NITRIDE-BASED SEMICONDUCTOR LIGHT-EMITTING DEVICE AND METHOD FOR FABRICATING THE SAME
    2.
    发明申请
    NITRIDE-BASED SEMICONDUCTOR LIGHT-EMITTING DEVICE AND METHOD FOR FABRICATING THE SAME 审中-公开
    基于氮化物的半导体发光器件及其制造方法

    公开(公告)号:US20150318445A1

    公开(公告)日:2015-11-05

    申请号:US14800852

    申请日:2015-07-16

    Abstract: A nitride-based semiconductor light-emitting device includes: a nitride-based semiconductor multilayer structure including a p-type semiconductor region having an m-plane as a growing plane; and an Ag electrode provided so as to be in contact with the growing plane of the p-type semiconductor region, wherein the Ag electrode has a thickness in a range of not less than 200 nm and not more than 1,000 nm; an integral intensity ratio of an X-ray intensity of a (111) plane on the growing plane of the Ag electrode to that of a (200) plane is in a range of not less than 20 and not more than 100; and the Ag electrode has a reflectance of not less than 70%.

    Abstract translation: 氮化物系半导体发光元件包括:氮化物系半导体多层结构,其包含具有m面作为生长面的p型半导体区域; 以及设置成与p型半导体区域的生长平面接触的Ag电极,其中Ag电极的厚度在不小于200nm且不大于1000nm的范围内; Ag电极的生长面上的(111)面的X射线强度与(200)面的X射线强度的积分强度比在20以上且100以下的范围内, 并且Ag电极具有不小于70%的反射率。

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