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    Release layer for imprinted photocationic curable resins
    1.
    发明授权
    Release layer for imprinted photocationic curable resins 失效
    印版光固化树脂的剥离层

    公开(公告)号：US07749422B2

    公开(公告)日：2010-07-06

    申请号：US11694117

    申请日：2007-03-30

    申请人： Robert D. Allen ,  Mark W. Hart ,  Frances Houle ,  Hiroshi Ito

    发明人： Robert D. Allen ,  Mark W. Hart ,  Frances Houle ,  Hiroshi Ito

    IPC分类号： B29C35/08

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  Y10S977/887

    摘要： An imprint process comprising coating a selected surface of a micropatterned template with a release composition having a basic reactive moiety; wherein the template is transparent to UV radiation; imprinting the template onto a photocationically curable composition; curing the UV curable composition to form an imprinted composition, wherein the release composition having a basic reactive moiety is effective to locally inhibit curing of the composition at an interface between the template and the imprinted composition; and releasing the template from the imprinted composition.

    摘要翻译： 一种压印方法，包括用具有碱性反应性部分的释放组合物涂布微图案化模板的选定表面; 其中所述模板对UV辐射是透明的; 将模板印刷在光固化组合物上; 固化可UV固化组合物以形成印迹组合物，其中具有碱性反应性部分的释放组合物有效地局部抑制组合物在模板和印迹组合物之间的界面处的固化; 并从印迹组合物释放模板。

    RELEASE LAYER FOR IMPRINTED PHOTOCATIONICALLY CURED FILMS
    2.
    发明申请
    RELEASE LAYER FOR IMPRINTED PHOTOCATIONICALLY CURED FILMS 审中-公开
    释放层，用于印刷光固化膜

    公开(公告)号：US20080248213A1

    公开(公告)日：2008-10-09

    申请号：US12061010

    申请日：2008-04-02

    申请人： Robert D. Allen ,  Mark W. Hart ,  Frances Houle ,  Hiroshi Ito

    发明人： Robert D. Allen ,  Mark W. Hart ,  Frances Houle ,  Hiroshi Ito

    IPC分类号： C08J7/18

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  Y10S977/887

    摘要： An imprint process comprising coating a selected surface of a micropatterned template with a release composition having a basic reactive moiety; wherein the template is transparent to UV radiation; imprinting the template onto a photocationically curable composition; curing the UV curable composition to form an imprinted composition, wherein the release composition having a basic reactive moiety is effective to locally inhibit curing of the composition at an interface between the template and the imprinted composition; and releasing the template from the imprinted composition.

    摘要翻译： 一种压印方法，包括用具有碱性反应性部分的释放组合物涂布微图案化模板的选定表面; 其中所述模板对UV辐射是透明的; 将模板印刷在光固化组合物上; 固化可UV固化组合物以形成印迹组合物，其中具有碱性反应性部分的释放组合物有效地局部抑制组合物在模板和印迹组合物之间的界面处的固化; 并从印迹组合物释放模板。

    RELEASE LAYER FOR IMPRINTED PHOTOCATIONIC CURABLE RESINS
    3.
    发明申请
    RELEASE LAYER FOR IMPRINTED PHOTOCATIONIC CURABLE RESINS 失效
    释放层，用于印刷光固化树脂

    公开(公告)号：US20080241418A1

    公开(公告)日：2008-10-02

    申请号：US11694117

    申请日：2007-03-30

    申请人： Robert D. Allen ,  Mark W. Hart ,  Frances Houle ,  Hiroshi Ito

    发明人： Robert D. Allen ,  Mark W. Hart ,  Frances Houle ,  Hiroshi Ito

    IPC分类号： B05D3/06

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  Y10S977/887

    摘要： An imprint process comprising coating a selected surface of a micropatterned template with a release composition having a basic reactive moiety; wherein the template is transparent to UV radiation; imprinting the template onto a photocationically curable composition; curing the UV curable composition to form an imprinted composition, wherein the release composition having a basic reactive moiety is effective to locally inhibit curing of the composition at an interface between the template and the imprinted composition; and releasing the template from the imprinted composition.

