公开(公告)号：US20130139118A1

公开(公告)日：2013-05-30

申请号：US13736929

申请日：2013-01-08

申请人： Peng LIU ,  Yu CAO ,  Luoqi CHEN ,  Jun YE

发明人： Peng LIU ,  Yu CAO ,  Luoqi CHEN ,  Jun YE

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G03F1/144 ,  G03F1/36 ,  G03F7/705 ,  G06F17/5009

摘要： A three-dimensional mask model of the invention provides a more realistic approximation of the three-dimensional effects of a photolithography mask with sub-wavelength features than a thin-mask model. In one embodiment, the three-dimensional mask model includes a set of filtering kernels in the spatial domain that are configured to be convolved with thin-mask transmission functions to produce a near-field image. In another embodiment, the three-dimensional mask model includes a set of correction factors in the frequency domain that are configured to be multiplied by the Fourier transform of thin-mask transmission functions to produce a near-field image.

公开(公告)号：US20140068530A1

公开(公告)日：2014-03-06

申请号：US14075917

申请日：2013-11-08

申请人： Luoqi CHEN ,  Jun YE ,  Yu CAO

发明人： Luoqi CHEN ,  Jun YE ,  Yu CAO

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G03F1/144 ,  G03F1/36 ,  G03F7/70083 ,  G03F7/70125 ,  G03F7/70441 ,  G03F7/705 ,  G06F17/5068

摘要： The present invention relates to lithographic apparatuses and processes, and more particularly to tools for optimizing illumination sources and masks for use in lithographic apparatuses and processes. According to certain aspects, the present invention significantly speeds up the convergence of the optimization by allowing direct computation of gradient of the cost function. According to other aspects, the present invention allows for simultaneous optimization of both source and mask, thereby significantly speeding the overall convergence. According to still further aspects, the present invention allows for free-form optimization, without the constraints required by conventional optimization techniques.

摘要翻译： 本发明涉及光刻设备和工艺，更具体地涉及用于优化用于光刻设备和工艺的照明源和掩模的工具。 根据某些方面，本发明通过允许直接计算成本函数的梯度来显着加快优化的收敛。 根据其他方面，本发明允许同时优化源和掩模，从而显着加速整体收敛。 根据另外的方面，本发明允许自由形式优化，而不需要常规优化技术所要求的限制。

公开(公告)号：US20130041750A1

公开(公告)日：2013-02-14

申请号：US13209256

申请日：2011-08-12

申请人： Jun YE ,  Yu Cao ,  Luoqi Chen ,  Ya Luo ,  Wei Zhuang ,  Hanying Feng

发明人： Jun YE ,  Yu Cao ,  Luoqi Chen ,  Ya Luo ,  Wei Zhuang ,  Hanying Feng

IPC分类号： G06Q30/00

CPC分类号： G06Q30/02

摘要： The various embodiments described in the present disclosure, in at least one aspect, relate to computer-implemented methods of online advertisement. In one embodiment, a method includes determining an attention score for each of a plurality of ad creatives corresponding to a common ad content based on at least a correlation between each ad creative and a user's subconscious interest. The method further includes selecting an ad creative among the plurality of ad creatives based at least in part on the attention scores, and presenting the ad content with the selected ad creative as an ad impression to the user.

摘要翻译： 在至少一个方面，在本公开中描述的各种实施例涉及计算机实现的在线广告的方法。 在一个实施例中，一种方法包括至少基于每个广告创意和用户的潜意识兴趣之间的相关性来确定对应于普通广告内容的多个广告素材中的每一个的注意分数。 所述方法还包括至少部分地基于所述注意分数来选择所述多个广告创意中的广告创意，以及向所述用户呈现作为广告展示的所选广告素材的广告内容。

公开(公告)号：US20100229147A1

公开(公告)日：2010-09-09

申请号：US12782666

申请日：2010-05-18

申请人： Jun YE ,  Yu Cao ,  Luoqi Chen ,  Hua-Yu Liu

发明人： Jun YE ,  Yu Cao ,  Luoqi Chen ,  Hua-Yu Liu

IPC分类号： G06F17/50

CPC分类号： G03F7/70641 ,  G03F7/705 ,  G03F7/70516 ,  G03F7/70625

摘要： A system and a method for creating a focus-exposure model of a lithography process are disclosed. The system and the method utilize calibration data along multiple dimensions of parameter variations, in particular within an exposure-defocus process window space. The system and the method provide a unified set of model parameter values that result in better accuracy and robustness of simulations at nominal process conditions, as well as the ability to predict lithographic performance at any point continuously throughout a complete process window area without a need for recalibration at different settings. With a smaller number of measurements required than the prior-art multiple-model calibration, the focus-exposure model provides more predictive and more robust model parameter values that can be used at any location in the process window.

