利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

43 条记录 (耗时 0.041 秒)

    Exposure method
    4.
    发明授权
    Exposure method 失效
    曝光方法

    公开(公告)号：US5498501A

    公开(公告)日：1996-03-12

    申请号：US416503

    申请日：1995-04-04

    申请人： Isamu Shimoda ,  Takao Kariya ,  Nobutoshi Mizusawa ,  Kunitaka Ozawa ,  Shunichi Uzawa

    发明人： Isamu Shimoda ,  Takao Kariya ,  Nobutoshi Mizusawa ,  Kunitaka Ozawa ,  Shunichi Uzawa

    IPC分类号： G03F7/20 ,  G03F9/00

    CPC分类号： G03F7/70066 ,  G03F7/2022 ,  G03F7/7045 ,  Y10S438/949

    摘要： A method of manufacturing of semiconductor devices, includes exposing different portions of a semiconductor substrate with a first exposure apparatus having a first exposure range; placing and aligning the semiconductor substrate with respect to a second exposure range of a second exposure apparatus, which range is larger than the first exposure range of the first exposure apparatus; detecting an alignment error of each of the portions of the semiconductor substrate as covered by the second exposure range of the second exposure apparatus; calculating an overall alignment error of those portions of the semiconductor substrate with respect to the entire second exposure range of the second exposure apparatus, on the basis of the detected alignment errors; and controlling the exposure operation of the second exposure apparatus on the basis of the calculated overall alignment error.

    摘要翻译： 一种半导体器件的制造方法，包括用具有第一曝光范围的第一曝光装置曝光半导体衬底的不同部分; 将半导体衬底相对于第二曝光装置的第二曝光范围放置和对准，该范围大于第一曝光装置的第一曝光范围; 检测由第二曝光装置的第二曝光范围所覆盖的半导体衬底的每个部分的对准误差; 基于检测到的对准误差，计算半导体衬底的这些部分相对于第二曝光装置的整个第二曝光范围的总体对准误差; 并根据计算的整体对准误差来控制第二曝光装置的曝光操作。

    Exposure apparatus
    8.
    发明授权
    Exposure apparatus 失效

    公开(公告)号：US5150391A

    公开(公告)日：1992-09-22

    申请号：US830449

    申请日：1992-02-05

    申请人： Ryuichi Ebinuma ,  Nobutoshi Mizusawa ,  Takao Kariya ,  Shigeyuki Suda ,  Shunichi Uzawa

    发明人： Ryuichi Ebinuma ,  Nobutoshi Mizusawa ,  Takao Kariya ,  Shigeyuki Suda ,  Shunichi Uzawa

    IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

    CPC分类号： G03F7/70066 ,  G03F7/70858 ,  G03F7/70891 ,  G03F9/70

    摘要： An exposure apparatus for transferring a pattern of an original onto a workpiece, includes a blocking member for defining a rectangular exposure region with respect to at least one of the original and the workpiece, wherein the exposure for the pattern transfer can be effected with the exposure region defined by the blocking member. Plural detection systems detect a positional deviation between the original and the workpiece, each of which is disposed so as to be associated with at least one of four sides of the rectangular exposure region. Plural first movable stages each is provided so as to be associated with at least one of the four sides, and each is adapted to carry thereon one of the detection systems disposed to be associated with a corresponding side. Each first movable stage comprises a single-axis stage movable in a direction parallel to a corresponding side. Plural second stages each carryies thereon corresponding one of the first movable stages, and each comprises a single-axis stage movable in a direction perpendicular to a corresponding side and in a direction parallel to the rectangular exposure region. Each second movable state is operable to displace the light blocking member to change the rectangular exposure region.

    Temperature controlling device for mask and wafer holders
    10.
    发明授权
    Temperature controlling device for mask and wafer holders 失效
    面罩和晶圆座的温度控制装置

    公开(公告)号：US5577552A

    公开(公告)日：1996-11-26

    申请号：US412101

    申请日：1995-03-28

    申请人： Ryuichi Ebinuma ,  Takao Kariya ,  Nobutoshi Mizusawa ,  Koji Uda ,  Eiji Sakamoto ,  Shunichi Uzawa

    发明人： Ryuichi Ebinuma ,  Takao Kariya ,  Nobutoshi Mizusawa ,  Koji Uda ,  Eiji Sakamoto ,  Shunichi Uzawa

    IPC分类号： G03F7/20 ,  G05D23/19 ,  H05K7/20 ,  F28D15/00

    CPC分类号： H05K7/20281 ,  G03F7/707 ,  G03F7/70875 ,  G05D23/1919

    摘要： A temperature controlling device suitably usable in a semiconductor microcircuit manufacturing exposure apparatus exposes a semiconductor wafer to a mask to print a pattern of the mask on the wafer. The device includes a constant-temperature liquid medium supplying system for controlling temperature of a liquid at high precision, a distributing system for distributing the supplied liquid medium into plural flow passages, to supply the liquid medium to plural subjects of control such as, for example, a mask stage, a wafer stage and the like. The device further includes a plurality of temperature controls each being provided in corresponding one of the flow passages, for correction of any variance in temperature of the distributed liquid medium, resulting from pressure loss energies in the respective flow passages. Thus, temperatures of plural subjects of control can be controlled efficiently and with a simple structure.

    摘要翻译： 可适用于半导体微电路制造曝光装置的温度控制装置将半导体晶片暴露于掩模，以将掩模的图案印刷在晶片上。 该装置包括用于高精度地控制液体的温度的恒温液体介质供给系统，用于将供应的液体介质分配到多个流动通道中的分配系统，以将液体介质供应到多个控制对象，例如 ，掩模台，晶片台等。 该装置还包括多个温度控制装置，每个温度控制装置设置在对应的一个流动通道中，用于校正由相应流动通道中的压力损失能量产生的分配液体介质的温度变化。 因此，能够以简单的结构有效地控制多个控制对象的温度。