公开(公告)号：US06969683B2

公开(公告)日：2005-11-29

申请号：US10750348

申请日：2003-12-31

申请人： Rongxiang Hu ,  Yongbae Kim ,  Sang-Yun Lee ,  Hiroaki Takikawa ,  Shumay Dou ,  Sarah Neuman ,  Philippe Schoenborn ,  Keith Chao ,  Dilip Vijay ,  Kai Zhang ,  Masaichi Eda

发明人： Rongxiang Hu ,  Yongbae Kim ,  Sang-Yun Lee ,  Hiroaki Takikawa ,  Shumay Dou ,  Sarah Neuman ,  Philippe Schoenborn ,  Keith Chao ,  Dilip Vijay ,  Kai Zhang ,  Masaichi Eda

IPC分类号： H01L21/311 ,  H01L21/44 ,  H01L21/4763 ,  H01L21/768

CPC分类号： H01L21/76831 ,  H01L21/31144 ,  H01L21/76807 ,  H01L21/76808 ,  H01L21/76826 ,  H01L21/76829

摘要： A method for forming a dual damascene interconnect in a dielectric layer is provided. Generally, a first aperture is etched in the dielectric. A poison barrier layer is formed over part of the dielectric, which prevents resist poisoning. A patterned mask is formed over the poison barrier layer. A second aperture is etched into the dielectric layer, wherein at least part of the first aperture shares the same area as at least part of the second aperture.

摘要翻译： 提供了一种在电介质层中形成双镶嵌互连的方法。 通常，在电介质中蚀刻第一孔。 在电介质的一部分上形成中毒阻挡层，防止抗蚀剂中毒。 在毒物屏障层上形成图案化掩模。 第二孔被蚀刻到电介质层中，其中第一孔的至少一部分具有与第二孔的至少一部分相同的面积。

公开(公告)号：US06743725B1

公开(公告)日：2004-06-01

申请号：US09928570

申请日：2001-08-13

申请人： Rongxiang Hu ,  Philippe Schoenborn ,  Masaichi Eda

发明人： Rongxiang Hu ,  Philippe Schoenborn ,  Masaichi Eda

IPC分类号： H01L21311

CPC分类号： C09K13/00 ,  C09K13/08 ,  H01L21/31116 ,  H01L21/76807

摘要： The subject matter described herein involves an improved etch process for use in fabricating integrated circuits on semiconductor wafers. The selectivity of the etch process for silicon carbide versus silicon oxide, organo silica-glass or other low dielectric constant type material is enhanced by adding hydrogen (H2) or ammonia (NH3) or other hydrogen-containing gas to the etch chemistry.

摘要翻译： 本文描述的主题涉及用于制造半导体晶片上的集成电路的改进的蚀刻工艺。 碳化硅与氧化硅，有机二氧化硅玻璃或其他低介电常数型材料的蚀刻工艺的选择性通过向蚀刻化学品中加入氢（H 2）或氨（NH 3）或其它含氢气体来增强。

公开(公告)号：US06713386B1

公开(公告)日：2004-03-30

申请号：US10025304

申请日：2001-12-19

申请人： Rongxiang Hu ,  Yongbae Kim ,  Sang-Yun Lee ,  Hiroaki Takikawa ,  Shumay Dou ,  Sarah Neuman ,  Philippe Schoenborn ,  Keith Chao ,  Dilip Vijay ,  Kai Zhang ,  Masaichi Eda

发明人： Rongxiang Hu ,  Yongbae Kim ,  Sang-Yun Lee ,  Hiroaki Takikawa ,  Shumay Dou ,  Sarah Neuman ,  Philippe Schoenborn ,  Keith Chao ,  Dilip Vijay ,  Kai Zhang ,  Masaichi Eda

IPC分类号： H01L214763

CPC分类号： H01L21/76831 ,  H01L21/31144 ,  H01L21/76807 ,  H01L21/76808 ,  H01L21/76826 ,  H01L21/76829

摘要： A method for forming a dual damascene interconnect in a dielectric layer is provided. Generally, a first aperture is etched in the dielectric. A poison barrier layer is formed over part of the dielectric, which prevents resist poisoning. A patterned mask is formed over the poison barrier layer. A second aperture is etched into the dielectric layer, wherein at least part of the first aperture shares the same area as at least part of the second aperture.