摘要翻译： 公开了一种用于创建光刻工艺的聚焦曝光模型的系统和方法。 系统和方法利用参数变化的多个维度的校准数据，特别是在曝光 - 散焦过程窗口空间内。 该系统和方法提供了一套统一的模型参数值，可在标称工艺条件下提供更好的模拟精度和鲁棒性，以及能够在整个过程窗口区域内连续预测任何点的光刻性能，而无需 重新校准在不同的设置。 与现有技术的多模型校准相比，要进行的测量数量要少一些，聚焦曝光模型提供了更多的预测性和更健壮的模型参数值，可以在过程窗口中的任何位置使用。

公开(公告)号：US20140047397A1

公开(公告)日：2014-02-13

申请号：US14064937

申请日：2013-10-28

申请人： Jun YE ,  Peng Liu ,  Yu Cao

发明人： Jun YE ,  Peng Liu ,  Yu Cao

IPC分类号： G06F17/50

CPC分类号： G03F7/70441 ,  G03F7/70266 ,  G03F7/705 ,  G03F7/70533 ,  G03F7/706 ,  G03F7/70891 ,  G06F17/50

摘要： Methods for calibrating a photolithographic system are disclosed. A cold lens contour for a reticle design and at least one hot lens contour for the reticle design are generated from which a process window is defined. Aberrations induced by a lens manipulator are characterized in a manipulator model and the process window is optimized using the manipulator model. Aberrations are characterized by identifying variations in critical dimensions caused by lens manipulation for a plurality of manipulator settings and by modeling behavior of the manipulator as a relationship between manipulator settings and aberrations. The process window may be optimized by minimizing a cost function for a set of critical locations.

摘要翻译： 公开了用于校准光刻系统的方法。 生成用于掩模版设计的冷透镜轮廓和用于掩模版设计的至少一个热透镜轮廓，由此定义处理窗口。 由透镜操纵器诱导的畸变在机械手模型中表征，并且使用机械手模型优化过程窗口。 像差的特征在于识别由多个操纵器设置的透镜操纵引起的关键尺寸的变化，以及通过将操纵器的行为建模为机械手设置和像差之间的关系。 可以通过最小化一组关键位置的成本函数来优化过程窗口。

公开(公告)号：US20130332894A1

公开(公告)日：2013-12-12

申请号：US13971381

申请日：2013-08-20

申请人： Jun YE ,  Yen-Wen LU ,  Yu CAO

发明人： Jun YE ,  Yen-Wen LU ,  Yu CAO

IPC分类号： G06F17/50

CPC分类号： G06F17/5009 ,  G03F1/00 ,  G03F7/004 ,  G03F7/705 ,  G03F7/70666 ,  G06F17/5081 ,  G06F19/00 ,  G06F2217/12 ,  G06F2217/14 ,  G06T7/0004 ,  G06T2207/30148 ,  G21K5/00

摘要： In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques.

摘要翻译： 在一个方面，本发明涉及用于模拟，验证，检查，表征，确定和/或评估光刻设计，技术和/或系统的技术和系统，和/或由其执行的各个功能或使用的组件 其中。 在一个实施例中，本发明是加速光刻特性和/或性质的光刻模拟，检查，表征和/或评估以及光刻系统和处理技术的效果和/或相互作用的系统和方法。

公开(公告)号：US20100162197A1

公开(公告)日：2010-06-24

申请号：US12642436

申请日：2009-12-18

申请人： Jun YE ,  Yu Cao ,  Hanying Feng

发明人： Jun YE ,  Yu Cao ,  Hanying Feng

IPC分类号： G06F17/50

CPC分类号： G03F1/36 ,  G03F1/144 ,  G03F7/70441 ,  G03F7/705 ,  G06F17/5081 ,  G06F2217/12

摘要： The present invention relates to an efficient OPC method of increasing imaging performance of a lithographic process utilized to image a target design having a plurality of features. The method includes the steps of determining a function for generating a simulated image, where the function accounts for process variations associated with the lithographic process; and optimizing target gray level for each evaluation point in each OPC iteration based on this function. In one given embodiment, the function is approximated as a polynomial function of focus and exposure, R(ε, f)=P0+f2·Pb with a threshold of T+Vε for contours, where P0 represents image intensity at nominal focus, f represents the defocus value relative to the nominal focus, ε represents the exposure change, V represents the scaling of exposure change, and parameter “Pb” represents second order derivative images. In another given embodiment, the analytical optimal gray level is given for best focus with the assumption that the probability distribution of focus and exposure variation is Gaussian.

