公开(公告)号：US5182615A

公开(公告)日：1993-01-26

申请号：US563420

申请日：1990-08-07

申请人： Hiroshi Kurosawa ,  Koji Uda ,  Kunitaka Ozawa ,  Shunichi Uzawa ,  Nobutoshi Mizusawa ,  Shigeyuki Suda ,  Noriyuki Nose ,  Takao Kariya

发明人： Hiroshi Kurosawa ,  Koji Uda ,  Kunitaka Ozawa ,  Shunichi Uzawa ,  Nobutoshi Mizusawa ,  Shigeyuki Suda ,  Noriyuki Nose ,  Takao Kariya

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F7/70691 ,  G03F9/7049

摘要： An exposure apparatus for printing a pattern of a mask to a wafer includes a mask moving mechanism for moving the mask; a wafer moving mechanism or moving the wafer along a predetermined movement coordinate; a measuring system for measuring an error with respect to the movement coordinate, resulting from the movement of the mask by the mask moving mechanism; and a memorizing device for memorizing a data table prepared on the basis of the error measured by the measuring system; wherein the wafer moving mechanism uses the data in the data table when it moves the wafer for positioning of the wafer with respect to the mask.

公开(公告)号：US5161176A

公开(公告)日：1992-11-03

申请号：US802705

申请日：1991-12-06

申请人： Ryuichi Ebinuma ,  Kunitaka Ozawa ,  Takao Kariya ,  Shunichi Uzawa ,  Noriyuki Nose

发明人： Ryuichi Ebinuma ,  Kunitaka Ozawa ,  Takao Kariya ,  Shunichi Uzawa ,  Noriyuki Nose

IPC分类号： G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/70066

摘要： An exposure apparatus includes a light source for exposing a wafer through a mask; a light blocking device being movable and effective to block light from the light source to limit an exposure zone; a positional deviation detecting system for detecting positional deviation between the mask and the wafer; and a drive control system for moving the light blocking device to execute position control therefor, on the basis of a detection signal from the positional deviation detecting system.

摘要翻译： 曝光装置包括用于通过掩模曝光晶片的光源; 遮光装置可移动并且有效地阻挡来自光源的光以限制曝光区域; 用于检测掩模和晶片之间的位置偏差的位置偏差检测系统; 以及驱动控制系统，用于基于来自位置偏差检测系统的检测信号移动遮光装置以执行其位置控制。

公开(公告)号：US6018395A

公开(公告)日：2000-01-25

申请号：US766928

申请日：1996-12-16

申请人： Makiko Mori ,  Shunichi Uzawa ,  Kunitaka Ozawa ,  Hirohisa Ohta ,  Noriyuki Nose

发明人： Makiko Mori ,  Shunichi Uzawa ,  Kunitaka Ozawa ,  Hirohisa Ohta ,  Noriyuki Nose

IPC分类号： G03F9/00 ,  G01B11/00

CPC分类号： G03F9/70

摘要： An alignment method useable with an original having a pattern and a substrate having a surface area on which the pattern of the original is printed. The alignment method comprises detecting plural marks, calculating plural times, the amount of rotational deviation on the basis of different combinations of marks, calculating the quantity of rotational correction of the original and the substrate by using the computed rotational deviations, and aligning on the basis of the calculated quantity of the rotational deviation.

摘要翻译： 可用于具有图案的原稿的对准方法和具有印刷原稿图案的表面积的基板。 对准方法包括基于不同的标记组合来检测多个标记，多次计算旋转偏差量，通过使用计算出的旋转偏差来计算原件和基板的旋转校正量，并基于 的计算量的旋转偏差。

公开(公告)号：US5142156A

公开(公告)日：1992-08-25

申请号：US588947

申请日：1990-09-27

申请人： Kunitaka Ozawa ,  Shunichi Uzawa ,  Hirohisa Ohta ,  Makiko Mori ,  Noriyuki Nose

