公开(公告)号：US5863505A

公开(公告)日：1999-01-26

申请号：US862920

申请日：1997-05-27

申请人： Ryutaro Wada ,  Makoto Asao ,  Tsutomu Nishimura ,  Toshio Iwata ,  Kenji Yamaguchi ,  Kiyoshi Tsune

发明人： Ryutaro Wada ,  Makoto Asao ,  Tsutomu Nishimura ,  Toshio Iwata ,  Kenji Yamaguchi ,  Kiyoshi Tsune

IPC分类号： G21F7/00 ,  A61G11/00

CPC分类号： G21F7/00

摘要： The present invention provides an underground-environment simulator which simulates underground environment spaces used for radioactive waste disposal or the like, and has a hermetic box, wherein the carbon dioxide gas concentration inside the box can be adjusted to an optional level, and the atmosphere inside the box can be uniformly and stably maintained. In the underground-environment simulator of the present invention, a carbon dioxide gas feeding means feeds carbon dioxide gas into a circulating gas circulation which controls the atmosphere inside the hermetic box, and the concentration of carbon dioxide gas in the circulating gas is measured and adjusted to a predetermined level while oxygen is removed from the circulating gas in an oxyhydrogen reactor. Accordingly, the carbon dioxide gas concentration can be controlled within a low concentration range, and various underground environments can be accurately simulated by varying the carbon dioxide gas concentration to an optional level.

摘要翻译： 本发明提供一种地下环境模拟器，其模拟用于放射性废物处理等的地下环境空间，并且具有密封箱，其中箱内的二氧化碳气体浓度可以调节到可选的水平，并且内部的气氛 可以均匀且稳定地保持盒子。 在本发明的地下环境模拟器中，二氧化碳气体供给装置将二氧化碳气体供给到控制密封箱内的气氛的循环气体循环中，并且测量和调整循环气体中的二氧化碳气体的浓度 在氧氢反应器中从循环气体除去氧气的同时达到预定水平。 因此，可以将二氧化碳气体浓度控制在低浓度范围内，并且可以通过将二氧化碳气体浓度改变为任意水平来精确地模拟各种地下环境。

公开(公告)号：US09172904B2

公开(公告)日：2015-10-27

申请号：US13360631

申请日：2012-01-27

申请人： Kenji Yamaguchi ,  Masaki Sato ,  Hidehito Taniura

发明人： Kenji Yamaguchi ,  Masaki Sato ,  Hidehito Taniura

IPC分类号： H04N5/77 ,  G11B27/10 ,  H04N9/82

CPC分类号： G11B27/105 ,  H04N5/772 ,  H04N9/8227

摘要： In order to quicken switching of indices and reduce the time required for display after switching, a mobile phone includes a video content specifying portion to specify at least one video content, an index element generating portion to generate a thumbnail for a video content when accepting a generation instruction and to stop generation of the thumbnail when accepting a cancellation instruction, an index element generation requesting portion, in response to the event that a video content is specified by the video content specifying portion, to output a generation instruction including identification information identifying the specified video content to the index element generating portion, and a cancellation instructing portion to output a cancellation instruction to stop generation of the thumbnail for the already specified video content when a new video content is specified before completion of generation of the thumbnail for the already specified video content.

摘要翻译： 为了加快索引的切换和减少切换后显示所需的时间，移动电话包括指定至少一个视频内容的视频内容指定部分，当接收到视频内容时生成用于视频内容的缩略图的索引元素生成部分 响应于由视频内容指定部分指定了视频内容的事件，生成指示，并且在接收到取消指令时停止生成缩略图，索引元素生成请求部分，输出包含识别信息的识别信息的生成指令 指定视频内容到索引元素生成部分，以及消除指示部分，在已经指定的缩略图的生成完成之前指定新的视频内容时，输出取消指令以停止生成已经指定的视频内容的缩略图 视频内容

公开(公告)号：US08986069B2

公开(公告)日：2015-03-24

申请号：US13459421

申请日：2012-04-30

申请人： Tamami Takahashi ,  Masaya Seki ,  Hiroaki Kusa ,  Kenji Yamaguchi ,  Masayuki Nakanishi

