公开(公告)号：US07566872B2

公开(公告)日：2009-07-28

申请号：US11509059

申请日：2006-08-24

申请人： Ritsuo Fukaya ,  Hidetoshi Sato ,  Zhigang Wang ,  Noriaki Arai ,  Makoto Ezumi

发明人： Ritsuo Fukaya ,  Hidetoshi Sato ,  Zhigang Wang ,  Noriaki Arai ,  Makoto Ezumi

IPC分类号： H01J37/28

CPC分类号： H01J37/28 ,  H01J2237/22

摘要： A scanning electron microscope is disclosed. The primary electron beam is radiated on a reticle (specimen), and an observation image of the reticle is obtained using the electrons secondarily released. The microscope comprises a lamp for radiating the vacuum ultraviolet light having the wavelength of not more than 172 nm on the reticle in the atmosphere, a radiation chamber for hermetically sealing the reticle so that the vacuum ultraviolet light can be radiated on the reticle, and a specimen holder for holding the reticle in the radiation chamber and capable of adjusting the distance between the lamp and the reticle.

摘要翻译： 公开了一种扫描电子显微镜。 将一次电子束照射在标线（样品）上，并使用二次释放的电子获得掩模版的观察图像。 显微镜包括用于在大气中的掩模版上照射波长不大于172nm的真空紫外光的灯，用于气密地密封掩模版的辐射室，以便可以将真空紫外光照射在掩模版上，并且 用于将掩模版保持在辐射室中并且能够调节灯和掩模版之间的距离的样本保持器。

公开(公告)号：US20070045539A1

公开(公告)日：2007-03-01

申请号：US11509059

申请日：2006-08-24

申请人： Ritsuo Fukaya ,  Hidetoshi Sato ,  Zhigang Wang ,  Noriaki Arai ,  Makoto Ezumi

发明人： Ritsuo Fukaya ,  Hidetoshi Sato ,  Zhigang Wang ,  Noriaki Arai ,  Makoto Ezumi

IPC分类号： G21K7/00

CPC分类号： H01J37/28 ,  H01J2237/22

摘要： A scanning electron microscope is disclosed. The primary electron beam is radiated on a reticle (specimen), and an observation image of the reticle is obtained using the electrons secondarily released. The microscope comprises a lamp for radiating the vacuum ultraviolet light having the wavelength of not more than 172 nm on the reticle in the atmosphere, a radiation chamber for hermetically sealing the reticle so that the vacuum ultraviolet light can be radiated on the reticle, and a specimen holder for holding the reticle in the radiation chamber and capable of adjusting the distance between the lamp and the reticle.

摘要翻译： 公开了一种扫描电子显微镜。 将一次电子束照射在标线（样品）上，并使用二次释放的电子获得掩模版的观察图像。 显微镜包括用于在大气中的掩模版上照射波长不大于172nm的真空紫外光的灯，用于气密地密封掩模版的辐射室，以便可以将真空紫外光照射在掩模版上，并且 用于将掩模版保持在辐射室中并且能够调节灯和掩模版之间的距离的样本保持器。

公开(公告)号：US20140217274A1

公开(公告)日：2014-08-07

申请号：US14240306

申请日：2012-08-16

申请人： Zhigang Wang ,  Nobuhiro Okai ,  Hidetoshi Sato ,  Ritsuo Fukaya

发明人： Zhigang Wang ,  Nobuhiro Okai ,  Hidetoshi Sato ,  Ritsuo Fukaya

IPC分类号： H01J37/26 ,  H01J37/29 ,  H01J37/153

CPC分类号： H01J37/265 ,  H01J37/153 ,  H01J37/263 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/24495 ,  H01J2237/24578

摘要： This charged particle beam device is characterized by controlling a deflector in a manner so as to correct the amount of scanning deflection of a charged particle beam between: a first detection condition for detecting a secondary charged particle (112) signal; and a second detection condition for detecting a reflected charged particle (111) signal. As a result, it is possible to correct length measurement error and scaling fluctuation arising when altering the type of charged particle to detect. Thus, in the observation, measurement, and the like of a low-step sample or a charged sample, even when forming an image that is on the basis of the reflected charged particle signal, it is possible to obtain an accurate image regardless of length measurement error and scaling fluctuation.