发明人： Kunitaka Ozawa ,  Shunichi Uzawa ,  Hirohisa Ohta ,  Makiko Mori ,  Noriyuki Nose

IPC分类号： G03F7/20 ,  G03F9/00 ,  G05D3/12 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/70883 ,  G03F9/70

摘要： An alignment method for use in an exposure apparatus for printing a pattern of an original onto different surface areas of a substrate, the alignment method comprising the steps of: providing alignment marks around the pattern of the original and placing the original on an original supporting stage; providing a reference mark on an X-Y stage for supporting the substrate and being movable in X and Y directions, and moving the X-Y stage so as to place the reference mark at those positions, in sequence, which correspond to the alignment marks of the original, respectively, and which are preset in respect to a stage coordinate system; detecting, in sequence, positional errors of the alignment marks of the original with respect to the corresponding set positions, respectively, by using the reference mark and through the movement of the X-Y stage, wherein the positional errors are detected by use of positional error detectors which are provided to be associated with the alignment marks of the original, respectively; calculating a rotational error of the original with respect to the stage coordinate system, in .theta. direction, by using the positional errors; and rotationally moving the original supporting table in the .theta. direction so as to correct the rotational error.

公开(公告)号：US5459573A

公开(公告)日：1995-10-17

申请号：US291747

申请日：1994-08-17

申请人： Naoto Abe ,  Koji Uda ,  Isamu Shimoda ,  Shunichi Uzawa ,  Noriyuki Nose

发明人： Naoto Abe ,  Koji Uda ,  Isamu Shimoda ,  Shunichi Uzawa ,  Noriyuki Nose

IPC分类号： G01B11/00 ,  G01D5/26 ,  G03F9/00 ,  H01L21/68 ,  H01L31/12 ,  H01L33/00 ,  H01S5/06 ,  H01S5/062 ,  H01S5/0683 ,  G01N21/86

CPC分类号： G03F9/7088 ,  G03F9/7049 ,  H01L21/68 ,  H01L21/682 ,  H01S5/06835 ,  H01S5/06216

摘要： A position detecting apparatus usable for aligning mask and a semiconductor wafer, wherein a laser beam produced by a semiconductor laser is projected through a predetermined optical system to alignment marks formed on the mask and the wafer, and the light reflected by the marks are detected by an accumulation type sensor to produce an electrical signal, from which the relative positional relation between the mask and the wafer are detected on the basis of the electrical signal. To obtain proper mark signals, the quantity of light incident on the accumulation sensor is controlled. In this apparatus, the beam emitting strength of the semiconductor laser is made constant, and the control of thee amount of light incident on the accumulation sensor is effected by controlling the operation period of the semiconductor laser. In addition, the actuation timing of the semiconductor laser is advanced from the accumulation start of the accumulation type sensor by the time required for the semiconductor laser to be thermally stabilized after its actuation. The mark detection signal produced by the accumulation sensor is precise.

摘要翻译： 一种可用于对准掩模和半导体晶片的位置检测装置，其中由半导体激光器产生的激光束通过预定的光学系统投射到形成在掩模和晶片上的对准标记，并且由标记反射的光被 用于产生电信号的累积型传感器，根据电信号检测掩模和晶片之间的相对位置关系。 为了获得适当的标记信号，控制入射在累积传感器上的光量。 在该装置中，半导体激光器的发射光强度保持恒定，并且通过控制半导体激光器的工作周期来控制入射到积聚传感器上的光量。 此外，半导体激光器的激活定时从累积型传感器的累积开始到半导体激光器在其致动之后被热稳定所需的时间前进。 由积累传感器产生的标记检测信号是精确的。

