公开(公告)号：US09136426B2

公开(公告)日：2015-09-15

申请号：US14076409

申请日：2013-11-11

Applicant: QD VISION, INC.

Inventor： Sang-Jin Kim ,  Matthew Stevenson ,  Gagan Mahan ,  Peter T. Kazlas

IPC: H01L21/00 ,  H01L33/00 ,  C09K11/02 ,  C09K11/56 ,  C09K11/88 ,  H05B33/10 ,  H05B33/14 ,  H01L33/06 ,  H01L51/50

CPC classification number: H01L33/005 ,  C09K11/02 ,  C09K11/565 ,  C09K11/883 ,  H01L33/06 ,  H01L33/08 ,  H01L51/502 ,  H01L51/5237 ,  H01L51/56 ,  H01L2933/005 ,  H05B33/10 ,  H05B33/14

Abstract: A method of processing quantum dots is disclosed. The method comprises applying energy to excite the quantum dots to emit light and placing the quantum dots under vacuum after excitation of the quantum dots. Also disclosed is a method of processing a component including quantum dots comprising applying energy to the component including quantum dots to excite the quantum dots to emit light; and placing the component including quantum dots under vacuum after excitation. A method for processing a device is further disclosed, the method comprising applying energy to the device to excite the quantum dots to emit light; and placing the device under vacuum after excitation of the quantum dots. A method for preparing a device is also disclosed. Quantum dots, component, and devices of the methods are also disclosed.

Abstract translation: 公开了一种处理量子点的方法。 该方法包括施加能量以激发量子点发光并在量子点激发之后将量子点置于真空下。 还公开了一种处理包括量子点的部件的方法，包括向包括量子点的部件施加能量以激发量子点发光; 激发后将包含量子点的成分置于真空下。 还公开了一种处理器件的方法，该方法包括向器件施加能量以激发量子点发光; 并且在激发量子点之后将器件置于真空下。 还公开了一种用于制备器件的方法。 还公开了该方法的量子点，分量和装置。

公开(公告)号：US20140061584A1

公开(公告)日：2014-03-06

申请号：US13683365

申请日：2012-11-21

Applicant: QD Vision, Inc.

Inventor： Gagan Mahan ,  Peter T. Kazlas

IPC: H01L33/64 ,  H01L31/024

CPC classification number: H01L31/024 ,  H01L23/4334 ,  H01L31/052 ,  H01L33/641 ,  H01L2924/0002 ,  H01L2924/09701 ,  H01L2924/12044 ,  Y02E10/50 ,  H01L2924/00

Abstract: A device comprising an arrangement of device materials and a layer comprising a material with heat-dissipating properties disposed over at least a portion thereof is disclosed. The device can further include an interleave layer disposed between the top surface of the arrangement of device materials and the layer comprising a material with heat-dissipating properties. A barrier layer may further be included between the arrangement of device materials and the layer comprising a material with heat-dissipating properties. Methods are also disclosed. In certain embodiments, a device includes quantum confined semiconductor nanoparticles.

Abstract translation: 公开了一种装置，其包括装置材料的布置以及包括在其至少一部分上设置的具有散热特性的材料的层。 该装置还可以包括布置在装置材料装置的顶表面和包含具有散热特性的材料的层之间的交错层。 阻挡层可以进一步包括在器件材料的布置和包含具有散热特性的材料的层之间。 还公开了方法。 在某些实施例中，器件包括量子限制的半导体纳米颗粒。