摘要翻译： 该带电粒子束装置的特征在于以下步骤：控制偏转器以便校正带电粒子束的扫描偏转量：检测次级带电粒子（112）信号的第一检测条件; 以及用于检测反射的带电粒子（111）信号的第二检测条件。 结果，可以校正改变被检测的带电粒子的类型时出现的长度测量误差和缩放波动。 因此，在低阶样本或带电样本的观察，测量等中，即使形成基于反射的带电粒子信号的图像，也可以获得精确的图像，而不管长度 测量误差和缩放波动。

公开(公告)号：US08907267B2

公开(公告)日：2014-12-09

申请号：US14240306

申请日：2012-08-16

申请人： Zhigang Wang ,  Nobuhiro Okai ,  Hidetoshi Sato ,  Ritsuo Fukaya

发明人： Zhigang Wang ,  Nobuhiro Okai ,  Hidetoshi Sato ,  Ritsuo Fukaya

IPC分类号： H01J37/28 ,  H01J37/26 ,  H01J37/29 ,  H01J37/153

CPC分类号： H01J37/265 ,  H01J37/153 ,  H01J37/263 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/24495 ,  H01J2237/24578

摘要： This charged particle beam device is characterized by controlling a deflector in a manner so as to correct the amount of scanning deflection of a charged particle beam between: a first detection condition for detecting a secondary charged particle (112) signal; and a second detection condition for detecting a reflected charged particle (111) signal. As a result, it is possible to correct length measurement error and scaling fluctuation arising when altering the type of charged particle to detect. Thus, in the observation, measurement, and the like of a low-step sample or a charged sample, even when forming an image that is on the basis of the reflected charged particle signal, it is possible to obtain an accurate image regardless of length measurement error and scaling fluctuation.

摘要翻译： 该带电粒子束装置的特征在于以下步骤：控制偏转器以便校正带电粒子束的扫描偏转量：检测次级带电粒子（112）信号的第一检测条件; 以及用于检测反射的带电粒子（111）信号的第二检测条件。 结果，可以校正改变被检测的带电粒子的类型时出现的长度测量误差和缩放波动。 因此，在低阶样本或带电样本的观察，测量等中，即使形成基于反射的带电粒子信号的图像，也可以获得精确的图像，而不管长度 测量误差和缩放波动。

公开(公告)号：US20110139981A1

公开(公告)日：2011-06-16

申请号：US13059537

申请日：2009-08-08

申请人： Ritsuo Fukaya ,  Nobuhiro Okai ,  Koki Miyahara ,  Zhigang Wang

发明人： Ritsuo Fukaya ,  Nobuhiro Okai ,  Koki Miyahara ,  Zhigang Wang

IPC分类号： G01N23/225 ,  G01N23/00

CPC分类号： H01J37/026 ,  H01J37/09 ,  H01J37/15 ,  H01J37/28 ,  H01J2237/0041 ,  H01J2237/0045 ,  H01J2237/0458

摘要： An object of the present invention is to provide a scanning electron microscope aiming at making it possible to control the quantity of electrons generated by collision of electrons emitted from a sample with other members, and a sample charging control method using the control of electron quantity. To achieve the object, a scanning electron microscope including a plurality of apertures through which an electron beam can pass and a mechanism for switching the apertures for the electron beam, and a method for controlling sample charging by switching the apertures are proposed. The plurality of apertures are at least two apertures. Portions respectively having different secondary electron emission efficiencies are provided on peripheral portions of the at least two apertures on a side opposed to the sample. The quantity of electrons generated by collision of electrons emitted from the sample can be controlled by switching the apertures.

摘要翻译： 本发明的目的是提供一种扫描电子显微镜，其目的在于可以控制从样品与其他部件发射的电子的碰撞产生的电子的量，以及使用电子量的控制的样品充电控制方法。 为了实现该目的，提出了一种扫描电子显微镜，其包括电子束可以通过的多个孔，以及用于切换电子束的孔的机构，以及通过切换孔来控制样品充电的方法。 多个孔是至少两个孔。 分别具有不同二次电子发射效率的部分设置在与样品相对的一侧上的至少两个孔的周边部分上。 可以通过切换孔来控制从样品发射的电子的碰撞产生的电子的量。

