公开(公告)号：US5317615A

公开(公告)日：1994-05-31

申请号：US987554

申请日：1992-12-08

申请人： Ryuichi Ebinuma ,  Nobutoshi Mizusawa ,  Takao Kariya ,  Shigeyuki Suda ,  Shunichi Uzawa ,  Takayuki Hasegawa

发明人： Ryuichi Ebinuma ,  Nobutoshi Mizusawa ,  Takao Kariya ,  Shigeyuki Suda ,  Shunichi Uzawa ,  Takayuki Hasegawa

IPC分类号： G03F7/20 ,  G03F9/00 ,  G21K5/00

CPC分类号： G03F7/70066 ,  G03F7/70858 ,  G03F7/70891 ,  G03F9/70

摘要： An exposure apparatus and method for exposing a workpiece to a pattern of an original with radiation includes a masking device having movable blades for variably defining an aperture to selectively block and transmit the radiation to define on the workpiece a desired exposure zone corresponding to the aperture, the masking device having a window, and a detector for detecting the positional deviation between the original and the workpiece by using light passing through the window of the masking device.

摘要翻译： 一种用于将工件暴露于具有辐射的原稿图案的曝光装置和方法包括：具有可动刀片的掩模装置，用于可变地限定孔径以选择性地阻挡和透射辐射，以在工件上限定对应于孔的期望曝光区域， 具有窗口的掩蔽装置和用于通过使用穿过掩蔽装置的窗口的光检测原件和工件之间的位置偏差的检测器。

公开(公告)号：US5150391A

公开(公告)日：1992-09-22

申请号：US830449

申请日：1992-02-05

申请人： Ryuichi Ebinuma ,  Nobutoshi Mizusawa ,  Takao Kariya ,  Shigeyuki Suda ,  Shunichi Uzawa

发明人： Ryuichi Ebinuma ,  Nobutoshi Mizusawa ,  Takao Kariya ,  Shigeyuki Suda ,  Shunichi Uzawa

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/70066 ,  G03F7/70858 ,  G03F7/70891 ,  G03F9/70

摘要： An exposure apparatus for transferring a pattern of an original onto a workpiece, includes a blocking member for defining a rectangular exposure region with respect to at least one of the original and the workpiece, wherein the exposure for the pattern transfer can be effected with the exposure region defined by the blocking member. Plural detection systems detect a positional deviation between the original and the workpiece, each of which is disposed so as to be associated with at least one of four sides of the rectangular exposure region. Plural first movable stages each is provided so as to be associated with at least one of the four sides, and each is adapted to carry thereon one of the detection systems disposed to be associated with a corresponding side. Each first movable stage comprises a single-axis stage movable in a direction parallel to a corresponding side. Plural second stages each carryies thereon corresponding one of the first movable stages, and each comprises a single-axis stage movable in a direction perpendicular to a corresponding side and in a direction parallel to the rectangular exposure region. Each second movable state is operable to displace the light blocking member to change the rectangular exposure region.

公开(公告)号：US5182615A

公开(公告)日：1993-01-26

申请号：US563420

申请日：1990-08-07

申请人： Hiroshi Kurosawa ,  Koji Uda ,  Kunitaka Ozawa ,  Shunichi Uzawa ,  Nobutoshi Mizusawa ,  Shigeyuki Suda ,  Noriyuki Nose ,  Takao Kariya

发明人： Hiroshi Kurosawa ,  Koji Uda ,  Kunitaka Ozawa ,  Shunichi Uzawa ,  Nobutoshi Mizusawa ,  Shigeyuki Suda ,  Noriyuki Nose ,  Takao Kariya

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F7/70691 ,  G03F9/7049

摘要： An exposure apparatus for printing a pattern of a mask to a wafer includes a mask moving mechanism for moving the mask; a wafer moving mechanism or moving the wafer along a predetermined movement coordinate; a measuring system for measuring an error with respect to the movement coordinate, resulting from the movement of the mask by the mask moving mechanism; and a memorizing device for memorizing a data table prepared on the basis of the error measured by the measuring system; wherein the wafer moving mechanism uses the data in the data table when it moves the wafer for positioning of the wafer with respect to the mask.

