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43 条记录 (耗时 0.035 秒)

    Alignment system
    4.
    发明授权
    Alignment system 失效
    对齐系统

    公开(公告)号：US5112133A

    公开(公告)日：1992-05-12

    申请号：US769495

    申请日：1991-10-01

    申请人： Hiroshi Kurosawa ,  Koji Uda ,  Kunitaka Ozawa ,  Shunichi Uzawa ,  Ryuichi Ebinuma ,  Takao Kariya

    发明人： Hiroshi Kurosawa ,  Koji Uda ,  Kunitaka Ozawa ,  Shunichi Uzawa ,  Ryuichi Ebinuma ,  Takao Kariya

    IPC分类号： G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68

    CPC分类号： G03F9/70 ,  H01L21/681 ,  H01L21/682 ,  Y10T307/786

    摘要： An alignment system usable in an exposure apparatus for printing a pattern of a mask on a wafer, for aligning the mask and the wafer, is disclosed. The system includes a plurality of position detecting devices; a plurality of driving stages corresponding to the position detecting devices, respectively, each driving stage being adapted to move a corresponding one of the position detecting devices two-dimensionally along a plane which is substantially opposed to the mask; a plurality of contacts corresponding to the position detecting devices, respectively, each contact being provided at an end portion of a corresponding one of the position detecting devices, along the plane and facing the pattern side; a detecting device for detecting mutual approach of the position detecting devices through at least one of the contacts; and a control device for controlling movement of at least one of the driving stages in accordance with the detection by the detecting device.

    Exposure apparatus
    5.
    发明授权
    Exposure apparatus 失效
    曝光装置

    公开(公告)号：US5377251A

    公开(公告)日：1994-12-27

    申请号：US203498

    申请日：1994-02-28

    申请人： Nobutoshi Mizusawa ,  Ryuichi Ebinuma ,  Hiroshi Kurosawa ,  Koji Uda ,  Takao Kariya ,  Shumichi Uzawa

    发明人： Nobutoshi Mizusawa ,  Ryuichi Ebinuma ,  Hiroshi Kurosawa ,  Koji Uda ,  Takao Kariya ,  Shumichi Uzawa

    IPC分类号： G03F7/20 ,  G21K5/00

    CPC分类号： G03F7/70008 ,  G03F7/702

    摘要： An exposure method for manufacture of semiconductor devices, includes moving a shutter having an edge so that the edge is related to a predetermined exposure region; projecting an exposure beam to the edge of the shutter and to at least a portion of the exposure region; determining a position of a shadow of the edge of the shutter formed by the exposure beam with respect to a predetermined coordinate system related to movement of a movable chuck; adjusting the shutter in accordance with the determination; placing a substrate on the chuck; moving the chuck so that the substrate is related to the exposure region; and controlling the exposure of the substrate with the exposure beam through the shutter.

    摘要翻译： 一种用于制造半导体器件的曝光方法，包括移动具有边缘的快门，使得边缘与预定曝光区域相关; 将曝光光束投影到所述光闸的边缘和所述曝光区域的至少一部分; 确定由曝光光束形成的快门的边缘相对于与可移动卡盘移动有关的预定坐标系的位置; 根据确定调整快门; 将基板放置在卡盘上; 移动卡盘使得基板与曝光区域相关; 以及通过所述快门控制所述基板与曝光光束的曝光。

    Substrate holding device and exposing apparatus using the same
    6.
    发明授权
    Substrate holding device and exposing apparatus using the same 失效
    基板保持装置和使用其的曝光装置

    公开(公告)号：US5883932A

    公开(公告)日：1999-03-16

    申请号：US464225

    申请日：1995-06-05

    申请人： Yuji Chiba ,  Nobutoshi Mizusawa ,  Kazunori Iwamoto ,  Yutaka Tanaka ,  Shinichi Hara ,  Mitsuji Marumo ,  Shin Matsui ,  Hiroshi Kurosawa

    发明人： Yuji Chiba ,  Nobutoshi Mizusawa ,  Kazunori Iwamoto ,  Yutaka Tanaka ,  Shinichi Hara ,  Mitsuji Marumo ,  Shin Matsui ,  Hiroshi Kurosawa

    IPC分类号： B23Q3/08 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/683 ,  H01J37/20

    CPC分类号： G03F7/707 ,  H01L21/6838 ,  H01J2237/20 ,  H01J2237/3175 ,  Y10T279/11

    摘要： A substrate holding apparatus in which first and second vacuum clamping devices each have a holding surface for holding a portion of a substrate, a first driving device for rotating the first vacuum clamping device relative to the second vacuum clamping device, and a second driving device for reciprocally moving the first vacuum clamping device between a position in which it protrudes by a predetermined amount from the holding surface of the second vacuum clamping device and a position in which it does not protrude from that holding surface. Also disclosed is a substrate holding device in which a vacuum clamping device creates a vacuum clamp force on the holding surface thereof, a cylindrical delivering member surrounds at least a portion of the holding surface and is reciprocally movable between a position in which it protrudes by a predetermined amount from the holding surface and a position in which it does not protrude from the holding surface, and a driving device for moving the delivering member.