    摘要翻译： 一种压印方法，包括用具有碱性反应性部分的释放组合物涂布微图案化模板的选定表面; 其中所述模板对UV辐射是透明的; 将模板印刷在光固化组合物上; 固化可UV固化组合物以形成印迹组合物，其中具有碱性反应性部分的释放组合物有效地局部抑制组合物在模板和印迹组合物之间的界面处的固化; 并从印迹组合物释放模板。

    Stabilization of vinyl ether materials
    4.
    发明申请
    Stabilization of vinyl ether materials 失效
    乙烯基醚材料的稳定化

    公开(公告)号：US20070066750A1

    公开(公告)日：2007-03-22

    申请号：US11219218

    申请日：2005-09-02

    申请人： Frances Houle ,  Hiroshi Ito

    发明人： Frances Houle ,  Hiroshi Ito

    IPC分类号： C08L83/00 ,  C08G77/00

    CPC分类号： G03F7/027 ,  B29C59/002 ,  C09D4/00 ,  G03F7/0041 ,  G03F7/0755 ,  C08F216/125

    摘要： A stable viscosity coating composition, a method of forming the stable viscosity coating composition and a method for using the stable viscosity coating composition in a micro-molding imprint lithographic process, such as Step and Flash Imprint Lithography is disclosed. The stable viscosity coating composition may include at least one vinyl ether having at least one vinyl ether group (—OCR═CR2), and a stabilizer, wherein the stabilizer may be 9-anthracenemethanol, a substituted 9-anthracenemethanol, phenothiazine, or a substituted phenothiazine. The coating composition may include a radiation sensitive photoacid generator (PAG). The method of forming the coating composition comprises combining at least one vinyl ether having at least one vinyl ether group (—OCR═CR2), and at least one stabilizer.

    摘要翻译： 公开了稳定粘度涂料组合物，形成稳定粘度涂料组合物的方法和在微型成型压印光刻工艺中使用稳定粘度涂料组合物的方法，例如步骤和闪光印记平版印刷术。 稳定粘度涂料组合物可以包括至少一种具有至少一个乙烯基醚基的乙烯基醚（-OCR-CR 2 H 2）和稳定剂，其中稳定剂可以是9-蒽甲醇，取代的9 - 蒽基甲醇，吩噻嗪或取代的吩噻嗪。 涂料组合物可以包括辐射敏感光致酸产生剂（PAG）。 形成涂料组合物的方法包括组合至少一种具有至少一个乙烯基醚基团（-OCR-CR 2 H 2）的乙烯基醚和至少一种稳定剂。

    Processes and materials for step and flash imprint lithography
    5.
    发明申请
    Processes and materials for step and flash imprint lithography 有权
    步进和闪光压印光刻的工艺和材料

    公开(公告)号：US20070051697A1

    公开(公告)日：2007-03-08

    申请号：US11219095

    申请日：2005-09-02

    申请人： Richard DiPietro ,  Mark Hart ,  Frances Houle ,  Hiroshi Ito

    发明人： Richard DiPietro ,  Mark Hart ,  Frances Houle ,  Hiroshi Ito

    IPC分类号： B44C1/22

    CPC分类号： G03F7/0755 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0045

    摘要： A method of forming an image. The method includes: a transfer layer on a substrate; forming on the transfer layer, an etch barrier layer; pressing a template having a relief pattern into the etch barrier layer; exposing the etch barrier layer to actinic radiation forming a cured etch barrier layer having thick and thin regions corresponding to the relief pattern; removing the template; removing the thin regions of the cured etch barrier layer; removing regions of the transfer layer not protected by the etch barrier layer; removing regions of the substrate not protected by the transfer layer and any remaining etch barrier layer; and removing remaining transfer layer. The transfer layer may be removed using a solvent, the etch barrier layer may include a release agent and an adhesion layer may be formed between the transfer layer and the etch barrier layer. A reverse tone process is also described.

    摘要翻译： 一种形成图像的方法。 该方法包括：在基板上的转印层; 在转印层上形成蚀刻阻挡层; 将具有浮雕图案的模板压入蚀刻阻挡层中; 将蚀刻阻挡层暴露于形成具有对应于浮雕图案的厚和薄区域的固化蚀刻阻挡层的光化辐射; 删除模板; 去除固化的蚀刻阻挡层的薄区域; 除去未被蚀刻阻挡层保护的转移层的区域; 除去未被转移层保护的衬底的区域和任何剩余的蚀刻阻挡层; 并去除剩余的转移层。 可以使用溶剂去除转移层，蚀刻阻挡层可以包括脱模剂，并且可以在转移层和蚀刻阻挡层之间形成粘合层。 还描述了反向色调处理。

    Forming surface features using self-assembling masks
    6.
    发明授权
    Forming surface features using self-assembling masks 有权
    使用自组装掩模形成表面特征