公开(公告)号：US06476869B1

公开(公告)日：2002-11-05

申请号：US08185304

申请日：1994-01-19

申请人： Masayoshi Sekine ,  Shigeyuki Suda ,  Yasuyuki Unno

发明人： Masayoshi Sekine ,  Shigeyuki Suda ,  Yasuyuki Unno

IPC分类号： H04N5225

CPC分类号： H04N5/77 ,  H04N5/23248 ,  H04N5/23258 ,  H04N5/23267

摘要： In a system for transmitting a video signal obtained by a camera to a discrete device either via a recording/reproducing system or via a transmission line, an image processing system includes a circuit which is arranged within the camera to generate a photo-taking state signal indicating information on aberrations in particular; and a correction circuit which is arranged within a device for reproducing or receiving the video signal to correct the aberrations of the video signal in accordance with the photo-taking state signal.

摘要翻译： 在用于通过记录/再现系统或经由传输线将由相机获得的视频信号发送到分立设备的系统中，图像处理系统包括布置在相机内的电路，以产生拍摄状态信号 指出异常信息; 以及校正电路，其布置在用于再现或接收视频信号的装置中，以根据拍摄状态信号校正视频信号的像差。

公开(公告)号：US5499051A

公开(公告)日：1996-03-12

申请号：US498042

申请日：1995-06-30

申请人： Shigeyuki Suda ,  Yukichi Niwa ,  Tatsushi Katayama

发明人： Shigeyuki Suda ,  Yukichi Niwa ,  Tatsushi Katayama

IPC分类号： G03B15/00 ,  H04N13/00 ,  H04N13/02 ,  H04N5/225

CPC分类号： H04N13/0296 ,  H04N13/0239 ,  H04N13/0003 ,  H04N13/0055 ,  H04N13/0257 ,  H04N13/0456 ,  H04N2013/0081 ,  H04N2013/0088

摘要： A multi-lens imaging apparatus comprises a plurality of imaging optical systems in which an angle formed by optical axes is varied by inclining an optical axis of at least one optical system between a first state and a second state, and a plurality of image sensing means for detecting an image of an object imaged through the imaging optical systems. A photosensitive surface of the image sensing means corresponding to the at least one optical system is inclined with respect to the optical axis, and the inclined angle is established between an imaging surface being conjugated with the object surface in the first state and an imaging surface being conjugated with the subject surface in the second state, thereby reducing unsharpness amount generating at the periphery portions of the screen.

摘要翻译： 多透镜成像装置包括多个成像光学系统，其中由光轴形成的角度通过使至少一个光学系统的光轴倾斜在第一状态和第二状态之间而变化，并且多个图像感测装置 用于检测通过成像光学系统成像的物体的图像。 对应于至少一个光学系统的图像感测装置的感光表面相对于光轴倾斜，并且在第一状态下与被摄体表面共轭的成像表面和成像表面之间建立倾斜角度 在第二状态下与被摄体表面共轭，从而减少在屏幕的周边部分产生的不清晰度。

公开(公告)号：US5396335A

公开(公告)日：1995-03-07

申请号：US800271

申请日：1991-12-02

申请人： Masanobu Hasegawa ,  Kenji Saitoh ,  Shigeyuki Suda

发明人： Masanobu Hasegawa ,  Kenji Saitoh ,  Shigeyuki Suda

IPC分类号： G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G01B11/00

CPC分类号： G03F9/7088 ,  G03F9/7076

摘要： A method of detecting a positional deviation between a mask and a wafer, wherein a radiation beam having a predetermined intensity distribution is projected to an alignment pattern of the mask whereby a signal beam is produced, and wherein the positional deviation of the mask and the wafer is determined on the basis of the signal beam. The improvements reside in detecting a deviation of the position of incidence of the radiation beam upon the mask from a predetermined position, on the basis of the signal beam; relatively positioning the radiation beam and the mask so as to substantially correct the detected deviation; and determining the positional deviation of the mask and the wafer by using the relatively positioned radiation beam.

摘要翻译： 一种检测掩模和晶片之间的位置偏差的方法，其中具有预定强度分布的辐射束被投射到掩模的对准图案，由此产生信号光束，并且其中掩模和晶片的位置偏差 是基于信号光束确定的。 改进在于基于信号光束检测辐射束对掩模的入射位置与预定位置的偏差; 相对地定位辐射束和掩模，以便基本上校正检测到的偏差; 以及通过使用相对定位的辐射束来确定掩模和晶片的位置偏差。

公开(公告)号：US5162656A

公开(公告)日：1992-11-10

申请号：US841790

申请日：1992-03-02

申请人： Masakazu Matsugu ,  Kenji Saitoh ,  Shigeyuki Suda ,  Ryo Kuroda ,  Yukichi Niwa ,  Noriyuki Nose

