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公开(公告)号：US08574953B2
公开(公告)日：2013-11-05
申请号：US13362862
申请日：2012-01-31
IPC分类号： H01L51/40
CPC分类号： H01L51/0003 , H01L51/0002 , H01L51/0025 , H01L51/0077 , H01L51/0512 , Y10T428/1471
摘要： The present invention provides a process for preparing a melt-processed organic-inorganic hybrid material including the steps of maintaining a solid organic-inorganic hybrid material at a temperature above the melting point but below the decomposition temperature of the organic-inorganic hybrid material for a period of time sufficient to form a uniform melt and thereafter, cooling the uniform melt to an ambient temperature under conditions sufficient to produce the melt-processed organic-inorganic hybrid material.
摘要翻译： 本发明提供一种制备熔融加工的有机 - 无机混合材料的方法，包括以下步骤：将固体有机 - 无机混合材料保持在高于熔点但低于有机 - 无机混合材料的分解温度的温度 足以形成均匀熔体的时间段，然后在足以产生熔融加工的有机 - 无机混合材料的条件下将均匀的熔体冷却至环境温度。
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公开(公告)号：US20120126216A1
公开(公告)日：2012-05-24
申请号：US13362862
申请日：2012-01-31
CPC分类号： H01L51/0003 , H01L51/0002 , H01L51/0025 , H01L51/0077 , H01L51/0512 , Y10T428/1471
摘要： The present invention provides a process for preparing a melt-processed organic-inorganic hybrid material including the steps of maintaining a solid organic-inorganic hybrid material at a temperature above the melting point but below the decomposition temperature of the organic-inorganic hybrid material for a period of time sufficient to form a uniform melt and thereafter, cooling the uniform melt to an ambient temperature under conditions sufficient to produce the melt-processed organic-inorganic hybrid material.
摘要翻译： 本发明提供一种制备熔融加工的有机 - 无机混合材料的方法，包括以下步骤：将固体有机 - 无机混合材料保持在高于熔点但低于有机 - 无机混合材料的分解温度的温度 足以形成均匀熔体的时间段，然后在足以产生熔融加工的有机 - 无机混合材料的条件下将均匀的熔体冷却至环境温度。
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公开(公告)号：US20080292825A1
公开(公告)日：2008-11-27
申请号：US12167817
申请日：2008-07-03
CPC分类号： H01L51/0003 , H01L51/0002 , H01L51/0025 , H01L51/0077 , H01L51/0512 , Y10T428/1471
摘要： The present invention provides a process for preparing a melt-processed organic-inorganic hybrid material including the steps of maintaining a solid organic-inorganic hybrid material at a temperature above the melting point but below the decomposition temperature of the organic-inorganic hybrid material for a period of time sufficient to form a uniform melt and thereafter, cooling the uniform melt to an ambient temperature under conditions sufficient to produce the melt-processed organic-inorganic hybrid material.
摘要翻译： 本发明提供一种制备熔融加工的有机 - 无机混合材料的方法，包括以下步骤：将固体有机 - 无机混合材料保持在高于熔点但低于有机 - 无机混合材料的分解温度的温度 足以形成均匀熔体的时间段，然后在足以产生熔融加工的有机 - 无机混合材料的条件下将均匀的熔体冷却至环境温度。
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公开(公告)号：US07456045B2
公开(公告)日：2008-11-25
申请号：US11496542
申请日：2006-08-01
CPC分类号： H01L51/0003 , H01L51/0002 , H01L51/0025 , H01L51/0077 , H01L51/0512 , Y10T428/1471
摘要： The present invention provides a process for preparing a melt-processed organic-inorganic hybrid material including the steps of maintaining a solid organic-inorganic hybrid material at a temperature above the melting point but below the decomposition temperature of the organic-inorganic hybrid material for a period of time sufficient to form a uniform melt and thereafter, cooling the uniform melt to an ambient temperature under conditions sufficient to produce the melt-processed organic-inorganic hybrid material.
摘要翻译： 本发明提供一种制备熔融加工的有机 - 无机混合材料的方法，包括以下步骤：将固体有机 - 无机混合材料保持在高于熔点但低于有机 - 无机混合材料的分解温度的温度 足以形成均匀熔体的时间段，然后在足以产生熔融加工的有机 - 无机混合材料的条件下将均匀的熔体冷却至环境温度。
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公开(公告)号：US07291516B2
公开(公告)日：2007-11-06
申请号：US11446358
申请日：2006-06-05
CPC分类号： H01L51/0003 , H01L51/0002 , H01L51/0025 , H01L51/0077 , H01L51/0512 , Y10T428/1471
摘要： The present invention provides a process for preparing a melt-processed organic-inorganic hybrid material including the steps of maintaining a solid organic-inorganic hybrid material at a temperature above the melting point but below the decomposition temperature of the organic-inorganic hybrid material for a period of time sufficient to form a uniform melt and thereafter, cooling the uniform melt to an ambient temperature under conditions sufficient to produce the melt-processed organic-inorganic hybrid material.
