公开(公告)号：US20120242967A1

公开(公告)日：2012-09-27

申请号：US13243528

申请日：2011-09-23

申请人： Robbert Jan Voogd ,  Haico Victor Kok ,  Bearrach Moest ,  Petrus Franciscus Van Gils

发明人： Robbert Jan Voogd ,  Haico Victor Kok ,  Bearrach Moest ,  Petrus Franciscus Van Gils

IPC分类号： G03B27/54

CPC分类号： G03F9/7069 ,  G03F7/70066 ,  G03F7/7085

摘要： A lithographic apparatus comprising an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the radiation beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate, wherein the lithographic apparatus further comprises a patterning device masking blade provided with a hole, a diffusing material being located at the hole.

摘要翻译： 一种光刻设备，包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，用于使辐射束在其横截面上具有图案的图案形成装置，用于保持衬底的衬底台，以及 用于将图案化的辐射束投影到基板的目标部分上的投影系统，其中所述光刻设备还包括设置有孔的图案形成装置掩蔽刮板，位于所述孔处的扩散材料。

公开(公告)号：US09116446B2

公开(公告)日：2015-08-25

申请号：US13243528

申请日：2011-09-23

申请人： Robbert Jan Voogd ,  Haico Victor Kok ,  Bearrach Moest ,  Petrus Franciscus Van Gils

发明人： Robbert Jan Voogd ,  Haico Victor Kok ,  Bearrach Moest ,  Petrus Franciscus Van Gils

IPC分类号： G03F9/00 ,  G03F7/20

CPC分类号： G03F9/7069 ,  G03F7/70066 ,  G03F7/7085

摘要： A lithographic apparatus comprising an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the radiation beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate, wherein the lithographic apparatus further comprises a patterning device masking blade provided with a hole, a diffusing material being located at the hole.

摘要翻译： 一种光刻设备，包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，用于使辐射束在其横截面上具有图案的图案形成装置，用于保持衬底的衬底台，以及 用于将图案化的辐射束投影到基板的目标部分上的投影系统，其中所述光刻设备还包括设置有孔的图案形成装置掩蔽刮板，位于所述孔处的扩散材料。

公开(公告)号：US09632435B2

公开(公告)日：2017-04-25

申请号：US13046211

申请日：2011-03-11

申请人： Nicolaas Ten Kate ,  Johannes Henricus Wilhelmus Jacobs ,  Joost Jeroen Ottens ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Thibault Simon Mathieu Laurent ,  Robbert Jan Voogd ,  Giovanni Francisco Nino ,  Johan Gertrudis Cornelis Kunnen ,  Marinus Jan Remie

发明人： Nicolaas Ten Kate ,  Johannes Henricus Wilhelmus Jacobs ,  Joost Jeroen Ottens ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Thibault Simon Mathieu Laurent ,  Robbert Jan Voogd ,  Giovanni Francisco Nino ,  Johan Gertrudis Cornelis Kunnen ,  Marinus Jan Remie

IPC分类号： G03B27/52 ,  G03B27/58 ,  G03F7/20

CPC分类号： G03F7/70875 ,  G03F7/7085

摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

公开(公告)号：US10551752B2

公开(公告)日：2020-02-04

申请号：US13046283

申请日：2011-03-11

申请人： Nicolaas Ten Kate ,  Johannes Henricus Wilhelmus Jacobs ,  Joost Jeroen Ottens ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Thibault Simon Mathieu Laurent ,  Robbert Jan Voogd ,  Giovanni Francisco Nino ,  Johan Gertrudis Cornelis Kunnen ,  Marinus Jan Remie

发明人： Nicolaas Ten Kate ,  Johannes Henricus Wilhelmus Jacobs ,  Joost Jeroen Ottens ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Thibault Simon Mathieu Laurent ,  Robbert Jan Voogd ,  Giovanni Francisco Nino ,  Johan Gertrudis Cornelis Kunnen ,  Marinus Jan Remie

IPC分类号： G03F7/20

摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

公开(公告)号：US20110222033A1

公开(公告)日：2011-09-15

申请号：US13046283

申请日：2011-03-11

申请人： Nicolaas Ten Kate ,  Johannes Henricus Wilhelmus Jacobs ,  Joost Jeroen Ottens ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Thibault Simon Mathieu Laurent ,  Robbert Jan Voogd ,  Giovanni Francisco Nino ,  Johan Gertrudis Cornelis Kunnen ,  Marinus Jan Remie

发明人： Nicolaas Ten Kate ,  Johannes Henricus Wilhelmus Jacobs ,  Joost Jeroen Ottens ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Thibault Simon Mathieu Laurent ,  Robbert Jan Voogd ,  Giovanni Francisco Nino ,  Johan Gertrudis Cornelis Kunnen ,  Marinus Jan Remie

IPC分类号： G03B27/52

CPC分类号： G03F7/70875 ,  G03F7/7085

摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

公开(公告)号：US09298107B2

公开(公告)日：2016-03-29

申请号：US13183220

申请日：2011-07-14

申请人： Thibault Simon Mathieu Laurent ,  Gerardus Adrianus Antonius Maria Kusters ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Raymond Wilhelmus Louis Lafarre ,  Koen Steffens ,  Takeshi Kaneko ,  Robbert Jan Voogd ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Johan Gertrudis Cornelis Kunnen ,  Ramin Badie

发明人： Thibault Simon Mathieu Laurent ,  Gerardus Adrianus Antonius Maria Kusters ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Raymond Wilhelmus Louis Lafarre ,  Koen Steffens ,  Takeshi Kaneko ,  Robbert Jan Voogd ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Johan Gertrudis Cornelis Kunnen ,  Ramin Badie

IPC分类号： G03F7/20

CPC分类号： G03F7/70483 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70875

摘要： A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

摘要翻译： 一种用于支撑衬底支撑区域上的衬底的衬底台，所述衬底台具有至少在衬底支撑区域下方的传热流体通道，以及多个加热器和/或冷却器，以热控制通道中的传热流体 位于基板支撑区域下方的位置。

公开(公告)号：US20120013865A1

公开(公告)日：2012-01-19

申请号：US13183220

申请日：2011-07-14

申请人： Thibault Simon Mathieu LAURENT ,  Gerardus Adrianus Antonius Maria Kusters ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Raymond Wilhelmus Louis Lafarre ,  Koen Steffens ,  Takeshi Kaneko ,  Robbert Jan Voogd ,  Gregory Martin Mason Corcoran ,  Ruud Hendricus Martinus Johannes Bloks ,  Johan Gertrudis Cornelis Kunnen ,  Ramin Badie

发明人： Thibault Simon Mathieu LAURENT ,  Gerardus Adrianus Antonius Maria Kusters ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Raymond Wilhelmus Louis Lafarre ,  Koen Steffens ,  Takeshi Kaneko ,  Robbert Jan Voogd ,  Gregory Martin Mason Corcoran ,  Ruud Hendricus Martinus Johannes Bloks ,  Johan Gertrudis Cornelis Kunnen ,  Ramin Badie

IPC分类号： G03B27/52

CPC分类号： G03F7/70483 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70875

摘要： A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

摘要翻译： 一种用于支撑衬底支撑区域上的衬底的衬底台，所述衬底台具有至少在衬底支撑区域下方的传热流体通道，以及多个加热器和/或冷却器，以热控制通道中的传热流体 位于基板支撑区域下方的位置。