    公开(公告)号：US07828986B2

    公开(公告)日：2010-11-09

    申请号：US11926722

    申请日：2007-10-29

    申请人： Joy Cheng ,  Mark W. Hart ,  Hiroshi Ito ,  Ho-Cheol Kim ,  Robert Miller

    发明人： Joy Cheng ,  Mark W. Hart ,  Hiroshi Ito ,  Ho-Cheol Kim ,  Robert Miller

    IPC分类号： B44C1/22 ,  H01L21/302

    CPC分类号： H01L21/0337 ,  B81C1/00031 ,  B81C2201/0149 ,  B81C2201/0198 ,  H01L21/0271 ,  H01L21/0332

    摘要： A method. A combination is provided of a block copolymer and additional material. The copolymer includes a first block of a first polymer covalently bonded to a second block of a second polymer. The additional material is miscible with the first polymer. The first polymer includes polystyrene and the second polymer includes poly(ethylene oxide). A first layer including polydimethylglutarimide is adhered onto a surface of a substrate including a dielectric coated silicon wafer. A film is formed of the combination directly onto a surface of the first layer. Nanostructures of the additional material self-assemble within the first polymer block. The film and the first layer are simultaneously etched. The nanostructures have an etch rate lower than an etch rate of the block copolymer and lower than an etch rate of the first layer. Portions of the film are removed. Features remain on the surface of the first layer.

    摘要翻译： 一个方法。 提供了一种嵌段共聚物和另外的材料的组合。 共聚物包括共价键合到第二聚合物的第二嵌段的第一聚合物的第一嵌段。 附加材料与第一聚合物混溶。 第一聚合物包括聚苯乙烯，第二聚合物包括聚（环氧乙烷）。 包括聚二甲基戊二酰亚胺的第一层粘附到包括电介质涂覆的硅晶片的基材的表面上。 该组合物直接由第一层的表面形成。 附加材料的纳米结构在第一聚合物嵌段内自组装。 同时蚀刻膜和第一层。 纳米结构的蚀刻速率低于嵌段共聚物的蚀刻速率，并且低于第一层的蚀刻速率。 部分电影被删除。 特征保留在第一层的表面上。

    METHODS FOR FORMING SURFACE FEATURES USING SELF-ASSEMBLING MASKS
    7.
    发明申请
    METHODS FOR FORMING SURFACE FEATURES USING SELF-ASSEMBLING MASKS 有权
    使用自组装掩模形成表面特征的方法

    公开(公告)号：US20090107953A1

    公开(公告)日：2009-04-30

    申请号：US12057565

    申请日：2008-03-28

    申请人： Joy Cheng ,  Mark W. Hart ,  Hiroshi Ito ,  Ho-Cheol Kim ,  Robert Miller

    发明人： Joy Cheng ,  Mark W. Hart ,  Hiroshi Ito ,  Ho-Cheol Kim ,  Robert Miller

    IPC分类号： C23F1/00

    CPC分类号： H01L21/0337 ,  B81C1/00031 ,  B81C2201/0149 ,  B81C2201/0198 ,  H01L21/0271 ,  H01L21/0332

    摘要： A method for producing surface features and an etch masking method. A combination is provided of a block copolymer and additional material. The block copolymer includes a first block of a first polymer covalently bonded to a second block of a second polymer. The additional material is miscible with the first polymer. A film is formed of the combination directly onto a surface of a first layer. Nanostructures of the additional material self-assemble within the first polymer block. The film of the combination and the first layer are etched. The nanostructures have an etch rate lower than an etch rate of the block copolymer and lower than an etch rate of the first layer. The film is removed and features remain on the surface of the first layer. Also included is an etch masking method where the nanostructures mask portions of the first layer from said etchant.

    摘要翻译： 一种用于产生表面特征的方法和蚀刻掩模方法。 提供了一种嵌段共聚物和另外的材料的组合。 嵌段共聚物包括共价键合到第二聚合物的第二嵌段的第一聚合物的第一嵌段。 附加材料与第一聚合物混溶。 膜由直接形成在第一层的表面上。 附加材料的纳米结构在第一聚合物嵌段内自组装。 蚀刻组合和第一层的膜。 纳米结构的蚀刻速率低于嵌段共聚物的蚀刻速率，并且低于第一层的蚀刻速率。 去除膜并且特征保留在第一层的表面上。 还包括蚀刻掩模法，其中纳米结构掩盖了来自所述蚀刻剂的第一层的部分。

