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47 条记录 (耗时 0.039 秒)

    Carpet
    2.
    外观设计
    Carpet 有权

    公开(公告)号：USD906727S1

    公开(公告)日：2021-01-05

    申请号：US29706078

    申请日：2019-09-18

    申请人： Weidong Yang

    设计人： Weidong Yang

    Methods and apparatus for half duplex scheduling
    3.
    发明授权
    Methods and apparatus for half duplex scheduling 有权
    半双工调度的方法和装置

    公开(公告)号：US09042280B2

    公开(公告)日：2015-05-26

    申请号：US13547149

    申请日：2012-07-12

    申请人： Rapeepat Ratasuk ,  Gerald Gutowski ,  Weidong Yang

    发明人： Rapeepat Ratasuk ,  Gerald Gutowski ,  Weidong Yang

    IPC分类号： H04L5/16 ,  H04W72/12

    CPC分类号： H04W72/1205

    摘要： Systems and techniques are described for scheduling communication by half-duplex devices. One or more half-duplex devices informs a base station that it is capable only of half-duplex operation. For each such device, the base station configures a transmit/receive pattern comprising sequences of uplink and downlink subframes and applies the pattern to the device. The half-duplex device may receive during a downlink subframe and may transmit during an uplink subframe. Uplink and downlink subframes within a pattern are separated by an offset based at least in part on a number of hybrid automatic repeat request processes.

    摘要翻译： 描述了用于通过半双工设备调度通信的系统和技术。 一个或多个半双工设备通知基站它仅能够进行半双工操作。 对于每个这样的设备，基站配置包括上行链路和下行链路子帧的序列的发送/接收模式，并将该模式​​应用于该设备。 半双工设备可以在下行链路子帧期间接收并且可以在上行链路子帧期间进行发送。 至少部分地基于多个混合自动重复请求过程，将模式中的上行链路和下行链路子帧分隔开一个偏移。

    Method and system for interference reduction
    4.
    发明授权
    Method and system for interference reduction 有权
    减少干扰的方法和系统

    公开(公告)号：US08086181B2

    公开(公告)日：2011-12-27

    申请号：US12961741

    申请日：2010-12-07

    申请人： Daniel Wee ,  Hang Li ,  Weidong Yang ,  Guanghan Xu

    发明人： Daniel Wee ,  Hang Li ,  Weidong Yang ,  Guanghan Xu

    IPC分类号： H04B1/00 ,  H04B1/38

    CPC分类号： H04W16/18 ,  H04B1/7103 ,  H04B2201/709709 ,  H04J11/005 ,  H04J13/16 ,  H04W16/10 ,  H04W28/18 ,  H04W72/00 ,  H04W72/08 ,  H04W88/08 ,  H04W88/12

    摘要： A method and system for interference reduction for telecommunication systems are disclosed. The system comprises a base station control device (BCD) for configuring one or more parameters for operating one or more base stations (BSs), a first BS covering a first cell having one or more mobile terminals therein, a second BS covering a second cell neighboring to the first cell and sharing a predetermined frequency band with the first cell, wherein one or more radio frames constructed for communications between the first BS and any mobile terminal of the first cell and one or more radio frames constructed for communications between the second BS and any mobile terminal of the second cell are distinguishable by defining different channel configuration sets having one or more operation parameters, wherein the parameters includes a training sequence, a spreading code, and a channel observation window position.

    摘要翻译： 公开了用于电信系统的干扰减少的方法和系统。 该系统包括用于配置用于操作一个或多个基站（BS）的一个或多个参数的基站控制设备（BCD），覆盖其中具有一个或多个移动终端的第一小区的第一BS，覆盖第二小区的第二BS 与所述第一小区相邻并且与所述第一小区共享预定频带，其中为所述第一小区和所述第一小区的任何移动终端之间的通信而构造的一个或多个无线电帧以及为所述第二小区之间的通信而构造的一个或多个无线电帧 并且通过定义具有一个或多个操作参数的不同的信道配置集来区分第二小区的任何移动终端，其中参数包括训练序列，扩展码和信道观察窗口位置。

    DETERMINATION OF MATERIAL OPTICAL PROPERTIES FOR OPTICAL METROLOGY OF STRUCTURES
    5.
    发明申请
    DETERMINATION OF MATERIAL OPTICAL PROPERTIES FOR OPTICAL METROLOGY OF STRUCTURES 审中-公开
    材料光学性质的测定结构光学计量学

    公开(公告)号：US20110276319A1

    公开(公告)日：2011-11-10

    申请号：US12775392

    申请日：2010-05-06

    申请人： Jonathan Michael Madsen ,  Weidong Yang

    发明人： Jonathan Michael Madsen ,  Weidong Yang

    IPC分类号： G06G7/62

    CPC分类号： G03F7/70616 ,  G03F7/70608

    摘要： Methods of determining a material optical property for optical metrology of a structure is described. One method includes simulating a set of diffraction orders for a grating structure based on two or more azimuth angles and on one or more angles of incidence. A simulated spectrum is provided based on the set of diffraction orders. Another method includes simulating a set of diffraction orders for a grating structure based on two or more angles of incidence. A simulated spectrum is provided based on the set of diffraction orders.