    摘要翻译： 一种基板保持装置，其中第一和第二真空夹紧装置各自具有用于保持基板的一部分的保持表面，用于使第一真空夹紧装置相对于第二真空夹紧装置旋转的第一驱动装置，以及用于 在第一真空夹紧装置从第二真空夹紧装置的保持表面突出预定量的位置和不从该保持表面突出的位置之间往复移动第一真空夹紧装置。 还公开了一种基板保持装置，其中真空夹持装置在其保持表面上产生真空夹紧力，圆柱形输送构件围绕保持表面的至少一部分，并且可在其突出位置之间往复运动 从保持表面预定量和不从保持表面突出的位置，以及用于移动输送构件的驱动装置。

    Exposure control in an X-ray exposure apparatus
    7.
    发明授权
    Exposure control in an X-ray exposure apparatus 失效
    X射线曝光装置中的曝光控制

    公开(公告)号：US5365561A

    公开(公告)日：1994-11-15

    申请号：US182535

    申请日：1994-01-18

    申请人： Ryuichi Ebinuma ,  Nobutoshi Mizusawa ,  Masayuki Suzuki ,  Shinichirou Uno ,  Tetsuzo Mori ,  Hiroshi Kurosawa

    发明人： Ryuichi Ebinuma ,  Nobutoshi Mizusawa ,  Masayuki Suzuki ,  Shinichirou Uno ,  Tetsuzo Mori ,  Hiroshi Kurosawa

    IPC分类号： G03F7/20 ,  G21K1/04 ,  G21K5/00

    CPC分类号： G03F7/70058 ,  G03F7/702 ,  G21K1/04 ,  G21K1/043

    摘要： Exposure control method and apparatus particularly suitably usable in an X-ray exposure apparatus, for exposing a mask and a wafer to radiation (X-rays) from a synchrotron to transfer a pattern formed on a mask onto the wafer, is disclosed. A shutter device for controlling passage and interception of the synchrotron radiation is provided between the synchrotron and the wafer. The shutter device includes a blade member having a leading edge and a trailing edge which are rectilinearly movable in a direction in which there exists non-uniformness in illuminance of the radiation. The leading edge is used to determine the timing of start of passage of the radiation to the wafer, while the trailing edge is used to determine the timing of interception of the radiation. The moving speeds of the leading edge and the trailing edge are controlled independently of each other to provide different exposure times for different portions of an exposure region on the wafer, in accordance with the non-uniformness in illuminance. By this, the amount of absorption of radiation by a resist material on the wafer can be make uniform throughout the exposure region.

    摘要翻译： 公开了一种特别适用于X射线曝光装置的曝光控制方法和装置，用于将掩模和晶片暴露于来自同步加速器的辐射（X射线），以将形成在掩模上的图案转印到晶片上。 在同步加速器和晶片之间提供用于控制同步加速器辐射的通过和截取的快门装置。 快门装置包括具有前缘和后缘的叶片构件，其沿着存在辐射照度不均匀的方向可直线运动。 前沿用于确定辐射通向晶片的时间，而后缘用于确定辐射截取的时间。 前缘和后缘的移动速度彼此独立地控制，以根据照度的不均匀性为晶片上的曝光区域的不同部分提供不同的曝光时间。 由此，可以使整个曝光区域中的抗蚀剂材料在晶片上的辐射吸收量均匀。

    Exposure apparatus and device manufacturing method
    9.
    发明授权
    Exposure apparatus and device manufacturing method 失效
    曝光装置和装置制造方法

    公开(公告)号：US06204911B1

    公开(公告)日：2001-03-20

    申请号：US08705089

    申请日：1996-08-29

    申请人： Hiroshi Kurosawa ,  Kunitaka Ozawa ,  Noriyasu Hasegawa ,  Keiji Yoshimura

    发明人： Hiroshi Kurosawa ,  Kunitaka Ozawa ,  Noriyasu Hasegawa ,  Keiji Yoshimura

    IPC分类号： G03B2742

    CPC分类号： G03F7/70558 ,  G03F7/70358

    摘要： An exposure apparatus includes a light source for providing pulse light, a mask scanner for scanning a mask having a pattern, a wafer scanner for projecting a wafer onto which the pattern is to be projected and a light emission period determining device. The mask scanner and the wafer scanner scan the mask and the wafer in a timed relation so that the mask is illuminated while superposing portions of an illumination region defined by the pulse light and being narrower than the pattern such that the pattern is lithographically transferred onto the wafer. The light emission period determining device determines a period of emission of the pulse light, prior to an actual exposure process, wherein the emission period can be changed in accordance with a required precision of an integrated exposure amount.

    摘要翻译： 曝光装置包括用于提供脉冲光的光源，用于扫描具有图案的掩模的掩模扫描器，用于投影其上将要投射图案的晶片的晶片扫描器和发光周期确定装置。 掩模扫描器和晶片扫描器以定时关系扫描掩模和晶片，使得掩模被照亮，同时叠加由脉冲光限定的照明区域的部分并且比图案窄，使得图案被光刻转印到 晶圆。 发光周期确定装置在实际曝光处理之前确定脉冲光的发射周期，其中发光周期可以根据所需的综合曝光量的精度而改变。