发明人： Tamami Takahashi ,  Masaya Seki ,  Hiroaki Kusa ,  Kenji Yamaguchi ,  Masayuki Nakanishi

IPC分类号： B24B9/00 ,  B24B1/00 ,  B24B21/00 ,  B24B9/06 ,  B24B37/04 ,  B24B37/30

CPC分类号： B24B21/002 ,  B24B9/065 ,  B24B21/004 ,  B24B21/008 ,  B24B21/20 ,  B24B27/0076 ,  B24B37/042 ,  B24B37/30 ,  B24B41/068 ,  B24B49/00 ,  Y10T428/24777

摘要： A polishing apparatus polishes a periphery of a substrate. This polishing apparatus includes a rotary holding mechanism configured to hold the substrate horizontally and rotate the substrate, plural polishing head assemblies provided around the substrate, plural tape supplying and recovering mechanisms configured to supply polishing tapes to the plural polishing head assemblies and recover the polishing tapes from the plural polishing head assemblies, and plural moving mechanisms configured to move the plural polishing head assemblies in radial directions of the substrate held by the rotary holding mechanism. The tape supplying and recovering mechanisms are located outwardly of the plural polishing head assemblies in the radial directions of the substrate, and the tape supplying and recovering mechanisms are fixed in position.

摘要翻译： 抛光装置抛光基板的周边。 该抛光装置包括：旋转保持机构，被配置为水平地保持基板并旋转基板;设置在基板周围的多个抛光头组件;多个胶带供给和恢复机构，被配置为向多个抛光头组件提供研磨带，并回收抛光带 以及多个移动机构，其构造成沿着由旋转保持机构保持的基板的径向方向移动多个研磨头组件。 胶带供给和回收机构在基板的径向方向上位于多个研磨头组件的外侧，并且胶带供给和回收机构被固定就位。

公开(公告)号：US08187055B2

公开(公告)日：2012-05-29

申请号：US12292662

申请日：2008-11-24

申请人： Tamami Takahashi ,  Masaya Seki ,  Hiroaki Kusa ,  Kenji Yamaguchi ,  Masayuki Nakanishi

发明人： Tamami Takahashi ,  Masaya Seki ,  Hiroaki Kusa ,  Kenji Yamaguchi ,  Masayuki Nakanishi

IPC分类号： B24B1/00 ,  B24B49/00

CPC分类号： B24B21/002 ,  B24B9/065 ,  B24B21/004 ,  B24B21/008 ,  B24B21/20 ,  B24B27/0076 ,  B24B37/042 ,  B24B37/30 ,  B24B41/068 ,  B24B49/00 ,  Y10T428/24777

摘要： A polishing apparatus polishes a periphery of a substrate. This polishing apparatus includes a rotary holding mechanism configured to hold the substrate horizontally and rotate the substrate, plural polishing head assemblies provided around the substrate, plural tape supplying and recovering mechanisms configured to supply polishing tapes to the plural polishing head assemblies and recover the polishing tapes from the plural polishing head assemblies, and plural moving mechanisms configured to move the plural polishing head assemblies in radial directions of the substrate held by the rotary holding mechanism. The tape supplying and recovering mechanisms are located outwardly of the plural polishing head assemblies in the radial directions of the substrate, and the tape supplying and recovering mechanisms are fixed in position.

摘要翻译： 抛光装置抛光基板的周边。 该抛光装置包括：旋转保持机构，被配置为水平地保持基板并旋转基板;设置在基板周围的多个抛光头组件;多个胶带供给和恢复机构，被配置为向多个抛光头组件提供研磨带，并回收抛光带 以及多个移动机构，其构造成沿着由旋转保持机构保持的基板的径向方向移动多个研磨头组件。 胶带供给和回收机构在基板的径向方向上位于多个研磨头组件的外侧，并且胶带供给和回收机构被固定就位。

