摘要:
An active pixel image cell which includes a photosensor, active devices for control of the sensor and readout of a signal representing the intensity of light to which the sensor is exposed, and a neuron MOSFET transistor which "both amplifies the signal from the photosensor and" simulates the behavior of a human neuron. An integrated neural network and imaging array may be formed by interconnecting a group of such pixels. Digital signal processing algorithms used for image processing may be implemented at the pixel level by appropriate interconnections between the output signals from the photosensor of surrounding pixels and the neuron MOSFET.
摘要:
An active pixel image cell which includes a photosensor and an embedded memory element and may be used to produce signals corresponding to the photosensor outputs for successive frames. The structure of the active pixel cell includes an analog, non-volatile, or dynamic memory element and the control elements needed to store the output of the photosensor generated during a previous frame. The pixel elements then generate a signal representing the current frame output of the photosensor. The current frame output and previous frame output are then provided as output signals for the pixel and may be subjected to off-pixel processing as desired. For example, the two values may be subtracted from one another by an off-pixel difference amplifier to form a signal representing the difference between the image on the photodiode sensor of the pixel between successive frames. The difference signal may then be used for purposes of video compression, motion detection, or image stabilization.
摘要:
The amount of silicon real estate consumed by a photodiode-based active pixel sensor cell is reduced by utilizing a parasitic transistor to reset the voltage on the photodiode in lieu of the conventional use of a reset transistor. The parasitic transistor is formed by forming a doped region a distance apart from the well region of the photodiode, which defines a parasitic channel region therebetween, and a reset gate over the parasitic channel region.
摘要:
Leakage of a single-poly EPROM cell is prevented by eliminating field oxide isolating the source, channel, and drain from the control gate n-well, and by replacing field oxide surrounding the cell with a heavily doped surface isolation region. The EPROM cell also utilizes a floating gate having an open-rectangular floating gate portion over the control gate region, and a narrow floating gate portion over the channel and intervening silicon substrate. The surface area of the open-rectangular floating gate portion ensures a high coupling ratio with the control gate region. The small width of the narrow floating gate portion prevents formation of a sizeable leakage path between the n-well and the source, channel, and drain. To conserve surface area, the EPROM cell also eliminates the p+ contact region and the PLDD region in the control gate well of the conventional EPROM design. This is permitted because the VTp implant step is masked, permitting the control gate region to operate in accumulation mode during application of 5V programming voltages.
摘要:
A technique for decreasing the effective gain of a bipolar phototransistor at high light levels makes the image usable over a greatly extended range of illumination conditions. The effective current gain at high light levels is reduced by fabricating a "non-ideal" emitter, such as by inserting a thin 20 521 tunnel oxide between the emitter and base junction. The tunnel oxide between the emitter and base serves as a variable resistor as well as a good junction for carrier injection from the emitter. The total base voltage is the sum of the oxide voltage and the intrinsic base voltage. At high image intensity, the bipolar phototransistor will gradually enter into the saturation mode, i.e., the base to collector junction is forward biased. The beta is thus reduced. The bias of the collector should be about 0.3-0.8 V higher than the emitter at the 20.ANG. tunnel oxide thickness for optimum operation.
摘要:
A method of fabricating an EEPROM cell structure in a semiconductor substrate includes forming a layer of silicon oxide having a first thickness on the silicon substrate. N-type dopant is then introduced into the semiconductor substrate to define a buried region beneath the silicon oxide layer. Next, a tunnel window opening is formed in the silicon oxide layer to expose a surface area of the buried region. A layer of tunnel oxide is then grown in the tunnel window opening on the exposed surface of the buried region, such that the tunnel oxide has a thickness that is less than the thickness of the silicon oxide. A first layer of polysilicon is then formed on the structure resulting from the foregoing steps, followed by an overlaying layer of oxide.backslash.nitride.backslash.oxide (ONO) and an overlying layer of second polysilicon. The poly-2, ONO.backslash.poly-1 sandwich is then anisotropically etched to form first and second stacks which provide the floating gate/control gate electrodes for the EEPROM cell access transistor and the EEPROM cell storage cell structure, respectively.
摘要:
The layout and the programming voltage of a single-poly EPROM cell are reduced by eliminating the n+ contact region which is conventionally utilized to place a positive voltage on the n-well of the cell, and by utilizing a negative voltage to program the cell. The negative voltage is applied to a p+ contact region formed in the n-well which injects electrons directly onto the floating gate of the cell.
摘要:
Multiple logic levels can be simultaneously programmed into any combination of memory cells in a column of an ETOX array by applying one of a corresponding number of programming voltages to the word lines that correspond with the cells to be programmed. In the present invention, the memory cells in the array form a punchthrough current during programming which, in turn, leads to the formation of an increased number of substrate hot electrons. By utilizing the substrate hot electrons formed from the punchthrough current in addition to the channel hot electrons, much lower control gate voltages can be utilized during programming.
摘要:
Multiple logic levels can be simultaneously programmed into any combination of memory cells in a column of an alternate-metal virtual-ground (AMG) EPROM or flash memory array by applying one of a corresponding number of programming voltages to the word lines that correspond with the cells to be programmed. In the present invention, the memory cells in the array form a punchthrough current during programming which, in turn, leads to the formation of an increased number of substrate hot electrons. By utilizing the substrate hot electrons formed from the punchthrough current in addition to the channel hot electrons, much lower control gate voltages can be utilized during programming.
摘要:
Disclosed is a floating gate neuron MOS transistor that may be incorporated into devices such as low voltage silicon control rectifiers for protection of internal circuits against electrostatic discharge. The transistor includes two or more input gates capacitively coupled to the floating gate. By adjusting the coupling ratio of the input gates, it is possible to control the transistor drain turn-on voltage very precisely and thereby turn on the rectifier without relying on avalanche breakdown of the transistor.