    Methods for forming surface features using self-assembling masks
    8.
    发明授权
    Methods for forming surface features using self-assembling masks 有权
    使用自组装掩模形成表面特征的方法

    公开(公告)号：US08529779B2

    公开(公告)日：2013-09-10

    申请号：US12057565

    申请日：2008-03-28

    申请人： Joy Cheng ,  Mark W. Hart ,  Hiroshi Ito ,  Ho-Cheol Kim ,  Robert Miller

    发明人： Joy Cheng ,  Mark W. Hart ,  Hiroshi Ito ,  Ho-Cheol Kim ,  Robert Miller

    IPC分类号： B31D3/00 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  H01L21/302

    CPC分类号： H01L21/0337 ,  B81C1/00031 ,  B81C2201/0149 ,  B81C2201/0198 ,  H01L21/0271 ,  H01L21/0332

    摘要： A method for producing surface features and an etch masking method. A combination is provided of a block copolymer and additional material. The block copolymer includes a first block of a first polymer covalently bonded to a second block of a second polymer. The additional material is miscible with the first polymer. A film is formed of the combination directly onto a surface of a first layer. Nanostructures of the additional material self-assemble within the first polymer block. The film of the combination and the first layer are etched. The nanostructures have an etch rate lower than an etch rate of the block copolymer and lower than an etch rate of the first layer. The film is removed and features remain on the surface of the first layer. Also included is an etch masking method where the nanostructures mask portions of the first layer from said etchant.

    摘要翻译： 一种用于产生表面特征的方法和蚀刻掩模方法。 提供了一种嵌段共聚物和另外的材料的组合。 嵌段共聚物包括共价键合到第二聚合物的第二嵌段的第一聚合物的第一嵌段。 附加材料与第一聚合物混溶。 膜由直接形成在第一层的表面上。 附加材料的纳米结构在第一聚合物嵌段内自组装。 蚀刻组合和第一层的膜。 纳米结构的蚀刻速率低于嵌段共聚物的蚀刻速率，并且低于第一层的蚀刻速率。 去除膜并且特征保留在第一层的表面上。 还包括蚀刻掩模法，其中纳米结构掩盖了来自所述蚀刻剂的第一层的部分。

    FORMING SURFACE FEATURES USING SELF-ASSEMBLING MASKS
    9.
    发明申请
    FORMING SURFACE FEATURES USING SELF-ASSEMBLING MASKS 有权
    使用自组装面膜形成表面特征

    公开(公告)号：US20090107950A1

    公开(公告)日：2009-04-30

    申请号：US11926722

    申请日：2007-10-29

    申请人： Joy Cheng ,  Mark W. Hart ,  Hiroshi Ito ,  Ho-Cheol Kim ,  Robert Miller

    发明人： Joy Cheng ,  Mark W. Hart ,  Hiroshi Ito ,  Ho-Cheol Kim ,  Robert Miller

    IPC分类号： H01B13/00

    CPC分类号： H01L21/0337 ,  B81C1/00031 ,  B81C2201/0149 ,  B81C2201/0198 ,  H01L21/0271 ,  H01L21/0332

    摘要： A method for producing surface features and an etch masking method. A combination is provided of a block copolymer and additional material. The block copolymer includes a first block of a first polymer covalently bonded to a second block of a second polymer. The additional material is miscible with the first polymer. A film is formed of the combination directly onto a surface of a first layer. Nanostructures of the additional material self-assemble within the first polymer block. The film of the combination and the first layer are etched. The nanostructures have an etch rate lower than an etch rate of the block copolymer and lower than an etch rate of the first layer. The film is removed and features remain on the surface of the first layer. Also included is an etch masking method where the nanostructures mask portions of the first layer from said etchant.

    摘要翻译： 一种用于产生表面特征的方法和蚀刻掩模方法。 提供了一种嵌段共聚物和另外的材料的组合。 嵌段共聚物包括共价键合到第二聚合物的第二嵌段的第一聚合物的第一嵌段。 附加材料与第一聚合物混溶。 膜由直接形成在第一层的表面上。 附加材料的纳米结构在第一聚合物嵌段内自组装。 蚀刻组合和第一层的膜。 纳米结构的蚀刻速率低于嵌段共聚物的蚀刻速率，并且低于第一层的蚀刻速率。 去除膜并且特征保留在第一层的表面上。 还包括蚀刻掩模法，其中纳米结构掩盖了来自所述蚀刻剂的第一层的部分。