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    Electron beam column using high numerical aperture photocathode source illumination
    1.
    发明授权
    Electron beam column using high numerical aperture photocathode source illumination 失效
    电子束柱采用高数值孔径光电阴极源照明

    公开(公告)号：US06448568B1

    公开(公告)日：2002-09-10

    申请号：US09365604

    申请日：1999-07-30

    申请人： Paul C. Allen ,  Xiaolan Chen ,  Douglas E. Holmgren ,  Samuel C. Howells

    发明人： Paul C. Allen ,  Xiaolan Chen ,  Douglas E. Holmgren ,  Samuel C. Howells

    IPC分类号： H01J4006

    CPC分类号： B82Y10/00 ,  G03F7/70325 ,  G03F7/70375 ,  G03F7/70808 ,  H01J37/073 ,  H01J2237/3175

    摘要： A lithography apparatus including both a laser beam source and an electron beam column, where the electron beam column has a support(in one embodiment a window in the column housing) having an index of refraction n. The support, having a photocathode source material disposed on its remote surface, is located in some embodiments such that the internal angle of the incident laser beam is &thgr; with respect to a line perpendicular to the remote surface. The numerical aperture of the substrate(equal to nsin &thgr;) is greater than one in one embodiment, resulting in a high resolution spot size diameter incident on the photocathode source material at the remote surface. Incident energy from the laser beam thereby emits a corresponding high resolution electron beam from the photocathode source material. Electromagnetic lens components are disposed downstream in the electron beam column to demagnify the electron beam. This apparatus allows the continuously decreasing minimum feature dimension sizes for semiconductor electron beam lithography.

    摘要翻译： 包括激光束源和电子束列的光刻设备，其中电子束柱具有折射率n的支撑（在一个实施例中为柱壳体中的窗口）。 具有设置在其远程表面上的光电阴极源材料的支撑件位于一些实施例中，使得入射激光束的内角相对于垂直于远程表面的线是θ。 在一个实施例中，衬底的数值孔径（等于nsinθ）大于一个，导致入射到远端表面的光电阴极源材料上的高分辨率光斑尺寸直径。 因此来自激光束的入射能量由此从光电阴极源材料发射出相应的高分辨率电子束。 电磁透镜部件设置在电子束列的下游，以使电子束缩小。 该装置允许连续减小用于半导体电子束光刻的最小特征尺寸尺寸。

    Reflective diffraction of radiation beams for image registration
    7.
    发明授权
    Reflective diffraction of radiation beams for image registration 有权
    用于图像配准的辐射束的反射衍射

    公开(公告)号：US06751000B2

    公开(公告)日：2004-06-15

    申请号：US10313408

    申请日：2002-12-05

    申请人： Paul C. Allen ,  Samuel C. Howells

    发明人： Paul C. Allen ,  Samuel C. Howells

    IPC分类号： G02B2600

    CPC分类号： G03F7/70383 ,  G03F7/70291

    摘要： In a method of registering an image on a substrate, the substrate is placed on a substrate support and a radiation beam is directed toward the substrate. The radiation beam is reflectively diffracted to modulate the intensity of the radiation beam. The modulated radiation beam is scanned across the substrate to register an image on the substrate. In one version, the radiation beam is a laser beam which is projected onto a mask blank to form a mask.

    摘要翻译： 在将图像配置在基板上的方法中，将基板放置在基板支撑件上，并且将辐射束指向基板。 辐射束被反射衍射以调制辐射束的强度。 调制的辐射束被扫描穿过衬底以在衬底上注册图像。 在一个版本中，辐射束是投射到掩模坯料上以形成掩模的激光束。

    Image registration apparatus having an adjustable reflective diffraction grating and method
    8.
    发明授权
    Image registration apparatus having an adjustable reflective diffraction grating and method 有权
    具有可调节反射衍射光栅和方法的图像配准装置

    公开(公告)号：US06532097B1

    公开(公告)日：2003-03-11

    申请号：US09976978

    申请日：2001-10-11

    申请人： Paul C. Allen ,  Samuel C. Howells

    发明人： Paul C. Allen ,  Samuel C. Howells

    IPC分类号： G02F100

    CPC分类号： G03F7/70383 ,  G03F7/70291

    摘要： An image registration apparatus has a substrate support capable of supporting a substrate, the substrate support having a support motor capable of moving the substrate support. A radiation beam source is provided that is capable of providing a radiation beam. A beam intensity modulator is also provided that has an adjustable reflective diffraction grating capable of reflectively diffracting the radiation beam to modulate the intensity of the radiation beam. A controller is also provided that is adapted to control the substrate support, radiation beam source, and beam intensity modulator to modulate and scan the radiation beam across the substrate to register an image on the substrate.

    摘要翻译： 图像配准装置具有能够支撑衬底的衬底支撑件，衬底支撑件具有能够移动衬底支撑件的支撑电动机。 提供能够提供辐射束的辐射束源。 还提供了一种具有能够反射衍射辐射束以调制辐射束的强度的可调节的反射衍射光栅的光束强度调制器。 还提供了一种控制器，其适于控制衬底支撑件，辐射束源和光束强度调制器以调制和扫描穿过衬底的辐射束，以在衬底上注册图像。