公开(公告)号：US07691910B2

公开(公告)日：2010-04-06

申请号：US11918134

申请日：2006-04-11

申请人： Yutaka Ohmori ,  Hirokazu Kato ,  Kenji Yamaguchi

发明人： Yutaka Ohmori ,  Hirokazu Kato ,  Kenji Yamaguchi

IPC分类号： C09K3/00

CPC分类号： C01G25/02 ,  B82Y30/00 ,  C01P2004/64

摘要： There is provided an acidic zirconia sol having compatibility of particle properties and binding properties, and a production method of the same.The present invention relates to a production method of an acidic zirconia sol containing zirconia particles having a particle diameter of less than 20 nm in a content of 10 to 50% by mass, based on the mass of all zirconia particles including: a first process in which an alkaline zirconia sol (A) and a zirconium salt (B) are mixed in a mass ratio (Bs/As) ranging from 0.2 to 5.0 of a mass of a solid content (Bs) which is converted into an amount of ZrO2 in the zirconium salt (B) to a mass of a solid content (As) which is converted into an amount of ZrO2 in the alkaline zirconia sol (A); and a second process in which the resultant mixture is reacted at 80 to 250° C. to produce an acidic zirconia sol.

摘要翻译： 提供了具有颗粒性质和结合性质的相容性的酸性氧化锆溶胶及其制备方法。 本发明涉及以氧化锆粒子的质量计，含有10〜50质量％的粒径小于20nm的氧化锆粒子的酸性氧化锆溶胶的制造方法，其特征在于，包括： 将碱土金属氧化锆溶胶（A）和锆盐（B）以质量比（Bs / As）为0.2〜5.0，以固体成分（Bs）的质量比转化成ZrO 2的量 在碱性氧化锆溶胶（A）中将锆盐（B）转化为一定量的ZrO 2的固体成分（As）的质量; 和第二种方法，其中所得混合物在80-250℃反应生成酸性氧化锆溶胶。

公开(公告)号：US20100037801A1

公开(公告)日：2010-02-18

申请号：US12449214

申请日：2007-02-01

申请人： Yutaka Ohmori ,  Hirotomo Itou ,  Kenji Yamaguchi

发明人： Yutaka Ohmori ,  Hirotomo Itou ,  Kenji Yamaguchi

IPC分类号： C04B14/04

CPC分类号： C01B33/1465 ,  B82Y30/00 ,  C01P2004/64 ,  C01P2006/10 ,  C01P2006/22 ,  C01P2006/40 ,  C09C1/3045

摘要： There is provided a method for producing an elongated-shaped silica sol comprising the following steps: (a) adding an aqueous solution containing a water soluble Ca salt and/or Mg salt to an aqueous colloidal solution of active silicic acid with an SiO2 concentration of 1 to 6% by mass and a pH of 2 to 5 in a mass ratio of CaO and/or MgO to SiO2 in the active silicic acid of 1500 to 15,000 ppm, and mixing; (b) adding alkali metal hydroxide, a water soluble organic base, or water soluble silicate thereof to an aqueous solution obtained through (a) in a determined molar ratio to SiO2, and mixing; (c) heating a mixture obtained through (b) at 85 to 200° C. for 0.5 to 20 hours so as to obtain a colloidal solution; (d) removing, from the colloidal solution obtained through (c), part of water and at least part of anions derived from the aqueous solution containing the water soluble Ca salt and/or Mg salt; and (e) heating a colloidal solution obtained through (d) at a temperature of 80 to 195° C. that is lower than a heating temperature in (c) for 0.5 to 20 hours.

摘要翻译： 提供了一种生产细长形硅溶胶的方法，包括以下步骤：（a）将含有水溶性Ca盐和/或Mg盐的水溶液加入到活性硅酸的水溶胶体溶液中，SiO 2浓度为 1〜6质量％，活性硅酸中CaO和/或MgO与SiO 2的质量比为1500〜15000ppm的pH为2〜5，混合; （b）将碱金属氢氧化物，水溶性有机碱或其水溶性硅酸盐添加到通过（a）以与SiO 2确定的摩尔比获得的水溶液中，并混合; （c）在85〜200℃下加热通过（b）得到的混合物0.5〜20小时，得到胶体溶液; （d）从通过（c）获得的胶体溶液中除去部分水和至少部分源自含有水溶性Ca盐和/或Mg盐的水溶液的阴离子; 和（e）将（d）得到的胶体溶液在（c）中的加热温度低于80〜195℃的温度下加热0.5〜20小时。