公开(公告)号：US5028797A

公开(公告)日：1991-07-02

申请号：US413739

申请日：1989-09-28

申请人： Naoto Abe ,  Shigeyuki Suda ,  Koji Uda ,  Hirohisa Ohta ,  Noriyuki Nose

发明人： Naoto Abe ,  Shigeyuki Suda ,  Koji Uda ,  Hirohisa Ohta ,  Noriyuki Nose

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/7096 ,  G03F9/7049

摘要： An alignment system for aligning a mask and a wafer into a predetermined positional relationship uses alignment marks provided on the mask and the water. In this system, light from a light source is directed to the alignment marks of the mask and the wafer and, then, the light from these alignment marks is detected by an accumulation type photoelectric converting device, for alignment of the mask and the wafer. The accumulation time of the photoelectric converting device is controlled to be sufficiently longer than or to be equal to a multiple, by an integral number, of the period of relative and natural vibration of the mask and the wafer. This makes it possible to reduce the effect of the relative vibration of the mask and the wafer upon the alignment result and, therefore, makes it possible to enhance the alignment precision.

公开(公告)号：US5495336A

公开(公告)日：1996-02-27

申请号：US441982

申请日：1995-05-16

申请人： Noriyuki Nose ,  Kunitaka Ozawa ,  Masanobu Hasegawa

发明人： Noriyuki Nose ,  Kunitaka Ozawa ,  Masanobu Hasegawa

IPC分类号： G03F9/00 ,  G01B11/00

CPC分类号： G03F9/70

摘要： A method of detecting the positional relationship between a first object and a second object is disclosed which includes projecting a first light through a convex lens mark of the first object and a concave lens pattern of the second object onto a first plane and projecting a second light through a concave lens mark of the first object and a convex lens pattern of the second object onto the first plane, wherein a first spacing between positions of incidence of the first light and the second light on the first plane increases with displacement of the second object relative to the first object in a predetermined direction. The method also includes projecting a third light through a concave lens mark of the first object and a convex lens pattern of the second object onto a second plane and projecting a fourth light through a convex lens mark of the first object and a concave lens pattern of the second object onto the second plane, wherein a second spacing between positions of incidence of the third light and the fourth light on the second plane decreases with displacement of the second object relative to the first object in the predetermined direction. The method also includes determining a reference for the detection of a position of the first object relative to a position of the second object on the basis of the first spacing and the second spacing as they become substantially equal to each other.

摘要翻译： 本发明公开了一种检测第一物体与第二物体之间的位置关系的方法，其中包括将第一物体的凸透镜标记的第一光和第二物体的凹透镜图案投射到第一平面上，并将第二光 通过第一物体的凹透镜标记和第二物体的凸透镜图案到第一平面上，其中第一光的入射位置和第一平面上的第二光的位置之间的第一间隔随着第二物体的位移而增加 相对于第一物体在预定方向上。 该方法还包括通过第一物体的凹透镜标记和第二物体的凸透镜图案将第三光投射到第二平面上，并将第四光通过第一物体的凸透镜标记投射并且将第四光投射到第二物体的凹透镜图案 所述第二物体在所述第二平面上，其中所述第三光的入射位置与所述第二平面上的所述第四光的位置之间的第二间隔随着所述第二物体相对于所述第一物体沿所述预定方向的位移而减小。 该方法还包括基于第一间隔和第二间隔基于彼此基本相等而确定用于检测第一物体相对于第二物体的位置的位置的参考。

公开(公告)号：US5343291A

公开(公告)日：1994-08-30

申请号：US851109

申请日：1992-03-16

申请人： Mitsutoshi Ohwada ,  Masakazu Matsugu ,  Shigeyuki Suda ,  Minoru Yoshii ,  Yukichi Niwa ,  Noriyuki Nose ,  Kenji Saitoh ,  Masanobu Hasegawa

发明人： Mitsutoshi Ohwada ,  Masakazu Matsugu ,  Shigeyuki Suda ,  Minoru Yoshii ,  Yukichi Niwa ,  Noriyuki Nose ,  Kenji Saitoh ,  Masanobu Hasegawa

IPC分类号： G03F9/00 ,  G01B11/02

CPC分类号： G03F9/7023 ,  G03F9/7049

摘要： A device for measuring an interval between two plate-like objects includes a light source for projecting a light toward the objects, a detector for detecting a position of incidence, upon a predetermined surface, of the light projected by the light source and deflected by the two objects, and a calculating portion for measuring the interval of the two objects on the basis of the detection by the detector.

