preferably an internal wall of a circular tube. A cathode is disposed adjacent the internal wall of the circular tube. The cathode preferably provides a hollow core, within which a magnetron is disposed. Preferably, an actuator is attached to the magnetron, wherein a position of the magnetron within the hollow core is altered upon activation of the actuator. Additionally, a carriage supporting the cathode and communicating with the target is preferably provided, and a cable bundle interacting with the cathode and linked to a cable bundle take up mechanism provided power and coolant to the cathode, magnetron, actuator and an anode of the sputtering apparatus.

Abstract translation: 至少包括作为约束结构的内表面的靶的溅射装置，限制结构的内表面优选为圆管的内壁。 阴极靠近圆管的内壁设置。 阴极优选地提供中空芯，其中设置有磁控管。 优选地，致动器附接到磁控管，其中在激活致动器时磁控管在中空芯内的位置被改变。 此外，优选地提供支撑阴极并与靶连通的托架，并且与阴极相互作用并连接到电缆束的电缆束拾取机构向阴极，磁控管，致动器和溅射的阳极提供功率和冷却​​剂 仪器。

公开(公告)号：US20140246311A1

公开(公告)日：2014-09-04

申请号：US13837756

申请日：2013-03-15

Applicant: POOLE VENTURA, INC.

Inventor： Mark R. Erickson ,  Henry J. Poole ,  Arthur W. Custer, III ,  Nader Jamshidi ,  Ady Hershcovitch

IPC: C23C14/35

CPC classification number: C23C14/35 ,  H01J37/32394 ,  H01J37/3405 ,  H01J37/342 ,  H01J37/3488 ,  Y10T29/49002

Abstract: A sputtering apparatus that includes at least a target presented as an inner surface of a confinement structure, the inner surface of the confinement structure is preferably an internal wall of a circular tube. A cathode is disposed adjacent the internal wall of the circular tube. The cathode preferably provides a hollow core, within which a magnetron is disposed. Preferably, an actuator is attached to the magnetron, wherein a position of the magnetron within the hollow core is altered upon activation of the actuator. Additionally, a carriage supporting the cathode and communicating with the target is preferably provided, and a cable bundle interacting with the cathode and linked to a cable bundle take up mechanism provides power and coolant to the cathode, magnetron, actuator and an anode of the sputtering apparatus.

Abstract translation: 至少包括作为约束结构的内表面的靶的溅射装置，限制结构的内表面优选为圆管的内壁。 阴极靠近圆管的内壁设置。 阴极优选地提供中空芯，其中设置有磁控管。 优选地，致动器附接到磁控管，其中在激活致动器时磁控管在中空芯内的位置被改变。 此外，优选地提供支撑阴极并与靶连通的托架，并且与阴极相互作用并连接到电缆束拾取机构的电缆束向阴极，磁控管，致动器和溅射阳极提供电力和冷却剂 仪器。