公开(公告)号：US20090117828A1

公开(公告)日：2009-05-07

申请号：US10581669

申请日：2005-02-23

申请人： Akihisa Hongo ,  Kenya Ito ,  Kenji Yamaguchi ,  Masayuki Nakanishi

发明人： Akihisa Hongo ,  Kenya Ito ,  Kenji Yamaguchi ,  Masayuki Nakanishi

IPC分类号： B24B49/04 ,  B24B1/04 ,  B24B49/12 ,  B24B9/02 ,  B24B57/02

CPC分类号： B24B37/02 ,  B24B9/065 ,  B24B21/002

摘要： The present invention relates to a polishing apparatus for removing surface roughness produced at a peripheral portion of a substrate, or for removing a film formed on a peripheral portion of a substrate. The polishing apparatus includes a housing (3) for forming a polishing chamber (2) therein, a rotational table (1) for holding and rotating a substrate (W), a polishing tape supply mechanism (6) for supplying a polishing tape (5) into the polishing chamber (2) and supplied to the polishing chamber (2), a polishing head (35) for pressing the polishing tape (5) against a bevel portion of the substrate (W), a liquid supply (50) for supplying a liquid to a front surface and a rear surface of the substrate (W), and a regulation mechanism (16) for making an internal pressure of the polishing chamber (2) being set to be lower than an external pressure of the polishing chamber (2).

摘要翻译： 本发明涉及一种用于去除在基板的周边部分产生的表面粗糙度或用于去除形成在基板的周边部分上的膜的抛光装置。 抛光装置包括用于在其中形成研磨室（2）的壳体（3），用于保持和旋转基底（W）的旋转台（1），用于供应研磨带（5）的研磨带供给机构 ）到抛光室（2）中并供给到抛光室（2），用于将抛光带（5）压靠在基板（W）的斜面部分上的抛光头（35） 将液体供给到所述基板（W）的前表面和后表面;以及调节机构（16），用于使所述研磨室（2）的内部压力被设定为低于所述研磨室 （2）。

公开(公告)号：US20080138272A1

公开(公告)日：2008-06-12

申请号：US11660086

申请日：2005-08-08

申请人： Yutaka Ohmori ,  Hirokazu Kato ,  Yoshinari Koyama ,  Kenji Yamaguchi

发明人： Yutaka Ohmori ,  Hirokazu Kato ,  Yoshinari Koyama ,  Kenji Yamaguchi

IPC分类号： C01B13/18 ,  C01F17/00 ,  C01F5/00 ,  C01F7/02 ,  C01F11/06 ,  C01G9/02 ,  C01G51/04 ,  C01G49/02 ,  C01G29/00 ,  C01G23/04 ,  C01G25/02 ,  C01G19/02

CPC分类号： B01J13/0047 ,  B01J21/06 ,  B01J21/066 ,  B01J23/10 ,  B01J35/0013 ,  B01J37/10 ,  B82Y30/00 ,  C01B13/366 ,  C01F7/448 ,  C01F17/0043 ,  C01G1/02 ,  C01G25/02 ,  C01G30/004 ,  C01P2002/72 ,  C01P2004/04 ,  C01P2004/50 ,  C01P2004/64 ,  C01P2006/10 ,  C01P2006/22 ,  C09C1/407

摘要： It is an object to provide a method for producing stable alkaline metal oxide sols having a uniform particle size distribution. The method comprises the steps of: heating a metal compound at a temperature of 60° C. to 110° C. in an aqueous medium that contains a carbonate of quaternary ammonium; and carrying out hydrothermal processing at a temperature of 110° C. to 250° C. The carbonate of quaternary ammonium is (NR4)2CO3 or NR4HCO3 in which R represents a hydrocarbon group, or a mixture thereof. The metal compound is one, or two or more metal compounds selected from a group of compounds based on a metal having a valence that is bivalent, trivalent, or tetravalent.