公开(公告)号：US07851756B2

公开(公告)日：2010-12-14

申请号：US12182709

申请日：2008-07-30

申请人： Ritsuo Fukaya ,  Zhigang Wang

发明人： Ritsuo Fukaya ,  Zhigang Wang

IPC分类号： G01K1/08 ,  H01J3/14 ,  H01J3/26

CPC分类号： H01J37/28 ,  H01J37/026 ,  H01J37/147 ,  H01J37/265 ,  H01J2237/0044

摘要： It is to prevent an image drift from occurring caused by a specimen being charged when observing the specimen including an insulating material.A first scan is performed in a predetermined direction on scanning line and in a predetermined sequential direction of scanning lines and a second scan is performed in a scanning direction different from the predetermined scanning direction and in a sequential direction different from the predetermined sequential direction. An image may be created by repeating the process of executing the second scan after executing the first scan and by requiring the arithmetic average of the frames obtained by the second scans. An image may be created by averaging arithmetically at least one frame obtained by the first scan and at least one frame obtained by the second scan.

摘要翻译： 这是为了防止在观察包括绝缘材料的试样时由试样充电引起的图像漂移。 在扫描线和扫描线的预定顺序方向上沿预定方向执行第一扫描，并且在与预定扫描方向不同的扫描方向上和沿与预定顺序方向不同的顺序方向上执行第二扫描。 可以通过在执行第一次扫描之后重​​复执行第二扫描的处理并且要求通过第二扫描获得的帧的算术平均来创建图像。 可以通过对由第一扫描获得的至少一帧和通过第二扫描获得的至少一帧进行算术平均来创建图像。

公开(公告)号：US08692197B2

公开(公告)日：2014-04-08

申请号：US13578179

申请日：2011-02-09

申请人： Zhigang Wang ,  Nobuhiro Okai ,  Ritsuo Fukaya

发明人： Zhigang Wang ,  Nobuhiro Okai ,  Ritsuo Fukaya

IPC分类号： H01J37/26

CPC分类号： H01J37/28 ,  H01J37/026 ,  H01J37/244 ,  H01J2237/24592 ,  H01J2237/2817

摘要： A scanning electron microscope and an optical-condition setting method are provided. The optical condition allows the suppression of a lowering in the measurement and inspection accuracy caused by the influence of electrification, even if there are a large number of measurement and inspection points. A pattern on a sample is measured based on the detection of electrons by scanning the sample surface with an electron beam. A change in measurement values relative to the number of measurements is determined from the measurement values at a plurality of measurement points on the sample, and the sample-surface electric field is controlled so that the inclination of the change becomes equal to zero, or becomes close to zero.

摘要翻译： 提供扫描电子显微镜和光学条件设定方法。 即使存在大量的测量点和检查点，光学条件允许抑制由电气化的影响引起的测量和检查精度的降低。 基于通过用电子束扫描样品表面的电子检测来测量样品上的图案。 根据样品上的多个测量点的测量值确定测量值相对于测量次数的变化，并且控制样品表面电场，使得变化的倾斜度等于零，或变为 接近零。

公开(公告)号：US08487251B2

公开(公告)日：2013-07-16

申请号：US13059537

申请日：2009-08-08

申请人： Ritsuo Fukaya ,  Nobuhiro Okai ,  Koki Miyahara ,  Zhigang Wang

发明人： Ritsuo Fukaya ,  Nobuhiro Okai ,  Koki Miyahara ,  Zhigang Wang

IPC分类号： G01N23/00

CPC分类号： H01J37/026 ,  H01J37/09 ,  H01J37/15 ,  H01J37/28 ,  H01J2237/0041 ,  H01J2237/0045 ,  H01J2237/0458

摘要： An object of the present invention is to provide a scanning electron microscope aiming at making it possible to control the quantity of electrons generated by collision of electrons emitted from a sample with other members, and a sample charging control method using the control of electron quantity. To achieve the object, a scanning electron microscope including a plurality of apertures through which an electron beam can pass and a mechanism for switching the apertures for the electron beam, and a method for controlling sample charging by switching the apertures are proposed. The plurality of apertures are at least two apertures. Portions respectively having different secondary electron emission efficiencies are provided on peripheral portions of the at least two apertures on a side opposed to the sample. The quantity of electrons generated by collision of electrons emitted from the sample can be controlled by switching the apertures.