发明人： Masakazu Matsugu ,  Kenji Saitoh ,  Shigeyuki Suda ,  Ryo Kuroda ,  Yukichi Niwa ,  Noriyuki Nose

IPC分类号： G03F9/00

CPC分类号： G03F9/7023 ,  G03F9/7049

摘要： A device for detecting positional relationship between a first and second objects in a predetermined direction is disclosed. The device includes light source for projecting light upon the first object so that the light incident on the first object is deflected thereby and emanates therefrom in a direction perpendicular to the predetermined direction; a light receiving portion disposed in a direction in which the light having been deflected perpendicularly to the predetermined direction and having been deflected again by the second object advances, the light receiving portion being operable to detect the position of incidence of the light thereupon, wherein the position of the light upon the light receiving means is changeable with the position of incidence of the light upon the second object; and a detecting system for detecting the positional relationship between the first and second objects in the predetermined direction, on the basis of the detection by the light receiving portion.

摘要翻译： 公开了一种用于检测预定方向上的第一和第二物体之间的位置关系的装置。 该装置包括用于将光投射到第一物体上的光源，使得入射在第一物体上的光由此偏转，并在垂直于预定方向的方向上从其发出; 光接收部分沿着垂直于预定方向偏转并被第二物体再次偏转的方向设置的方向延伸，光接收部分可操作以检测其上的光的入射位置，其中， 光在光接收装置上的位置可随着第二物体上的光入射位置而改变; 以及检测系统，用于基于光接收部分的检测来检测第一和第二物体在预定方向上的位置关系。

公开(公告)号：US5148035A

公开(公告)日：1992-09-15

申请号：US789630

申请日：1991-11-12

申请人： Jun Hattori ,  Shigeyuki Suda

发明人： Jun Hattori ,  Shigeyuki Suda

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/7049

摘要： A device for detecting a positional relationship between opposed first and second objects, with respect to a first direction perpendicular to the opposing direction. The device includes a light source for projecting light to the first and second objects, a photodetecting portion for receiving light from one of the first and second objects irradiated with the light from the light source, the photodetecting portion being operable to detect a predetermined parameter related to the light, which parameter is changeable with the positional relationship between the first and second objects with respect to the first direction, a first position detecting system for detecting a positional relationship between the first and second objects, with respect to a second direction perpendicular to the opposing direction of the first and second objects and having an angle with respect to the first direction, and a second position detecting system for detecting the positional relationship between the first and second objects with respect to the first direction, on the basis of the detection by the photodetecting system and the first position detecting system.

公开(公告)号：US5114235A

公开(公告)日：1992-05-19

申请号：US553315

申请日：1990-07-17

申请人： Shigeyuki Suda ,  Naoto Abe

发明人： Shigeyuki Suda ,  Naoto Abe

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/7023 ,  G03F9/7049

摘要： A method of detecting relative positional deviation of first and second substrates, wherein first and second marks with optical powers are formed on the first and second substrates. A radiation beam is projected to the first substrate and, as a result, the first and second marks produce a signal beam whose position of incidence upon a predetermined plane is changeable with the relative positional deviation of the first and second substrates. A sensor is disposed adjacent to the predetermined plane and receives the signal beam to produce an output signal corresponding to the position of incidence of the signal beam upon the sensor. Here, a reference mark is provided to produce, when irradiated with a radiation beam, a reference beam so that it advances along a light path substantially the same as the light path for the signal beam to the sensor when the first and second substrates are in a predetermined positional relation. The produced reference beam is received by the sensor, whereby a reference signal corresponding to the position of incidence of the reference beam upon the sensor is obtained. The relative position of the first and second substrates can be detected on the basis of the output signal and the reference signal.

公开(公告)号：US5073017A

公开(公告)日：1991-12-17

申请号：US434578

申请日：1989-11-13

申请人： Shigeyuki Suda

发明人： Shigeyuki Suda

IPC分类号： G02B9/34 ,  G02B13/00 ,  G02B27/64

CPC分类号： G02B27/646

摘要： A telephoto lens is provided, in succession from the object side to the image surface side, with a first lens component having a positive refractive power and a second lens component having a negative refractive power. At least one curved lens surface of the second lens component is inclined relative to the optic axis to thereby deflect the image. Particularly the lens surface which near the image surface is inclined.

摘要翻译： 从物体侧到图像面侧依次设置有具有正折光力的第一透镜部件和具有负屈光力的第二透镜部件的长焦镜头。 第二透镜部件的至少一个弯曲透镜表面相对于光轴倾斜，从而偏转图像。 特别是靠近图像表面的透镜表面倾斜。