摘要翻译： 本发明的目的是提供一种具有均匀粒度分布的稳定的碱金属氧化物溶胶的制造方法。 该方法包括以下步骤：在含有季铵盐的水性介质中，在60℃至110℃的温度下加热金属化合物; 并在110℃至250℃的温度下进行水热处理。季铵盐的碳酸盐为（NR 4）2 CO 3， 或其中R表示烃基的NR 4或NR 4 HCO 3，或其混合物。 金属化合物是选自基于具有二价，三价或四价的价数的金属的一组或两种以上的金属化合物。

公开(公告)号：US20060203310A1

公开(公告)日：2006-09-14

申请号：US11370382

申请日：2006-03-02

申请人： Kenji Yamaguchi ,  Mitsukazu Kurose ,  Nozomu Inoue ,  Ken Ikuma

发明人： Kenji Yamaguchi ,  Mitsukazu Kurose ,  Nozomu Inoue ,  Ken Ikuma

IPC分类号： G03F3/08

CPC分类号： H04N1/40031 ,  H04N1/4015

摘要： Provided is an exposure head controller for controlling a plurality of light-emitting elements arranged in a first direction and exposing a plurality of pixels, including: an exposure data generator for generating, based on pixel exposure data for exposing the respective pixels, a plurality of area exposure data for respectively exposing a plurality of areas in which the respective pixels are divided in a second direction intersecting with the first direction; and an exposure controller for exposing the plurality of pixels by controlling the plurality of light-emitting elements and exposing the plurality of areas based on the area exposure data.

摘要翻译： 提供了一种用于控制沿第一方向布置的多个发光元件并暴露多个像素的曝光头控制器，包括：曝光数据发生器，用于基于用于曝光各个像素的像素曝光数据产生多个像素， 区域曝光数据，用于分别在与第一方向相交的第二方向上分别曝光各像素分割的多个区域; 以及曝光控制器，用于通过控制多个发光元件并基于区域曝光数据曝光多个区域来曝光多个像素。

公开(公告)号：US20060145490A1

公开(公告)日：2006-07-06

申请号：US10524776

申请日：2003-08-27

申请人： Kenji Yamaguchi ,  Yoshihiro Yamamoto ,  Taro Kiguchi ,  Masahiko Sameshima ,  Takashi Hamamoto

发明人： Kenji Yamaguchi ,  Yoshihiro Yamamoto ,  Taro Kiguchi ,  Masahiko Sameshima ,  Takashi Hamamoto

IPC分类号： B60R19/18

CPC分类号： B60R19/18 ,  B60R21/04 ,  B60R21/0428 ,  B60R21/34 ,  B60R2019/186 ,  B60R2019/1866 ,  B60R2019/1873 ,  B60R2019/1886 ,  B60R2021/0414 ,  B60R2021/0435

摘要： There are provided a vehicle impact energy absorbing member which is arranged as an impact energy absorbing member of a simple construction capable of absorbing impact energy with high efficiency, and which is capable of improving the pedestrian protection performance as well as the passenger protection performance, and a vehicle impact energy absorbing structure using the vehicle impact energy absorbing member. More specifically, a compression energy absorbing member 10 using compression deformation and a buckling energy absorbing member 20 using buckling deformation are provided. Impact energy applied to a vehicle body is absorbed by a combination of the two energy absorbing members 10 and 20. Buckling energy absorbing portions 11a and 11b are also provided which have a buckling characteristic such that a peak value of impact force is equal to or smaller than a set value and in which a setting is made such that at least one of impact timing for starting absorption of impact energy and peak value timing for making the impact force have a peak value after collision is changed in a stepping manner or continuously. Impact energy applied to the vehicle body is absorbed by buckling deformation of the buckling energy absorbing portions 11a and 11b.

摘要翻译： 提供了一种车辆冲击能量吸收构件，其被布置为能够以高效率吸收冲击能量的简单结构的冲击能量吸收构件，并且能够改善行人保护性能以及乘客保护性能，以及 使用车辆冲击能量吸收构件的车辆冲击能量吸收结构。 更具体地，提供使用压缩变形的压缩能量吸收构件10和使用屈曲变形的屈曲能量吸收构件20。 施加到车体的冲击能量被两个能量吸收构件10和20的组合吸收。 还提供了弯曲能量吸收部分11a和11b，其具有使冲击力的峰值等于或小于设定值的弯曲特性，并且其中设置使得至少一个冲击正时为 冲击力的开始吸收和使冲击力具有碰撞后的峰值的峰值时间以步进方式或连续地改变。 施加到车体的冲击能量被屈曲能量吸收部分11a和11b的屈曲变形所吸收。