摘要翻译： 用于测量两个板状物体之间的间隔的装置包括：用于向物体投射光的光源;检测器，用于检测由光源投射并被光源偏转的预定表面上的入射位置; 两个物体和用于根据检测器的检测来测量两个物体的间隔的计算部分。

公开(公告)号：US5319444A

公开(公告)日：1994-06-07

申请号：US20464

申请日：1993-02-22

申请人： Kenji Saitoh ,  Masakazu Matsugu ,  Yukichi Niwa ,  Noriyuki Nose ,  Minoru Yoshii ,  Shigeyuki Suda

发明人： Kenji Saitoh ,  Masakazu Matsugu ,  Yukichi Niwa ,  Noriyuki Nose ,  Minoru Yoshii ,  Shigeyuki Suda

IPC分类号： G03F9/00 ,  G01B11/14 ,  G01N21/86

CPC分类号： G03F9/7049

摘要： A method of detecting relative positional deviation between first and second objects. The method includes the steps of providing the first object with a first mark which functions as a lens, providing the second object with a second mark which functions as a lens, providing an optical system between the first and second objects, directing a radiation beam through the first mark and the optical system to the second mark, and detecting any shift of the radiation beam from the second mark irradiated with the radiation beam from the optical system, to detect the relative positional deviation of the first and second objects.

摘要翻译： 一种检测第一和第二物体之间的相对位置偏差的方法。 该方法包括以下步骤：向第一物体提供用作透镜的第一标记，为第二物体提供用作透镜的第二标记，在第一和第二物体之间提供光学系统，引导辐射束通过 第一标记和第二标记的光学系统，并且检测来自用来自光学系统的辐射束照射的第二标记的辐射束的任何偏移，以检测第一和第二物体的相对位置偏差。

公开(公告)号：US5294980A

公开(公告)日：1994-03-15

申请号：US58662

申请日：1993-05-10

申请人： Masakazu Matsugu ,  Kenji Saitoh ,  Yukichi Niwa ,  Noriyuki Nose ,  Ryo Kuroda ,  Shigeyuki Suda

发明人： Masakazu Matsugu ,  Kenji Saitoh ,  Yukichi Niwa ,  Noriyuki Nose ,  Ryo Kuroda ,  Shigeyuki Suda

IPC分类号： G03F9/00 ,  G01B11/00 ,  G01N21/85

CPC分类号： G03F9/70

摘要： A device for detecting a relative positional relationship between first and second objects with respect to a predetermined direction includes an illumination system for irradiating the first object with light, wherein the first and second objects are provided with first and second physical optic elements, respectively, each having a light converging or diverging function in at least one direction and wherein the illumination system illuminates the first physical optic element. A photodetecting system detects light passing through the first object and emanating from the second object, and is operable to detect light convergently or divergently influenced by both of the first and physical optic elements, such that the relative positional relationship between the first and second objects can be detected on the basis of the detection by the photodetecting system. At least one of the first and second physical optic elements has a light converging or diverging function in a direction perpendicular to the one direction and has different focal lengths in the perpendicular direction and in the one direction.

摘要翻译： 用于检测相对于预定方向的第一和第二物体之间的相对位置关系的装置包括用于用光照射第一物体的照明系统，其中第一和第二物体分别设置有第一和第二物理光学元件， 在至少一个方向上具有聚光或发散功能，并且其中所述照明系统照亮所述第一物理光学元件。 光检测系统检测穿过第一物体并从第二物体发出的光，并且可操作以从第一物理光学元件和物理光学元件两者收敛或分散地检测光，使得第一和第二物体之间的相对位置关系 基于光检测系统的检测来检测。 第一和第二物理光学元件中的至少一个在垂直于一个方向的方向上具有聚光或发散功能，并且在垂直方向和一个方向上具有不同的焦距。