摘要:
Provided is a thin film device and an associated method of making a thin film device. For example, fabrication of an inverter thin film device is described. Moreover, a parallel spaced electrically conductive strips are provided upon a substrate. A functional material is deposited upon the conductive strips. A 3D structure is then provided upon the functional material, the 3D structure having a plurality of different heights, at least one height defining a first portion of the conductive strips to be bundled. The 3D structure and functional material are then etched to define a TFD disposed above the first portion of the conductive strips. The first portion of the conductive strips is bundled adjacent to the TFD.
摘要:
Provided is a thin film device and an associated method of making a thin film device. For example, fabrication of an inverter thin film device is described. Moreover, a parallel spaced electrically conductive strips are provided upon a substrate. A functional material is deposited upon the conductive strips. A 3D structure is then provided upon the functional material, the 3D structure having a plurality of different heights, at least one height defining a first portion of the conductive strips to be bundled. The 3D structure and functional material are then etched to define a TFD disposed above the first portion of the conductive strips. The first portion of the conductive strips is bundled adjacent to the TFD.
摘要:
Provided is a thin film device and an associated method of making a thin film device. For example, fabrication of an inverter thin film device is described. Moreover, a parallel spaced electrically conductive strips are provided upon a substrate. A functional material is deposited upon the conductive strips. A 3D structure is then provided upon the functional material, the 3D structure having a plurality of different heights, at least one height defining a first portion of the conductive strips to be bundled. The 3D structure and functional material are then etched to define a TFD disposed above the first portion of the conductive strips. The first portion of the conductive strips is bundled adjacent to the TFD.
摘要:
Provided is a thin film device and an associated method of making a thin film device. For example, fabrication of an inverter thin film device is described. Moreover, a parallel spaced electrically conductive strips are provided upon a substrate. A functional material is deposited upon the conductive strips. A 3D structure is then provided upon the functional material, the 3D structure having a plurality of different heights, at least one height defining a first portion of the conductive strips to be bundled. The 3D structure and functional material are then etched to define a TFD disposed above the first portion of the conductive strips. The first portion of the conductive strips is bundled adjacent to the TFD.
摘要:
An addressing circuit is operable to address one or more memory elements in a cross-point memory array. The addressing circuit includes first and second sets of address lines for addressing the cross-point memory array. The address circuit also includes pull-up and pull-down circuit elements. Both the pull-up and pull-down circuit elements and the address lines include cross-point resistive elements.
摘要:
An integrated line selection apparatus within active matrix arrays is described. The circuit includes multiple gate line drive transistor devices, each gate line drive transistor device having a drain coupled to a gate line of multiple gate lines in a gate line driver circuit coupled to an active matrix array and a source to receive an input signal. The circuit further includes at least one address line transistor device corresponding to each gate line transistor device, each address line transistor device having a drain coupled to a gate of the corresponding gate line drive transistor device and a gate coupled to a corresponding address line, such that by asserting a predetermined combination of voltages on the plurality of address lines, a single gate line of said plurality of gate lines is selected to receive the input signal to be transmitted to a corresponding pixel within the corresponding active matrix array.
摘要:
An addressing circuit is operable to address one or more memory elements in a cross-point memory array. The addressing circuit includes first and second sets of address lines for addressing the cross-point memory array. The address circuit also includes pull-up and pull-down circuit elements. Both the pull-up and pull-down circuit elements and the address lines include cross-point resistive elements.
摘要:
An integrated line selection apparatus within active matrix arrays is described. The circuit includes multiple gate line drive transistor devices, each gate line drive transistor device having a drain coupled to a gate line of multiple gate lines in a gate line driver circuit coupled to an active matrix array and a source to receive an input signal. The circuit further includes at least one address line transistor device corresponding to each gate line transistor device, each address line transistor device having a drain coupled to a gate of the corresponding gate line drive transistor device and a gate coupled to a corresponding address line, such that by asserting a predetermined combination of voltages on the plurality of address lines, a single gate line of said plurality of gate lines is selected to receive the input signal to be transmitted to a corresponding pixel within the corresponding active matrix array.
摘要:
An aspect of the present invention is a logical arrangement of memory arrays. The logical arrangement includes a plurality of memory arrays deposed in a row-column configuration, a controller coupled to the plurality of memory arrays and at least one power line, at least one sense line and at least one address line coupled to the controller wherein a number of connections from the controller to the at least one power line, the at least one sense line and the at least one address line is minimized.
摘要:
A fabrication process for a device such as a backplane for a flat panel display includes depositing thin film layers on a substrate, forming a 3D template overlying the thin film layers, and etching the 3D template and the thin film layers to form gate lines and transistors from the thin film layers. An insulating or passivation layer can then be deposited on the gate lines and the transistors, so that column or data lines can be formed on the insulating layer.