摘要翻译： 本发明涉及一种提高用于成像具有多个特征的目标设计的光刻工艺的成像性能的有效OPC方法。 该方法包括以下步骤：确定用于产生模拟图像的功能，其中该功能考虑到与光刻工艺相关联的工艺变化; 并基于此功能对每个OPC迭代中的每个评估点优化目标灰度级。 在一个给定的实施例中，函数近似为焦点和曝光的多项式函数，R（＆egr; f）= P0 + f2·Pb，阈值为T + V＆egr; 对于轮廓，其中P0表示标称焦点处的图像强度，f表示相对于标称焦点的散焦值， 表示曝光变化，V表示曝光变化的缩放，参数“Pb”表示二阶导数图像。 在另一个给定的实施例中，假设聚焦和曝光变化的概率分布为高斯，给出最佳聚焦的分析最佳灰度级。

公开(公告)号：US20140005998A1

公开(公告)日：2014-01-02

申请号：US14013593

申请日：2013-08-29

申请人： Jun YE ,  Yu Cao ,  Hanying Feng

发明人： Jun YE ,  Yu Cao ,  Hanying Feng

IPC分类号： G06F17/50

CPC分类号： G06F17/5009 ,  G03F7/705 ,  G03F7/70991

摘要： A method of efficient simulating imaging performance of a lithographic process utilized to image a target design having a plurality of features. The method includes the steps of determining a function for generating a simulated image, where the function accounts for process variations associated with the lithographic process; and generating the simulated image utilizing the function, where the simulated image represents the imaging result of the target design for the lithographic process.

摘要翻译： 一种有效地模拟用于对具有多个特征进行成像的目标设计的光刻工艺的成像性能的方法。 该方法包括以下步骤：确定用于产生模拟图像的功能，其中该功能考虑到与光刻工艺相关联的工艺变化; 并利用该功能产生模拟图像，其中模拟图像表示用于光刻工艺的目标设计的成像结果。

公开(公告)号：US20100119961A1

公开(公告)日：2010-05-13

申请号：US12613221

申请日：2009-11-05

申请人： Jun YE ,  Yu Cao ,  Hanying Feng

发明人： Jun YE ,  Yu Cao ,  Hanying Feng

IPC分类号： G03F7/20 ,  G03B27/32

CPC分类号： G06F17/50 ,  G03F1/144 ,  G03F1/36 ,  G03F1/68 ,  G03F7/70433 ,  G03F7/705 ,  G03F7/70516

摘要： A method of efficient optical and resist parameters calibration based on simulating imaging performance of a lithographic process utilized to image a target design having a plurality of features. The method includes the steps of determining a function for generating a simulated image, where the function accounts for process variations associated with the lithographic process; and generating the simulated image utilizing the function, where the simulated image represents the imaging result of the target design for the lithographic process. Systems and methods for calibration of lithographic processes whereby a polynomial fit is calculated for a nominal configuration of the optical system and which can be used to estimate critical dimensions for other configurations.

摘要翻译： 一种基于模拟用于对具有多个特征进行成像的目标设计的光刻工艺的成像性能的有效的光学和抗蚀剂参数校准的方法。 该方法包括以下步骤：确定用于产生模拟图像的功能，其中该功能考虑到与光刻工艺相关联的工艺变化; 并利用该功能产生模拟图像，其中模拟图像表示用于光刻工艺的目标设计的成像结果。 用于校准光刻过程的系统和方法，由此针对光学系统的标称配置计算多项式拟合，并且其可以用于估计其他配置的关键尺寸。

公开(公告)号：US20130003759A1

公开(公告)日：2013-01-03

申请号：US13530944

申请日：2012-06-22

申请人： Andrew SERGEEV ,  Jun YE ,  Shigang WANG ,  Shiting YU

发明人： Andrew SERGEEV ,  Jun YE ,  Shigang WANG ,  Shiting YU

IPC分类号： H04J3/00

CPC分类号： H04L12/42 ,  H04J3/085 ,  H04L12/437 ,  H04L45/586

摘要： Technology for reducing bandwidth consumption in an Ethernet network, by dynamic selection of one copy of traffic services (per protection group) for transmitting to a remote Ethernet node from a multi-homing node. The dynamic selection is performed during a normal (full) working condition of the multi-homing node. In case the multi-homing node condition changes to a partially working condition, selection of the services per protection group depends on the remaining working facilities of the multi-homing node.

摘要翻译： 通过动态选择一个流量服务副本（每个保护组）以从多重归属节点传输到远程以太网节点，降低以太网网络带宽消耗的技术。 在多归属节点的正常（满）工作状态期间进行动态选择。 在多归属节点条件变为部分工作状态的情况下，每个保护组的服务选择取决于多归属节点的其余工作设施。