摘要翻译： 本发明提供一种制备熔融加工的有机 - 无机混合材料的方法，包括以下步骤：将固体有机 - 无机混合材料保持在高于熔点但低于有机 - 无机混合材料的分解温度的温度 足以形成均匀熔体的时间段，然后在足以产生熔融加工的有机 - 无机混合材料的条件下将均匀的熔体冷却至环境温度。
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公开(公告)号：US07875408B2
公开(公告)日：2011-01-25
申请号：US11698182
申请日：2007-01-25
申请人： John A. Hoffnagle , David R. Medeiros , Robert D. Miller , Libor Vycklicky , Gregory M. Wallraff
发明人： John A. Hoffnagle , David R. Medeiros , Robert D. Miller , Libor Vycklicky , Gregory M. Wallraff
CPC分类号： G03F7/091 , G03F7/0382 , G03F7/0392 , Y10S430/106 , Y10S430/146
摘要： Compositions comprising photobleachable organic materials can be bleached by 193 nm light, and brought back to their original state by stimuli after exposure. (reversible photobleaching). We use these compositions in art-known contrast enhancement layers and as a part of a photoresist, especially in optical lithography processes for semiconductor fabrication. They may comprise polymers such as organo-silicon polymers, polymers comprising polymers of aromatic hydroxyl compounds such as phenol and naphthol such as phenol formaldehyde polymers and naphthol formaldehyde polymers styrene polymers and phenolic acrylate polymers or cyclic materials comprising: where the radicals “R” and “Y” represent organo, or substituted organo moieties, Structures I, II, and III represent basic organic skeletons and can be unsubstituted or substituted in any available position with any one or combinations of multiple substituents.
摘要翻译： 包含可光漂白有机材料的组合物可以用193nm的光漂白，并且在曝光后通过刺激使其恢复到其初始状态。 （可逆光漂白）。 我们将这些组合物用于本领域已知的对比增强层和作为光致抗蚀剂的一部分，特别是在用于半导体制造的光刻工艺中。 它们可以包括聚合物，例如有机硅聚合物，包含芳族羟基化合物如苯酚和萘酚的聚合物的聚合物，例如苯酚甲醛聚合物和萘酚甲醛聚合物苯乙烯聚合物和酚醛丙烯酸酯聚合物或环状材料，其包括：其中基团“R”和 “Y”表示有机或取代的有机部分，结构I，II和III表示碱性有机骨架，并且可以在任何可用位置被未取代或被任何一个或多个取代基的组合取代。
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公开(公告)号：US07563558B2
公开(公告)日：2009-07-21
申请号：US11924005
申请日：2007-10-25
申请人： Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard A. DiPietro , David R. Medeiros , Ratnam Sooriyakumaran
发明人： Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard A. DiPietro , David R. Medeiros , Ratnam Sooriyakumaran
IPC分类号： G03F7/00 , G03F7/004 , C08F214/18
CPC分类号： G03F7/0046 , C08F220/24 , C08F222/06 , C08F232/08 , G03F7/0382 , G03F7/0392 , G03F7/0395
摘要： The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.