    摘要翻译： 描述了确定结构的光学测量的材料光学性质的方法。 一种方法包括模拟基于两个或更多个方位角以及一个或多个入射角的光栅结构的衍射级。 基于一组衍射级提供了模拟光谱。 另一种方法包括模拟基于两个或多个入射角的光栅结构的一组衍射级。 基于一组衍射级提供了模拟光谱。

    Tent
    6.
    发明申请
    Tent 有权
    帐篷

    公开(公告)号：US20110155198A1

    公开(公告)日：2011-06-30

    申请号：US12982238

    申请日：2010-12-30

    申请人： Weidong Yang ,  Pil Yul Lee ,  Keong Woong Youn

    发明人： Weidong Yang ,  Pil Yul Lee ,  Keong Woong Youn

    IPC分类号： E04H15/58

    CPC分类号： E04H15/14 ,  E04H15/32

    摘要： A tent is provided. The tent includes a tarp having a plurality of walls and a platform oriented substantially perpendicularly to at least one of the walls. At least a portion of the platform is coupled to the tarp.

    摘要翻译： 提供帐篷。 帐篷包括具有多个壁的篷布和基本上垂直于至少一个壁定向的平台。 平台的至少一部分与篷布连接。

    Determining profile parameters of a structure using approximation and fine diffraction models in optical metrology
    7.
    发明授权
    Determining profile parameters of a structure using approximation and fine diffraction models in optical metrology 有权
    在光学计量学中使用近似和精细衍射模型确定结构的轮廓参数

    公开(公告)号：US07949490B2

    公开(公告)日：2011-05-24

    申请号：US11848154

    申请日：2007-08-30

    申请人： Wei Liu ,  Shifang Li ,  Weidong Yang

    发明人： Wei Liu ,  Shifang Li ,  Weidong Yang

    IPC分类号： G06F15/00

    CPC分类号： G02B27/0012 ,  G01B11/0625 ,  G03F7/705 ,  G03F7/70625

    摘要： Provided is a method for determining one or more profile parameters of a structure using an optical metrology model, the optical metrology model including a profile model, an approximation diffraction model, and a fine diffraction model. A simulated approximation diffraction signal is generated based on an approximation diffraction model of the structure. A set of difference diffraction signals is obtained by subtracting the simulated approximation diffraction signal from each of simulated fine diffraction signals and paired with the corresponding profile parameters. A machine learning system is trained using the pairs of difference diffraction signal and corresponding profile parameters. A measured diffraction signal adjusted by the simulated approximation diffraction signal is input into the trained machine learning system and generates the corresponding profile parameters.

    摘要翻译： 提供一种用于使用光学测量模型来确定结构的一个或多个轮廓参数的方法，光学测量模型包括轮廓模型，近似衍射模型和精细衍射模型。 基于结构的近似衍射模型生成模拟近似衍射信号。 通过从每个模拟的细衍射信号中减去模拟的近似衍射信号并与相应的轮廓参数配对来获得一组差分衍射信号。 使用差分衍射信号和相应的轮廓参数对来训练机器学习系统。 通过模拟近似衍射信号调整的测量衍射信号被输入到经过训练的机器学习系统中，并产生相应的轮廓参数。

    COMPUTATION EFFICIENCY BY DIFFRACTION ORDER TRUNCATION
    8.
    发明申请
    COMPUTATION EFFICIENCY BY DIFFRACTION ORDER TRUNCATION 有权
    通过衍生顺序交换计算效率

    公开(公告)号：US20100042388A1

    公开(公告)日：2010-02-18

    申请号：US12193341

    申请日：2008-08-18

    申请人： Joerg Bischoff ,  Shifang Li ,  Weidong Yang ,  Hanyou Chu

    发明人： Joerg Bischoff ,  Shifang Li ,  Weidong Yang ,  Hanyou Chu

    IPC分类号： G06G7/62

    CPC分类号： G06E1/00

    摘要： A method for improving computation efficiency for diffraction signals in optical metrology is described. The method includes simulating a set of diffraction orders for a three-dimensional structure. The diffraction orders within the set of diffraction orders are then prioritized. The set of diffraction orders is truncated to provide a truncated set of diffraction orders based on the prioritizing. Finally, a simulated spectrum is provided based on the truncated set of diffraction orders.