摘要翻译： 本发明的目的是提供一种扫描电子显微镜，其目的在于可以控制从样品与其他部件发射的电子的碰撞产生的电子的量，以及使用电子量的控制的样品充电控制方法。 为了实现该目的，提出了一种扫描电子显微镜，其包括电子束可以通过的多个孔，以及用于切换电子束的孔的机构，以及通过切换孔来控制样品充电的方法。 多个孔是至少两个孔。 分别具有不同二次电子发射效率的部分设置在与样品相对的一侧上的至少两个孔的周边部分上。 可以通过切换孔来控制从样品发射的电子的碰撞产生的电子的量。

公开(公告)号：US20120318977A1

公开(公告)日：2012-12-20

申请号：US13578179

申请日：2011-02-09

申请人： Zhigang Wang ,  Nobuhiro Okai ,  Ritsuo Fukaya

发明人： Zhigang Wang ,  Nobuhiro Okai ,  Ritsuo Fukaya

IPC分类号： H01J37/26

CPC分类号： H01J37/28 ,  H01J37/026 ,  H01J37/244 ,  H01J2237/24592 ,  H01J2237/2817

摘要： It is an object of the present invention to provide an optical-condition setting method for a charged-particle beam device, and the charged-particle beam device which make it possible to set the following optical condition: Namely, an optical condition which allows the suppression of a lowering in the measurement and inspection accuracy caused by the influence of electrification, even if there exist a large number of measurement and inspection points.In order to accomplish the above-described object, the following scanning electron microscope or optical-condition setting method is proposed: Namely, a scanning electron microscope or an optical-condition setting method for measuring a pattern on a sample based on the detection of electrons, the electrons being emitted from the sample by scanning the sample surface with an electron beam, wherein a change in measurement values relative to the number of measurements is determined from the measurement values at a plurality of measurement points on the sample, and the sample-surface electric field is controlled so that the inclination of the change becomes equal to zero, or becomes close to zero.

摘要翻译： 本发明的目的是提供一种带电粒子束装置的光学条件设定方法以及使得能够设定以下光学条件的带电粒子束装置：即，允许 即使存在大量的测量点和检查点，也抑制了电气化影响引起的测量和检查精度的降低。 为了实现上述目的，提出了以下扫描电子显微镜或光学条件设定方法：即，基于电子检测来测量样品上的图案的扫描电子显微镜或光学条件设定方法 通过用电子束扫描样品表面从样品发射电子，其中相对于测量次数的测量值的变化根据样品上的多个测量点的测量值确定， 控制表面电场使得变化的倾斜度等于零，或变得接近零。

公开(公告)号：US20090032723A1

公开(公告)日：2009-02-05

申请号：US12182709

申请日：2008-07-30

申请人： Ritsuo FUKAYA ,  Zhigang Wang

发明人： Ritsuo FUKAYA ,  Zhigang Wang

IPC分类号： H01J3/14

CPC分类号： H01J37/28 ,  H01J37/026 ,  H01J37/147 ,  H01J37/265 ,  H01J2237/0044

摘要： It is to prevent an image drift from occurring caused by a specimen being charged when observing the specimen including an insulating material.A first scan is performed in a predetermined direction on scanning line and in a predetermined sequential direction of scanning lines and a second scan is performed in a scanning direction different from the predetermined scanning direction and in a sequential direction different from the predetermined sequential direction. An image may be created by repeating the process of executing the second scan after executing the first scan and by requiring the arithmetic average of the frames obtained by the second scans. An image may be created by averaging arithmetically at least one frame obtained by the first scan and at least one frame obtained by the second scan.

摘要翻译： 这是为了防止在观察包括绝缘材料的试样时由试样充电引起的图像漂移。 在扫描线和扫描线的预定顺序方向上沿预定方向执行第一扫描，并且在与预定扫描方向不同的扫描方向上和沿与预定顺序方向不同的顺序方向上执行第二扫描。 可以通过在执行第一次扫描之后重​​复执行第二扫描的处理并且要求通过第二扫描获得的帧的算术平均来创建图像。 可以通过对由第一扫描获得的至少一帧和通过第二扫描获得的至少一帧进行算术平均来创建图像。