摘要翻译： 本发明提供了可用于负性抗蚀剂组合物的聚合物。 本发明的聚合物包含（1）具有极性官能团的第一单体; （2）第二单体; 和（3）赋予选自可交联官能团，耐蚀刻性和溶解度调制中的至少一种特性的第三单体。 第一单体在消除极性官能团时提供酸催化的极性开关，而第二单体提供水溶解。 本发明的聚合物可以并入负性抗蚀剂组合物，其还可以包括光酸产生剂，交联剂，碱性化合物，溶剂，溶解促进剂，光碱产生剂，潜碱性化合物，表面活性剂，粘合促进剂和消泡剂。
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8.发明授权公开(公告)号：US07300739B2
公开(公告)日：2007-11-27
申请号：US10449181
申请日：2003-05-29
申请人： Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard A. DiPietro , David R. Medeiros , Ratnam Sooriyakumaran
发明人： Robert David Allen , Gregory Breyta , Phillip Joe Brock , Richard A. DiPietro , David R. Medeiros , Ratnam Sooriyakumaran
CPC分类号： G03F7/0046 , C08F220/24 , C08F222/06 , C08F232/08 , G03F7/0382 , G03F7/0392 , G03F7/0395
摘要： The present invention provides polymers that are useful in negative resist compositions. Polymers of the present invention comprise (1) a first monomer having a polar functional group; (2) a second monomer; and optionally, (3) a third monomer that imparts at least one characteristic selected from crosslinkable functionality, etch resistance, and solubility modulation. The first monomer provides an acid catalyzed polarity switch upon elimination of the polar functional group, whereas, the second monomer provides aqueous dissolution. The polymers of the present invention may be incorporated into negative resist compositions, which may also include photoacid generators, crosslinking agents, basic compounds, solvents, dissolution accelerators, photobase generators, latent basic compounds, surfactants, adhesion promoters, and anti-foaming agents.
摘要翻译： 本发明提供了可用于负性抗蚀剂组合物的聚合物。 本发明的聚合物包含（1）具有极性官能团的第一单体; （2）第二单体; 和（3）赋予选自可交联官能团，耐蚀刻性和溶解度调制中的至少一种特性的第三单体。 第一单体在消除极性官能团时提供酸催化的极性开关，而第二单体提供水溶解。 本发明的聚合物可以并入负性抗蚀剂组合物中，其还可以包括光酸产生剂，交联剂，碱性化合物，溶剂，溶解促进剂，光碱产生剂，潜碱性化合物，表面活性剂，粘合促进剂和消泡剂。
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9.发明授权Synthesis and application of photosensitive pentacene precursor in organic thin film transistors 有权感光并五苯前驱体在有机薄膜晶体管中的合成与应用公开(公告)号：US07053401B2
公开(公告)日：2006-05-30
申请号：US10323899
申请日：2002-12-20
IPC分类号： H01L35/24
CPC分类号： H01L51/0055 , H01L51/0003 , H01L51/0015 , H01L51/0016
摘要： Soluble, photosensitive precursors of pentacene are synthesized by a one-step Diels-Alder reaction of pentacene with N-sulfinylamides. These precursors may include a photopolymerizable group, which renders the pentacene precursor as a negative tone resist. The pentacene precursor may also include an acid-sensitive protecting group, which in the presence of a photoacid generator and upon exposure to UV light, is removed and the product becomes base soluble. Patterned pentacene thin films may be obtained by exposure to UV light through a mask and/or heating, and used as an active channel material for an organic field effect transistor.
摘要翻译： 并五苯的可溶性光敏前体通过并五苯与N-亚磺酰胺的一步Diels-Alder反应合成。 这些前体可以包括可光聚合基团，其使并五苯前体作为负性抗拒剂。 并五苯前体还可以包含酸敏感的保护基团，其在光酸产生剂存在下和暴露于UV光下被除去并且产物变得可溶于碱。 图案化的并五苯薄膜可以通过掩模和/或加热曝光于UV光下获得，并用作有机场效应晶体管的有源沟道材料。
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公开(公告)号：US06730454B2
公开(公告)日：2004-05-04
申请号：US10124087
申请日：2002-04-16
申请人： Dirk Pfeiffer , Marie Angelopoulos , Katherina Babich , Phillip Brock , Wu-Song Huang , Arpan P. Mahorowala , David R. Medeiros , Ratnam Sooriyakumaran
发明人： Dirk Pfeiffer , Marie Angelopoulos , Katherina Babich , Phillip Brock , Wu-Song Huang , Arpan P. Mahorowala , David R. Medeiros , Ratnam Sooriyakumaran
IPC分类号： G03F700
CPC分类号： H01L21/0276 , G03F7/0045 , G03F7/0757 , G03F7/091 , Y10S430/151
摘要： Antireflective compositions characterized by the presence of an SiO-containing polymer having chromophore moieties and transparent moieties are useful antireflective hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions of the invention are advantageously useful with shorter wavelength lithographic processes and/or have minimal residual acid content.
摘要翻译： 存在具有发色团部分和透明部分的含SiO聚合物的抗反射组合物是光刻工艺中有用的抗反射硬掩模组合物。 这些组合物提供突出的光学，机械和蚀刻选择性，同时适用于使用旋涂应用技术。 本发明的组合物有利地用于较短波长的光刻工艺和/或具有最小的残留酸含量。
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