    摘要翻译： 描述了一种提高光学测量中衍射信号的计算效率的方法。 该方法包括模拟一组三维结构的衍射级数。 然后优先考虑该组衍射级中的衍射级。 衍射级的集合被截断以提供基于优先级的截断的衍射级集合。 最后，基于截断的衍射级组提供了一个模拟光谱。

    Method and system for interference reduction in a wireless communication network using a joint detector
    9.
    发明授权
    Method and system for interference reduction in a wireless communication network using a joint detector 有权
    使用联合检测器的无线通信网络中减少干扰的方法和系统

    公开(公告)号：US07656936B2

    公开(公告)日：2010-02-02

    申请号：US10352774

    申请日：2003-01-28

    申请人： Hang Li ,  Weidong Yang ,  Guanghan Xu

    发明人： Hang Li ,  Weidong Yang ,  Guanghan Xu

    IPC分类号： H04B1/00 ,  H04B1/10 ,  H04B7/02 ,  H04L1/02

    CPC分类号： H04B1/71055 ,  H04B7/0851 ,  H04W16/28

    摘要： A method and system for reducing interference in a wireless communication network is disclosed. The wireless communication network has at least one base station using an antenna array and one or more code channels to receive or transmit one or more communication signals from or to a plurality of terminals used by one or more users. A signal received by the antenna array carries one or more training sequences and a traffic signal in a frame. After estimating a spatial signature and joint channel response model per user based on the training sequences, one or more spatial weights are found based on the estimated spatial signature and joint channel response model to maximize a signal to noise ratio. A joint detection matrix is then formed based on the estimated spatial weights, the joint channel response model, and a user code channel assignment. After code correlating a traffic signal to obtain one or more user specific multi-antenna signals, a spatial combining is performed on one or more multi-antenna signals associated with each user to generate scalar symbol estimates. Thereafter, a joint detection is done based on the scalar symbol estimates using the joint detection matrix. Similar techniques can be used for downlink communications.

    摘要翻译： 公开了一种用于减少无线通信网络中的干扰的方法和系统。 无线通信网络具有使用天线阵列和一个或多个代码信道的至少一个基站来接收或发送来自一个或多个用户使用的多个终端的一个或多个通信信号。 由天线阵列接收的信号在帧中携带一个或多个训练序列和交通信号。 在基于训练序列估计每个用户的空间签名和联合信道响应模型之后，基于估计的空间签名和联合信道响应模型找到一个或多个空间权重以使信噪比最大化。 然后基于估计的空间权重，联合信道响应模型和用户代码信道分配来形成联合检测矩阵。 在将业务信号相关以获得一个或多个用户特定多天线信号的代码之后，对与每个用户相关联的一个或多个多天线信号执行空间组合以生成标量符号估计。 此后，基于使用联合检测矩阵的标量符号估计完成联合检测。 类似的技术可以用于下行链路通信。

    Local process variation correction for overlay measurement
    10.
    发明授权
    Local process variation correction for overlay measurement 有权
    覆盖测量的局部过程变化校正

    公开(公告)号：US07508976B1

    公开(公告)日：2009-03-24

    申请号：US10748829

    申请日：2003-12-29

    申请人： Weidong Yang ,  Roger R. Lowe-Webb ,  Silvio J. Rabello

    发明人： Weidong Yang ,  Roger R. Lowe-Webb ,  Silvio J. Rabello

    IPC分类号： G06K9/00

    CPC分类号： G03F7/70633

    摘要： A diffraction based overlay metrology system produces the overlay error independent of effects caused by local process variations. Generally, overlay patterns include process variations that provide spectral contributions, along with the overlay shift, to the measured overlay error. The contributions from process variations are removed from the determined overlay error. In one embodiment, the local process variations are removed by measuring the overlay pattern before and after the top diffraction gratings are formed. A plurality of differential spectra from the measurement locations of the completed overlay pattern can then be used with a plurality of ratios of differential spectra from measurement locations of the incomplete overlay pattern can then be used to determine the overlay error by either direct calculation or by fitting techniques. In another embodiment, the local process variations are removed with no premeasurement but with careful construction of the overlay patterns.

    摘要翻译： 基于衍射的覆盖度量系统产生独立于局部过程变化所引起的影响的覆盖误差。 通常，覆盖图案包括提供光谱贡献以及覆盖偏移与所测量的覆盖误差的过程变化。 来自过程变化的贡献从确定的覆盖错误中移除。 在一个实施例中，通过在顶部衍射光栅形成之前和之后测量覆盖图案来去除局部工艺变化。 然后可以使用来自完成的覆盖图案的测量位置的多个差分光谱，然后可以使用来自不完全覆盖图案的测量位置的多个差分光谱比率来通过直接计算或通过拟合来确定覆盖误差 技术 在另一个实施例中，在没有预测量的情况下移除局部过程变化，但是仔细地构造覆盖图案。